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    Laser produced plasma EUV light source
    111.
    发明授权
    Laser produced plasma EUV light source 有权
    激光产生等离子体EUV光源

    公开(公告)号：US08035092B2

    公开(公告)日：2011-10-11

    申请号：US12655987

    申请日：2010-01-11

    申请人： Alexander N. Bykanov ,  Norbert Bowering ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Oleh Khodykin

    发明人： Alexander N. Bykanov ,  Norbert Bowering ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Oleh Khodykin

    IPC分类号： H04H1/04

    CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70908 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/008

    摘要： A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.

    摘要翻译： 公开了一种可以包括在等离子体位置处产生等离子体的系统，等离子体产生EUV辐射和离开等离子体的离子的装置。 该装置还可以包括一个光学元件，例如多个远离现场的多层反射镜，以及设置在等离子体和光学元件之间的流动气体，该气体建立足以在该距离上操作的气体压力， d，在离子到达光学器件之前，将离子能量降低到预先选定的值以下。 在一个实施方案中，气体可以包含氢气，并且在一个具体实施方案中，气体可以包含大于50体积％的氢气。

    Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
    113.
    发明授权
    Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source 有权
    用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法

    公开(公告)号：US07732793B2

    公开(公告)日：2010-06-08

    申请号：US11705954

    申请日：2007-02-13

    申请人： Alexander I. Ershov ,  William F. Marx ,  Norbert Bowering ,  Bjorn A. M. Hansson ,  Oleh Khodykin ,  Igor V. Fomenkov

    发明人： Alexander I. Ershov ,  William F. Marx ,  Norbert Bowering ,  Bjorn A. M. Hansson ,  Oleh Khodykin ,  Igor V. Fomenkov

    IPC分类号： C25F1/00

    CPC分类号： B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/7085 ,  G03F7/70916 ,  G21K1/06 ,  G21K2201/06 ,  H05G2/001

    摘要： Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

    摘要翻译： 公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。 在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。 在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。 在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。 在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

    Drive laser delivery systems for euv light source
    115.
    发明申请
    Drive laser delivery systems for euv light source 有权
    驱动用于euv光源的激光输送系统

    公开(公告)号：US20090267005A1

    公开(公告)日：2009-10-29

    申请号：US12322669

    申请日：2009-02-04

    申请人： Alexander N. Bykanov ,  Igor V. Fomenkov ,  Oleh Khodykin ,  Alexander I. Ershov

    发明人： Alexander N. Bykanov ,  Igor V. Fomenkov ,  Oleh Khodykin ,  Alexander I. Ershov

    IPC分类号： G01J3/10

    CPC分类号： H05G2/003 ,  G03F7/70033 ,  H01S3/0064 ,  H01S3/073 ,  H01S3/0805 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/083 ,  H01S3/10092 ,  H01S3/105 ,  H01S3/1066 ,  H01S3/115 ,  H01S3/121 ,  H01S3/127 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2383 ,  H05G2/008

    摘要： An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.

    摘要翻译： 公开了一种LPP EUV光源，其具有位于等离子体室中的光学器件，用于反射在其中产生的EUV光和激光输入窗口。 对于该方面，EUV光源可以被配置为将窗口暴露于更低的气体蚀刻剂压力以将窗口暴露于气体蚀刻剂压力以进行光学清洁，以避免窗口涂层变质。 在另一方面，EUV光源可以包括沿着光束路径定位以参与与光束路径上的光的第一相互作用的目标材料; 光放大器; 以及至少一个光导向光子从第一相互作用散射到光放大器中以在光束路径上产生激光束，用于随后与目标材料的相互作用以产生EUV发光等离子体。

    Laser spectral engineering for lithographic process
    116.
    发明授权
    Laser spectral engineering for lithographic process 有权
    激光光谱工程用于光刻工艺

    公开(公告)号：US07382815B2

    公开(公告)日：2008-06-03

    申请号：US10915517

    申请日：2004-08-09

    申请人： Ronald L. Spangler ,  Jacob P. Lipcon ,  John A. Rule ,  Robert N. Jacques ,  Armen Kroyan ,  Ivan Lalovic ,  Igor V. Fomenkov ,  John M. Algots

    发明人： Ronald L. Spangler ,  Jacob P. Lipcon ,  John A. Rule ,  Robert N. Jacques ,  Armen Kroyan ,  Ivan Lalovic ,  Igor V. Fomenkov ,  John M. Algots

    IPC分类号： H01S5/00

    CPC分类号： G03F7/70575 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0812 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/13 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258

    摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.

