公开(公告)号：US09612256B2

公开(公告)日：2017-04-04

申请号：US13951000

申请日：2013-07-25

Applicant: Michael D. Bulatowicz

Inventor： Michael D. Bulatowicz

IPC: G01P21/00 ,  G01P15/125 ,  G01P15/13 ,  G01P15/08

CPC classification number: G01P21/00 ,  G01P15/125 ,  G01P15/131 ,  G01P2015/0828

Abstract: One embodiment of the invention includes an accelerometer sensor system. The system includes a sensor comprising a proofmass and electrodes and being configured to generate acceleration feedback signals based on control signals applied to the electrodes in response to an input acceleration. The system also includes an acceleration component configured to measure the input acceleration based on the acceleration feedback signals. The system further includes an acceleration controller configured to generate the control signals to define a first scale-factor range associated with the sensor and to define a second scale-factor range associated with the sensor. The control system includes a calibration component configured to calibrate the accelerometer sensor system with respect to range-dependent bias error based on a difference between the measured input acceleration at each of the first scale-factor range and the second scale-factor range.

公开(公告)号：US09612255B2

公开(公告)日：2017-04-04

申请号：US13771792

申请日：2013-02-20

Applicant: Michael D. Bulatowicz

Inventor： Michael D. Bulatowicz

IPC: G01P21/00 ,  G06F17/10 ,  G01P15/125 ,  G01P15/13 ,  G01P15/08

CPC classification number: G01P21/00 ,  G01P15/125 ,  G01P15/131 ,  G01P2015/0828 ,  G06F17/10

Abstract: One embodiment of the invention includes an accelerometer sensor system. The system includes a sensor comprising a proofmass and electrodes and being configured to generate acceleration feedback signals based on control signals applied to the electrodes in response to an input acceleration. The system also includes an acceleration component configured to measure the input acceleration based on the acceleration feedback signals. The system further includes an acceleration controller configured to generate the control signals to define a first scale-factor range associated with the sensor and to define a second scale-factor range associated with the sensor. The control system includes a calibration component configured to calibrate the accelerometer sensor system with respect to range-dependent bias error based on a difference between the measured input acceleration at each of the first scale-factor range and the second scale-factor range.

公开(公告)号：US09296606B2

公开(公告)日：2016-03-29

申请号：US14172894

申请日：2014-02-04

Applicant: INVENSENSE, INC.

Inventor： Kirt Reed Williams ,  Matthew Julian Thompson ,  Joseph Seeger

IPC: G01P15/08 ,  B81B3/00 ,  G01N3/20 ,  G01P15/125 ,  B81C1/00 ,  G01K1/00

CPC classification number: B81B3/0051 ,  B81B2201/0221 ,  B81B2201/0235 ,  B81B2201/0271 ,  B81C1/00666 ,  G01K1/00 ,  G01N3/20 ,  G01P15/125 ,  G01P2015/0828

Abstract: A method and system for a MEMS device is disclosed. The MEMS device includes a free layer, with a first portion and a second portion. The MEMS device also includes a underlying substrate, the free layer movably positioned relative to the underlying substrate. The first portion and second portion of the free layer are coupled through at least one stem. A sense material is disposed over portions of the second portion of the free layer. Stress in the sense material and second portion of the free layer does not cause substantial deflection of the first portion.

Abstract translation: 公开了一种用于MEMS器件的方法和系统。 MEMS器件包括具有第一部分和第二部分的自由层。 MEMS器件还包括下面的衬底，自由层相对于下面的衬底可移动地定位。 自由层的第一部分和第二部分通过至少一个杆连接。 感测材料设置在自由层的第二部分的部分上。 感应材料和自由层的第二部分的应力不会引起第一部分的实质的偏转。

公开(公告)号：US20150168441A1

公开(公告)日：2015-06-18

申请号：US14106245

申请日：2013-12-13

Applicant: Intel Corporation

Inventor： David N. Hutchison ,  John Heck

IPC: G01P15/093 ,  G01P15/14

CPC classification number: G01P15/093 ,  G01C19/5712 ,  G01C19/5733 ,  G01C19/5776 ,  G01P15/14 ,  G01P2015/0828 ,  G01P2015/084

Abstract: Embodiments of the present disclosure are directed towards techniques and configurations for a MEMS device configured to determine inertial change applied to the device. In one instance, the device may comprise a laser arrangement configured to generate a light beam having a resonant wavelength, a waveguide configured to receive and output the light beam, and an optical resonator comprising a deformable closed loop and optically coupled to the waveguide to receive a portion of the light beam. A deformation of the optical resonator may result in a change of an optical path length of a portion of the light beam traveling through the optical resonator, causing a change in the resonant wavelength of the light beam outputted by the waveguide. Other embodiments may be described and/or claimed.

Abstract translation: 本公开的实施例针对被配置为确定施加到该装置的惯性变化的MEMS装置的技术和配置。 在一个实例中，该装置可以包括被配置为产生具有谐振波长的光束的激光装置，被配置为接收和输出光束的波导，以及包括可变形闭环的光学谐振器，并且光耦合到波导以接收 一部分光束。 光谐振器的变形可能导致光通过光谐振器的光束的一部分的光程长度的变化，导致波导输出的光束的谐振波长的变化。 可以描述和/或要求保护其他实施例。

