Wafer stage with reference surface
    1.
    发明授权
    Wafer stage with reference surface 失效
    带参考面的晶圆台

    公开(公告)号:US5285142A

    公开(公告)日:1994-02-08

    申请号:US15520

    申请日:1993-02-09

    摘要: An electromagnetic sub-stage and an electromagnetic monolithic stage coupled such that one follows the other having a single reference surface positioned therebetween. A sub-stage having linear motors for movement in the X-Y direction is mounted by a U bracket to a monolithic stage. The monolithic stage is suspended by flat electromagnetic coils providing precise motion of the body of the monolithic stage in X, Y, Z, and rotation about the Z axis or .theta.. Follow control means links or tracks the movement of the monolithic stage to the sub-stage such that the monolithic stage positioning coils are centered in their respective magnetic structure. Adjustable mechanical stops attached the monolithic stage in combination with air bearings riding on the reference surface limit travel of the monolithic stage in the focus or Z direction. The single reference surface extends over the entire range of motion of the monolithic stage. This improves position accuracy, and cleaning and servicing of the apparatus. The modular nature of the monolithic stage permits easy removal for inspection and repair.

    摘要翻译: 电磁子级和电磁单片级耦合,使得一个接一个地具有位于它们之间的单个参考表面。 具有用于在X-Y方向上移动的线性电动机的子级通过U形支架安装到整体级。 整体级由平面电磁线圈悬挂,提供整体级的主体在X,Y,Z以及围绕Z轴或(θ)的旋转的精确运动。 跟随控制装置链接或跟踪单片级到子级的运动,使得单片级定位线圈在它们各自的磁性结构中居中。 可调节的机械止动件将整体式平台与空气轴承相结合,在整体级在焦点或Z方向的参考面极限行程上。 单个参考表面在整体级的整个运动范围上延伸。 这提高了位置精度,以及对设备的清洁和维护。 整体式台架的模块化特性允许拆卸检查和维修。

    Method and system for operating an air gauge at programmable or constant standoff
    2.
    发明授权
    Method and system for operating an air gauge at programmable or constant standoff 有权
    用于在可编程或恒定间距下操作气压计的方法和系统

    公开(公告)号:US07797985B2

    公开(公告)日:2010-09-21

    申请号:US12209487

    申请日:2008-09-12

    IPC分类号: G01B13/08

    摘要: Provided are a methods and systems for determining a topography of an object. In an embodiment, a system includes a reference probe configured to measure a surface of a reference surface and to generate a reference signal, a measuring probe configured to measure a surface of an object and to generate a measurement signal, a sensor configured to sense a position of the measuring probe and to generate a sensor signal, and a combiner configured to receive the sensor signal and the measurement signal and to generate a combination signal therefrom. A desired distance between the measuring probe and the object is substantially maintained by adjusting the position of the measuring probe based on the measurement signal. A topography of the object is determined based at least on a comparison of the reference signal and the combination signal.

    摘要翻译: 提供了一种用于确定对象的形貌的方法和系统。 在一个实施例中,系统包括被配置为测量参考表面的表面并产生参考信号的参考探针,配置成测量物体的表面并产生测量信号的测量探针,被配置为感测 测量探针的位置并产生传感器信号,以及组合器,被配置为接收传感器信号和测量信号并从其产生组合信号。 通过基于测量信号调整测量探针的位置,基本上保持了测量探针和物体之间的期望距离。 至少基于参考信号和组合信号的比较来确定对象的地形。

    Lithographic apparatus and device manufacturing method utilizing a metrology system with sensors
    3.
    发明授权
    Lithographic apparatus and device manufacturing method utilizing a metrology system with sensors 有权
    利用传感器的计量系统的光刻设备和设备制造方法

    公开(公告)号:US07369214B2

    公开(公告)日:2008-05-06

    申请号:US11201162

    申请日:2005-08-11

    申请人: Daniel N. Galburt

    发明人: Daniel N. Galburt

    IPC分类号: G03B27/52

    摘要: A system and method include an object supported on a moveable support, an optical system that transmits radiation onto the object, a support having an aperture therethrough, a sensor system coupled to the support, and a control system coupled to the sensor system and the moveable support. The sensor system is arranged with respect to the aperture to measure a surface of the object and send measurement signals to the control system, such that the control system generates control signals received and used by the moveable support to ensure that the surface of the object receiving light transmitted by the optical system through the aperture is in a focus plane of the optical system.