    摘要翻译： 一种称为光电工程的集成电路光刻技术，用于放电激光器的带宽控制。 在优选的方法中，使用计算机模型来模拟光刻参数以确定产生所需光刻结果所需的所需激光光谱。 然后使用快速响应的调谐机构来调整脉冲串中的激光脉冲的中心波长，以实现接近所需激光光谱的脉冲串的集成光谱。 控制激光束带宽以产生具有至少两个光谱峰值的有效光束光谱，以便在光致抗蚀剂膜中产生改进的图案分辨率。 提供了具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速带宽检测控制系统的线窄设备。 在优选实施例中，波长调谐镜以与激光器的重复频率相位的每秒超过500次抖动的抖动速率抖动。 在一种情况下，用方波信号驱动压电驱动，在第二种情况下，它是用正弦波信号驱动的。 在另一个实施例中，最大位移与激光脉冲在一对一的基础上匹配，以便为一系列激光脉冲产生具有两个峰值的所需平均光谱。 其它优选实施例利用三个独立的波长调谐位置，产生具有三个独立峰值的光谱。

    EUV optics
    117.
    发明申请
    EUV optics 有权
    EUV光学

    公开(公告)号：US20080043321A1

    公开(公告)日：2008-02-21

    申请号：US11505177

    申请日：2006-08-16

    申请人： Norbert R. Bowering ,  Igor V. Fomenkov

    发明人： Norbert R. Bowering ,  Igor V. Fomenkov

    IPC分类号： G02B5/08

    CPC分类号： G03F7/7015 ,  G02B5/0891 ,  G02B7/182 ,  G21K1/062 ,  Y10T29/49982

    摘要： In a first aspect, a method of fabricating an EUV light source mirror is disclosed which may comprise the acts/steps of providing a plurality of discrete substrates; coating each substrate with a respective multilayer coating; securing the coated substrates in an arrangement wherein each coated substrate is oriented to a common focal point; and thereafter polishing at least one of the multilayer coatings. In another aspect, an optic for use with EUV light is disclosed which may comprise a substrate; a smoothing layer selected from the group of materials consisting of Si, C, Si3N4, B4C, SiC and Cr, the smoothing layer material being deposited using highly energetic deposition conditions and a multilayer dielectric coating. In another aspect, a corrosion resistant, multilayer coating for an EUV mirror may comprise alternating layers of Si and a compound material having nitrogen and a 5th period transition metal.

    摘要翻译： 在第一方面，公开了一种制造EUV光源反射镜的方法，其可以包括提供多个离散基板的动作/步骤; 用相应的多层涂层涂覆每个基材; 将涂覆的基底固定在其中每个涂覆的基底被定向到公共焦点的布置中; 然后抛光至少一个多层涂层。 在另一方面，公开了一种用于EUV光的光学元件，其可以包括基底; 选自由Si，C，Si 3 N 4，B 4 C，SiC和Cr组成的材料组中的平滑层， 使用高能沉积条件沉积的平滑层材料和多层介电涂层。 另一方面，用于EUV反射镜的耐腐蚀多层涂层可以包括交替的Si层和具有氮和第五阶段过渡金属的复合材料。

    Laser spectral engineering for lithographic process
    118.
    发明授权
    Laser spectral engineering for lithographic process 有权
    激光光谱工程用于光刻工艺

