公开(公告)号：US20180017872A1

公开(公告)日：2018-01-18

申请号：US15718659

申请日：2017-09-28

Applicant: FUJIFILM Corporation

Inventor： Wataru NIHASHI ,  Hideaki TSUBAKI ,  Toru TSUCHIHASHI ,  Tomotaka TSUCHIMURA

IPC: G03F7/32 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20

CPC classification number: G03F7/325 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/16 ,  G03F7/20 ,  G03F7/2004

Abstract: Provide are a pattern forming method including a step (1) of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition including a resin having an acid-decomposable repeating unit capable of decomposing by the action of an acid to generate an acid having a pKa of 3.0 or less, a step (2) of exposing the film using actinic rays or radiation, and a step (3) of carrying out development using a developer including an organic solvent after the exposure to form a negative tone pattern; and a method for manufacturing an electronic device, including the pattern forming method.

公开(公告)号：US20160041465A1

公开(公告)日：2016-02-11

申请号：US14881400

申请日：2015-10-13

Applicant: FUJIFILM Corporation

Inventor： Hiroo TAKIZAWA ,  Shuji HIRANO ,  Natsumi YOKOKAWA ,  Wataru NIHASHI

IPC: G03F7/038 ,  G03F7/32 ,  G03F7/20

CPC classification number: G03F7/038 ,  C08F12/22 ,  C08F212/14 ,  C08F216/14 ,  C08F220/18 ,  C08F220/26 ,  C11D11/0047 ,  G03F7/004 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2004 ,  G03F7/2037 ,  G03F7/32 ,  G03F7/325 ,  H01L21/0275

Abstract: The pattern forming method includes (1) forming a film using an active light sensitive or radiation sensitive resin composition, (2) exposing the film to active light or radiation, and (3) developing the exposed film using a developer including an organic solvent, in which the active light sensitive or radiation sensitive resin composition contains a resin (A) having a group which generates a polar group by being decomposed due to the action of an acid, the resin (A) has a phenolic hydroxyl group and/or a phenolic hydroxyl group protected with a group leaving due to the action of an acid, and the developer including the organic solvent contains an additive which forms at least one interaction of an ionic bond, a hydrogen bond, a chemical bond, and a dipole interaction, with the polar group.

Abstract translation: 图案形成方法包括：（1）使用有源光敏或辐射敏感性树脂组合物形成膜，（2）将膜曝露于活性光或辐射，以及（3）使用包含有机溶剂的显影剂显影曝光膜， 其中活性光敏或辐射敏感性树脂组合物含有具有由于酸作用而分解产生极性基团的基团的树脂（A），树脂（A）具有酚羟基和/或 由于酸的作用而被基团保护的酚羟基，包含有机溶剂的显影剂含有形成离子键，氢键，化学键和偶极相互作用的至少一种相互作用的添加剂， 与极地集团。

公开(公告)号：US20210200097A1

公开(公告)日：2021-07-01

申请号：US17178218

申请日：2021-02-17

Applicant: FUJIFILM Corporation

Inventor： Hideaki TSUBAKI ,  Toru TSUCHIHASHI ,  Wataru NIHASHI ,  Kei YAMAMOTO

IPC: G03F7/32 ,  G03F7/075 ,  G03F7/095 ,  G03F7/039 ,  G03F7/004 ,  G03F7/11 ,  G03F7/038 ,  H01L21/304 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/40

Abstract: An object of the present invention is to provide a treatment liquid for patterning a resist film and a pattern forming method, each of which can simultaneously suppress the occurrence of pattern collapse in a resist L/S pattern and the occurrence of omission failure in a resist C/H pattern.
The treatment liquid of the present invention is a treatment liquid for patterning a resist film, which is used for subjecting a resist film obtained from an actinic ray-sensitive or radiation-sensitive resin composition to at least one of development or washing, and contains an organic solvent, in which the treatment liquid contains a first organic solvent having an SP value of 16.3 MPa1/2 or less and a second organic solvent having an SP value of 17.1 MPa1/2 or more.

