公开(公告)号：US12084763B2

公开(公告)日：2024-09-10

申请号：US17184802

申请日：2021-02-25

Applicant: Applied Materials, Inc.

Inventor： Marc Shull ,  Peter Reimer ,  Hong P. Gao ,  Chandra V. Deshpandey

IPC: C04B35/626 ,  C04B35/581 ,  C04B35/628 ,  C23C16/02 ,  C23C16/40 ,  C23C16/44 ,  C23C16/442 ,  C23C16/455 ,  C23C16/505 ,  H01L21/687

CPC classification number: C23C16/4417 ,  C04B35/581 ,  C04B35/62685 ,  C04B35/62805 ,  C04B35/6281 ,  C04B35/62815 ,  C04B35/62884 ,  C04B35/62894 ,  C23C16/0227 ,  C23C16/0272 ,  C23C16/40 ,  C23C16/405 ,  C23C16/45536 ,  C23C16/45544 ,  C23C16/505 ,  H01L21/68757 ,  C04B2235/3225 ,  C23C16/442

Abstract: Exemplary deposition methods may include introducing hydrogen into a processing chamber, a powder disposed within a processing region of the processing chamber. The method may include striking a first plasma in the processing region, the first plasma including energetic hydrogen species. The method may include exposing the powder to the energetic hydrogen species in the processing region. The method may include chemically reducing the powder through a reaction of the powder with the energetic hydrogen species. The method may include removing process effluents including unreacted hydrogen from the processing region. The method may also include forming a layer of material on grains of the powder within the processing region.

公开(公告)号：US20230416907A1

公开(公告)日：2023-12-28

申请号：US18037365

申请日：2020-11-30

Applicant: WACKER CHEMIE AG

Inventor： Michael FRICKE ,  Moritz BECKER ,  Claudia KLEINLEIN ,  Jürgen PFEIFFER ,  Sebastian SUCKOW

IPC: C23C16/24 ,  C23C16/442 ,  C23C16/04 ,  C23C16/44 ,  C23C16/455 ,  H01M4/36 ,  H01M4/38 ,  H01M4/587 ,  C01B33/02 ,  C01B33/04

CPC classification number: C23C16/24 ,  C23C16/442 ,  C23C16/045 ,  C23C16/4417 ,  C23C16/45523 ,  H01M4/366 ,  H01M4/386 ,  H01M4/587 ,  C01B33/02 ,  C01B33/043 ,  H01M2004/027

Abstract: Silicon-containing materials along with process for producing and uses for the same. The process includes reacting the silicon-containing materials in a fluidized bed reactor by deposition of silicon from at least one silicon precursor in pores and on the surface of porous particles. A fluidizing gas stream is provided within the fluidized bed reactor that is fully or partly induced to oscillate in a pulsed manner and propagates in the form of a wave and acts on the fluidized bed so as to form a homogeneously fluidized bed as a pulsed gas stream so as to form a homogeneously fluidized bed having a fluidization index FI of at least 0.95. Where the fluidizing gas stream has a superficial velocity which is above a measured minimum fluidization velocity of the pulsed gas stream and where the pulsation is combined with mechanical stirring as a further fluidizing aid.

公开(公告)号：US20230295796A1

公开(公告)日：2023-09-21

申请号：US18157248

申请日：2023-01-20

Applicant: X-ENERGY, LLC

Inventor： Howard Taery Kim

IPC: C23C16/32 ,  C23C16/448 ,  C23C16/442 ,  G21C3/62

CPC classification number: C23C16/32 ,  C23C16/442 ,  C23C16/4481 ,  G21C3/626

Abstract: A metal or ceramic layer may be deposited on nuclear materials by chemical vapor deposition using a non-halogenated liquid organometallic metal precursor. The chemical vapor deposition is carried out by a method including steps of introducing nuclear fuel particles into a fluidized bed reactor, and heating the fluidized bed reactor to a desired operating temperature T1. A flow of a carrier- gas is initiated through a vaporizer, and the non-halogenated liquid organometallic metal precursor is injected into the vaporizer and vaporized. A first mixture of the carrier gas and the vaporized non-halogenated liquid organometallic metal precursor may be mixed with a gaseous carbon source, a gaseous nitrogen source, a gaseous oxygen source, or a mixture thereof to produce a second mixture; and the second mixture flows into the fluidized bed reactor at operating temperature T1, allowing deposition of a desired ceramic coating on the particles. The non-halogenated liquid organometallic metal precursor may be a compound of Zr, Hf, Nb, Ta, W, V, Ti, or a mixture thereof.

