Abstract:
A process for forming a titanium dioxide film which has recently been recognized to be useful for an insulating material for film capacitors and other electric circuit, by feeding a mixed gas of vapor of organo oxy titanium compound, oxygen and carrier gas to the surface of heated baseplate to grow an amorphouslike titanium dioxide film on said surface of baseplate, and if necessary, crystallizing said titanium dioxide film with a heat treatment in order to stabilize the film.
Abstract:
A fluorescent lamp device in which a DC power source of high voltage and small capacity is connected for maintaining a slight glow discharge within the lamp, a main current of the lamp being adjustably supplied from a main power source of large capacity and a rectifier is inserted into the main power circuit for blocking high voltages DC current flowing into the main circuit from the high-voltage source.
Abstract:
1,150,753. Brazing. MATSUSHITA ELECTRONICS CORP. 26 Sept., 1966 [28 Sept., 1965], No. 42915/66. Heading B3R. [Also in Divisions C1 and C7] A gas-tight seal is formed between a metal and a ceramic or a crystallized glass by depositing a film of W or Mo from the vapour phase by reduction of a halide or thermal decomposition of a carbonyl, while maintaining the ceramic or glass at a temperature above 500‹ C., and then brazing the metallized portion to a metal body or a metallized surface. In examples, copper tubes are silver brazed to Mo and W coated ceramic tubes.