公开(公告)号：US11024517B2

公开(公告)日：2021-06-01

申请号：US15607356

申请日：2017-05-26

Applicant: SEMES CO., LTD.

Inventor： Young Hun Lee ,  Jae Myoung Lee

IPC: H01L21/67 ,  H01L21/677 ,  H01L21/687 ,  B08B3/04 ,  B08B3/08 ,  B08B3/14

Abstract: Disclosed are an apparatus and a method for liquid-treating a substrate. An apparatus for treating a substrate includes a liquid treatment chamber that supplies a liquid onto the substrate to liquid-treat the substrate, a drying chamber that removes the remained liquid on the substrate, and a transfer unit that transfers the substrate between the liquid treatment chamber and the drying chamber, wherein the transfer unit includes a hand that supports the substrate, and a weight measuring unit that measures a weight of the remained liquid on the substrate. A weight of a remained liquid on a substrate may be measured by measuring a weight of the substrate while the substrate is transferred.

公开(公告)号：US10818519B2

公开(公告)日：2020-10-27

申请号：US16044601

申请日：2018-07-25

Applicant: SEMES CO., LTD.

Inventor： Yong Hee Lee ,  Young Hun Lee

IPC: H01L21/67 ,  H01L21/687 ,  H01L21/02

Abstract: Disclosed are an apparatus and a method for drying a substrate. The apparatus for drying a substrate includes a chamber having a treatment space in the interior thereof, a substrate support unit configured to the substrate in the treatment space, a conversion unit configured to convert a state of the substrate supported by the substrate support unit between a horizontal state and an inclined state, a fluid supply unit configured to supply a drying fluid into the treatment space, and a controller configured to control the conversion unit and the fluid supply unit.

公开(公告)号：US12300517B2

公开(公告)日：2025-05-13

申请号：US17547182

申请日：2021-12-09

Applicant: SEMES CO., LTD.

Inventor： Sang Min Lee ,  Young Hun Lee ,  Myung Seok Cha

IPC: H01L21/67

Abstract: The inventive concept provides a temperature controlling method. The temperature controlling method for controlling a temperature of a tank storing a treating fluid transferred to the chamber, comprises supplying the treating fluid to the inner space of the tank, heating the treating fluid at the inner space, and transferring the heated treating fluid to the chamber, wherein the temperature of the inner space is controlled based on a measured pressure of the inner space.

公开(公告)号：US12027381B2

公开(公告)日：2024-07-02

申请号：US17137181

申请日：2020-12-29

Applicant: SEMES CO., LTD.

Inventor： Youngseop Choi ,  Young Hun Lee ,  Jinwoo Jung ,  Miso Park

IPC: B08B3/08 ,  B08B3/10 ,  B08B7/00 ,  B08B13/00 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/67034 ,  B08B3/08 ,  B08B3/10 ,  B08B7/0021 ,  B08B13/00 ,  H01L21/67207 ,  H01L21/67023 ,  H01L21/67167 ,  H01L21/68707

Abstract: Embodiments of the inventive concept provide an apparatus for treating a substrate. According to an exemplary embodiment, an apparatus for treating a substrate comprises a first valve and a second valve sequentially installed along a direction from a fluid supplying source to a high-pressure chamber in the supply line; a branch line branching from the supply line between the first valve and the second valve and connected to an exhaust line; a third valve installed on the branch line; an exhaust unit exhausting the process fluid inside the high-pressure chamber; and a controller, wherein the controller is configured to perform, before a transfer robot transfers the substrate to the high-pressure chamber for treating the substrate, a first operating of opening the first valve and closing the second valve and a third valve, and a second operating of closing the first valve and the second valve, and opening the third valve.

公开(公告)号：US11794220B2

公开(公告)日：2023-10-24

申请号：US16924633

申请日：2020-07-09

Applicant: SEMES CO., LTD.

Inventor： Inhwang Park ,  Gui Su Park ,  Young Hun Lee ,  Youngseop Choi ,  Seung Hoon Oh ,  Jonghyeon Woo ,  Jin Mo Jae

IPC: B08B7/00 ,  H01L21/67

CPC classification number: B08B7/0021 ,  H01L21/6719 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/67103

Abstract: An apparatus for treating a substrate includes a process chamber having a treatment space for treating the substrate; a fluid supply unit for supplying fluid to the treatment space, wherein the fluid supply unit includes: a supply pipe connected to the treatment space to supply the fluid to the treatment space; a pump installed in the supply pipe to provide flow pressure to the fluid; a vent line installed between the pump and the process chamber to discharge pressure in the fluid to an outside; a relief valve installed in the vent line to open and close the vent line; and a reservoir installed between the pump and a branch point wherein the vent line branches from the supply pipe, wherein the reservoir has a cross-sectional area larger than a cross-sectional area of a portion of the supply pipe located between the pump and the branch point.

