公开(公告)号：US06676289B2

公开(公告)日：2004-01-13

申请号：US09933719

申请日：2001-08-22

申请人： Ryoichi Hirano ,  Shusuke Yoshitake ,  Toru Tojo ,  Shuichiro Fukutome ,  Teruaki Yamamoto ,  Masaki Toriumi

发明人： Ryoichi Hirano ,  Shusuke Yoshitake ,  Toru Tojo ,  Shuichiro Fukutome ,  Teruaki Yamamoto ,  Masaki Toriumi

IPC分类号： G01K1300

CPC分类号： G01K7/42

摘要： According to one embodiment of the present invention, the present invention may provide a temperature measuring method in a pattern drawing apparatus having a drawing chamber for drawing a pattern on a substrate to be transferred inside, a stage installed inside the drawing chamber, a standby chamber connected to the drawing chamber, and a thermostatic device installed inside the standby chamber, characterized in that a dummy substrate having a temperature measuring device and a recording device for recording the temperature measured by the temperature measuring device is transferred to the thermostatic device, then transferred into the drawing chamber, and then put on the stage, thus the temperature history of the dummy substrate in the transfer route from the thermostatic device to the stage is measured by the temperature measuring device and recorded in the recording device.

摘要翻译： 根据本发明的一个实施例，本发明可以提供一种图形绘制装置中的温度测量方法，该图形绘制装置具有用于在待传送内部的基板上绘制图案的拉伸室，安装在拉伸室内的台，备用室 连接到拉伸室，以及安装在备用室内的恒温装置，其特征在于，具有用于记录由温度测量装置测量的温度的温度测量装置和记录装置的虚拟基板被传送到恒温装置，然后转移 进入拉伸室，然后放在平台上，由温度测量装置测量从恒温装置到载物台的传输路径中的虚拟基板的温度历史记录在记录装置中。

公开(公告)号：US06182369B2

公开(公告)日：2001-02-06

申请号：US09038038

申请日：1998-03-11

申请人： Ryoichi Hirano ,  Shusuke Yoshitake ,  Kazuto Matsuki ,  Toru Tojo

发明人： Ryoichi Hirano ,  Shusuke Yoshitake ,  Kazuto Matsuki ,  Toru Tojo

IPC分类号： G01B5004

CPC分类号： G03F7/70383 ,  G03F7/70433 ,  H01J37/3023 ,  H01J2237/30461 ,  H01J2237/31764

摘要： A pattern forming apparatus comprising a sample base for positioning a sample on the base and moving a drawing position of the sample, a position measuring unit for measuring a position of the sample base, a correcting unit for mutually independently correcting drawing positions at those respective areas into which a whole drawing section of the sample is divided, the drawing position being calculated by the position measuring unit at the respective area, and a drawing unit for drawing a pattern on the sample on the basis of the position of the sample base measured by the position measuring unit and drawing position of the respective area corrected by the correcting unit.

摘要翻译： 一种图案形成装置，包括用于将样本定位在基座上并移动样本的绘制位置的样本基座，用于测量样本基座的位置的位置测量单元，用于相互独立地校正各个区域的绘制位置的校正单元 样本的整个绘图部分被划分成，绘图位置由各个区域的位置测量单元计算，以及绘图单元，用于根据样本的位置根据由 位置测量单元和由校正单元校正的各个区域的绘图位置。

公开(公告)号：US06281510B1

公开(公告)日：2001-08-28

申请号：US09562181

申请日：2000-05-02

申请人： Shusuke Yoshitake ,  Yoshiaki Tsukumo ,  Ryoichi Hirano ,  Toru Tojo ,  Yoshiaki Tada ,  Makoto Kanda

发明人： Shusuke Yoshitake ,  Yoshiaki Tsukumo ,  Ryoichi Hirano ,  Toru Tojo ,  Yoshiaki Tada ,  Makoto Kanda

IPC分类号： A61N500

CPC分类号： H01L21/67748 ,  H01L21/67751 ,  Y10S438/949

摘要： A method of transferring a sample to and from a treating chamber kept in a vacuum atmosphere through a pressure regulatively preparatory chamber. The sample is contained in the sample transfer container, which is kept air-permeable by a dust filtering filter, in a cleaned atmosphere before the sample is transferred to the treating chamber. The sample transfer container is transferred into the preparatory chamber, and the inside of the preparatory chamber is evacuated to a vacuum atmosphere. The sample is then extracted from the sample transfer container in the vacuum atmosphere and is transferred into the treating chamber. Also disclosed is an apparatus for supporting the sample transferring method.

