公开(公告)号：US20140038395A1

公开(公告)日：2014-02-06

申请号：US14001797

申请日：2011-08-31

申请人： Takahiro Kozawa ,  Kenji Nakashima ,  Keeyoung Jun ,  Takahiro Ito

发明人： Takahiro Kozawa ,  Kenji Nakashima ,  Keeyoung Jun ,  Takahiro Ito

IPC分类号： C23C16/24 ,  H01L21/02

CPC分类号： H01L21/0262 ,  C01B33/027 ,  C01B33/029 ,  C23C16/24 ,  C23C16/452 ,  C23C16/45561 ,  H01L21/0237 ,  H01L21/02532

摘要： A vapor deposition device includes a vapor deposition chamber, a heating chamber, a mixing chamber, a first reservoir for storing trichlorosilane gas, and a second reservoir for storing silane gas that reacts with hydrochloric acid gas. The heating chamber communicates with the first reservoir and the mixing chamber, heats the trichlorosilane gas and then supplies the heated gas to the mixing chamber. The mixing chamber communicates with the second reservoir and the vapor deposition chamber, mixes the heated gas supplied from the heating chamber and the silane gas and then supplies the mixed gas to the vapor deposition chamber. A temperature in the heating chamber is higher than a temperature in the mixing chamber.

摘要翻译： 气相沉积装置包括蒸镀室，加热室，混合室，用于储存三氯硅烷气体的第一储存器和用于储存与盐酸气体反应的硅烷气体的第二储存器。 加热室与第一储存器和混合室连通，加热三氯硅烷气体，然后将加热的气体供应到混合室。 混合室与第二储存器和气相沉积室连通，将从加热室供应的加热气体与硅烷气体混合，然后将混合气体供应到气相沉积室。 加热室中的温度高于混合室中的温度。

公开(公告)号：US20130040441A1

公开(公告)日：2013-02-14

申请号：US13642973

申请日：2010-12-08

申请人： Takahiro Ito ,  Takahiro Kozawa ,  Kenji Nakashima ,  Keeyoung Jun

发明人： Takahiro Ito ,  Takahiro Kozawa ,  Kenji Nakashima ,  Keeyoung Jun

IPC分类号： H01L21/20

CPC分类号： H01L21/0262 ,  C23C16/24 ,  C30B29/06 ,  C30B33/06 ,  H01L21/0237 ,  H01L21/02389 ,  H01L21/02532

摘要： A process for supplying a mixed material gas that includes a chlorosilane gas and a carrier gas to a surface of a substrate heated at 1200 to 1400° C. from a direction perpendicular to the surface is provided. A supply rate of the chlorosilane gas is equal to or more than 200 μmol per minute per 1 cm2 of the surface of the substrate. The carrier gas includes a hydrogen gas and at least one or more gases selected from argon, xenon, krypton and neon.

摘要翻译： 提供了一种从垂直于表面的方向向包含氯硅烷气体和载气的混合材料气体供给到加热到1200至1400℃的基板的表面的方法。 氯硅烷气体的供给速度等于或大于200μmol/分钟/ 1cm 2的基材表面。 载气包括氢气和选自氩，氙，氪和氖的至少一种或多种气体。

公开(公告)号：US08956458B2

公开(公告)日：2015-02-17

申请号：US14001797

申请日：2011-08-31

申请人： Takahiro Kozawa ,  Kenji Nakashima ,  Keeyoung Jun ,  Takahiro Ito

发明人： Takahiro Kozawa ,  Kenji Nakashima ,  Keeyoung Jun ,  Takahiro Ito

IPC分类号： C23C16/00 ,  H01L21/02 ,  C01B33/027 ,  C01B33/029 ,  C23C16/24 ,  C23C16/452 ,  C23C16/455

CPC分类号： H01L21/0262 ,  C01B33/027 ,  C01B33/029 ,  C23C16/24 ,  C23C16/452 ,  C23C16/45561 ,  H01L21/0237 ,  H01L21/02532

摘要： A vapor deposition device includes a vapor deposition chamber, a heating chamber, a mixing chamber, a first reservoir for storing trichlorosilane gas, and a second reservoir for storing silane gas that reacts with hydrochloric acid gas. The heating chamber communicates with the first reservoir and the mixing chamber, heats the trichlorosilane gas and then supplies the heated gas to the mixing chamber. The mixing chamber communicates with the second reservoir and the vapor deposition chamber, mixes the heated gas supplied from the heating chamber and the silane gas and then supplies the mixed gas to the vapor deposition chamber. A temperature in the heating chamber is higher than a temperature in the mixing chamber.

