Upstream signal capture and processing in a subscriber device

    公开(公告)号:US09948981B2

    公开(公告)日:2018-04-17

    申请号:US15078825

    申请日:2016-03-23

    Abstract: An upstream signal capture device includes a signal capture circuit having a first port and a second port. The first port of the signal capture circuit is arranged for coupling to a diplexer. The upstream signal capture device also includes an amplifier having a first port and a second port, the first port of the amplifier coupled to the second port of the signal capture circuit, and an analog-to-digital converter (ADC) having a first port and a second port, the first port of the ADC coupled to the second port of the amplifier. The upstream signal capture device further includes a digital threshold detector having an input and output, the input of the digital threshold detector coupled to the second port of the analog-to-digital converter, and a memory configured to capture samples of the upstream signal. When using the upstream signal capture device to capture an upstream signal, a portion of an upstream signal is diverted into an analog-to-digital converter (ADC). A portion of the upstream signal is converted into a digital signal, and when the digital signal exceeds a threshold, the signal is captured in a memory.

    SOI FinFET transistor with strained channel

    公开(公告)号:US09947772B2

    公开(公告)日:2018-04-17

    申请号:US14231466

    申请日:2014-03-31

    Inventor: John H. Zhang

    Abstract: Stress is introduced into the channel of an SOI FinFET device by transfer directly from a metal gate. In SOI devices in particular, stress transfer efficiency from the metal gate to the channel is nearly 100%. Either tensile or compressive stress can be applied to the fin channel by choosing different materials to be used in the gate stack as the bulk gate material, a gate liner, or a work function material, or by varying processing parameters during deposition of the gate or work function materials. P-gates and N-gates are therefore formed separately. Gate materials suitable for use as stressors include tungsten (W) for NFETs and titanium nitride (TiN) for PFETs. An optical planarization material assists in patterning the stress-inducing metal gates. A simplified process flow is disclosed in which isolation regions are formed without need for a separate mask layer, and gate sidewall spacers are not used.

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