公开(公告)号：US09527118B2

公开(公告)日：2016-12-27

申请号：US14934200

申请日：2015-11-06

Applicant: Semes Co., Ltd.

Inventor： Young Hun Lee ,  Eui Sang Lim ,  Jae Myoung Lee

IPC: H01L21/331 ,  H01L21/8222 ,  B08B7/00 ,  H01L21/02 ,  H01L21/67

CPC classification number: B08B7/0021 ,  H01L21/02057 ,  H01L21/02101 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/67069

Abstract: Disclosed are systems and methods for treating a substrate. The method may include supplying supercritical carbon dioxide into a chamber to treat a substrate. Here, temperature and pressure of the chamber is maintained to allow carbon dioxide to be directly changed from a gas state to a supercritical state when the carbon dioxide is supplied into the chamber.

Abstract translation: 公开了用于处理基材的系统和方法。 该方法可以包括将超临界二氧化碳供应到室中以处理基底。 这里，保持室的温度和压力，以便当将二氧化碳供应到室中时，使二氧化碳直接从气态改变为超临界状态。

公开(公告)号：US12272569B2

公开(公告)日：2025-04-08

申请号：US17547182

申请日：2021-12-09

Applicant: SEMES CO., LTD.

Inventor： Sang Min Lee ,  Young Hun Lee ,  Myung Seok Cha

IPC: H01L21/67

Abstract: The inventive concept provides a temperature controlling method. The temperature controlling method for controlling a temperature of a tank storing a treating fluid transferred to the chamber, comprises supplying the treating fluid to the inner space of the tank, heating the treating fluid at the inner space, and transferring the heated treating fluid to the chamber, wherein the temperature of the inner space is controlled based on a measured pressure of the inner space.

公开(公告)号：US12272543B2

公开(公告)日：2025-04-08

申请号：US18068917

申请日：2022-12-20

Applicant: SEMES CO., LTD.

Inventor： Yong Hyun Choi ,  Young Hun Lee ,  Seung Hoon Oh ,  Mi So Park ,  Tae Jong Choi ,  Yong Sun Ko ,  Jin Woo Jung

IPC: H01L21/02 ,  B08B3/02 ,  F26B5/00

Abstract: The present invention provides a method for treating a substrate. The method for treating a substrate comprises: treating the substrate with liquid; and drying the liquid-treated substrate, and the liquid treatment step includes: a first liquid supply step of supplying a first liquid to an upper surface of the rotating substrate; and a second liquid supply step of supplying a second liquid to an upper surface of the rotating substrate, and in the second liquid supply step, a rotation speed of the substrate is adjusted such that the second liquid supplied on the substrate flows from a central region of the substrate to an edge region of the substrate.

公开(公告)号：US11804386B2

公开(公告)日：2023-10-31

申请号：US17244722

申请日：2021-04-29

Applicant: SEMES CO., LTD.

Inventor： Young Hun Lee ,  Jae Myoung Lee

IPC: H01L21/06 ,  H01L21/677 ,  H01L21/687 ,  H01L21/67

CPC classification number: H01L21/6704 ,  H01L21/6719 ,  H01L21/67023 ,  H01L21/67051 ,  H01L21/67253 ,  H01L21/67703 ,  H01L21/67742 ,  H01L21/67781 ,  H01L21/68707 ,  H01L21/68764

Abstract: Disclosed are an apparatus and a method for liquid-treating a substrate. An apparatus for treating a substrate includes a liquid treatment chamber that supplies a liquid onto the substrate to liquid-treat the substrate, a drying chamber that removes the remained liquid on the substrate, and a transfer unit that transfers the substrate between the liquid treatment chamber and the drying chamber, wherein the transfer unit includes a hand that supports the substrate, and a weight measuring unit that measures a weight of the remained liquid on the substrate. A weight of a remained liquid on a substrate may be measured by measuring a weight of the substrate while the substrate is transferred.

公开(公告)号：US11721575B2

公开(公告)日：2023-08-08

申请号：US16906237

申请日：2020-06-19

Applicant: SEMES CO., LTD.

Inventor： Inhwang Park ,  Gui Su Park ,  Young Hun Lee ,  Youngseop Choi ,  Seung Hoon Oh ,  Jonghyeon Woo ,  Jin Mo Jae

IPC: H01L21/687 ,  B08B3/04 ,  H01L21/67

CPC classification number: H01L21/68785 ,  B08B3/04 ,  H01L21/67051 ,  H01L21/67126 ,  H01L21/68792

Abstract: An apparatus for supporting a substrate includes a rotatable spin head that supports the substrate, a hollow shaft that is connected with the spin head and that transmits torque to the spin head, a nozzle assembly that is disposed in an interior space of the spin head so as not to rotate and that supplies a treatment liquid to a backside of the substrate, and a sealing member that seals a gap between the spin head and the nozzle assembly using a magnetic fluid.