Controlling defects in thin wafer handling
    93.
    发明授权
    Controlling defects in thin wafer handling 有权
    控制薄晶片处理中的缺陷

    公开(公告)号:US08722540B2

    公开(公告)日:2014-05-13

    申请号:US12841874

    申请日:2010-07-22

    IPC分类号: H01L21/302 H01L21/461

    摘要: A method includes bonding a wafer on a carrier through an adhesive, and performing a thinning process on the wafer. After the step of performing the thinning process, a portion of the adhesive not covered by the wafer is removed, while the portion of the adhesive covered by the wafer is not removed.

    摘要翻译: 一种方法包括通过粘合剂将晶片接合在载体上,并在晶片上进行稀化处理。 在进行稀化处理的步骤之后,去除未被晶片覆盖的粘合剂的一部分,同时由晶片覆盖的粘合剂部分未被除去。