    公开(公告)号：US07298770B2

    公开(公告)日：2007-11-20

    申请号：US10912933

    申请日：2004-08-05

    申请人： Ronald L. Spangler ,  Jacob P. Lipcon ,  John A. Rule ,  Robert N. Jacques ,  Armen Kroyan ,  Ivan Lalovic ,  Igor V. Fomenkov ,  John M. Algots

    发明人： Ronald L. Spangler ,  Jacob P. Lipcon ,  John A. Rule ,  Robert N. Jacques ,  Armen Kroyan ,  Ivan Lalovic ,  Igor V. Fomenkov ,  John M. Algots

    IPC分类号： H01S3/22 ,  H01S3/223 ,  H01S3/10 ,  H01S3/13

    CPC分类号： G03F7/70575 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0812 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/13 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258

    摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.

    摘要翻译： 一种称为光电工程的集成电路光刻技术，用于放电激光器的带宽控制。 在优选的方法中，使用计算机模型来模拟光刻参数以确定产生所需光刻结果所需的所需激光光谱。 然后使用快速响应的调谐机构来调整脉冲串中的激光脉冲的中心波长，以实现接近所需激光光谱的脉冲串的集成光谱。 控制激光束带宽以产生具有至少两个光谱峰值的有效光束光谱，以便在光致抗蚀剂膜中产生改进的图案分辨率。 提供了具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速带宽检测控制系统的线窄设备。 在优选实施例中，波长调谐镜以与激光器的重复频率相位的每秒超过500次抖动的抖动速率抖动。 在一种情况下，用方波信号驱动压电驱动，在第二种情况下，它是用正弦波信号驱动的。 在另一个实施例中，最大位移与激光脉冲在一对一的基础上匹配，以便为一系列激光脉冲产生具有两个峰值的所需平均光谱。 其它优选实施例利用三个独立的波长调谐位置，产生具有三个独立峰值的光谱。

    Virtual laser operator
    120.
    发明授权
    Virtual laser operator 有权
    虚拟激光操作员

    公开(公告)号：US06618425B1

    公开(公告)日：2003-09-09

    申请号：US09442140

    申请日：1999-11-17

    申请人： Jason R. Carlesi ,  David J. Dunlap ,  Igor V. Fomenkov

    发明人： Jason R. Carlesi ,  David J. Dunlap ,  Igor V. Fomenkov

    IPC分类号： H01S300

    CPC分类号： H04B10/50 ,  G03F7/70025 ,  G03F7/70525 ,  G03F7/708

    摘要： A laser controller interconnected with an electric discharge laser communicates with a remote computer incorporating a display screen programmably emulating a conventional keyboard. The display screen has a plurality of imaged virtual keys each programmably emulating a physical key of a conventional keyboard. Some virtual keys programmably emulate a prescribed sequence of keystrokes, which control, monitor, and record the laser operation. A prescribed sequence can optionally be automated, conditional, or interrupted by operator prompts. The remote computer communicates serially with the laser controller through an electrically conductive cable, a fiberoptic link, or a wireless channel. A keystroke is typically applied by manually pressing the position of a corresponding virtual key on a touch sensitive screen, or alternatively by actuating a conventional pointing device. The electric discharge laser can be a KrF or ArF excimer laser, or a F2 molecular laser, which can be applied as a radiation exposure source for microlithography.

    摘要翻译： 与放电激光器互连的激光控制器与包含可编程仿真常规键盘的显示屏的远程计算机通信。 显示屏具有多个成像的虚拟键，每个可编程地仿真常规键盘的物理键。 一些虚拟键可编程地模拟规定的击键序列，其控制，监视和记录激光操作。 规定的顺序可以任选地由操作者提示自动化，有条件地或中断。 远程计算机通过导电电缆，光纤链路或无线信道与激光控制器串行通信。 通常通过在触敏屏幕上手动按下相应的虚拟键的位置，或者通过启动常规的指示设备来应用按键。 放电激光器可以是KrF或ArF准分子激光器或F2分子激光器，其可以作为用于微光刻的辐射照射源。