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    Micromachine and manufacturing method therefor
    101.
    发明申请
    Micromachine and manufacturing method therefor 审中-公开
    微机械及其制造方法

    公开(公告)号：US20030227035A1

    公开(公告)日：2003-12-11

    申请号：US10446374

    申请日：2003-05-28

    Inventor： Hiromu Ishii ,  Yasuyuki Tanabe ,  Katsuyuki Machida ,  Masami Urano ,  Shouji Yagi ,  Tomomi Sakata

    IPC: H01L029/80 ,  H01L031/112

    CPC classification number: B81B3/0008 ,  B81B2201/045 ,  B81C2201/112

    Abstract: In a micromachine according to this invention, a polyimide film is formed on the surface of each electrode. The polyimide film is formed as follows. A substrate having each electrode and a counterelectrode are dipped in an electrodeposition polyimide solution, and a positive voltage is applied to the electrode. A material dissolved in the electrodeposition polyimide solution is deposited on a surface of the positive-voltage-applied electrode that is exposed in the solution, thus forming a polyimide film on the surface.

    Abstract translation: 在根据本发明的微型机器中，在每个电极的表面上形成聚酰亚胺膜。 聚酰亚胺膜如下形成。 将具有每个电极和反电极的基板浸渍在电沉积聚酰亚胺溶液中，并向电极施加正电压。 溶解在电沉积聚酰亚胺溶液中的材料沉积在暴露在溶液中的正电压施加电极的表面上，从而在表面上形成聚酰亚胺膜。

    Method for making a multi-die chip
    103.
    发明申请
    Method for making a multi-die chip 有权
    制造多芯片芯片的方法

    公开(公告)号：US20030197248A1

    公开(公告)日：2003-10-23

    申请号：US10456319

    申请日：2003-06-06

    Inventor： Jeffry Joseph Sniegowski ,  Murray Steven Rodgers

    IPC: H01L029/06

    CPC classification number: H01L23/544 ,  B81B2201/045 ,  B81C1/00873

    Abstract: The present invention generally relates to a die perimeter region of a die having a microelectromechanical assembly fabricated thereon. This die perimeter region may be configured to facilitate electrically interconnecting adjacent die on a wafer. Moreover, this die perimeter region may be configured to facilitate separating the die from a wafer.

    Abstract translation: 本发明一般涉及一种具有在其上制造的微机电组件的管芯的管芯周边区域。 该芯周边区域可以被配置为便于在晶片上电相互连接相邻的管芯。 此外，该模周边区域可以被配置为便于将模具与晶片分离。

    Metal alloy elements in micromachined devices
    105.
    发明申请
    Metal alloy elements in micromachined devices 有权
    微加工装置中的金属合金元素

    公开(公告)号：US20030116528A1

    公开(公告)日：2003-06-26

    申请号：US10015086

    申请日：2001-12-11

    Inventor： Jonathan J. Bernstein ,  William P. Taylor

    IPC: C23F001/00

    CPC classification number: H01H1/0036 ,  B81B3/0078 ,  B81B2201/045 ,  B81B2203/0118 ,  C23C14/165 ,  H01H1/023 ,  H01H2001/0057 ,  Y10T428/12597

    Abstract: A micromechanical device is provided, which includes at least one flexible member formed from an alloy, where the alloy is made up of one or more noble metals and one or more alloying elements, wherein each of the alloying elements has an equilibrium solid solubility in the noble metal, and wherein the one or more alloying elements are present in an amount that does not result in precipitates. A method for making a micromechanical device includes depositing an alloy on a substrate to form at least one flexible member, the alloy comprising one or more noble metals and one or more alloying elements, wherein the one or more alloying elements form a solid solution with the one or more noble metals; and removing a portion of the substrate or a sacrificial layer beneath the deposited alloy layer to obtain a flexible member.

    Abstract translation: 提供了一种微机械装置，其包括由合金形成的至少一个柔性构件，其中所述合金由一种或多种贵金属和一种或多种合金元素构成，其中每种合金元素在所述合金元素中具有平衡的固体溶解度 贵金属，并且其中所述一种或多种合金元素以不会导致沉淀物的量存在。 一种用于制造微机械装置的方法包括在基底上沉积合金以形成至少一个柔性构件，所述合金包括一种或多种贵金属和一种或多种合金元素，其中所述一种或多种合金元素形成固溶体， 一种或多种贵金属; 以及去除所沉积的合金层下面的衬底或牺牲层的一部分以获得柔性构件。

    Microelectromechanical device with moving element
    107.
    发明授权
    Microelectromechanical device with moving element 失效
    具有移动元件的微机电装置

