-
公开(公告)号：US20160268097A1
公开(公告)日：2016-09-15
申请号：US15160972
申请日：2016-05-20
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Michael R. Rice , Ron Naftali , Natan Schlimoff , Igor Krivts (Krayvitz) , Israel Avneri , Yoram Uziel , Zvika Rozenberg , Erez Admoni , Yochanan Madmon
CPC classification number: H01J37/18 , G01N21/9501 , G01N2201/023 , G02B21/26 , H01J37/20 , H01J2237/022 , H01J2237/182 , H01J2237/202 , H01L21/67126 , H01L21/6719 , H01L21/67196 , H01L21/67242
Abstract: Chamber elements defining an internal chamber to be utilized during a substrate related stage selected from the group consisting of substrate manufacturing stage and substrate inspection stage, the chamber elements comprising: a first element having a first surface; a second element having a second surface about the periphery of the internal chamber; a third element connected to the second element; and a clamping mechanism that is connected to the second and third elements and is arranged to press the second element towards the first element; wherein a first area of the first surface and a second area of the second surface come into proximity with each other at a first interface; wherein the first surface is positioned above the second surface; wherein a gas groove and a vacuum groove are formed in the second area; wherein the second element comprises a gas conduit that is arranged to provide gas to the gas groove and a vacuum conduit that is arranged to provide vacuum to the vacuum groove; wherein a provision of the gas and the vacuum assists in a formation of a gas cushion between the first and second areas; wherein the chamber elements are operable to partially surround a first portion of a movement system and a substrate during the substrate related stage, the movement system is arranged to introduce a movement of the first element in relation to the second element and the third element, wherein the gas cushion maintains predefined conditions in the internal chamber during the movement.
Abstract translation: 腔室元件限定在从由衬底制造阶段和衬底检查阶段组成的组中选择的衬底相关阶段期间被利用的内部室，所述室元件包括：具有第一表面的第一元件; 第二元件，其具有围绕所述内部腔室的周边的第二表面; 连接到第二元件的第三元件; 以及夹紧机构，其连接到所述第二和第三元件并且被布置成朝向所述第一元件按压所述第二元件; 其中所述第一表面的第一区域和所述第二表面的第二区域在第一界面处彼此接近; 其中所述第一表面位于所述第二表面上方; 其中在所述第二区域中形成气体槽和真空槽; 其中所述第二元件包括气体管道，所述气体管道被布置成向所述气体槽提供气体;以及真空管道，其布置成向所述真空槽提供真空; 其中所述气体和所述真空的提供有助于在所述第一和第二区域之间形成气垫; 其中所述室元件可操作以在所述基板相关级期间部分地包围运动系统和基板的第一部分，所述运动系统布置成引入所述第一元件相对于所述第二元件和所述第三元件的运动，其中 气垫在运动过程中保持内腔中的预定条件。
-
公开(公告)号：US20160163570A1
公开(公告)日：2016-06-09
申请号：US15040904
申请日：2016-02-10
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Michael R. Rice , Paul Reuter , William (Ty) Weaver , Travis Morey , Natan Schlimoff , Igor Krivts (Krayvitz) , Israel Avneri , Yoram Uziel , Erez Admoni
IPC: H01L21/67 , H01L21/687 , H01L21/677
CPC classification number: H01L21/67126 , H01L21/67748 , H01L21/67751 , H01L21/68714
Abstract: According to an embodiment of the invention, there is provided a system, comprising: a first chamber; a second chamber; a chuck; a movement system; wherein the first chamber comprises: a first element that has a first surface; a first chamber housing that comprises a second surface; wherein the first surface and the second surface come into proximity with each other at a first interface; a supporting element for supporting the chuck when the chuck is positioned within the first chamber; and a first dynamic seal formed at the first interface and is arranged to seal the first chamber from the movement system; wherein the second chamber comprises: a second chamber housing; a movement system that is arranged to introduce movement between (a) the first chamber housing and (b) the first element and the chuck; and a movement control element for mechanically coupling the first element to the movement system.
Abstract translation: 根据本发明的实施例，提供了一种系统，包括：第一室; 第二个房间 一个卡盘 运动系统; 其中所述第一室包括：具有第一表面的第一元件; 包括第二表面的第一腔室; 其中所述第一表面和所述第二表面在第一界面处彼此接近; 用于当所述卡盘位于所述第一腔室内时支撑所述卡盘的支撑元件; 以及第一动态密封件，其形成在所述第一界面处并且被布置成将所述第一腔室与所述运动系统密封; 其中所述第二腔室包括：第二腔室壳体; 运动系统，被布置成引入（a）第一室壳体和（b）第一元件和卡盘之间的运动; 以及用于将第一元件机械地联接到移动系统的移动控制元件。
-
3.发明公开公开(公告)号：US20240290572A1
公开(公告)日：2024-08-29
申请号：US18115689
申请日：2023-02-28
Applicant: Applied Materials Israel Ltd.
