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公开(公告)号：US20050002806A1
公开(公告)日：2005-01-06
申请号：US10495462
申请日：2002-11-15
申请人： Rudolf Fuechslin , Markus Weiss , Rudolf Duenki , Peter Mejer , Thomas Neff , Erich Stoll , Andreas Suter
发明人： Rudolf Fuechslin , Markus Weiss , Rudolf Duenki , Peter Mejer , Thomas Neff , Erich Stoll , Andreas Suter
CPC分类号： A61M39/223 , A61M5/14 , A61M5/142 , A61M5/14216 , A61M5/1456 , A61M2005/1402 , A61M2005/14264 , Y10T137/86871
摘要： The invention relates to a medical pump device comprising a rotary valve (13) having preferably only one rectilinear channel (20) which respectively connects the inlet (4) and the outlet (7) of the pump device, or connects the inlet to a pump chamber (15), or said pump chamber to the outlet, upon rotation of the rotary element (19) of the valve. The invention enables a medical pump device to be especially easily produced, said pump device being preferably inserted between an infusion syringe driver or an infusion container and a catheter, and being used to supply small quantities of liquid in an accurately dosed manner.
摘要翻译： 本发明涉及一种医疗泵装置，其包括旋转阀（13），其优选地仅具有一个直接通道（20），其分别连接泵装置的入口（4）和出口（7），或将入口连接到泵 （15）或所述泵室在所述旋转元件（19）旋转时到所述出口。 本发明能够特别容易地制造医疗泵装置，所述泵装置优选地插入在注射器驱动器或输注容器和导管之间，并且用于以精确计量的方式供应少量的液体。
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公开(公告)号：US07614857B2
公开(公告)日：2009-11-10
申请号：US10495462
申请日：2002-11-15
申请人： Rudolf Marcel Fuechslin , Markus Weiss , Rudolf Duenkl , Peter Fritz Mejer , Thomas Neff , Erich Paul Stoll , Andreas Suter
发明人： Rudolf Marcel Fuechslin , Markus Weiss , Rudolf Duenkl , Peter Fritz Mejer , Thomas Neff , Erich Paul Stoll , Andreas Suter
IPC分类号： F04B7/00
CPC分类号： A61M39/223 , A61M5/14 , A61M5/142 , A61M5/14216 , A61M5/1456 , A61M2005/1402 , A61M2005/14264 , Y10T137/86871
摘要： The invention relates to a medical pump device comprising a rotary valve (13) having preferably only one rectilinear channel (20) which respectively connects the inlet (4) and the outlet (7) of the pump device, or connects the inlet to a pump chamber (15), or said pump chamber to the outlet, upon rotation of the rotary element (19) of the valve. The invention enables a medical pump device to be especially easily produced, said pump device being preferably inserted between an infusion syringe driver or an infusion container and a catheter, and being used to supply small quantities of liquid in an accurately dosed manner.
摘要翻译： 本发明涉及一种医疗泵装置，其包括旋转阀（13），其优选地仅具有一个直接通道（20），其分别连接泵装置的入口（4）和出口（7），或将入口连接到泵 （15）或所述泵室在所述旋转元件（19）旋转时到所述出口。 本发明能够特别容易地制造医疗泵装置，所述泵装置优选地插入在注射器驱动器或输注容器和导管之间，并且用于以精确计量的方式供应少量的液体。
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3.发明授权Device for damping vibrations in projection exposure apparatuses for semiconductor lithography 有权用于半导体光刻的投影曝光装置中用于阻尼振动的装置公开(公告)号：US08212992B2
公开(公告)日：2012-07-03
申请号：US13045697
申请日：2011-03-11
申请人： Peter Kloesch , Michael Ringel , Markus Weiss
发明人： Peter Kloesch , Michael Ringel , Markus Weiss
CPC分类号： G03F7/709 , G03F7/70825 , G03F7/7085
摘要： A changeable assembly for a projection exposure apparatus for semiconductor lithography contains at least one damping element. Projection exposure apparatus for semiconductor lithography and measuring assemblies for a projection exposure apparatus for semiconductor lithography can include at least one sensor for detecting parameters and vibrations of the projection exposure apparatus, wherein the measuring assembly is embodied in such a way that it can be inserted into an exchange opening, provided for an optical element, in the projection exposure apparatus.
