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公开(公告)号：US09991099B2
公开(公告)日：2018-06-05
申请号：US14939659
申请日：2015-11-12
Applicant: Seagate Technology LLC
Inventor： Samuel Lewis Tanaka , Christopher L. Platt , Thomas Larson Greenberg
CPC classification number: H01J37/32568 , C23C16/26 , C23C16/50 , H01J37/3233 , H01J37/32403 , H01J37/3244 , H01J37/32449 , H01J37/32541 , H01J2237/032 , H01J2237/3321 , H01K1/18
Abstract: A chemical vapor deposition source that includes at least one plate to which first and second electrical connection posts are coupled. The chemical vapor deposition source also includes a filament having a first end and a second end. The first end of the filament is electrically connected to the first electrical connection post and the second end of the filament is electrically connected to the second electrical connection post. The chemical vapor deposition source further includes at least one filament holder electrically insulated from the at least one plate. The at least one filament holder holds a portion of the filament between the first end and the second end.
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公开(公告)号：US10748571B2
公开(公告)日：2020-08-18
申请号：US15876062
申请日：2018-01-19
Applicant: Seagate Technology LLC
Inventor： Samuel Lewis Tanaka , ChunWai Joseph Tong , Xiaoding Ma , Jerry Kueirweei Chour , Thomas Larson Greenberg
IPC: H01J37/34 , G11B5/851 , G11B5/73 , H01F1/06 , G11B5/65 , C23C14/34 , G11B5/012 , H01F41/18 , C23C14/18 , C23C14/35 , G11B5/00
Abstract: A device includes a housing unit and a number of magnets. The housing unit includes a number of holes therein. The magnets are positioned in the holes. The magnets have a same pole orientation. It is appreciated that the magnets are positioned in the holes to form a mechanically balanced and magnetically unbalanced structure.
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公开(公告)号：US10541166B2
公开(公告)日：2020-01-21
申请号：US15484736
申请日：2017-04-11
Applicant: Seagate Technology LLC
Inventor： Daniel Peinovich , Samuel Lewis Tanaka , Thomas Larson Greenberg
IPC: H01L21/677 , H01L21/67 , H01L21/68 , H01L21/687
Abstract: A method includes moving a sensor and an article at a first speed to position the sensor into a reference position relative to an article fixture. The sensor and the article are moved at a second speed as the sensor approaches the reference position. It is determined when the sensor is in the reference position, wherein the sensor is configured to be in the reference position when a contact is established between the sensor and a surface of the article fixture. The article is moved by a predetermined increment relative to the reference position to position the article in a target position in response to determining that the sensor is in the reference position.
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公开(公告)号：US09666465B2
公开(公告)日：2017-05-30
申请号：US14105065
申请日：2013-12-12
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： Daniel Peinovich , Samuel Lewis Tanaka , Thomas Larson Greenberg
IPC: H01L21/68 , H01L21/687 , H01L21/677 , H01L21/67
CPC classification number: H01L21/67703 , H01L21/67259 , H01L21/67766 , H01L21/67778 , H01L21/68 , H01L21/68707 , Y10T29/49998
Abstract: Provided herein is an apparatus including a loader configured to position a workpiece in a holding fixture. In some embodiments, the holding fixture includes an opening configured to removably receive the workpiece therein and hold the workpiece in a target position within the opening. The apparatus also includes position detecting means configured to translate a sensor to a predetermined location relative to the holding fixture and further configured to translate the workpiece by a predetermined increment relative to the predetermined location to position the workpiece in the target position.
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公开(公告)号：US20160035546A1
公开(公告)日：2016-02-04
申请号：US14448639
申请日：2014-07-31
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： Christopher Loren Platt , Zhaohui Fan , Samuel Lewis Tanaka , Chun Wai Joseph Tong , Thomas Larson Greenberg , Xiaoding Ma
CPC classification number: C23C14/35 , C23C16/26 , C23C16/50 , H01J37/32422 , H01J37/32568 , H01J37/32669
Abstract: The embodiments disclose an apparatus including at least two carbon source deposition tools for emitting electrons, at least two reflective polarity rear button permanent magnets integrated into the carbon source deposition tools for reflecting emitted electrons, and at least two paired polarity Helmholtz coils integrated into the carbon source deposition tools for forming uniform parallel magnetic field lines for confining the emitted electrons to uniformly deposit carbon onto the surfaces of a two-sided media disk.