Inventor： Ofer Dudovitch , Erez Admoni
IPC: H01J37/20 , H01L21/683
CPC classification number: H01J37/20 , H01L21/6833 , H01J2237/2007 , H01J2237/20235
Abstract: A chuck that supports a sample in a processing chamber and comprises: a support plate formed from a dielectric material, the support plate including an upper planar support surface sized and shaped to retain a substrate disposed on the support plate; one or more electrodes disposed within the support plate proximate the upper planar support surface; a plurality of lift pin holes formed completely through the support plate; a plurality of stub cavities formed within the support plate, each stub cavity having an opening at the upper planar support surface; a plurality of retractable stubs corresponding in number to the plurality of stub cavities, wherein each retractable stub is disposed in a unique one of the stub cavities; and a stub lift mechanism operable to move each retractable stub in the plurality of stubs between a down position and an up position, wherein in the down position a distal end of the retractable stub is disposed within its respective stub cavity and recessed below the upper planar support surface and the up position the distal end of the retractable stub protrudes above the upper planar support surface through the stub cavity opening.
-
公开(公告)号：US20190085968A1
公开(公告)日：2019-03-21
申请号：US15709271
申请日：2017-09-19
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Erez Admoni , Efim Vinnitsky
IPC: F16H57/04
Abstract: A method and a lubrication system for lubricating a transmission system component. The lubrication system may include a lubrication system reservoir for storing a lubrication liquid; and a distribution system. The distribution system may be configured to refill, with the lubrication liquid, a transmission system reservoir that is configured to lubricate the transmission system component. The refill occurs while the transmission system component and the lubrication system are positioned within a vacuum chamber.
-
公开(公告)号：US09488924B2
公开(公告)日：2016-11-08
申请号：US14149677
申请日：2014-01-07
Applicant: APPLIED MATERIALS ISRAEL, LTD.
Inventor： Mariano Abramson , Hadar Mazaki , Erez Admoni , Israel Avneri
IPC: G03B27/42 , G03F7/20 , H01L21/67 , H01L21/677
CPC classification number: G03F7/70916 , H01L21/67028 , H01L21/6776
Abstract: A system that may include a mechanical stage that is arranged to move an object along a predetermined path in relation to an optical module during an illumination of the object by the optical module; a structural support element that is arranged to support at least a part of the optical module; a gas flow module that is arranged to direct clean gas towards the object through gas flow module openings that define a coverage area that is (a) bigger than the object and (b) is positioned directly above at least a majority of the object when the object is positioned anywhere along the predetermined path.
Abstract translation: 一种系统，其可以包括机械台，所述机械台被布置成通过所述光学模块在所述物体的照明期间沿着与光学模块相关的预定路径移动物体; 布置成支撑所述光学模块的至少一部分的结构支撑元件; 气体流动模块，其布置成通过气流模块开口将清洁气体引向物体，所述气流模块开口限定了（a）比物体大的覆盖区域，并且（b）直接位于物体的至少大部分上方， 物体位于沿着预定路径的任何地方。
-
Patent Agency Ranking
公开(公告)号：US10056274B2
公开(公告)日：2018-08-21
申请号：US15040904
申请日：2016-02-10
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Michael R. Rice , Paul Reuter , William (Ty) Weaver , Travis Morey , Natan Schlimoff , Igor Krivts (Krayvitz) , Israel Avneri , Yoram Uziel , Erez Admoni
IPC: H01L21/67 , H01L21/68 , H01L21/677 , H01L21/687
CPC classification number: H01L21/67126 , H01L21/67748 , H01L21/67751 , H01L21/68714
Abstract: According to an embodiment of the invention, there is provided a system, comprising: a first chamber; a second chamber; a chuck; a movement system; wherein the first chamber comprises: a first element that has a first surface; a first chamber housing that comprises a second surface; wherein the first surface and the second surface come into proximity with each other at a first interface; a supporting element for supporting the chuck when the chuck is positioned within the first chamber; and a first dynamic seal formed at the first interface and is arranged to seal the first chamber from the movement system; wherein the second chamber comprises: a second chamber housing; a movement system that is arranged to introduce movement between (a) the first chamber housing and (b) the first element and the chuck; and a movement control element for mechanically coupling the first element to the movement system.
-
公开(公告)号：US20150192868A1
公开(公告)日：2015-07-09
申请号：US14149677
申请日：2014-01-07
Applicant: APPLIED MATERIALS ISRAEL, LTD.
Inventor： Mariano Abramson , Hadar Mazaki , Erez Admoni , Israel Avneri
IPC: G03F7/20 , H01L21/677 , H01L21/02
CPC classification number: G03F7/70916 , H01L21/67028 , H01L21/6776
Abstract: A system that may include a mechanical stage that is arranged to move an object along a predetermined path in relation to an optical module during an illumination of the object by the optical module; a structural support element that is arranged to support at least a part of the optical module; a gas flow module that is arranged to direct clean gas towards the object through gas flow module openings that define a coverage area that is (a) bigger than the object and (b) is positioned directly above at least a majority of the object when the object is positioned anywhere along the predetermined path.
