公开(公告)号：US08653491B2

公开(公告)日：2014-02-18

申请号：US12725178

申请日：2010-03-16

申请人： William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Chris C. Chrobak ,  James H. Crouch

发明人： William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Chris C. Chrobak ,  James H. Crouch

IPC分类号： H01G2/00 ,  H05G2/00 ,  G03F7/20

CPC分类号： H05G2/005 ,  G03F7/70033 ,  G21K5/00 ,  H05G2/003 ,  H05G2/006

摘要： An extreme ultraviolet light system and method includes a drive laser, a chamber including an extreme ultraviolet light collector and a target material dispenser including an adjustable target material outlet capable of outputting multiple portions of target material along a target material path. Also included: a drive laser steering device, a detection system including at least one detector and a controller coupled to the target material dispenser, the detector system and the drive laser steering device. The controller includes logic for detecting a location of the first portion of target material from the first light reflected from the first portion of target material and logic for adjusting the target material dispenser outlet to output a subsequent portion of target material to a waist of the focused drive laser. A system and a method for optimizing an extreme ultraviolet light output is also disclosed.

摘要翻译： 一种极紫外光系统和方法包括驱动激光器，包括极紫外光收集器的腔室和包括可调靶材料出口的目标材料分配器，其能够沿目标材料路径输出目标材料的多个部分。 还包括：驱动激光转向装置，包括至少一个检测器和耦合到目标材料分配器的控制器，检测器系统和驱动激光转向装置的检测系统。 控制器包括用于从目标材料的第一部分反射的第一光和逻辑上检测目标材料的第一部分的位置的逻辑，用于调节目标材料分配器出口，以将目标材料的后续部分输出到聚焦的腰部 驱动激光 还公开了一种用于优化极紫外光输出的系统和方法。

公开(公告)号：US08575575B2

公开(公告)日：2013-11-05

申请号：US12725167

申请日：2010-03-16

申请人： William N. Partlo ,  Igor V. Fomenkov

发明人： William N. Partlo ,  Igor V. Fomenkov

IPC分类号： H01G2/00 ,  H05G2/00 ,  G03F7/20

CPC分类号： H05G2/005 ,  G03F7/70033 ,  G21K5/00 ,  H05G2/003 ,  H05G2/006

摘要： A system and method for an extreme ultraviolet light chamber comprising a collector mirror, a cooling system coupled to a backside of the collector mirror operative to cool a reflective surface of the collector mirror and a buffer gas source coupled to the extreme ultraviolet light chamber.

摘要翻译： 一种用于极紫外光室的系统和方法，包括收集器反射镜，耦合到收集器反射镜的后侧的冷却系统，其用于冷却收集反射镜的反射表面和耦合到极紫外光室的缓冲气体源。

公开(公告)号：US08263953B2

公开(公告)日：2012-09-11

申请号：US13075500

申请日：2011-03-30

申请人： Igor V. Fomenkov ,  William N. Partlo

发明人： Igor V. Fomenkov ,  William N. Partlo

IPC分类号： H01J35/00 ,  G21G5/00 ,  G01J3/10

CPC分类号： H05G2/008 ,  H05G2/005 ,  H05G2/006

摘要： A device is disclosed herein which may comprise a chamber, a source providing a stream of target material droplets delivering target material to an irradiation region in the chamber along a path between a target material release point and the irradiation region, a gas flow in the chamber, at least a portion of the gas flowing in a direction toward the droplet stream, a system producing a laser beam irradiating droplets at the irradiation region to generate a plasma producing EUV radiation, and a shroud positioned along a portion of said stream, said shroud having a first shroud portion shielding droplets from said flow and an opposed open portion.