    摘要翻译: 系统和方法包括支撑在可移动支撑件上的物体,将辐射透射到物体上的光学系统,具有穿过其中的孔的支撑件,耦合到支撑件的传感器系统以及耦合到传感器系统的控制系统和可移动的 支持。 传感器系统相对于孔布置以测量物体的表面并将测量信号发送到控制系统,使得控制系统产生由可移动支撑件接收和使用的控制信号,以确保物体的表面接收 由光学系统通过孔传播的光在光学系统的聚焦平面内。

    Patterned mask holding device and method using two holding systems
    4.
    发明授权
    Patterned mask holding device and method using two holding systems 有权
    图案掩模保持装置和方法使用两个保持系统

    公开(公告)号:US07196775B2

    公开(公告)日:2007-03-27

    申请号:US10922862

    申请日:2004-08-23

    申请人: Daniel N. Galburt

    发明人: Daniel N. Galburt

    IPC分类号: G03B27/62 G03B27/42

    CPC分类号: G03F7/707 G03F7/70708

    摘要: A system and method that eliminate or substantially reduce slippage of a pattern generator with respect to a pattern generator holding device during a scanning portion of an exposure operation. In first and second examples, this is done by either (a) continuously or (b) when needed concurrently using first and second pattern generator holding systems to hold the pattern generator to the pattern generator holding device. In these examples, the first pattern generator holding systems utilizes an electrostatic system to attract the pattern generator to the pattern generator holding device and the second pattern generator holding system utilizes a vacuum system to attract the pattern generator to the pattern generator holding device.

    摘要翻译: 一种在曝光操作的扫描部分期间消除或显着地减少图案发生器相对于图案发生器保持装置的滑动的系统和方法。 在第一和第二示例中,这可以通过(a)连续地或(b)同时使用第一和第二图案发生器保持系统将图案发生器保持到图案发生器保持装置来完成。 在这些示例中,第一图案发生器保持系统利用静电系统将图案发生器吸引到图案发生器保持装置,并且第二图案发生器保持系统利用真空系统将图案发生器吸引到图案发生器保持装置。

    Gas gauge proximity sensor with a modulated gas flow
    5.
    发明授权
    Gas gauge proximity sensor with a modulated gas flow 失效
    具有调制气流的气量计接近传感器

    公开(公告)号:US07021121B2

    公开(公告)日:2006-04-04

    申请号:US10854429

    申请日:2004-05-27

    IPC分类号: G01B13/08

    CPC分类号: G01B13/12

    摘要: A gas gauge proximity sensor modulates a gas stream that is used to feed reference and measurement air gauges, respectively, in a reference portion proximate a reference surface and a measurement portion proximate a measurement surface. The gas stream can be modulated at a frequency at which there is minimal acoustical interference energy (e.g., minimal noise) in demodulated output signal. The sensor output can be filtered so that a measurement signal includes only the modulated frequency and side bands of that frequency to include the desired response band of the device as a whole. The filtered signal can be demodulated using a demodulator operating at a same frequency as the modulator to produce the demodulated output signal. In this embodiment, substantially only ambient acoustical energy in the band pass region may interfere with the device operation. Alternatively, the modulation can be introduced through the reference portion. A reference nozzle sets up a pressure field with the reference surface. A carrier frequency can be generated by mechanical motion of the reference surface. For example, this motion can be introduced by a mechanism like a piezoelectric device or a voice coil coupled to the reference surface. The modulated gas flow combines with the other gas flows to produce a modulated combined gas flow.

