Abstract:
A method to transmit data over a single-wire bus wherein a first communication channel is defined by pulses of different durations according to the state of the transmitted bit and depending on a reference duration, and a second communication channel is defined by the reference duration.
Abstract:
During a phase of programming the cell, a first voltage is applied to the source region and a second voltage, higher than the first voltage, is applied to the drain region until the cell is put into conduction. The numerical value of the item of data to be written is controlled by the level of the control voltage applied to the control gate and the item of data is de facto written with the numerical value during the putting into conduction of the cell. The programming is then stopped.
Abstract:
A memory device includes an input/output interface, a bus of SPI type coupled to the input/output interface, and a plurality of individual non-volatile memory devices connected to the bus of SPI type. The chip select inputs of each individual memory device are all connected to one and the same chip select wire of the SPI bus. The individual memory devices are further configured and controllable so as to behave, as seen by the input/output interface, as a single non-volatile memory device, the total memory space of which has a total memory capacity equal to the sum of the individual memory capacities of the individual devices.
Abstract:
An operation for writing at least one datum in at least one memory cell of the electrically erasable and programmable read-only memory type comprises at least one step of erasing or of programming of the cell by a corresponding erasing or programming pulse. The correct or incorrect conducting of the writing operation is checked by an analysis of the form of the erasing or programming pulse during the corresponding erasing or programming step. The result of this analysis is representative of the writing operation being conducted correctly or incorrectly.
Abstract:
An operation for writing at least one datum in at least one memory cell of the electrically erasable and programmable read-only memory type comprises at least one step of erasing or of programming of the cell by a corresponding erasing or programming pulse. The correct or incorrect conducting of the writing operation is checked by an analysis of the form of the erasing or programming pulse during the corresponding erasing or programming step. The result of this analysis is representative of the writing operation being conducted correctly or incorrectly.
Abstract:
An electronic device includes at least one processing circuit connected through at least one terminal at a first reference voltage. At least one radio frequency communication circuit is connected at least to receive the reference voltage. At least one first pad is intended to be taken to a second reference voltage of at least one electronic circuit external to the device. At least one first resistive impedance is coupled between the terminal and the first pad.
Abstract:
An integrated structure includes a first MOS transistor with a first controllable gate region overlying a first gate dielectric and a second MOS transistor neighboring the first MOS transistor and having a second controllable gate region overlying the first gate dielectric. A common conductive region overlies the first and second gate regions and is separated therefrom by a second gate dielectric. The common conductive region includes a continuous element located over a portion of the first and second gate regions and a branch extending downward from the continuous element toward the substrate as far as the first gate dielectric. The branch located between the first and second gate regions.
Abstract:
An operation for writing at least one datum in at least one memory cell of the electrically erasable and programmable read-only memory type comprises at least one step of erasing or of programming of the cell by a corresponding erasing or programming pulse. The correct or incorrect conducting of the writing operation is checked by an analysis of the form of the erasing or programming pulse during the corresponding erasing or programming step. The result of this analysis is representative of the writing operation being conducted correctly or incorrectly.
Abstract:
An integrated structure includes a first MOS transistor with a first controllable gate region overlying a first gate dielectric and a second MOS transistor neighboring the first MOS transistor and having a second controllable gate region overlying the first gate dielectric. A common conductive region overlies the first and second gate regions and is separated therefrom by a second gate dielectric. The common conductive region includes a continuous element located over a portion of the first and second gate regions and a branch extending downward from the continuous element toward the substrate as far as the first gate dielectric. The branch located between the first and second gate regions.
Abstract:
Integrated non-volatile memory device includes an integrated memory cell of the EEPROM type with a floating-gate transistor and a selection transistor connected in series between a source line and a bit line, and a programming circuit for the memory cell. The selection transistor is connected between the floating-gate transistor and the source line. The programming circuit is configured for programming the t least one memory cell with a programming voltage split between a positive voltage and a negative voltage.