ULTRA HIGH PRECISION MEASUREMENT TOOL
    2.
    发明申请
    ULTRA HIGH PRECISION MEASUREMENT TOOL 有权
    超高精度测量工具

    公开(公告)号:US20090289185A1

    公开(公告)日:2009-11-26

    申请号:US12133298

    申请日:2008-06-04

    IPC分类号: G01N23/00

    摘要: A focused ion beam device is described comprising a gas field ion source with an analyzer for analyzing and classifying the structure of a specimen, a controller for controlling and/or modifying the structure of the specimen according to the analysis of the analyzer, an emitter tip, the emitter tip has a base tip comprising a first material and a supertip comprising a material different from the first material, wherein the supertip is a single atom tip and the base tip is a single crystal base tip. Furthermore, the focused ion beam device has a probe current control and a sample charge control. A method of operating a focused ion beam device is provided comprising applying a voltage between a single emission centre of the supertip and an electrode, supplying gas to the emitter tip, analyzing and classifying the structure of a specimen, and controlling the structure of the specimen.

    摘要翻译: 描述了一种聚焦离子束装置,其包括气体离子源,其具有用于分析和分类样品结构的分析器,用于根据分析仪的分析来控制和/或改变样品的结构的控制器,发射器尖端 发射极尖端具有包括第一材料和超高压头的基座尖端,所述第一材料和第一材料包括不同于所述第一材料的材料,其中所述超高压是单个原子尖端,并且所述基座尖端是单晶基底尖端。 此外,聚焦离子束装置具有探针电流控制和样品充电控制。 提供了一种操作聚焦离子束装置的方法,包括在超高压的单个发射中心和电极之间施加电压,向发射极尖端供应气体,分析和分类样品的结构,以及控制样品的结构 。

    Stable Emission Gas Ion Source and Method for Operation Thereof
    3.
    发明申请
    Stable Emission Gas Ion Source and Method for Operation Thereof 有权
    稳定排放气体离子源及其操作方法

    公开(公告)号:US20090260112A1

    公开(公告)日:2009-10-15

    申请号:US12420384

    申请日:2009-04-08

    IPC分类号: G01N13/10

    摘要: A method of operating a focused ion beam device for emitting during operation a focused ion beam including ions of a gas generated at a first partial pressure, comprising cleaning an emitter tip positioned in an emitter tip region of the focused ion beam device, the cleaning comprises introducing the gas into the emitter tip region such that the gas has a second partial pressure of at least two times the first pressure. Further, a focused ion beam device is provided, comprising a gas field emitter tip (13) in an emitter tip region emitting an ion beam including ions of a gas, a gas inlet for supplying a gas with different pressures (110), a gas outlet (120), a pressure measurement device for measuring the pressure in the emitter tip region and a control unit (130) for controlling switching between an operation mode and a cleaning mode, further controlling the pressures in the emitter tip region and being connected to the pressure measurement device.

    摘要翻译: 一种操作聚焦离子束装置的方法,用于在操作期间发射包括以第一分压产生的气体的离子的聚焦离子束,包括清洁位于聚焦离子束装置的发射极尖端区域中的发射极尖端,所述清洁包括 将气体引入发射极尖端区域,使得气体具有至少两倍于第一压力的第二分压。 此外,提供聚焦离子束装置,其包括发射极尖端区域中的气体发射极尖端(13),其发射包括气体离子的离子束,用于供应不同压力的气体的气体入口(110),气体 出口(120),用于测量发射极尖端区域中的压力的​​压力测量装置和用于控制操作模式和清洁模式之间的切换的控制单元(130),进一步控制发射极尖端区域中的压力并连接到 压力测量装置。

    SWITCHABLE MULTI PERSPECTIVE DETECTOR, OPTICS THEREFORE AND METHOD OF OPERATING THEREOF
    4.
    发明申请
    SWITCHABLE MULTI PERSPECTIVE DETECTOR, OPTICS THEREFORE AND METHOD OF OPERATING THEREOF 有权
    可切换多用途检测器及其操作方法及其操作方法

    公开(公告)号:US20150021474A1

    公开(公告)日:2015-01-22

    申请号:US13960393

    申请日:2013-08-06

    摘要: A secondary charged particle detection device for detection of a signal beam is described. The device includes a detector arrangement having at least two detection elements with active detection areas, wherein the active detection areas are separated by a gap (G), a particle optics configured for separating the signal beam into a first portion of the signal beam and into at least one second portion of the signal beam, and configured for focusing the first portion of the signal beam and the at least one second portion of the signal beam. The particle optics includes an aperture plate and at least a first inner aperture openings in the aperture plate, and at least one second radially outer aperture opening in the aperture plate, wherein the first aperture opening has a concave shaped portion, particularly wherein the first aperture opening has a pincushion shape.