摘要翻译： 将样品转移到保持在真空气氛中的处理室通过压力调节室的方法。 在将样品转移到处理室之前，在清洁的气氛中将样品容纳在样品转移容器中，该容器在灰尘过滤过滤器中保持透气。 将样品转移容器转移到准备室中，并将预备室的内部抽真空至真空环境。 然后将样品在真空气氛中从样品转移容器中提取，并转移到处理室中。 还公开了一种用于支持样品转印方法的装置。

公开(公告)号：US6090176A

公开(公告)日：2000-07-18

申请号：US38037

申请日：1998-03-11

申请人： Shusuke Yoshitake ,  Yoshiaki Tsukumo ,  Ryoichi Hirano ,  Toru Tojo ,  Yoshiaki Tada ,  Makoto Kanda

发明人： Shusuke Yoshitake ,  Yoshiaki Tsukumo ,  Ryoichi Hirano ,  Toru Tojo ,  Yoshiaki Tada ,  Makoto Kanda

IPC分类号： B65G49/07 ,  H01L21/677 ,  B65D85/90

CPC分类号： H01L21/67748 ,  H01L21/67751 ,  Y10S438/949

摘要： A method of transferring a sample to and from a treating chamber kept in a vacuum atmosphere through a pressure regulative preparatory chamber. The sample is contained in the sample transfer container, which is kept air-permeable by a dust filtering filter, in a cleaned atmosphere before the sample is transferred to the treating chamber. The sample transfer container is transferred into the preparatory chamber, and the inside of the preparatory chamber is evacuated to a vacuum atmosphere. The sample is then extracted from the sample transfer container in the vacuum atmosphere and is transferred into the treating chamber. Also disclosed is an apparatus for supporting the sample transferring method.

摘要翻译： 将样品转移到保持在真空气氛中的处理室通过压力调节准备室的方法。 在将样品转移到处理室之前，在清洁的气氛中将样品容纳在样品转移容器中，该容器在灰尘过滤过滤器中保持透气。 将样品转移容器转移到准备室中，并将预备室的内部抽真空至真空环境。 然后将样品在真空气氛中从样品转移容器中提取，并转移到处理室中。 还公开了一种用于支持样品转印方法的装置。

公开(公告)号：US5912468A

公开(公告)日：1999-06-15

申请号：US841762

申请日：1997-04-28

申请人： Ryoichi Hirano ,  Souji Koikari ,  Kazuto Matsuki ,  Shusuke Yoshitake ,  Toru Tojo

发明人： Ryoichi Hirano ,  Souji Koikari ,  Kazuto Matsuki ,  Shusuke Yoshitake ,  Toru Tojo

IPC分类号： G21K5/04 ,  G01Q30/00 ,  G01Q70/02 ,  G03F7/20 ,  H01J37/317 ,  H01L21/027 ,  H01J37/30

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/30455

摘要： An object of the present invention is to provide a charged particle exposure system which can prevent the shift of an orbit of an electron beam in the vicinity of a periphery of a substrate when drawing a pattern onto the substrate, thereby making it possible to draw the pattern with high accuracy. According to the present invention, there is provided a charged particle beam exposure system comprising a holder for holding a substrate, a beam source for emitting a charged particle beam onto a surface of the substrate, beam scanning means for scanning the charged particle beam to draw a pattern on the surface of the substrate, a first electrical conductive block coming in electrical contact with a surface of a peripheral portion of the substrate, a first DC power supply unit for supplying an arbitrary voltage to the first electrical conductive block, a second electrical conductive block arranged to cover upside of the first electrical conductive block and upside of a peripheral portion along the periphery of the substrate, and to be electrically insulated from the substrate, and a second DC power supply unit for supplying the other arbitrary voltage to the second electrical conductive block.

摘要翻译： 本发明的目的是提供一种带电粒子曝光系统，其可以在将图案画到基板上时防止电子束在基板周围附近的轨道偏移，从而可以将 图案精度高。 根据本发明，提供了一种带电粒子束曝光系统，包括用于保持基板的保持器，用于将带电粒子束发射到基板的表面上的光束源;用于扫描带电粒子束以绘制的束扫描装置 衬底表面上的图案，与衬底的周边部分的表面电接触的第一导电块，用于向第一导电块提供任意电压的第一直流电源单元，第二电导体块 导电块，其布置成覆盖所述第一导电块的上侧和沿着所述衬底的周边的周边部分的上侧，并且与所述衬底电绝缘;以及第二DC电源单元，用于将所述另一任意电压提供给所述第二导电块 导电块。

公开(公告)号：US06411023B1

公开(公告)日：2002-06-25

申请号：US09496643

申请日：2000-02-03

申请人： Katsuhito Ogura ,  Ryoichi Hirano ,  Toru Tojo

发明人： Katsuhito Ogura ,  Ryoichi Hirano ,  Toru Tojo

IPC分类号： H05H1900

CPC分类号： H01J37/18 ,  H01J2237/022

摘要： A vacuum processing apparatus performs processing such-as a pattern depiction with a charged beam within a process chamber evacuated to a high vacuum by an ion pump. The vacuum processing apparatus, which makes it possible to prevent the accuracy of the charged beam pattern depiction from being deteriorated by ions and electrons leaking from the ion pump, has a conductor and a voltage applying unit. The conductor is arranged in the vicinity of the suction port of the process chamber communicating with the ion pump such that the conductor is electrically insulated from the process chamber. The voltage applying unit imparts a potential differing from that of the process chamber to the conductor. Because of the potential difference between the conductor and the process chamber, the ions and electrons leaking from the ion pump are reflected or adsorbed by the conductor so as to suppress leakage of the ions and electrons into the process chamber.