公开(公告)号：US20190187558A1

公开(公告)日：2019-06-20

申请号：US16285839

申请日：2019-02-26

Applicant: FUJIFILM Corporation

Inventor： Wataru NIHASHI ,  Hajime Furutani ,  Akihiro Kaneko ,  Hideaki Tsubaki ,  Shuji Hirano

IPC: G03F7/038 ,  G03F7/039 ,  G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  C08F220/18 ,  C08F220/30

CPC classification number: G03F7/038 ,  C08F220/18 ,  C08F220/30 ,  C08F2220/302 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/325 ,  G03F7/38

Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition containing a resin and a compound that generates acid due to irradiation with an actinic ray or radiation. The resin includes a repeating unit (a) represented by Formula (I-1) and a repeating unit (b) having a group in which a protective group including a monocyclic ring leaves due to an action of an acid to generate a polar group. (In the formula, R11 and R12 each independently represent a hydrogen atom or an alkyl group. R13 represents a hydrogen atom or an alkyl group, or is a single bond or an alkylene group, and is bonded to L or Ar in the formula to form a ring. L represents a single bond or a divalent linking group. Ar represents an aromatic ring. n represents an integer of 2 or more.)

公开(公告)号：US20180364569A1

公开(公告)日：2018-12-20

申请号：US16109868

申请日：2018-08-23

Applicant: FUJIFILM Corporation

Inventor： Wataru NIHASHI ,  Hideaki TSUBAKI

IPC: G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32

Abstract: An actinic ray-sensitive or radiation-sensitive composition, and an actinic ray-sensitive or radiation-sensitive composition obtained by the method for producing an actinic ray-sensitive or radiation-sensitive composition each contain a cation having a metal atom, and a ligand, in which a value of σ represented by Equation (1) is 2.2 or less. A pattern forming method and the method for manufacturing an electronic device each use the actinic ray-sensitive or radiation-sensitive composition. σ = ∑ k = 1 N  { ( μ - X k ) 2 × y k } ( 1 )

公开(公告)号：US20180217503A1

公开(公告)日：2018-08-02

申请号：US15937876

申请日：2018-03-28

Applicant: FUJIFILM Corporation

Inventor： Hideaki TSUBAKI ,  Toru TSUCHIHASHI ,  Wataru NIHASHI ,  Kei YAMAMOTO

IPC: G03F7/32 ,  G03F7/16 ,  G03F7/20 ,  G03F7/40 ,  H01L21/304 ,  G03F7/038 ,  G03F7/039 ,  G03F7/38

CPC classification number: G03F7/32 ,  G03F7/0043 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/095 ,  G03F7/11 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/325 ,  G03F7/38 ,  G03F7/40 ,  H01L21/304

Abstract: An object of the present invention is to provide a treatment liquid for patterning a resist film and a pattern forming method, each of which can simultaneously suppress the occurrence of pattern collapse in a resist L/S pattern and the occurrence of omission failure in a resist C/H pattern.The treatment liquid of the present invention is a treatment liquid for patterning a resist film, which is used for subjecting a resist film obtained from an actinic ray-sensitive or radiation-sensitive resin composition to at least one of development or washing, and contains an organic solvent, in which the treatment liquid contains a first organic solvent having an SP value of 16.3 MPa1/2 or less and a second organic solvent having an SP value of 17.1 MPa1/2 or more.

公开(公告)号：US20180120705A1

公开(公告)日：2018-05-03

申请号：US15853973

申请日：2017-12-26

Applicant: FUJIFILM Corporation

Inventor： Wataru NIHASHI ,  Toru TSUCHIHASHI ,  Hideaki TSUBAKI

IPC: G03F7/32 ,  G03F7/039 ,  G03F7/004

Abstract: Provided are a positive tone pattern forming method in which development is carried out using a developer containing an organic solvent with use of a composition containing (A) a resin which has a repeating unit containing a moiety capable of forming a polar interaction and whose polarity is decreased due to release of the polar interaction by the action of an acid or a base, or a composition containing (A′) a resin having a repeating unit containing a polar group and (B) a compound capable of forming a polar interaction with the polar group of the resin (A′); and an electronic device manufacturing method including such a pattern forming method.