Abstract translation: 一种系统，其可以包括机械台，所述机械台被布置成通过所述光学模块在所述物体的照明期间沿着与光学模块相关的预定路径移动物体; 布置成支撑所述光学模块的至少一部分的结构支撑元件; 气体流动模块，其布置成通过气流模块开口将清洁气体引向物体，所述气流模块开口限定了（a）比物体大的覆盖区域，并且（b）直接位于物体的至少大部分上方， 物体位于沿着预定路径的任何地方。
-
公开(公告)号：US20150075659A1
公开(公告)日：2015-03-19
申请号：US14456258
申请日：2014-08-11
Applicant: Applied Materials Israel, Ltd.
Inventor： Michael R. Rice , Natan Schlimoff , Igor Krivts (Krayvitz) , Israel Avneri , Yoram Uziel , Erez Admoni , Paul Reuter , William (Ty) Weaver
IPC: F16K3/16 , F16K31/124 , F16K3/02
CPC classification number: F16K3/0236 , F16K3/0227 , F16K3/188 , F16K25/02 , F16K39/04 , F16K51/02 , Y10T137/877
Abstract: According to an embodiment of the invention, there is provided a slit valve, comprising: a first slit valve portion having a first window therethrough, the first window is sized to permit passage of an object through the first window; wherein the first window is surrounded by a first area of the first slit valve portion; a second slit valve portion that comprises a first sealing element and a first positioning module; wherein the first positioning module is arranged to move the first sealing element in relation to the first window; wherein at least one slit valve portion of the first and second slit valve portions comprises at least one first gas opening for emitting pressurized gas so as to assist in a creation of a first gas cushion between the first area and the first sealing element when the first sealing element is placed adjacent to the first window thus creating a seal between the first and second slit valve portions.
Abstract translation: 根据本发明的实施例，提供了一种狭缝阀，包括：第一狭缝阀部分，其具有穿过其中的第一窗口，第一窗口的尺寸设定成允许物体通过第一窗口; 其中所述第一窗口被所述第一狭缝阀部分的第一区域包围; 第二狭缝阀部分，其包括第一密封元件和第一定位模块; 其中所述第一定位模块被布置成相对于所述第一窗口移动所述第一密封元件; 其中所述第一和第二狭缝阀部分的至少一个狭缝阀部分包括用于发射加压气体的至少一个第一气体开口，以便当所述第一和第二狭缝阀部分在所述第一和第二狭缝阀部分的所述第一和第二密封元件之间产生第一气垫时， 密封元件被放置成与第一窗口相邻，从而在第一和第二狭缝阀部分之间形成密封。
-
公开(公告)号：US20250065509A1
公开(公告)日：2025-02-27
申请号：US18236322
申请日：2023-08-21
Applicant: Applied Materials Israel Ltd.
Inventor： Hagay Cafri , Erez Admoni
Abstract: An apparatus that includes an end effector for handling and transporting wafers, the end effector including: a base portion having a first end adapted to be attached to a robot; a wafer support platform having a surface to support a wafer, a slidable joint coupling the base portion to the wafer support platform; and a sensor configured to detect when the wafer support platform slides relative to the base portion beyond a predetermined distance.
-
公开(公告)号：US09997328B2
公开(公告)日：2018-06-12
申请号：US15160972
申请日：2016-05-20
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Michael R. Rice , Ron Naftali , Natan Schlimoff , Igor Krivts (Krayvitz) , Israel Avneri , Yoram Uziel , Zvika Rozenberg , Erez Admoni , Yochanan Madmon
CPC classification number: H01J37/18 , G01N21/9501 , G01N2201/023 , G02B21/26 , H01J37/20 , H01J2237/022 , H01J2237/182 , H01J2237/202 , H01L21/67126 , H01L21/6719 , H01L21/67196 , H01L21/67242
Abstract: Chamber elements defining an internal chamber to be utilized during a substrate related stage selected from the group consisting of substrate manufacturing stage and substrate inspection stage, the chamber elements comprising: a first element having a first surface; a second element having a second surface about the periphery of the internal chamber; a third element connected to the second element; and a clamping mechanism that is connected to the second and third elements and is arranged to press the second element towards the first element; wherein a first area of the first surface and a second area of the second surface come into proximity with each other at a first interface; wherein the first surface is positioned above the second surface; wherein a gas groove and a vacuum groove are formed in the second area; wherein the second element comprises a gas conduit that is arranged to provide gas to the gas groove and a vacuum conduit that is arranged to provide vacuum to the vacuum groove; wherein a provision of the gas and the vacuum assists in a formation of a gas cushion between the first and second areas; wherein the chamber elements are operable to partially surround a first portion of a movement system and a substrate during the substrate related stage, the movement system is arranged to introduce a movement of the first element in relation to the second element and the third element, wherein the gas cushion maintains predefined conditions in the internal chamber during the movement.
-
-
-
-
-
-
-
-
-
Search Results
11
records
(took 0.013 seconds)