摘要翻译： 气相沉积装置包括蒸镀室，加热室，混合室，用于储存三氯硅烷气体的第一储存器和用于储存与盐酸气体反应的硅烷气体的第二储存器。 加热室与第一储存器和混合室连通，加热三氯硅烷气体，然后将加热的气体供应到混合室。 混合室与第二储存器和气相沉积室连通，将从加热室供应的加热气体与硅烷气体混合，然后将混合气体供应到气相沉积室。 加热室中的温度高于混合室中的温度。

公开(公告)号：US08703590B2

公开(公告)日：2014-04-22

申请号：US13642973

申请日：2010-12-08

申请人： Takahiro Ito ,  Takahiro Kozawa ,  Kenji Nakashima ,  Keeyoung Jun

发明人： Takahiro Ito ,  Takahiro Kozawa ,  Kenji Nakashima ,  Keeyoung Jun

IPC分类号： H01L21/20

CPC分类号： H01L21/0262 ,  C23C16/24 ,  C30B29/06 ,  C30B33/06 ,  H01L21/0237 ,  H01L21/02389 ,  H01L21/02532

摘要： A process for supplying a mixed material gas that includes a chlorosilane gas and a carrier gas to a surface of a substrate heated at 1200 to 1400° C. from a direction perpendicular to the surface is provided. A supply rate of the chlorosilane gas is equal to or more than 200 μmol per minute per 1 cm2 of the surface of the substrate. The carrier gas includes a hydrogen gas and at least one or more gases selected from argon, xenon, krypton and neon.

摘要翻译： 提供了一种从垂直于表面的方向向包含氯硅烷气体和载气的混合材料气体供给到加热到1200至1400℃的基板的表面的方法。 氯硅烷气体的供给速度等于或大于200μmol/分钟/ 1cm 2的基材表面。 载气包括氢气和选自氩，氙，氪和氖的至少一种或多种气体。

公开(公告)号：US09243326B2

公开(公告)日：2016-01-26

申请号：US13636874

申请日：2011-03-17

申请人： Yu Yan Jiang ,  Masahide Inagaki ,  Kenji Nakashima ,  Soichiro Makino ,  Nariaki Horinouchi ,  Takahiro Ito

发明人： Yu Yan Jiang ,  Masahide Inagaki ,  Kenji Nakashima ,  Soichiro Makino ,  Nariaki Horinouchi ,  Takahiro Ito

IPC分类号： C23C16/455

CPC分类号： C23C16/45508 ,  C23C16/45504 ,  C23C16/45587 ,  C23C16/45597

摘要： A surface treatment apparatus in which a disk-like sample-holding plate is provided inside an enclosure constituting a cylindrical circumferential wall. A cylindrical portion in an upper portion of the enclosure constitutes a material fluid supplying channel, and a channel provided on the lateral side of the sample-holding plate in the enclosure and shaped spreading as it goes farther from the cylindrical portion constitutes a fluid discharge channel. The fluid discharge channel employs a parabola curve or the like in which the position of the upper end of the outmost circumference of the sample-holding plate is defined as a focus position and the position of the upper end of the outlet that is symmetrically opposite to the focus position is defined as a reference position.

摘要翻译： 一种表面处理装置，其中盘形样品保持板设置在构成圆柱形周壁的外壳的内部。 外壳的上部的圆筒部分构成材料流体供给通道，并且设置在外壳中的样品保持板的侧面上的通道，并且随着与圆柱形部分更远的形状扩散，构成流体排出通道 。 流体排出通道使用抛物线曲线等，其中将样品保持板的最外周的上端的位置定义为聚焦位置，并且出口的上端的位置对称地相对于 焦点位置被定义为参考位置。

公开(公告)号：US08497217B2

公开(公告)日：2013-07-30

申请号：US13151081

申请日：2011-06-01

申请人： Takahiro Ito ,  Kenji Nakashima

发明人： Takahiro Ito ,  Kenji Nakashima

IPC分类号： H01L21/205

CPC分类号： C23C16/4411 ,  C23C16/24 ,  C23C16/4401 ,  C23C16/4488 ,  C23C16/45589 ,  C23C16/4585 ,  C30B25/14 ,  C30B29/06 ,  H01L21/02381 ,  H01L21/02532 ,  H01L21/0262

摘要： A film forming apparatus and a film forming method for suppressing a drop in the film forming speed caused by-product gas are provided. A film forming apparatus for forming a film on a wafer includes a chamber in which the wafer is located; a gas introducing member configured to introduce raw material gas into the chamber, in which the raw material gas turning into by-product gas and a substance which adheres to the surface of the wafer by reacting at a surface of the wafer; and a reverse reaction member configured to generate the raw material gas by causing the by-product gas to react in the chamber.