    摘要翻译: 气体计量接近传感器调节用于分别在靠近参考表面的参考部分和靠近测量表面的测量部分供给参考和测量气量计的气流。 气体流可以在解调输出信号中具有最小声学干扰能量(例如最小噪声)的频率下进行调制。 可以对传感器输出进行滤波,使得测量信号仅包括该频率的调制频率和边带,以包括整个设备的期望响应频带。 可以使用与调制器工作在相同频率的解调器来解调经滤波的信号,以产生解调的输出信号。 在该实施例中,带通区域中基本上只有环境声能可能会干扰器件操作。 或者,可以通过参考部分引入调制。 参考喷嘴与参考表面建立一个压力场。 可以通过参考表面的机械运动来产生载波频率。 例如,该运动可以通过耦合到参考表面的压电装置或音圈等机构引入。 经调制的气流与其他气流结合以产生调制的组合气流。

    Lithographic tool with dual isolation system and method for configuring the same

    公开(公告)号:US06859258B2

    公开(公告)日:2005-02-22

    申请号:US10369569

    申请日:2003-02-21

    摘要: An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle stage component is supported by the isolated base frame. The reticle stage component provides a mount for a reticle. An isolated bridge provides a mount for a projection optics. The isolated bridge is supported by the isolated base frame. Alternatively, an isolated bridge is supported by a non-isolated base frame. A wafer stage component is supported by the non-isolated base frame. A reticle stage component is supported by the non-isolated base frame. An isolated optical relay is supported by the non-isolated base frame. The isolated optical relay includes one or more individually servo controlled framing blades.

    Method, system, and apparatus for management of reaction loads in a lithography system

    公开(公告)号:US06784978B2

    公开(公告)日:2004-08-31

    申请号:US10095070

    申请日:2002-03-12

    申请人: Daniel N. Galburt

    发明人: Daniel N. Galburt

    IPC分类号: G03B2758

    摘要: A method, system, and apparatus for management of reaction loads in a lithography system is described. An isolated structure is supported by a non-isolated structure. The isolated structure supports a moveable stage. A linear motor includes a first linear motor element and a second linear motor element. The first linear motor element is coupled to the moveable stage. A plurality of parallel flexure plates mount the second linear motor element on the isolated structure. A flexure rod is coupled between the non-isolated structure and the second linear motor element.

    Actuator coil cooling system
    9.
    发明授权
    Actuator coil cooling system 失效
    执行器线圈冷却系统

    公开(公告)号:US07176593B2

    公开(公告)日:2007-02-13

    申请号:US11154669

    申请日:2005-06-17

    申请人: Daniel N. Galburt

    发明人: Daniel N. Galburt

    IPC分类号: H02K9/00

    摘要: An actuator coil with a race track winding that generates a magnetic field. A cooling tube has cooling liquid flowing therethrough and is wrapped around a periphery of the race track winding. A plurality of thermal conductive strips are arranged generally transverse to at least portions of the race track winding so as to conduct heat from the racetrack winding to the cooling tube.

    摘要翻译: 具有产生磁场的赛道绕组的致动器线圈。 冷却管具有流过其中的冷却液,并缠绕在跑道绕组的周边。 多个导热条通常横贯至赛道绕组的至少部分,以将热量从跑道线圈传导到冷却管。

    Removable reticle window and support frame using magnetic force
    10.
    发明授权
    Removable reticle window and support frame using magnetic force 失效
    可移动的分划板窗和支撑架采用磁力

    公开(公告)号:US07042554B2

    公开(公告)日:2006-05-09

    申请号:US11166392

    申请日:2005-06-27

    申请人: Daniel N. Galburt

    发明人: Daniel N. Galburt

    IPC分类号: G03B27/58 G03B27/62 G03F9/00

    CPC分类号: G03F1/64 G03F7/70983

    摘要: An apparatus for maintaining an optical gap between a pellicle and a reticle in a photolithography system includes a frame defining first and second opposing surfaces, a reticle mated to the first opposing surface using magnetic coupling and a pellicle mated to the second opposing surface using magnetic coupling.

    摘要翻译: 用于在光刻系统中保持防护薄膜组件和掩模版之间的光学间隙的装置包括限定第一和第二相对表面的框架,使用磁耦合与第一相对表面配合的掩模版,以及使用磁耦合与第二相对表面配合的防护薄膜 。