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    RADIATION SYSTEM
    5.
    发明申请
    RADIATION SYSTEM 审中-公开

    公开(公告)号：US20200152345A1

    公开(公告)日：2020-05-14

    申请号：US16743025

    申请日：2020-01-15

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Han-Kwang NIENHUYS ,  Rilpho Ludovicus Donker ,  Gosse Charles De Vries

    IPC: G21K1/06 ,  G03F7/20 ,  G02B5/02

    Abstract: A radiation system includes a beam splitting apparatus configured to split a main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.

    Method and Apparatus for Determining a Radiation Beam Intensity Profile
    6.
    发明申请
    Method and Apparatus for Determining a Radiation Beam Intensity Profile 审中-公开

    公开(公告)号：US20200098486A1

    公开(公告)日：2020-03-26

    申请号：US16556603

    申请日：2019-08-30

    Applicant: ASML Netherlands B.V.

    Inventor： Teis Johan COENEN ,  Han-Kwang NIENHUYS ,  Sandy Claudia SCHOLZ ,  Sander Bas ROOBOL

    IPC: G21K1/06 ,  G01T1/29 ,  G03F7/20

    Abstract: Methods and apparatus for determining an intensity profile of a radiation beam. The method comprises providing a diffraction structure, causing relative movement of the diffraction structure relative to the radiation beam from a first position wherein the radiation beam does not irradiate the diffraction structure to a second position wherein the radiation beam irradiates the diffraction structure, measuring, with a radiation detector, diffracted radiation signals produced from diffraction of the radiation beam by the diffraction structure as the diffraction structure transitions from the first position to the second position or vice versa, and determining the intensity profile of the radiation beam based on the measured diffracted radiation signals.

    Component for a Radiation Source, Associated Radiation Source and Lithographic Apparatus
    8.
    发明申请
    Component for a Radiation Source, Associated Radiation Source and Lithographic Apparatus 有权
    辐射源组件，相关辐射源和光刻设备

    公开(公告)号：US20160377985A1

    公开(公告)日：2016-12-29

    申请号：US14901941

    申请日：2014-06-17

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Han-Kwang NIENHUYS

    IPC: G03F7/20

    CPC classification number: G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    Abstract: Disclosed is component for a radiation source, said radiation source being operable to generate radiation from a fuel, said component having a surface comprising a plurality of first regions that have a high wettability by said fuel, separated by second regions which have a low wettability by said fuel. Said component may comprise a screening element for a droplet generator or contamination trap, for example.

    Abstract translation: 公开了一种用于辐射源的部件，所述辐射源可操作以产生来自燃料的辐射，所述部件具有包括多个第一区域的表面，所述第一区域具有由所述燃料具有高润湿性的第一区域，由具有低润湿性的第二区域分开， 说燃料 所述组件可以包括例如用于液滴发生器或污染物阱的筛选元件。

    MANUFACTURING A REFLECTIVE DIFFRACTION GRATING
    10.
    发明申请
    MANUFACTURING A REFLECTIVE DIFFRACTION GRATING 有权

    公开(公告)号：US20220221629A1

    公开(公告)日：2022-07-14

    申请号：US17600420

    申请日：2020-03-06

    Applicant: ASML Netherlands B.V.

    Inventor： Han-Kwang NIENHUYS ,  Sietse Thijmen VAN DER POST

    IPC: G02B5/18

    Abstract: A grating is provided on a mirror for specularly reflecting and diffracting a grazing-incidence beam of radiation and has a periodic structure with a grating period comprising first (ridge) and second (trench) substructures either side of a sidewall 806 facing the incident beam 800. The ridge is configured to specularly reflect the beam from the flat top 808 of the ridge into a specularly reflected beam 810 in a zeroth-order direction β′=β. The grating is configured with fixed or varying pitch to diffract the beam from the grating periods in one or more non-zero-diffraction-order direction β′≠β. The shape of the trench may be is described by structural parameters top width and depth that define the aspect ratio of the trench. The shape is determined such that any rays (and optionally diffraction) of the beam that reflect once from the trench floor in the zeroth-order direction are obscured by the sidewall.

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