摘要翻译： 提供了一种用于抑制造成副产品气体的成膜速度下降的成膜装置和成膜方法。 用于在晶片上形成膜的成膜装置包括晶片所在的室; 气体导入部件，其将原料气体引入所述室内，原料气体转化为副产物气体;以及物质，其通过在所述晶片的表面反应而附着于所述晶片的表面; 以及反作用构件，其被配置为通过使副产物气体在室中反应而产生原料气体。

公开(公告)号：US20130008610A1

公开(公告)日：2013-01-10

申请号：US13636874

申请日：2011-03-17

申请人： Yu Yan Jiang ,  Masahide Inagaki ,  Kenji Nakashima ,  Soichiro Makino ,  Nariaki Horinouchi ,  Takahiro Ito

发明人： Yu Yan Jiang ,  Masahide Inagaki ,  Kenji Nakashima ,  Soichiro Makino ,  Nariaki Horinouchi ,  Takahiro Ito

IPC分类号： B05C13/02 ,  C23C16/458

CPC分类号： C23C16/45508 ,  C23C16/45504 ,  C23C16/45587 ,  C23C16/45597

摘要： A surface treatment apparatus in which a disk-like sample-holding plate is provided inside an enclosure constituting a cylindrical circumferential wall. A cylindrical portion in an upper portion of the enclosure constitutes a material fluid supplying channel, and a channel provided on the lateral side of the sample-holding plate in the enclosure and shaped spreading as it goes farther from the cylindrical portion constitutes a fluid discharge channel. The fluid discharge channel employs a parabola curve or the like in which the position of the upper end of the outmost circumference of the sample-holding plate is defined as a focus position and the position of the upper end of the outlet that is symmetrically opposite to the focus position is defined as a reference position.

摘要翻译： 一种表面处理装置，其中盘形样品保持板设置在构成圆柱形周壁的外壳的内部。 外壳的上部的圆筒部分构成材料流体供给通道，并且设置在外壳中的样品保持板的侧面上的通道，并且随着与圆柱形部分更远的形状扩散，构成流体排出通道 。 流体排出通道使用抛物线曲线等，其中将样品保持板的最外周的上端的位置定义为聚焦位置，并且出口的上端的位置对称地相对于 焦点位置被定义为参考位置。

公开(公告)号：US09309373B2

公开(公告)日：2016-04-12

申请号：US13996858

申请日：2011-12-02

申请人： Takahiro Ito ,  Makoto Imahori ,  Tatsuo Nishio

发明人： Takahiro Ito ,  Makoto Imahori ,  Tatsuo Nishio

IPC分类号： C08K5/07 ,  C08K5/01 ,  C09J151/06 ,  B32B7/12 ,  C08G18/62 ,  C08G18/79 ,  C09J175/04 ,  C09J123/16 ,  B32B15/08 ,  C08F255/02 ,  C08F255/04 ,  C08L51/06 ,  C09J123/28

CPC分类号： C08K5/01 ,  B32B7/12 ,  B32B15/08 ,  C08F255/02 ,  C08F255/04 ,  C08G18/6204 ,  C08G18/791 ,  C08K5/07 ,  C08L51/06 ,  C08L2205/025 ,  C09J123/16 ,  C09J123/286 ,  C09J151/06 ,  C09J175/04 ,  C08F222/06 ,  C08F220/18 ,  C08F2220/1883

摘要： Provided is an adhesive composition leading to sufficient adhesive strength when used for bonding to a polyolefin resin molded article that bonds poorly with other members. Also provided is an adhesive composition having excellent heat resistance (heat resistant adhesion) in the bonded part of a composite body obtained by joining a polyolefin resin-formed body and other member. This adhesive composition contains an organic solvent, a carboxyl group-containing polyolefin resin which is dissolved in this organic solvent and which has a melt flow rate of 5 to 40 g/10 min when measured at 130° C., and a polyfunctional isocyanate compound. This adhesive composition may further contain a carboxyl group-containing polyolefin resin having a melting point of 120° C. to 170° C.