    公开(公告)号：US06535663B1

    公开(公告)日：2003-03-18

    申请号：US09619013

    申请日：2000-07-19

    Applicant: Igal Roberto Chertkow

    Inventor： Igal Roberto Chertkow

    IPC: G02B642

    CPC classification number: H04Q11/0005 ,  B81B3/0021 ,  B81B2201/045 ,  B81B2203/051 ,  B81C1/00214 ,  G02B6/3514 ,  G02B6/3518 ,  G02B6/3556 ,  G02B6/357 ,  G02B6/3572 ,  G02B6/3576 ,  G02B6/3578 ,  G02B6/3584 ,  G02B6/423 ,  H01H2001/0084 ,  H04Q2011/003

    Abstract: A microelectromechanical (MEMS) device has a substrate, and a generally planar moving element, such as a mirror, disposed in parallel to the surface of the substrate. An actuator is operatively engageable with the moving element for selectively actuating the moving element between a first position in a plane horizontal to the surface of the substrate and a second position in that plane. The MEMS device may be effectively used as an optical switch. Various different actuators can be used. Preferably, the device is fabricated using a surface micromachining process.

    Abstract translation: 微机电（MEMS）器件具有平行于衬底的表面设置的衬底和大致平面的移动元件，例如反射镜。 致动器可操作地与移动元件接合，用于在垂直于基板的表面的平面中的第一位置和该平面中的第二位置之间选择性地启动移动元件。 MEMS器件可以有效地用作光开关。 可以使用各种不同的致动器。 优选地，使用表面微加工工艺制造该装置。

    Optical switch
    108.
    发明申请
    Optical switch 失效
    光开关

    公开(公告)号：US20030016906A1

    公开(公告)日：2003-01-23

    申请号：US10195741

    申请日：2002-07-16

    Applicant: NEC CORPORATION

    Inventor： Motoyasu Utsunomiya

    IPC: G02B006/35 ,  G02F001/295

    CPC classification number: G02B6/357 ,  B81B3/0062 ,  B81B2201/045 ,  G02B6/3518 ,  G02B6/3556

    Abstract: An analog beam-steering free-space optical switch for connecting and switching a plurality of optical signals includes a plurality of optical devices and electrostatic actuators for driving the optical devices. Each optical device is pivotally borne so as to allow rotation around a prescribed center of rotation, and each electrostatic actuator includes the substrate that holds the optical devices and a plurality of driving electrodes that are secured to the substrate. The application of electrostatic voltage between an optical device and the driving electrodes generates electrostatic driving torque for causing the optical device to tilt with respect to the substrate around the center of rotation, whereby the direction of reflection of an optical signal is changed. The plurality of driving electrodes are arranged in a radial pattern relative to the electrode center. Each driving electrode is formed in a shape such that the electrode width of a prescribed outer portion relative to the electrode center decreases with progression toward the outside. In addition, each driving electrode is formed in a shape such that the electrode width of a prescribed inner portion with respect to the electrode center decreases with progression toward the inside. Forming the driving electrodes in this way improves the driving torque characteristic of the micromirror and extends the range of steering angles within which stable positioning can be performed by low-voltage drive.

    Abstract translation: 用于连接和切换多个光信号的模拟光束转向自由空间光开关包括用于驱动光学装置的多个光学装置和静电致动器。 每个光学装置枢转地支承以允许围绕规定的旋转中心旋转，并且每个静电致动器包括保持光学装置的基板和固定到基板的多个驱动电极。 在光学器件和驱动电极之间施加静电电压产生静电驱动转矩，以使光学元件相对于旋转中心周围的衬底倾斜，从而改变光信号的反射方向。 多个驱动电极相对于电极中心以径向图案布置。 每个驱动电极形成为使得相对于电极中心的规定外部部分的电极宽度随着朝向外部的方向而减小的形状。 此外，每个驱动电极形成为使得相对于电极中心的规定内部部分的电极宽度随着向内侧的进行而减小的形状。 以这种方式形成驱动电极改善了微反射镜的驱动转矩特性，并延长了通过低压驱动可以进行稳定定位的转向角范围。

    Polysilicon microelectronic reflectors and beams and methods of fabricating same
    109.
    发明申请
    Polysilicon microelectronic reflectors and beams and methods of fabricating same 审中-公开
    多晶硅微电子反射器和光束及其制造方法

    公开(公告)号：US20020186444A1

    公开(公告)日：2002-12-12

    申请号：US10207537

    申请日：2002-07-29

    Inventor： David Alan Koester

    IPC: G02B026/08

    CPC classification number: B81B3/0072 ,  B81B2201/045 ,  B81C2201/0167 ,  G02B26/0866

