公开(公告)号：US20230229074A1

公开(公告)日：2023-07-20

申请号：US17899616

申请日：2022-08-31

Applicant: SEMES CO., LTD.

Inventor： Hyo Won YANG ,  Hyun Yoon ,  Ji Hoon Jeong ,  In Ki Jung ,  Ki Hoon Choi ,  Tae Hee Kim ,  Se Hoon Oh

IPC: G03F1/72

CPC classification number: G03F1/72

Abstract: A photomask correction method capable of increasing the photomask precision is provided. The photomask correction method comprises measuring an intensity profile of a laser, acquiring etching amount data corresponding to the measured intensity profile using a library, determining a process parameter of the laser based on the etching amount data, and correcting a photomask with the laser according to the determined process parameter.

公开(公告)号：US20230207324A1

公开(公告)日：2023-06-29

申请号：US18057321

申请日：2022-11-21

Applicant: SEMES CO., LTD.

Inventor： Won Sik Son ,  Hyun Yoon ,  Hyo Won Yang ,  Ji Hoon Jeong ,  Young Dae Chung ,  In Ki Jung

IPC: H01L21/268 ,  H01L21/67

CPC classification number: H01L21/268 ,  H01L21/6704 ,  H01L21/67115

Abstract: The present invention provides a substrate treating method of treating a substrate including a plurality of cells, the substrate treating method including: a liquid treating operation of supplying a treatment liquid to the substrate; and a heating operation of heating the substrate by supplying the treatment liquid and irradiating laser light to a specific region located outside a region in which the plurality of cells is provided, in which the laser light is formed to cover the specific region when viewed from the top.

公开(公告)号：US20230213876A1

公开(公告)日：2023-07-06

申请号：US18148127

申请日：2022-12-29

Applicant: SEMES CO., LTD.

Inventor： Hyo Won YANG ,  Hyun Yoon ,  Young Ho Park ,  Tae Hee Kim ,  In Ki Jung ,  Kwang Sup Kim

IPC: G03F7/20 ,  G03F7/30 ,  G03F7/40

CPC classification number: G03F7/70683 ,  G03F7/2053 ,  G03F7/30 ,  G03F7/40 ,  G03F7/70025 ,  G03F7/7085 ,  G03F7/70825 ,  G03F1/72

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a support unit configured to rotate and support a substrate; a liquid supply unit configured to supply a liquid to the substrate supported on the support unit; and an optical module for heating the substrate supported on the support unit, and wherein the support unit includes a teaching member having a grid displaying a reference point which matches a center of the support unit.

公开(公告)号：US20230211436A1

公开(公告)日：2023-07-06

申请号：US18145245

申请日：2022-12-22

Applicant: SEMES CO., LTD.

Inventor： Hyo Won YANG ,  Hyun Yoon ,  Ji Hoon Jeong ,  Ki Hoon Choi ,  In Ki Jung ,  Won Sik Son ,  Tae Hee Kim

IPC: B23K26/03 ,  G03F1/84 ,  G03F1/42 ,  G03F1/60 ,  B23K26/122 ,  B23K26/06 ,  B23K26/04 ,  B23K26/362

CPC classification number: B23K26/032 ,  G03F1/84 ,  G03F1/42 ,  G03F1/60 ,  B23K26/122 ,  B23K26/0648 ,  B23K26/043 ,  B23K26/362

Abstract: The inventive concept provides a mask treating method. The mask treating method includes treating a mask by supplying a liquid to the mask, and irradiating a laser to a region of the mask on which a specific pattern is formed while the liquid remains on the mask; moving an optical module including a laser unit configured to irradiate the laser between a process position for treating the substrate and a standby position deviating from the process position; and adjusting a state of the optical module at an inspection port provided at the standby position to a set condition before the optical module is moved to the process position.