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    Laser spectral engineering for lithographic process
    2.
    发明授权
    Laser spectral engineering for lithographic process 有权
    激光光谱工程用于光刻工艺

    公开(公告)号：US07382815B2

    公开(公告)日：2008-06-03

    申请号：US10915517

    申请日：2004-08-09

    申请人： Ronald L. Spangler ,  Jacob P. Lipcon ,  John A. Rule ,  Robert N. Jacques ,  Armen Kroyan ,  Ivan Lalovic ,  Igor V. Fomenkov ,  John M. Algots

    发明人： Ronald L. Spangler ,  Jacob P. Lipcon ,  John A. Rule ,  Robert N. Jacques ,  Armen Kroyan ,  Ivan Lalovic ,  Igor V. Fomenkov ,  John M. Algots

    IPC分类号： H01S5/00

    CPC分类号： G03F7/70575 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0812 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/13 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258

    摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.

    摘要翻译： 一种称为光电工程的集成电路光刻技术，用于放电激光器的带宽控制。 在优选的方法中，使用计算机模型来模拟光刻参数以确定产生所需光刻结果所需的所需激光光谱。 然后使用快速响应的调谐机构来调整脉冲串中的激光脉冲的中心波长，以实现接近所需激光光谱的脉冲串的集成光谱。 控制激光束带宽以产生具有至少两个光谱峰值的有效光束光谱，以便在光致抗蚀剂膜中产生改进的图案分辨率。 提供了具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速带宽检测控制系统的线窄设备。 在优选实施例中，波长调谐镜以与激光器的重复频率相位的每秒超过500次抖动的抖动速率抖动。 在一种情况下，用方波信号驱动压电驱动，在第二种情况下，它是用正弦波信号驱动的。 在另一个实施例中，最大位移与激光脉冲在一对一的基础上匹配，以便为一系列激光脉冲产生具有两个峰值的所需平均光谱。 其它优选实施例利用三个独立的波长调谐位置，产生具有三个独立峰值的光谱。

    Laser spectral engineering for lithographic process
    3.
    发明授权
    Laser spectral engineering for lithographic process 有权
    激光光谱工程用于光刻工艺

    公开(公告)号：US07298770B2

    公开(公告)日：2007-11-20

    申请号：US10912933

    申请日：2004-08-05

    申请人： Ronald L. Spangler ,  Jacob P. Lipcon ,  John A. Rule ,  Robert N. Jacques ,  Armen Kroyan ,  Ivan Lalovic ,  Igor V. Fomenkov ,  John M. Algots

    发明人： Ronald L. Spangler ,  Jacob P. Lipcon ,  John A. Rule ,  Robert N. Jacques ,  Armen Kroyan ,  Ivan Lalovic ,  Igor V. Fomenkov ,  John M. Algots

    IPC分类号： H01S3/22 ,  H01S3/223 ,  H01S3/10 ,  H01S3/13

    CPC分类号： G03F7/70575 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0812 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/13 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258

    摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.

    摘要翻译： 一种称为光电工程的集成电路光刻技术，用于放电激光器的带宽控制。 在优选的方法中，使用计算机模型来模拟光刻参数以确定产生所需光刻结果所需的所需激光光谱。 然后使用快速响应的调谐机构来调整脉冲串中的激光脉冲的中心波长，以实现接近所需激光光谱的脉冲串的集成光谱。 控制激光束带宽以产生具有至少两个光谱峰值的有效光束光谱，以便在光致抗蚀剂膜中产生改进的图案分辨率。 提供了具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速带宽检测控制系统的线窄设备。 在优选实施例中，波长调谐镜以与激光器的重复频率相位的每秒超过500次抖动的抖动速率抖动。 在一种情况下，用方波信号驱动压电驱动，在第二种情况下，它是用正弦波信号驱动的。 在另一个实施例中，最大位移与激光脉冲在一对一的基础上匹配，以便为一系列激光脉冲产生具有两个峰值的所需平均光谱。 其它优选实施例利用三个独立的波长调谐位置，产生具有三个独立峰值的光谱。

    High repetition rate laser produced plasma EUV light source
    9.
    发明申请
    High repetition rate laser produced plasma EUV light source 有权

    公开(公告)号：US20080197297A1

    公开(公告)日：2008-08-21

    申请号：US11471434

    申请日：2006-06-20

    申请人： Robert P. Akins ,  Richard L. Sandstrom ,  William N. Partlo ,  Igor V. Fomenkov ,  Thomas D. Steiger ,  John Martin Algots ,  Norbert Bowering ,  Robert N. Jacques ,  Frederick Palenschat ,  Jun Song

    发明人： Robert P. Akins ,  Richard L. Sandstrom ,  William N. Partlo ,  Igor V. Fomenkov ,  Thomas D. Steiger ,  John Martin Algots ,  Norbert Bowering ,  Robert N. Jacques ,  Frederick Palenschat ,  Jun Song

    IPC分类号： G01J3/10

    CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

    摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.