    Abstract: A microelectronic reflector is fabricated by forming a first polysilicon layer on a microelectronic substrate, forming a first phosphosilicate glass (PSG) layer on the first polysilicon layer, and reactive ion etching to remove the first PSG layer from at least a portion of the first polysilicon layer. A second polysilicon layer is formed on at least a portion of the first polysilicon layer from which the first PSG layer was removed and a second PSG layer is formed on at least a second portion of the second polysilicon layer. Reactive ion etching is performed to remove the second PSG layer from at least a portion of the second polysilicon layer. A third PSG layer then is formed on at least a portion of the second polysilicon layer from which the second PSG layer was removed. Reactive ion etching is performed to remove the third PSG layer from at least a portion of the second polysilicon layer. By forming a third PSG layer, and reactive ion etching this layer, additional stress may be created in the first and/or second doped polysilicon layers that bends the ends of the doped first and/or second polysilicon layers towards the microelectronic substrate upon release of the treated polysilicon layer from the substrate, compared to doped polysilicon layers on which the third PSG layer was not formed and reactive ion etched. This increased stress may be counteracted by forming a stress-correcting layer on at least a portion of the second polysilicon layer from which the third PSG layer was removed, and then forming a reflective layer such as gold on at least a portion of the stress-correcting layer. The stress-correcting layer preferably comprises platinum, which can produce high stresses that can counteract the stresses in the first and second doped polysilicon layers, to thereby allow a flat mirror and/or beam to be produced.

    Abstract translation: 通过在微电子衬底上形成第一多晶硅层，在第一多晶硅层上形成第一磷硅酸盐玻璃（PSG）层，以及反应离子刻蚀以从第一多晶硅层的至少一部分去除第一PSG层来制造微电子反射体 层。 在去除第一PSG层的第一多晶硅层的至少一部分上形成第二多晶硅层，并且在第二多晶硅层的至少第二部分上形成第二PSG层。 执行反应离子蚀刻以从第二多晶硅层的至少一部分去除第二PSG层。 然后在去除第二PSG层的第二多晶硅层的至少一部分上形成第三PSG层。 执行反应离子蚀刻以从第二多晶硅层的至少一部分去除第三PSG层。 通过形成第三PSG层和反应离子蚀刻该层，可以在第一和/或第二掺杂多晶硅层中产生额外的应力，该第一和/或第二掺杂多晶硅层在释放时折射掺杂的第一和/或第二多晶硅层的端部朝向微电子衬底 与其上未形成第三PSG层的反射离子蚀刻的掺杂多晶硅层相比，来自衬底的处理过的多晶硅层。 这种增加的应力可以通过在去除第三PSG层的第二多晶硅层的至少一部分上形成应力校正层，然后在至少一部分应力层上形成反射层，例如金， 校正层。 应力校正层优选地包括铂，其可以产生可以抵消第一和第二掺杂多晶硅层中的应力的高应力，从而允许产生平坦的反射镜和/或光束。

    Multi-axis magnetically actuated device
    110.
    发明申请
    Multi-axis magnetically actuated device 审中-公开

    公开(公告)号：US20020171901A1

    公开(公告)日：2002-11-21

    申请号：US10087615

    申请日：2002-03-01

    Applicant: The Charles Stark Draper Laboratory, Inc.

    Inventor： Jonathan Jay Bernstein

    IPC: G02B026/08

    CPC classification number: G02B6/3572 ,  B81B3/0021 ,  B81B2201/042 ,  B81B2201/045 ,  B81B2203/058 ,  B81C1/00214 ,  G02B6/3512 ,  G02B6/3556 ,  G02B6/358 ,  G02B6/3584 ,  G02B26/085 ,  G02B26/101 ,  Y10S359/90

    Abstract: A multi-axis magnetically actuated device, an array of multi-axis magnetically actuated devices, and a method of fabrication of a multi-axis magnetically actuated device are disclosed. In addition, disclosed is an optical switch comprised of an array of multi-axis magnetically actuated devices and an array of ports adapted to receive an optical waveguide such as, for example, an optical fiber. The multi-axis magnetically actuated device of the invention is capable of rotational movement in two orthogonal directions. In one embodiment, the multi-axis magnetically actuated device comprises two nested rotational members, an inner rotational member nested within an outer rotational member that in turn is nested within a base member. The inner rotational member is mounted by two inner torsional flexures to the outer rotational member that in turn is mounted by two outer torsional flexures to the base member. The inner torsional flexures define an inner axis of rotation while the outer torsional flexures define an outer axis of rotation. The rotational motions of each rotational member arise in response to an interaction between a magnetic influence and a magnetic moment generated by a current passing through coils arranged adjacent to a surface of the inner rotational member. Bulk micromachining techniques enable the members to be formed from a monolithic silicon wafer and can produce a member with a smooth surface. The smooth surface of a member may function as a reflector. In one embodiment, the inner rotational member functions as a reflector.

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