摘要翻译： 提供一种粘合剂组合物，当与用于与其它构件粘合不良的聚烯烃树脂模制品粘合时，导致足够的粘合强度。 还提供了通过将聚烯烃树脂形成体与其它构件接合而获得的复合体的接合部分具有优异的耐热性（耐热粘合性）的粘合剂组合物。 该粘合剂组合物含有溶解于该有机溶剂中的有机溶剂，含羧基的聚烯烃树脂，在130℃下测定时的熔体流动速率为5〜40g / 10min，多官能异氰酸酯化合物 。 该粘合剂组合物还可以含有熔点为120〜170℃的含羧基的聚烯烃树脂。

公开(公告)号：US09170842B2

公开(公告)日：2015-10-27

申请号：US13814137

申请日：2011-07-27

申请人： Tomohiro Nakagawa ,  Maki Ohata ,  Kazuhisa Sekine ,  Ken Ohta ,  Masahiro Fukuyori ,  Tetsuya Shioda ,  Takahiro Ito ,  Katsuaki Akama

发明人： Tomohiro Nakagawa ,  Maki Ohata ,  Kazuhisa Sekine ,  Ken Ohta ,  Masahiro Fukuyori ,  Tetsuya Shioda ,  Takahiro Ito ,  Katsuaki Akama

IPC分类号： G06F9/46 ,  G06F9/50

CPC分类号： G06F9/5005 ,  G06F9/5022

摘要： In an information processing terminal, a second screen activation monitoring unit that has received a focus OFF notification sends a domain switch request notification to a domain control unit, and the domain control unit that has received the notification sends a domain switch notification to a first OS. Then, the first OS sends a focus ON notification to a first screen activation monitoring unit and further sends the focus OFF notification to a first application. A resource is thereby released by the first application that is implemented to release an acquired resource upon receiving the focus OFF notification.

摘要翻译： 在信息处理终端中，已经接收到焦点关闭通知的第二屏幕激活监视单元将域切换请求通知发送到域控制单元，并且已经接收到通知的域控制单元向第一OS发送域切换通知 。 然后，第一OS将焦点ON通知发送到第一屏幕激活监视单元，并且进一步向第一应用发送焦点关闭通知。 因此，第一应用释放资源，该应用被实现以在接收到焦点关闭通知时释放所获取的资源。

公开(公告)号：US20130338284A1

公开(公告)日：2013-12-19

申请号：US13996858

申请日：2011-12-02

申请人： Takahiro Ito ,  Makoto Imahori ,  Tatsuo Nishio

发明人： Takahiro Ito ,  Makoto Imahori ,  Tatsuo Nishio

IPC分类号： C08K5/01 ,  C09J123/16 ,  C09J151/06 ,  C08K5/07

CPC分类号： C08K5/01 ,  B32B7/12 ,  B32B15/08 ,  C08F255/02 ,  C08F255/04 ,  C08G18/6204 ,  C08G18/791 ,  C08K5/07 ,  C08L51/06 ,  C08L2205/025 ,  C09J123/16 ,  C09J123/286 ,  C09J151/06 ,  C09J175/04 ,  C08F222/06 ,  C08F220/18 ,  C08F2220/1883

摘要： The purpose of the present invention is to provide an adhesive composition leading to sufficient adhesive strength when used for bonding to a polyolefin resin molded article that bonds poorly with other members. Another purpose of the present invention is to provide an adhesive composition having excellent heat resistance (heat resistant adhesion) in the bonded part of a composite body obtained by joining a polyolefin resin-formed body and other member. This adhesive composition contains an organic solvent, a carboxyl group-containing polyolefin resin which is dissolved in this organic solvent and which has a melt flow rate of 5 to 40 g/10 min when measured at 130° C., and a polyfunctional isocyanate compound. This adhesive composition may further contain a carboxyl group-containing polyolefin resin having a melting point of 120° C. to 170° C.

摘要翻译： 本发明的目的是提供一种粘合剂组合物，当粘合到与其它构件不良粘合的聚烯烃树脂模塑制品时，导致足够的粘合强度。 本发明的另一个目的是提供一种通过将聚烯烃树脂成形体与其它构件接合而获得的复合体的接合部分具有优异的耐热性（耐热粘合性）的粘合剂组合物。 该粘合剂组合物含有溶解于该有机溶剂中的有机溶剂，含羧基的聚烯烃树脂，在130℃下测定时的熔体流动速率为5〜40g / 10min，多官能异氰酸酯化合物 。 该粘合剂组合物还可以含有熔点为120〜170℃的含羧基的聚烯烃树脂。