公开(公告)号：US20230174431A1

公开(公告)日：2023-06-08

申请号：US18012121

申请日：2021-06-21

Applicant: SAFRAN CERAMICS ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE ,  UNIVERSITE DE BORDEAUX

Inventor： Arnaud DELEHOUZE ,  Eric BOUILLON ,  Nathalie Dominique BERTRAND ,  Alain Jean-Michel GUETTE ,  Armine EL MANSOURI

IPC: C04B35/628 ,  C23C16/26 ,  C23C16/34 ,  C23C16/442 ,  C23C16/04 ,  C04B35/80 ,  C04B35/64

CPC classification number: C04B35/62884 ,  C23C16/26 ,  C23C16/342 ,  C23C16/345 ,  C23C16/442 ,  C23C16/045 ,  C04B35/80 ,  C04B35/62873 ,  C04B35/62868 ,  C04B35/62871 ,  C04B35/64 ,  C04B2235/5248 ,  C04B2235/5244

Abstract: A method for coating fibres includes coating short fibres having an average length less than or equal to 5 mm by chemical vapour deposition in a fluidised bed, the short fibres treated being made of ceramic material or carbon and being mixed with spacer particles distinct from the short fibres, the spacer particles having an average diameter greater than or equal to 20 μm.

公开(公告)号：US09987657B2

公开(公告)日：2018-06-05

申请号：US14581154

申请日：2014-12-23

Applicant: UCHICAGO ARGONNE, LLC

Inventor： Jie Li ,  Yung Liu

IPC: B01J2/00 ,  C23C16/44 ,  C23C16/442 ,  C23C16/455 ,  B05C19/02 ,  B05C19/06 ,  B05D1/24 ,  B01J2/16

CPC classification number: B05C19/02 ,  B01J2/006 ,  B01J2/16 ,  B05C19/06 ,  B05D1/24 ,  C23C16/4417 ,  C23C16/442 ,  C23C16/45502

Abstract: The invention provides a method for dispersing particles within a reaction field, the method comprising confining the particles to the reaction field using a standing wave. The invention also provides a system for coating particles, the system comprising a reaction zone; a means for producing fluidized particles within the reaction zone; a fluid to produce a standing wave within the reaction zone; and a means for introducing coating moieties to the reaction zone. The invention also provides a method for coating particles, the method comprising fluidizing the particles, subjecting the particles to a standing wave; and contacting the subjected particles with a coating moiety.

公开(公告)号：US20170372898A1

公开(公告)日：2017-12-28

申请号：US15540622

申请日：2015-12-29

Applicant: Georgia Tech Research Corporation

Inventor： Michael A. Filler ,  Sven Holger Behrens ,  Laurens Victor Breedveld

IPC: H01L21/02 ,  C23C16/442 ,  C23C16/04 ,  C23C16/44

CPC classification number: H01L21/02653 ,  C23C16/045 ,  C23C16/4417 ,  C23C16/442 ,  H01L21/02532 ,  H01L21/02543 ,  H01L21/02546 ,  H01L21/02576 ,  H01L21/02579 ,  H01L21/02603 ,  H01L21/02606 ,  H01L21/0262 ,  H01L21/02645

Abstract: A method for forming nanostructures including introducing a hollow shell into a reactor. The hollow shell has catalyst nanoparticles exposed on its interior surface. The method also includes introducing a precursor into the reactor to grow nanostructures from the interior surface of the hollow shell from the catalyst nanoparticles.

公开(公告)号：US09705125B2

公开(公告)日：2017-07-11

申请号：US14625442

申请日：2015-02-18

Applicant: Technische Universiteit Delft

Inventor： Erik Maria Kelder ,  Jan Rudolf Van Ommen ,  John Nijenhuis

IPC: H01M4/36 ,  H01M4/04 ,  B01J2/16 ,  C23C16/44 ,  C23C16/442 ,  C23C16/455 ,  H01M4/505 ,  H01M4/131 ,  H01M4/485 ,  H01M4/1391 ,  H01M10/0525 ,  H01M4/02

CPC classification number: H01M4/0428 ,  B01J2/16 ,  C23C16/4417 ,  C23C16/442 ,  C23C16/45525 ,  H01M4/131 ,  H01M4/1391 ,  H01M4/366 ,  H01M4/485 ,  H01M4/505 ,  H01M10/0525 ,  H01M2004/028 ,  Y02E60/122 ,  Y10T428/2991

Abstract: A method for covering particles having a diameter of maximally 60 μm by means of atomic layer deposition, whereby said method comprises the step of fluidizing said particles in a fluidized bed reactor using a first reactant gas comprising a first reactant for substantially completely covering said particles with a monolayer of said first reactant.

