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    Systems and methods for drive laser beam delivery in an euv light source
    101.
    发明申请
    Systems and methods for drive laser beam delivery in an euv light source 失效
    用于在euv光源中驱动激光束传输的系统和方法

    公开(公告)号：US20100127191A1

    公开(公告)日：2010-05-27

    申请号：US12592107

    申请日：2009-11-18

    申请人： William N. Partlo ,  Igor V. Fomenkov ,  Jason Paxton

    发明人： William N. Partlo ,  Igor V. Fomenkov ,  Jason Paxton

    IPC分类号： G21K5/00 ,  H05H1/24

    CPC分类号： H05G2/003 ,  H01S3/005 ,  H01S3/2391 ,  H05G2/008

    摘要： An EUV light source device is described herein which may comprise a laser beam travelling along a beam path, at least a portion of the beam path aligned along a linear axis; a material for interaction with the laser beam at an irradiation site to create an EUV light emitting plasma; a first reflector having a focal point, the first reflector positioned with the focal point on the linear axis, the first reflector receiving laser light along the beam path; and a second reflector receiving laser light reflected by the first reflector and directing the laser light toward the irradiation site.

    摘要翻译： 本文描述了EUV光源装置，其可以包括沿着光束路径传播的激光束，所述光束路径的至少一部分沿线性轴线对准; 用于在照射部位与激光束相互作用以产生EUV发光等离子体的材料; 具有焦点的第一反射器，所述第一反射器的焦点位于所述线性轴线上，所述第一反射器沿着所述光束路径接收激光; 以及第二反射器，其接收由所述第一反射器反射并且将所述激光引向所述照射部位的激光。

    System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
    103.
    发明申请
    System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus 有权
    系统管理极紫外（EUV）光刻设备的腔室之间的气流

    公开(公告)号：US20090154642A1

    公开(公告)日：2009-06-18

    申请号：US12002073

    申请日：2007-12-14

    申请人： Alexander N. Bykanov ,  David C. Brandt ,  Igor V. Fomenkov ,  William N. Partlo

    发明人： Alexander N. Bykanov ,  David C. Brandt ,  Igor V. Fomenkov ,  William N. Partlo

    IPC分类号： G21K5/00

    CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70908 ,  G03F7/70916

    摘要： A gas flow management system may comprise a first and second enclosing walls at least partially surrounding first and second respective spaces; a system generating plasma in the first space, the plasma emitting extreme ultraviolet light; an elongated body restricting flow from the first space to the second space, the body at least partially surrounding a passageway and having a first open end allowing EUV light to enter the passageway from the first space and a second open end allowing EUV light to exit the passageway into the second space, the body shaped to establish a location having a reduced cross-sectional area relative to the first and second ends; and a flow of gas exiting an aperture, the aperture positioned to introduce gas into the passageway at a position between the first end of the body and the location having a reduced cross-sectional area.

    摘要翻译： 气体流量管理系统可以包括至少部分地围绕第一和第二相应空间的第一和第二封闭壁; 在第一空间中产生等离子体的系统，等离子体发射极紫外光; 限制从第一空间流到第二空间的细长体，所述主体至少部分地围绕通道并且具有允许EUV光从第一空间进入通道的第一开口端，以及允许EUV光从第二空间退出的第二开口端 通道进入第二空间，身体形状以建立相对于第一和第二端具有减小的横截面面积的位置; 以及离开孔的气流，所述孔定位成在主体的第一端和具有减小的横截面积的位置之间的位置处将气体引入通道。

    EUV light source
    104.
    发明授权
    EUV light source 有权
    EUV光源

    公开(公告)号：US07323703B2

    公开(公告)日：2008-01-29

    申请号：US11647007

    申请日：2006-12-27

    申请人： I. Roger Oliver ,  William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Norbert Bowering ,  John Viatella ,  David W. Myers

    发明人： I. Roger Oliver ,  William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Norbert Bowering ,  John Viatella ,  David W. Myers

    IPC分类号： H01J35/20

    CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    摘要： An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape having a focus; the shell having a sufficient size and thermal mass to carry operating heat away from the multilayer reflector and to radiate the heat from the surface of the shell on a side of the shell opposite from the focus. The material of the shell may comprise a material selected from a group which may comprise silicon carbide, silicon, Zerodur or ULE glass, aluminum, beryllium, molybdenum, copper and nickel. The apparatus and method may comprise at least one radiative heater directed at the shell to maintain the steady state temperature of the shell within a selected range of operating temperatures.