    摘要翻译: 描述了用于检测信号光束的二次带电粒子检测装置。 该装置包括具有至少两个具有主动检测区域的检测元件的检测器装置,其中主动检测区域由间隙(G)分开,粒子光学器件被配置用于将信号光束分离成信号光束的第一部分并进入 信号光束的至少一个第二部分,并且被配置为聚焦信号光束的第一部分和信号光束的至少一个第二部分。 颗粒光学器件包括孔板和孔板中的至少第一内孔开口和孔板中的至少一个第二径向外孔开口,其中第一孔口具有凹形部分,特别地其中第一孔 开口有枕形。

    CHARGED PARTICLE BEAM DEVICE WITH DYNAMIC FOCUS AND METHOD OF OPERATING THEREOF
    5.
    发明申请
    CHARGED PARTICLE BEAM DEVICE WITH DYNAMIC FOCUS AND METHOD OF OPERATING THEREOF 有权
    具有动态聚焦的充电颗粒光束装置及其操作方法

    公开(公告)号:US20150213998A1

    公开(公告)日:2015-07-30

    申请号:US14679581

    申请日:2015-04-06

    摘要: A retarding field scanning electron microscope for imaging a specimen is described. The microscope includes a scanning deflection assembly configured for scanning an electron beam over the specimen, one or more controllers in communication with the scanning deflection assembly for controlling a scanning pattern of the electron beam, and a combined magnetic-electrostatic objection lens configured for focusing the electron beam, wherein the objective lens includes a magnetic lens portion and an electrostatic lens portion. The electrostatic lens portion includes an first electrode configured to be biased to a high potential, and a second electrode disposed between the first electrode and the specimen plane, the second electrode being configured to be biased to a potential lower than the first electrode, wherein the second electrode is configured for providing a retarding field of the retarding field scanning electron microscope. The retarding field scanning electron microscope further includes a voltage supply being connected to the second electrode for biasing the second electrode to a potential and being in communication with the one or more controllers, wherein the one or more controllers synchronize a variation of the potential of the second electrode with the scanning pattern of the electron beam.

    摘要翻译: 描述了用于成像试样的延迟场扫描电子显微镜。 显微镜包括扫描偏转组件,其被配置用于扫描试样上的电子束,与扫描偏转组件连通的一个或多个控制器,用于控制电子束的扫描图案;以及组合的磁静电对置透镜,其被配置用于聚焦 电子束,其中物镜包括磁透镜部分和静电透镜部分。 静电透镜部包括被配置为被偏置成高电位的第一电极和设置在第一电极和检体平面之间的第二电极,第二电极被配置为被偏置到比第一电极低的电位,其中, 第二电极构造成用于提供延迟场扫描电子显微镜的延迟场。 延迟场扫描电子显微镜还包括电压源,其连接到第二电极,用于将第二电极偏压到电位并与一个或多个控制器通信,其中一个或多个控制器使得一个或多个控制器的电位变化同步 具有电子束扫描图形的第二电极。

    CHARGED PARTICLE BEAM DEVICE WITH A GAS FIELD ION SOURCE AND A GAS SUPPLY SYSTEM
    7.
    发明申请
    CHARGED PARTICLE BEAM DEVICE WITH A GAS FIELD ION SOURCE AND A GAS SUPPLY SYSTEM 有权
    带有气体离子源和气体供应系统的充电颗粒光束装置

    公开(公告)号:US20080067408A1

    公开(公告)日:2008-03-20

    申请号:US11752560

    申请日:2007-05-23

    申请人: Dieter WINKLER

    发明人: Dieter WINKLER

    IPC分类号: H01T23/00

    摘要: The present invention provides a charged particle beam device for irradiating a specimen with ions. The charged particle beam device comprises a gas field ion source unit for generating a beam of ions, the gas field ion source having an emitter unit having an emitter unit tip; and a gas supply system for directing gas to the emitter unit tip. The gas supply system comprises an array of capillary tubes. Further, the present invention provides a method for irradiating a specimen with ions by operating a charged particle beam device having a gas field ion source, wherein the method comprises the step of directing a gas flow to an emitter unit tip, wherein the gas flow has a gas beam aperture angle of 3° or less.

    摘要翻译: 本发明提供一种用离子照射样本的带电粒子束装置。 带电粒子束装置包括用于产生离子束的气体离子源单元,气体离子源具有发射极单元,其具有发射极单元尖端; 以及用于将气体引导到发射器单元尖端的气体供应系统。 气体供应系统包括一排毛细管。 此外,本发明提供了一种通过操作具有气体离子源的带电粒子束装置对离子进行照射的方法,其中该方法包括将气流引导到发射器单元尖端的步骤,其中气流具有 气束孔径角为3°以下。

    HIGH RESOLUTION GAS FIELD ION COLUMN WITH REDUCED SAMPLE LOAD
    9.
    发明申请
    HIGH RESOLUTION GAS FIELD ION COLUMN WITH REDUCED SAMPLE LOAD 有权
    高分辨率气体场离子柱与减少样品负载

    公开(公告)号:US20090146074A1

    公开(公告)日:2009-06-11

    申请号:US12277818

    申请日:2008-11-25

    IPC分类号: H01J3/14

    摘要: A method of operating a focused ion beam device having a gas field ion source is described. According to some embodiments, the method includes emitting an ion beam from a gas field ion source, providing an ion beam column ion beam energy in the ion beam column which is higher than the final beam energy, decelerating the ion beam for providing a final beam energy on impingement of the ion beam on the specimen of 1 keV to 4 keV, and imaging the specimen.

    摘要翻译: 描述了具有气体场离子源的聚焦离子束装置的操作方法。 根据一些实施例,该方法包括从气体场离子源发射离子束,在离子束列中提供高于最终光束能量的离子束柱离子束能量,使离子束减速以提供最终光束 将离子束撞击在1keV至4keV的样品上的能量,并对样品进行成像。