摘要翻译： 本文公开了一种装置，其可以包括室，源提供目标材料液滴流，其沿着目标材料释放点和照射区域之间的路径将靶材料输送到腔室中的照射区域，腔室中的气流 ，所述气体的至少一部分沿着朝向所述液滴流的方向流动，产生在所述照射区域处照射液滴的激光束以产生等离子体产生EUV辐射的系统，以及沿着所述流的一部分定位的护罩，所述护罩 具有屏蔽来自所述流动的液滴的第一护罩部分和相对的开口部分。

公开(公告)号：US20120223256A1

公开(公告)日：2012-09-06

申请号：US13088166

申请日：2011-04-15

申请人： Alexander N. Bykanov ,  Silvia De Dea ,  Alexander I. Ershov ,  Vladimir B. Fleurov ,  Igor V. Fomenkov ,  William N. Partlo

发明人： Alexander N. Bykanov ,  Silvia De Dea ,  Alexander I. Ershov ,  Vladimir B. Fleurov ,  Igor V. Fomenkov ,  William N. Partlo

IPC分类号： H05G2/00

CPC分类号： H05G2/008 ,  G03F7/70925 ,  H05G2/005

摘要： An extreme-ultraviolet (EUV) light source is described herein comprising an optic; a primary EUV light radiator generating an EUV light emitting plasma and producing a deposit on said optic; and a cleaning system comprising a gas and a secondary light radiator, the secondary light radiator generating a laser produced plasma and producing a cleaning species with the gas.

摘要翻译： 本文描述了一种极光紫外（EUV）光源，其包括光学元件; 产生EUV发光等离子体并在所述光学器件上产生沉积物的主要EUV光辐射体; 以及包括气体和次级光辐射器的清洁系统，所述次级光辐射体产生激光产生的等离子体并且产生具有气体的清洁物质。

公开(公告)号：US08170078B2

公开(公告)日：2012-05-01

申请号：US12987039

申请日：2011-01-07

申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt ,  Richard L. Sandstrom ,  Ivan Lalovic

发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt ,  Richard L. Sandstrom ,  Ivan Lalovic

IPC分类号： H01S3/22

CPC分类号： H01S3/225 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/083 ,  H01S3/10092 ,  H01S3/2251 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2383 ,  H01S2301/02

摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

摘要翻译： 一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，其包括激光输出光束 脉冲，其可以包括环形功率放大级。

公开(公告)号：US20120092746A1

公开(公告)日：2012-04-19

申请号：US13077757

申请日：2011-03-31

申请人： Kai-Chung Hou ,  Richard L. Sandstrom ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov

发明人： Kai-Chung Hou ,  Richard L. Sandstrom ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov

IPC分类号： G02F1/11 ,  H01S3/00

CPC分类号： H01S3/117 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0064 ,  H01S3/076 ,  H01S3/0812 ,  H01S3/2232 ,  H01S3/2383 ,  H05G2/005 ,  H05G2/008

摘要： As disclosed herein, in a first aspect, a device may comprise: an oscillator producing a light output on a beam path; a target material for interaction with light on the beam path at an irradiation site; a beam delay on the beam path the beam delay having a beam folding optical arrangement; and a switch positioned along the beam path and interposed between the oscillator and the beam delay; the switch closable to divert at least a portion of light on the beam path from the beam path, the switch having close time, t1 and the beam path having a length, L1, along the path from the switch to the irradiation site; with t1

摘要翻译： 如本文所公开的，在第一方面中，一种装置可以包括：在光束路径上产生光输出的振荡器; 用于在照射部位与光束路径上的光相互作用的目标材料; 在光束路径上的光束延迟具有光束折叠光学布置的光束延迟; 以及沿光束路径定位并且介于振荡器和光束延迟之间的开关; 所述开关可关闭以使所述光束路径上的至少一部分光从所述光束路径转移，所述开关具有接近时间t1，并且所述光束路径具有沿着从所述开关到所述照射部位的路径的长度L1; 与t1

公开(公告)号：US08138487B2

公开(公告)日：2012-03-20

申请号：US12720190

申请日：2010-03-09

申请人： Georgiy O. Vaschenko ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard L. Sandstrom ,  Alexander I. Ershov ,  David Brandt ,  Joshua J. Miller

发明人： Georgiy O. Vaschenko ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard L. Sandstrom ,  Alexander I. Ershov ,  David Brandt ,  Joshua J. Miller

IPC分类号： A61N5/00

CPC分类号： H05G2/005 ,  G03F7/70033 ,  G21K5/00 ,  H05G2/003 ,  H05G2/006

摘要： A system and method generating an extreme ultraviolet light in an extreme ultraviolet light chamber including a collector mirror, a droplet generation system having a droplet outlet aligned to output a plurality of droplets along a target material path and a first catch including a first open end substantially aligned to the target material path and at least one internal surface oriented toward a second end of the first catch, the second end being opposite from the first open end.