    摘要翻译： 描述了可以包括可以包括等离子体形成室的等离子体产生的极紫外（“EUV”）光源多层收集器的装置和方法; 等离子体形成室内的壳体，具有焦点的收集器形状; 壳体具有足够的尺寸和热质量以将工作热量从多层反射器散开，并且在壳体的与焦点相对的一侧上从壳体的表面辐射热量。 壳的材料可以包括选自可以包括碳化硅，硅，Zerodur或ULE玻璃，铝，铍，钼，铜和镍的组的材料。 装置和方法可以包括指向壳体的至少一个辐射加热器，以将壳体的稳态温度维持在所选择的工作温度范围内。

    Pulse power system for extreme ultraviolet and x-ray sources
    106.
    发明授权
    Pulse power system for extreme ultraviolet and x-ray sources 有权
    用于极紫外和X射线源的脉冲电力系统

    公开(公告)号：US06744060B2

    公开(公告)日：2004-06-01

    申请号：US10120655

    申请日：2002-04-10

    申请人： Richard M. Ness ,  Igor V. Fomenkov ,  William N. Partlo

    发明人： Richard M. Ness ,  Igor V. Fomenkov ,  William N. Partlo

    IPC分类号： H05H104

    CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005 ,  H05H1/06

    摘要： The present invention provides a pulse power system for extreme ultraviolet and x-ray light sources. The pulse power system produces electrical pulses of at least 12 J at pulse repetition rates of at least 2000 Hz. The system is extremely reliable and has design lifetime substantially in excess of 10 billion pulses. The system includes a charging capacitor bank, a fast charger for charging the charging capacitor bank in time periods of less than 0.5 seconds. A voltage control circuit is provided for controlling the charging voltage capacitor to within less than 0.5 percent of desired values. The system includes a magnetic compression circuit for creating, compressing in duration and amplifying voltage pulses. A trigger circuit discharges the charging capacitor bank into the pulse compression circuit so as to produce EUV or x-ray light pulses with a timing accuracy of less than 10 ns. In a preferred embodiment a pulse transformer with at least two one-turn primary windings and a single one turn secondary winding is included in the pulse compression circuit and increases the pulse voltage by at least a factor of 3. The pulse power system described herein is useful for providing high energy electrical pulses at repetition rates in excess of 2000 Hz for several high temperature discharge EUV or x-ray light sources. These include dense plasma focus devices, Z pinch devices, hollow cathode Z-pinch devices and capillary discharge devices. Inclusion of the pulse transformer is recommended when the system is used for dense plasma focus, and the two types of Z-pinch devices.

    摘要翻译： 本发明提供一种用于极紫外和X射线光源的脉冲电力系统。 脉冲功率系统产生至少为12 J的脉冲重复频率至少为2000 Hz的电脉冲。 该系统非常可靠，设计寿命基本上超过100亿个脉冲。 该系统包括充电电容器组，用于在小于0.5秒的时间段内对充电电容器组充电的快速充电器。 提供了一种电压控制电路，用于将充电电压电容器控制在所需值的0.5％以内。 该系统包括用于产生，压缩持续时间并放大电压脉冲的磁压缩电路。 触发电路将充电电容器组放电到脉冲压缩电路中，以便产生具有小于10ns的定时精度的EUV或X射线光脉冲。 在优选实施例中，具有至少两个单匝初级绕组和单个匝次级绕组的脉冲变压器包括在脉冲压缩电路中，并且将脉冲电压增加至少3倍。本文描述的脉冲功率系统是 对于几个高温放电EUV或X射线光源，以超过2000Hz的重复率提供高能电脉冲是有用的。 这些包括致密等离子体聚焦装置，Z夹紧装置，空心阴极Z夹点装置和毛细管放电装置。 当系统用于等离子体浓度较高时，推荐使用脉冲变压器，以及两种类型的Z夹式器件。