公开(公告)号：US20150168834A1

公开(公告)日：2015-06-18

申请号：US14625897

申请日：2015-02-19

Applicant: FUJIFILM CORPORATION

Inventor： Hiroo TAKIZAWA ,  Shuji HIRANO ,  Natsumi YOKOKAWA ,  Wataru NIHASHI

IPC: G03F7/038 ,  C08F14/18 ,  C08F16/10 ,  G03F7/20 ,  C08F24/00

CPC classification number: G03F7/0388 ,  C08F14/185 ,  C08F16/10 ,  C08F24/00 ,  C08F220/18 ,  C08F220/20 ,  C08F220/26 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/325 ,  H01L21/0273 ,  H01L21/0274

Abstract: There is provided a pattern forming method, including: (a) forming a film by using an electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition containing a resin (A) having a repeating unit represented by Formula (1-0) and a repeating unit represented by Formula (1-2); (b) exposing the film by using an electron beam or extreme ultraviolet ray; and (c) developing the exposed film by using a developer containing an organic solvent to form a negative pattern, wherein a content of the repeating unit represented by Formula (1-0) is 45 mol % or more based on a whole repeating units in the resin (A).

Abstract translation: 提供了一种图案形成方法，包括：（a）通过使用含有具有由式（1-0）表示的重复单元的树脂（A）的电子束敏感或极紫外线敏感性树脂组合物形成膜和 由式（1-2）表示的重复单元; （b）通过使用电子束或极紫外线曝光该膜; 和（c）通过使用含有有机溶剂的显影剂显影曝光的薄膜以形成负图案，其中由式（1-0）表示的重复单元的含量相对于全部重复单元为45摩尔％以上 树脂（A）。

公开(公告)号：US20210011380A1

公开(公告)日：2021-01-14

申请号：US17036576

申请日：2020-09-29

Applicant: FUJIFILM Corporation

Inventor： Wataru NIHASHI ,  Michihiro SHIRAKAWA ,  Michihiro OGAWA

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/20 ,  G03F7/32

Abstract: The present invention provides a negative tone photosensitive composition for EUV light, capable of forming a pattern, in which occurrence of missing defects is suppressed and pattern collapse is suppressed. The present invention also provides a pattern forming method and a method for manufacturing an electronic device. The negative tone photosensitive composition for EUV light of an embodiment of the present invention includes a resin A having a repeating unit having an acid-decomposable group with a polar group being protected with a protective group that is eliminated by the action of an acid, and a photoacid generator, in which a ClogP value of the resin after elimination of the protective group from the resin A is 1.4 or less, a value x calculated by Expression (1) is 1.2 or more, and the value x calculated by Expression (1) and a value y calculated by Expression (2) satisfy a relationship of Expression (3).

公开(公告)号：US20190219921A1

公开(公告)日：2019-07-18

申请号：US16368522

申请日：2019-03-28

Applicant: FUJIFILM Corporation

Inventor： Hideaki TSUBAKI ,  Hajime FURUTANI ,  Akihiro KANEKO ,  Wataru NIHASHI ,  Shuji HIRANO

IPC: G03F7/039 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  C08F220/18 ,  H01L21/027

CPC classification number: G03F7/039 ,  C08F220/18 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/325 ,  G03F7/327 ,  G03F7/38 ,  H01L21/0274

Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin including a repeating unit (a) represented by Formula (1); (B) a compound that generates an acid by irradiation with actinic rays or radiation; and (C) an organic solvent. A concentration of solid contents of the actinic ray-sensitive or radiation-sensitive resin composition is 4 mass % or less. (in the formula, R11 and R12 each independently represent a hydrogen atom, a halogen atom, or a monovalent organic group. R13 represents a hydrogen atom, a halogen atom, or a monovalent organic group or is a single bond or an alkylene group, and is bonded to L or Ar in the formula to form a ring. L represents a single bond or a divalent linking group. Ar represents an aromatic ring group. n represents an integer of 2 or more.)