摘要翻译： 一种在包括收集反射镜的极紫外光室中产生极紫外光的系统和方法，具有液滴出口的液滴产生系统，该液滴产生系统沿着目标材料路径排列以输出多个液滴;以及第一捕集器，其基本上包括第一开口端 与目标材料路径对准并且至少一个内表面朝向第一卡扣的第二端定向，第二端与第一开口端相对。

公开(公告)号：US08000212B2

公开(公告)日：2011-08-16

申请号：US12637961

申请日：2009-12-15

申请人： Vahan Senekerimyan ,  Nam-Hyong Kim ,  Robert A. Bergstedt ,  Igor V. Fomenkov ,  William N. Partlo

发明人： Vahan Senekerimyan ,  Nam-Hyong Kim ,  Robert A. Bergstedt ,  Igor V. Fomenkov ,  William N. Partlo

IPC分类号： G11B7/00

CPC分类号： G01J1/429 ,  H05G2/008

摘要： An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; a beam delivery system configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location; and a metrology system. The beam delivery system includes converging lens configured and arranged to focus the amplified light beam at the target location. The metrology system includes a light collection system configured to collect a portion of the amplified light beam reflected from the converging lens and a portion of a guide laser beam reflected from the converging lens. The light collection system includes a dichroic optical device configured to optically separate the portions.

摘要翻译： 极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 射束传送系统，被配置为接收从驱动激光系统发射的放大光束并将放大的光束引向目标位置; 和计量系统。 光束传送系统包括被配置和布置成将被放大的光束聚焦在目标位置处的会聚透镜。 测量系统包括：光收集系统，被配置为收集从会聚透镜反射的放大光束的一部分和从会聚透镜反射的一部分引导激光束。 光采集系统包括配置为光学地分离这些部分的二向色光学装置。

公开(公告)号：US20100327192A1

公开(公告)日：2010-12-30

申请号：US12638413

申请日：2009-12-15

申请人： Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Jason Paxton ,  Nam-Hyong Kim ,  Jerzy R. Hoffman

发明人： Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Jason Paxton ,  Nam-Hyong Kim ,  Jerzy R. Hoffman

IPC分类号： H05G2/00 ,  H01S3/22 ,  H01S3/08

CPC分类号： H01S3/2232 ,  G03F7/70033 ,  H01S3/0014 ,  H01S3/0407 ,  H01S3/041 ,  H01S3/086 ,  H01S3/2308 ,  H05G2/008

摘要： A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.

摘要翻译： 用于生产极紫外光的方法包括在目标位置产生目标材料; 向具有放大频带的至少一个光放大器的增益介质提供泵浦能量以产生放大的光束; 使用一组光学部件的一个或多个光学部件将放大的光束传播通过增益介质; 使用所述光学部件组的一个或多个光学部件将放大的光束传送到目标位置; 用导向激光器产生具有波长在增益介质的放大频带之外且在光学部件的波长范围内的引导激光束; 并且引导所述引导激光束通过所述光学部件组，从而对准所述光学部件组的一个或多个光学部件。

公开(公告)号：US20100127186A1

公开(公告)日：2010-05-27

申请号：US12655987

申请日：2010-01-11

申请人： Alexander N. Bykanov ,  Norbert Bowering ,  Igor V. Fomenkov ,  David C. Brandt ,  Alexander I. Ershov ,  Oleh Khodykin ,  William N. Partlo

发明人： Alexander N. Bykanov ,  Norbert Bowering ,  Igor V. Fomenkov ,  David C. Brandt ,  Alexander I. Ershov ,  Oleh Khodykin ,  William N. Partlo

IPC分类号： G21K5/00 ,  G21K1/06

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70908 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/008

摘要： A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.