    High resolution spectral measurement device
    107.
    发明授权
    High resolution spectral measurement device 有权
    高分辨率光谱测量装置

    公开(公告)号：US06713770B2

    公开(公告)日：2004-03-30

    申请号：US10098975

    申请日：2002-03-15

    申请人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith ,  Daniel J. W. Brown

    发明人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith ,  Daniel J. W. Brown

    IPC分类号： G01J314

    CPC分类号： G01J3/26 ,  G01J1/4257 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/12 ,  G01J3/1804 ,  G01J3/22 ,  G01J9/02

    摘要： A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiod array and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array. Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer, and the etalon can be scanned.

    摘要翻译： 高分辨率光谱测量装置。 优选的实施例在紫外线范围内呈现非常窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光的光被聚焦成漫射器，并且离开扩散器的漫射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光​​的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时，定义狭缝功能，其极窄，例如约0.034μm（FWHM）和约0.091μm（95％积分）。 通过激光束的引导部分进入绝缘体并且在包括单色器狭缝波长的范围内扫描激光波长，可以非常精确地测量激光束的带宽。 在第二实施例中，第二狭缝和光检测器由光电二极管阵列替代，并且通过分析来自光电二极管阵列的一组扫描数据来确定激光束的带宽。 或者，激光波长可以固定在光栅光谱仪的光谱范围附近，可以扫描标准具。

    Plasma pinch high energy with debris collector
    109.
    发明授权
    Plasma pinch high energy with debris collector 失效
    等离子体夹杂高能量与碎片收集器

    公开(公告)号：US06541786B1

    公开(公告)日：2003-04-01

    申请号：US09324526

    申请日：1999-06-02

    申请人： William N. Partlo ,  Igor V. Fomenkov ,  Daniel L. Birx

    发明人： William N. Partlo ,  Igor V. Fomenkov ,  Daniel L. Birx

    IPC分类号： G21G400

    CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005 ,  H05H1/06

    摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. A working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharge between the electrodes to produce very high temperature, high density plasma pinch in the working gas providing radiation at the spectral line of the active gas. An external reflection radiation collector-director collects radiation produced in the plasma pinches and directs the radiation in a desired direction. In a preferred embodiment the active gas is lithium and the buffer gas is helium and the radiation collector-director is coated with the material used for the electrodes. A good choice for the material is tungsten. In a second preferred embodiment the buffer gas is argon and lithium gas is produced by vaporization of solid or liquid lithium located in a hole along the axis of the central electrode of a coaxial electrode configuration. Other preferred embodiments utilize a conical nested debris collector upstream of the radiation collector-director.

    摘要翻译： 高能光子源。 一对等离子体夹紧电极位于真空室中。 一种工作气体，其包括贵金属缓冲气体和选择用于提供所需光谱线的活性气体。 脉冲电源提供电压足够高的电脉冲以在电极之间产生电放电，以在工作气体中产生非常高温，高密度的等离子体夹紧，从而在活性气体的谱线处提供辐射。 外部反射辐射收集器 - 导向器收集在等离子体夹中产生的辐射，并将辐射引导到期望的方向。 在一个优选的实施方式中，活性气体是锂，缓冲气体是氦气，并且辐射收集器导向器涂覆有用于电极的材料。 材料的一个不错的选择是钨。 在第二优选实施例中，缓冲气体是氩气，并且通过沿着同轴电极配置的中心电极的轴的孔中的固体或液体锂的汽化来产生锂气体。 其他优选实施例利用在辐射收集器 - 导向器上游的锥形嵌套碎片收集器。