公开(公告)号：US20170145310A1

公开(公告)日：2017-05-25

申请号：US15075080

申请日：2016-03-18

Applicant: Intematix Corporation

Inventor： Yi-Qun Li ,  Xiongfei Shen ,  HaoGuo Zhu

IPC: C09K11/88 ,  C23C16/442 ,  H01L33/50

CPC classification number: C09K11/886 ,  C09K11/02 ,  C23C16/402 ,  C23C16/403 ,  C23C16/405 ,  C23C16/4417 ,  C23C16/442 ,  H01L33/502 ,  H01L33/504 ,  H01L33/505 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/48465 ,  H01L2224/49107 ,  H01L2224/73265 ,  H01L2924/181 ,  H01L2924/00014 ,  H01L2924/00012 ,  H01L2924/00

Abstract: A coated phosphor comprises: phosphor particles comprised of a phosphor with composition MSe1-xSx:Eu, wherein M is at least one of Mg, Ca, Sr, Ba and Zn and 0

公开(公告)号：US20170044416A1

公开(公告)日：2017-02-16

申请号：US14822731

申请日：2015-08-10

Applicant: Delavan Inc

Inventor： John A. Sharon ,  Ying She ,  Tahany I. El-Wardany ,  Wayde R. Schmidt

IPC: C09K5/14 ,  B23K26/342 ,  B22F1/00 ,  B22F3/105 ,  B22F1/02 ,  C23C16/26 ,  B23K15/00

CPC classification number: C09K5/14 ,  B22F1/02 ,  B22F3/1055 ,  B23K15/0086 ,  B23K26/342 ,  B23K35/00 ,  B33Y10/00 ,  B33Y70/00 ,  B33Y80/00 ,  C23C16/26 ,  C23C16/4417 ,  C23C16/442 ,  Y02P10/295

Abstract: A particulate for an additive manufacturing technique includes a particulate body formed from a particulate material and a coating disposed over particulate body. The coating includes a carbonaceous material that has a reflectivity that is lower than a reflectivity of the particulate material to reduce an energy input requirement of the particulate such that less energy is necessary to fuse the particulate into a layer of an article fabricated using the additive manufacturing technique. A method of making particulate is also disclosed.

Abstract translation: 用于添加剂制造技术的颗粒包括由颗粒材料形成的颗粒体和设置在颗粒体上的涂层。 涂层包括碳质材料，其具有低于颗粒材料的反射率的反射率，以减少颗粒的能量输入需求，使得需要较少的能量将颗粒熔合成使用添加剂制造制造的制品层 技术。 还公开了制备颗粒的方法。

公开(公告)号：US09546424B2

公开(公告)日：2017-01-17

申请号：US14578194

申请日：2014-12-19

Applicant: Pneumaticoat Technologies LLC

Inventor： David M. King ,  Alan W. Weimer ,  Paul R. Lichty

IPC: B05D7/00 ,  C23C16/44 ,  C04B41/00 ,  C04B41/45 ,  C04B41/81 ,  C23C16/40 ,  C23C16/455 ,  C23C16/442

CPC classification number: C23C16/402 ,  C04B41/009 ,  C04B41/4584 ,  C04B41/5031 ,  C04B41/5035 ,  C04B41/5041 ,  C04B41/5049 ,  C04B41/81 ,  C04B41/87 ,  C23C16/403 ,  C23C16/405 ,  C23C16/407 ,  C23C16/4417 ,  C23C16/442 ,  C23C16/45525 ,  C23C16/45555 ,  C04B35/46 ,  C04B35/48 ,  C04B41/4531

Abstract: A process for conducting vapor phase deposition is disclosed. The process separates a series of reactions through a sequence of reaction reservoirs. The reactor includes a reactive precursor reservoir beneath a powder reservoir separated by valve means. A reactive precursor is charged into the reactive precursor reservoir and a powder is charged into the powder reservoir. The pressures are adjusted so that the pressure in the reactive precursor reservoir is higher than that of the powder reservoir. The valve means is opened, and the vapor phase reactant fluidized the powder and coats its surface. The powder falls into the reactive precursor reservoir. The apparatus permits vapor phase deposition processes to be performed semi-continuously.

Abstract translation: 公开了一种用于进行气相沉积的方法。 该过程通过一系列反应池分离一系列反应。 该反应器包括在通过阀装置分开的粉末储存器下面的反应性前体储存器。 将反应性前体装入反应性前体储存器中，并将粉末装入粉末储存器中。 调整压力使得反应性前体储存器中的压力高于粉末储存器的压力。 打开阀门装置，汽相反应物流化粉末并涂覆其表面。 粉末落入反应性前体储存器中。 该装置允许气相沉积工艺半连续地进行。