摘要翻译： 真空处理装置通过离子泵在被抽成高真空的处理室内进行诸如利用带电束的图案描绘的处理。 能够防止带电波束图形的精度被从离子泵泄漏的离子和电子劣化的真空处理装置具有导体和电压施加单元。 导体布置在与离子泵连通的处理室的吸入口附近，使得导体与处理室电绝缘。 电压施加单元将不同于处理室的电位赋予导体。 由于导体和处理室之间的潜在差异，离子泵泄漏的离子和电子被导体反射或吸收，以便抑制离子和电子向处理室的泄漏。

公开(公告)号：US06239443B1

公开(公告)日：2001-05-29

申请号：US09040286

申请日：1998-03-18

申请人： Toru Tojo ,  Ryoichi Hirano ,  Susumu Saito ,  Hitoshi Suzuki ,  Kazuo Abe ,  Shinya Watanabe

发明人： Toru Tojo ,  Ryoichi Hirano ,  Susumu Saito ,  Hitoshi Suzuki ,  Kazuo Abe ,  Shinya Watanabe

IPC分类号： G01N2186

CPC分类号： G03F9/7049

摘要： An apparatus for emitting a beam to a sample used for manufacturing a semiconductor device in order to process the sample, includes a chamber having an opening, a moving mechanism provided in the chamber, for moving the sample in X-, Y- and Z-axis directions, and a beam emitting system associated with the opening of the chamber, for emitting a beam to the sample in the chamber. The apparatus further includes an optical position detector for guiding a coherent light beam into the chamber and detecting a light beam output from the chamber. The optical position detector has light beam generating unit for generating a coherent light beam to be emitted to the sample, light-receiving unit for receiving a light beam from a surface of the sample, and converting unit for converting a signal output from the light-receiving unit into signals in the X-, Y- and Z-axis directions.

摘要翻译： 用于向用于制造半导体器件的样品发射光束以便处理样品的装置包括具有开口的腔室，设置在腔室中的移动机构，用于将样品移动到X，Y和Z轴中， 以及与室的开口相关联的光束发射系统，用于将光束发射到室中的样品。 该装置还包括光学位置检测器，用于将相干光束引导到腔室中并检测从腔室输出的光束。 光学位置检测器具有用于产生要发射到样品的相干光束的光束产生单元，用于接收来自样品表面的光束的光接收单元，以及用于转换从发光元件输出的信号的转换单元， 接收单元进入X，Y和Z轴方向的信号。

公开(公告)号：US6080990A

公开(公告)日：2000-06-27

申请号：US40391

申请日：1998-03-18

申请人： Shinya Watanabe ,  Hitoshi Suzuki ,  Kazuo Abe ,  Susumu Saito ,  Toru Tojo ,  Ryoichi Hirano

发明人： Shinya Watanabe ,  Hitoshi Suzuki ,  Kazuo Abe ,  Susumu Saito ,  Toru Tojo ,  Ryoichi Hirano

IPC分类号： G01D5/38 ,  G01B11/00 ,  G01B11/03 ,  G03F9/00 ,  H01L21/027 ,  G01B11/14

CPC分类号： G03F9/7026 ,  G03F9/7049 ,  G03F9/7065 ,  G03F9/7088

摘要： A position measuring apparatus includes a light source 1, an illumination optical system 100, a light-reception optical system 400 and a light-receiving unit 500. Illuminating beam emitted from the light source 1 is diffracted by a two-dimensional pattern on an object 10, and then enters the light-reception optical system 400. The light-receiving unit 500 receives diffracted lights consisting of a combination of a higher-order diffracted light appearing on the object side for the zero-order diffracted light in the receive diffracted lights with a zero-order diffracted light different in frequency from the higher-order diffracted light and another combination of higher-order diffracted lights different in frequency from one another and appearing on the object side for the zero-order diffracted light, thereby forming a position measuring interference measurement signal within the plane including the object. A signal processing unit is adapted to measure the position of the object 10 based on the phase of the position measuring interference measurement signal.