摘要翻译： 用于半导体光刻的投影曝光装置的可变组件包含至少一个阻尼元件。 用于半导体光刻的投影曝光装置和用于半导体光刻的投影曝光装置的测量组件可以包括用于检测投影曝光装置的参数和振动的至少一个传感器，其中测量组件以这样一种方式被实现： 在投影曝光装置中设置有用于光学元件的交换开口。
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4.发明申请DEVICE FOR DAMPING VIBRATIONS IN PROJECTION EXPOSURE APPARATUSES FOR SEMICONDUCTOR LITHOGRAPHY 有权用于半导体层析的投影曝光装置中的阻尼振动装置公开(公告)号：US20110205507A1
公开(公告)日：2011-08-25
申请号：US13045697
申请日：2011-03-11
申请人： Peter Kloesch , Michael Ringel , Markus Weiss
发明人： Peter Kloesch , Michael Ringel , Markus Weiss
IPC分类号： G03B27/52
CPC分类号： G03F7/709 , G03F7/70825 , G03F7/7085
摘要： A changeable assembly for a projection exposure apparatus for semiconductor lithography contains at least one damping element. Projection exposure apparatus for semiconductor lithography and measuring assemblies for a projection exposure apparatus for semiconductor lithography can include at least one sensor for detecting parameters and vibrations of the projection exposure apparatus, wherein the measuring assembly is embodied in such a way that it can be inserted into an exchange opening, provided for an optical element, in the projection exposure apparatus.
摘要翻译： 用于半导体光刻的投影曝光装置的可变组件包含至少一个阻尼元件。 用于半导体光刻的投影曝光装置和用于半导体光刻的投影曝光装置的测量组件可以包括用于检测投影曝光装置的参数和振动的至少一个传感器，其中测量组件以这样一种方式被实现： 在投影曝光装置中设置有用于光学元件的交换开口。
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公开(公告)号：US07491951B2
公开(公告)日：2009-02-17
申请号：US11319193
申请日：2005-12-28
申请人： Marc Hubertus Lorenz Van Der Velden , Vadim Yevgenyevich Banine , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Markus Weiss , Bastiaan Theodoor Wolschrijn , Michiel D. Nijkerk
发明人： Marc Hubertus Lorenz Van Der Velden , Vadim Yevgenyevich Banine , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Markus Weiss , Bastiaan Theodoor Wolschrijn , Michiel D. Nijkerk
CPC分类号： G03F7/70933 , G03F7/70916 , G03F7/7095
摘要： The invention relates to a lithographic apparatus that includes a system configured to condition a radiation beam or project a patterned radiation beam onto a target portion of a substrate. The system includes an optically active device configured to direct the radiation beam or the patterned radiation beam, respectively, and a support structure configured to support the optically active device. The apparatus further includes a gas supply for providing a background gas into the system. The radiation beam or patterned radiation beam react with the background gas to form a plasma that includes a plurality of ions. The support structure includes an element that includes a material that has a low sputtering yield, a high sputter threshold energy, or a high ion implantation yield, to reduce sputtering and the creation of sputtering products.
摘要翻译： 本发明涉及一种光刻设备，其包括被配置为调节辐射束或将图案化的辐射束投影到基板的目标部分上的系统。 该系统包括被配置为分别引导辐射束或图案化辐射束的光学有源器件，以及被配置为支持光学有源器件的支撑结构。 该装置还包括用于将背景气体提供到系统中的气体供应。 辐射束或图案化的辐射束与背景气体反应以形成包括多个离子的等离子体。 支撑结构包括包括具有低溅射产率，高溅射阈值能量或高离子注入产量的材料的元件，以减少溅射和溅射产物的产生。
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6.发明授权Optical system having an optical element that can be brought into at least two positions 失效光学系统具有可以进入至少两个位置的光学元件公开(公告)号：US07362414B2
公开(公告)日：2008-04-22
申请号：US11065327
申请日：2005-02-24
CPC分类号： G02B27/0006 , G02B17/0657 , G03F7/702 , G03F7/70233 , G03F7/70825 , G03F7/70925 , G03F7/70975
摘要： There is provided an optical system including an optical element having a first used area and a second used area on which impinge rays of a light bundle, and a device for moving the optical element between a first position and a second position. The light bundle impinges on the first used area when the optical element is in the first position, and light bundle impinges on the second used area when the optical element is in the second position.
摘要翻译： 提供了一种光学系统，其包括具有第一使用区域的光学元件和光束的入射光线的第二使用区域，以及用于在第一位置和第二位置之间移动光学元件的装置。 当光学元件处于第一位置时，光束照射在第一使用区域上，并且当光学元件处于第二位置时，光束照射在第二使用区域上。
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公开(公告)号：US20080042079A1
公开(公告)日：2008-02-21
申请号：US11974718
申请日：2007-10-16
申请人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
发明人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
IPC分类号： G01J3/10
CPC分类号： B82Y10/00 , G02B5/09 , G02B7/182 , G02B17/006 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70158 , G03F7/70166 , G03F7/70175 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/70825 , G21K1/06 , G21K5/04
摘要： There is provided a system that includes a first optical sub-system contained in a first space, and a second optical sub-system contained in a second space. The first and said second spaces are separated by a structure selected from the group consisting of a diaphragm and a valve.
