METHODS, ALGORITHMS AND SYSTEMS FOR SUB-NANOSECOND DIGITAL SIGNAL PROCESSING OF PHOTOMULTIPLIER TUBE RESPONSE TO ENABLE MULTI-PHOTON COUNTING IN RAMAN SPECTROSCOPY

    公开(公告)号:US20240093404A1

    公开(公告)日:2024-03-21

    申请号:US18457324

    申请日:2023-08-28

    IPC分类号: C30B29/30 C30B25/06 C30B25/18

    CPC分类号: C30B29/30 C30B25/06 C30B25/18

    摘要: A computer-implemented method of determining the number of photons contributing to an output of a photonic sensor, including receiving an electrical signal from the photonic sensor proportional to a number of photons the photonic sensor detects at its input as a function of time, wherein the photonic sensor is calibrated such that a response of the photonic sensor to a single photon detected is in a waveform comprising an amplitude and time, wherein the product amplitude X time is statistically bounded, determining a probabilistic boundary between one or more of electrical, optical, and thermal sources of noise of the sensor, acquiring each response wave form from the sensor through analog-to-digital conversion with a resolution in amplitude and time corresponding to accuracy required in quantifying the response, storing each acquired response, individually, in real-time, or in buffered packets in digital form, determining the number of photons for a specific time resolved acquisition, and effecting a summation of the count of photon arrivals obtained based on amplitude evaluation from each specific time resolved acquisition, for all time resolved acquisitions performed in a given observation period, yielding the number of photon arrivals associated with the amplitude evaluation.

    Micron-scale monocrystal film
    9.
    发明授权

    公开(公告)号:US11450799B2

    公开(公告)日:2022-09-20

    申请号:US16772909

    申请日:2018-08-07

    摘要: The invention provides a micron-scale monocrystal film. The micron-scale monocrystal film includes 1) a substrate layer, and 2) a micron-scale monocrystal film layer located on the substrate layer, wherein a transition layer is interposed between the substrate layer and micron-scale monocrystal film layer, and the transition layer may include a first transition layer disposed adjacent to the substrate layer and a second transition layer disposed adjacent to the micron monocrystal film layer, wherein the transition layer may include H and an element from at least one kind of plasma gas used during the plasma bonding of the substrate layer and the micron-scale monocrystal film layer.