Abstract translation: 实施例公开了一种装置，其包括用于发射电子的至少两个碳源沉积工具，集成到用于反射发射电子的碳源沉积工具中的至少两个反射极性后按钮永磁体，以及集成到碳中的至少两个成对极性的亥姆霍兹线圈 源沉积工具，用于形成均匀的平行磁场线，用于限制发射的电子均匀地将碳均匀地沉积在双面介质盘的表面上。
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Patent Agency Ranking
公开(公告)号：US10184170B2
公开(公告)日：2019-01-22
申请号：US14916081
申请日：2014-01-17
Applicant: Seagate Technology LLC
Inventor： Samuel Lewis Tanaka , Thomas Larson Greenberg
Abstract: A plasma etching source installable into at least one of multiple compartments of a sputter deposition tool. The plasma etching source includes a first mounting plate and at least one electrode plate coupled to the first mounting plate. A gas inlet is included in the first mounting plate of the plasma etching source.
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公开(公告)号：US10151025B2
公开(公告)日：2018-12-11
申请号：US14448639
申请日：2014-07-31
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： Christopher Loren Platt , Zhaohui Fan , Samuel Lewis Tanaka , Chun Wai Joseph Tong , Thomas Larson Greenberg , Xiaoding Ma
Abstract: The embodiments disclose an apparatus including at least two carbon source deposition tools for emitting electrons, at least two reflective polarity rear button permanent magnets integrated into the carbon source deposition tools for reflecting emitted electrons, and at least two paired polarity Helmholtz coils integrated into the carbon source deposition tools for forming uniform parallel magnetic field lines for confining the emitted electrons to uniformly deposit carbon onto the surfaces of a two-sided media disk.
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公开(公告)号：US20180315446A1
公开(公告)日：2018-11-01
申请号：US15499320
申请日：2017-04-27
Applicant: Seagate Technology LLC
Inventor： Samuel Lewis Tanaka
Abstract: A system includes a cooling plate coupled to a first disk holder and to a second disk holder. The first disk holder and the second disk holder are each shaped to be removably coupled to respective inner diameter surfaces of disks such that, when coupled, each disk is positioned a distance from the cooling plate.
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公开(公告)号：US20170221744A1
公开(公告)日：2017-08-03
申请号：US15484736
申请日：2017-04-11
Applicant: Seagate Technology LLC
Inventor： Daniel Peinovich , Samuel Lewis Tanaka , Thomas Larson Greenberg
IPC: H01L21/677 , H01L21/67 , H01L21/68
CPC classification number: H01L21/67703 , H01L21/67259 , H01L21/67766 , H01L21/67778 , H01L21/68 , H01L21/68707 , Y10T29/49998
Abstract: A method includes moving a sensor and an article at a first speed to position the sensor into a reference position relative to an article fixture. The sensor and the article are moved at a second speed as the sensor approaches the reference position. It is determined when the sensor is in the reference position, wherein the sensor is configured to be in the reference position when a contact is established between the sensor and a surface of the article fixture. The article is moved by a predetermined increment relative to the reference position to position the article in a target position in response to determining that the sensor is in the reference position.
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公开(公告)号：US20160203956A1
公开(公告)日：2016-07-14
申请号：US14916081
申请日：2014-01-17
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： Samuel Lewis Tanaka , Thomas Larson Greenberg
CPC classification number: C23C14/34 , C23C14/022 , C23C14/56 , H01J37/32009 , H01J37/32403 , H01J37/3244 , H01J37/32532 , H01J37/32862 , H01J37/32889 , H01J37/34 , H01J2237/334
Abstract: A plasma etching source installable into at least one of multiple compartments of a sputter deposition tool. The plasma etching source includes a first mounting plate and at least one electrode plate coupled to the first mounting plate. A gas inlet is included in the first mounting plate of the plasma etching source.
Abstract translation: 等离子体蚀刻源可以安装到溅射沉积工具的多个隔间中的至少一个中。 等离子体蚀刻源包括第一安装板和联接到第一安装板的至少一个电极板。 等离子体蚀刻源的第一安装板中包括气体入口。
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