摘要翻译： 提供了一种包括包含在第一空间中的第一光学子系统和包含在第二空间中的第二光学子系统的系统。 第一和第二空间由选自隔膜和阀门的结构分开。
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公开(公告)号：US07321126B2
公开(公告)日：2008-01-22
申请号：US11416447
申请日：2006-05-02
申请人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
发明人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
IPC分类号： A61N5/00
CPC分类号： B82Y10/00 , G02B5/09 , G02B7/182 , G02B17/006 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70158 , G03F7/70166 , G03F7/70175 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/70825 , G21K1/06 , G21K5/04
摘要： There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength ≦193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.
摘要翻译： 提供了沿着扫描方向以扫描模式操作的投影曝光系统。 投影曝光系统包括收集器，其收集波长<= 193nm的光并照亮平面中的区域。 平面由具有与扫描方向平行的y方向和垂直于扫描方向的x方向的局部坐标系限定。 收集器包括（a）第一镜壳，（b）第一镜壳内的第二镜壳，以及（c）用于紧固第一镜壳和第二镜壳的紧固装置。 镜壳基本上围绕公共旋转轴线旋转对称。 紧固装置具有在镜壳的径向方向上延伸的支撑辐条，并且当投影到平面中时支撑辐条产生不平行于y方向的突起。
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公开(公告)号：US20070206301A1
公开(公告)日：2007-09-06
申请号：US11695626
申请日：2007-04-03
IPC分类号： G02B5/08
CPC分类号： B82Y10/00 , G02B7/1824 , G03F7/70166 , G03F7/702 , G03F7/70825
摘要： In a method for the production of a facetted mirror 24 having a plurality of mirror facets 12 and 12′, which have mirror surfaces 15 and are fitted into reception bores 22, 22′ of a support plate 16, the mirror facets 12, 12′ are made in a first method step. At least one of the mirror facets is fitted into the associated reception bore of the support plate in a second method step, after which the ACTUAL position of the optical axis of at least one mirror surface of an associated mirror facet 12, 12′ fitted into the support plate is respectively determined in a third step and compared with a SET position of a predetermined optical axis. Knowing the measured values determined for the at least one mirror facet 12, 12′ in the third method step, reprocessing of the mirror facet and/or of the reception bore is subsequently carried out in a further method step if there is an angular deviation between the ACTUAL position and the SET position.
摘要翻译： 在制造具有多个镜面12和12'的分面镜24的方法中，其具有镜面15并被装配到支撑板16的接收孔22,22'中，镜面12,12' 在第一方法步骤中制成。 在第二方法步骤中，至少一个镜面被安装到支撑板的相关联的接收孔中，之后将相关镜面12,12'的至少一个镜面的光轴的ACTUAL位置嵌入 分别在第三步骤中确定支撑板并与预定光轴的SET位置进行比较。 了解在第三方法步骤中对于至少一个镜面12,12'确定的测量值，随后在另外的方法步骤中进行镜面和/或接收孔的再处理，如果在第二方法步骤之间存在角度偏差 ACTUAL位置和SET位置。
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公开(公告)号：US07090362B2
公开(公告)日：2006-08-15
申请号：US10841846
申请日：2004-05-07
申请人： Hubert Holderer , Andreas Heisler , Wolfgang Singer , Markus Weiss , Andreas Seifert , Frank Melzer , Heinz Mann
发明人： Hubert Holderer , Andreas Heisler , Wolfgang Singer , Markus Weiss , Andreas Seifert , Frank Melzer , Heinz Mann
CPC分类号： G03F7/70258 , G02B5/09 , G02B7/1821 , G02B7/1824 , G02B26/0816 , G03F7/70075 , G03F7/70141 , G03F7/702 , G03F7/70275
摘要： In a facet mirror with a number of mirror facets, wherein the mirror facets are provided with reflecting surfaces, the mirror facets are mounted jointly in a basic body via bearing devices. The mirror facets comprise mirror bodies contacting at the periphery with the bearing devices via a surface, line or point contact. The preferred field of use of the facet mirrors is a projection objective of a projection exposure machine in microlithography for fabricating semiconductor elements.
摘要翻译： 在具有多个镜面的小平面镜中，其中镜面设置有反射面，镜面通过轴承装置联合地安装在基体内。 镜面包括通过表面，线或点接触在外周与轴承装置接触的镜体。 小平面镜的优选使用领域是用于制造半导体元件的微光刻中的投影曝光机的投影物镜。
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