摘要翻译： 位置测量装置包括光源1，照明光学系统100，光接收光学系统400和光接收单元500.从光源1发射的照明光束被物体上的二维图案衍射 光接收单元500接收由接收衍射光中的零级衍射光在物体侧出现的高阶衍射光的组合构成的衍射光 具有与高次衍射光不同的零级衍射光和频率彼此不同的高阶衍射光的另一组合，并且在物体侧出现零级衍射光，从而形成位置 在包括物体的平面内测量干涉测量信号。 信号处理单元适于基于位置测量干涉测量信号的相位来测量对象10的位置。

公开(公告)号：US20120081538A1

公开(公告)日：2012-04-05

申请号：US13242655

申请日：2011-09-23

申请人： Riki Ogawa ,  Masatoshi Hirono ,  Takeshi Nishizaka ,  Ryoichi Hirano ,  Ikunao Isomura ,  Kazuto Matsuki ,  Fumio Ozaki

发明人： Riki Ogawa ,  Masatoshi Hirono ,  Takeshi Nishizaka ,  Ryoichi Hirano ,  Ikunao Isomura ,  Kazuto Matsuki ,  Fumio Ozaki

IPC分类号： H04N7/18

CPC分类号： G01N21/956

摘要： This pattern inspection apparatus includes an inspection region information storage unit that stores an inspection region specified in a pattern region, a pattern surface height detection unit that detects a pattern surface height signal corresponding to a pattern surface height measurement position on the inspection sample, an autofocus mechanism that focuses on the inspection sample using the pattern surface height signal detected by the pattern surface height detection unit, a determination unit, and an autofocus mechanism control unit. When the determination unit determines that the pattern surface height measurement position is located within the inspection region, the autofocus mechanism control unit drives the autofocus mechanism, and the determination unit determines that the pattern surface height measurement position is not located within the inspection region, the autofocus mechanism control unit stops the autofocus mechanism.

摘要翻译： 该图案检查装置包括：检查区域信息存储单元，其存储在图案区域中指定的检查区域;图案表面高度检测单元，其检测与检查样品上的图案表面高度测量位置对应的图案表面高度信号;自动对焦 使用由图案表面高度检测单元，确定单元和自动对焦机构控制单元检测到的图案表面高度信号来关注检查样本的机构。 当确定单元确定图案表面高度测量位置位于检查区域内时，自动聚焦机构控制单元驱动自动聚焦机构，并且确定单元确定图案表面高度测量位置不位于检查区域内， 自动对焦机构控制单元停止自动对焦机构。

公开(公告)号：US5642373A

公开(公告)日：1997-06-24

申请号：US550119

申请日：1995-10-30

申请人： Takeshi Kamizato ,  Ryoichi Hirano

发明人： Takeshi Kamizato ,  Ryoichi Hirano

IPC分类号： H01S3/08 ,  H01S5/00 ,  H01S5/022 ,  H01S5/042 ,  H01S5/10 ,  H01S5/18 ,  H01S5/42 ,  H01S3/19

CPC分类号： H01S5/42 ,  H01L2224/48463 ,  H01L2224/73265 ,  H01S5/02292 ,  H01S5/0422 ,  H01S5/18 ,  H01S5/4018 ,  H01S5/4056

摘要： A monolithic semiconductor laser array includes an insulating substrate, a plurality of semiconductor layers epitaxially grown on the substrate and forming a laser structure, and at least one groove transverse to the substrate extending through the semiconductor layers into the substrate, dividing the semiconductor laser structure into at least two mutually isolated parts. Within each of the isolated parts of the semiconductor laser structure, a first groove includes a side wall transverse to the substrate and forming a first resonator facet of a semiconductor laser. A second groove in each of the parts includes a second side wall transverse to the substrate and opposite the first side wall, forming a second resonator facet of the semiconductor laser in that part. Each second groove also includes a third side wall oblique to the substrate and opposite the second side wall for reflecting light from the respective semiconductor laser so that light from each of the semiconductor lasers is emitted along a common axis transverse to the substrate. The second grooves are arranged radially about a common point on the substrate. The semiconductor lasers may be electrically connected in series to each other.

摘要翻译： 单片半导体激光器阵列包括绝缘基板，在基板上外延生长并形成激光结构的多个半导体层以及横跨于基板的至少一个沟槽延伸穿过半导体层进入基板，将半导体激光器结构分成 至少两个相互隔离的部分。 在半导体激光器结构的每个隔离部分中，第一凹槽包括横向于衬底的侧壁并形成半导体激光器的第一谐振器面。 每个部件中的第二凹槽包括横向于基板并与第一侧壁相对的第二侧壁，在该部分中形成半导体激光器的第二谐振器面。 每个第二凹槽还包括与基板倾斜并与第二侧壁相对的第三侧壁，用于反射来自各个半导体激光器的光，使得来自每个半导体激光器的光沿着与基板横向的共同轴线发射。 第二槽围绕基板上的公共点径向地布置。 半导体激光器可以彼此串联电连接。