公开(公告)号：US09016128B2

公开(公告)日：2015-04-28

申请号：US13374759

申请日：2012-01-10

Applicant: Mitsuaki Koyama ,  Takeru Mutoh ,  Hiroki Iwai

Inventor： Mitsuaki Koyama ,  Takeru Mutoh ,  Hiroki Iwai

IPC: G01H13/00 ,  G01P15/097 ,  G01P1/00 ,  G01P1/02 ,  G01P15/125 ,  G01L1/14 ,  G01L1/16 ,  G01P15/08

CPC classification number: G01P15/097 ,  G01L1/142 ,  G01L1/162 ,  G01P1/00 ,  G01P1/006 ,  G01P1/023 ,  G01P15/125 ,  G01P2015/0828 ,  G01P2015/0871

Abstract: A technique for detecting external force applied to a piezoelectric plate is provided. A crystal plate is cantilever-supported in a container. Excitation electrodes are formed on an upper face and lower face, respectively, of the crystal plate. A movable electrode is formed on the lower face side. A fixed electrode is provided on a bottom portion of the container facing the movable electrode. The excitation electrode on the upper face side and the fixed electrode are connected to an oscillation circuit. When the crystal plate bends by external force applied, capacitance between. A direction of the movable electrode along a length direction of the crystal plate is set to 30° to 60°, relative to a face orthogonal to an intended direction of the external force. The movable electrode and fixed electrode changes, and this capacitance change and a deformation of the crystal circuit.

Abstract translation: 提供了一种用于检测施加到压电板的外力的技术。 水晶板悬臂支撑在容器中。 激励电极分别形成在晶体板的上表面和下表面上。 可动电极形成在下表面侧。 在面向可动电极的容器的底部设置固定电极。 上侧激励电极和固定电极连接到振荡电路。 当晶体板通过外力施加弯曲时，电容之间。 可移动电极沿着晶体板的长度方向的方向相对于与外力的预期方向正交的面设定为30°〜60°。 可动电极和固定电极发生变化，电容变化，晶体电路变形。

公开(公告)号：US08877537B2

公开(公告)日：2014-11-04

申请号：US13882337

申请日：2011-05-19

Applicant: Jianhong Mao ,  Deming Tang

Inventor： Jianhong Mao ,  Deming Tang

IPC: H01L21/00 ,  B81C1/00 ,  G01P15/08 ,  H03H3/007

CPC classification number: B81C1/0015 ,  B81B2203/0118 ,  B81B2207/07 ,  B81C1/00293 ,  B81C2201/0109 ,  B81C2201/0125 ,  B81C2203/0145 ,  G01P15/0802 ,  G01P2015/0828 ,  H03H3/0072

Abstract: A method for manufacturing a micro-electro-mechanical system (MEMS) device is provided. The method comprises: providing a semiconductor substrate, the semiconductor substrate having a metal interconnection structure (100) formed therein; forming a first sacrificial layer (201) on the surface of the semiconductor substrate, the material of the first sacrificial layer is amorphous carbon; etching the first sacrificial layer to form a first recess (301); covering and forming a first dielectric layer (401) on the surface of the first sacrificial layer; thinning the first dielectric layer by a chemical mechanical polishing (CMP) process, until exposing the first sacrificial layer; forming a micromechanical structure layer (500) on the surface of the first sacrificial layer and exposing the first sacrificial layer, wherein a part of the micromechanical structure layer is connected to the first dielectric layer. The method avoids polishing the amorphous carbon, shortens the period of production, and improves the production efficiency.

Abstract translation: 提供了一种用于制造微机电系统（MEMS）装置的方法。 该方法包括：提供半导体衬底，其中形成有金属互连结构（100）的半导体衬底; 在所述半导体衬底的表面上形成第一牺牲层（201），所述第一牺牲层的材料是无定形碳; 蚀刻第一牺牲层以形成第一凹部（301）; 在第一牺牲层的表面上覆盖并形成第一介电层（401）; 通过化学机械抛光（CMP）工艺使第一介电层变薄，直到暴露出第一牺牲层; 在所述第一牺牲层的表面上形成微机械结构层（500）并暴露所述第一牺牲层，其中所述微机械结构层的一部分连接到所述第一介电层。 该方法避免抛光无定形碳，缩短生产周期，提高生产效率。

公开(公告)号：US08735198B2

公开(公告)日：2014-05-27

申请号：US11721029

申请日：2005-12-06

Applicant: Padraig O'Mahony ,  Frank Caris ,  Theo Kersjes ,  Christian Paquet

Inventor： Padraig O'Mahony ,  Frank Caris ,  Theo Kersjes ,  Christian Paquet

IPC: H01L21/00

CPC classification number: G01P15/08 ,  B81B7/02 ,  B81B2201/0235 ,  B81C2201/019 ,  G01P15/0802 ,  G01P2015/0828 ,  H04M2250/12 ,  Y10T29/49002

Abstract: One embodiment of the present application includes a multisensor assembly. This assembly has an electromechanical motion sensor member defined with one wafer layer, a first sensor carried with a first one or two or more other wafer layers, and a second sensor carried with a second one of the other wafer layers. The one wafer layer is positioned between the other wafer layers to correspondingly enclose the sensor member within a cavity of the assembly.

Abstract translation: 本申请的一个实施例包括多传感器组件。 该组件具有机电运动传感器构件，该机电运动传感器构件限定有一个晶片层，承载有第一或两个或更多个其它晶片层的第一传感器以及承载有第二其它晶片层的第二传感器。 一个晶片层位于其它晶片层之间，以将传感器构件相应地封闭在组件的空腔内。

公开(公告)号：US20140096587A1

公开(公告)日：2014-04-10

申请号：US13951049

申请日：2013-07-25

Applicant: Robert E. Stewart ,  Michael D. Bulatowicz

Inventor： Robert E. Stewart ,  Michael D. Bulatowicz

IPC: G01P21/00

CPC classification number: G01P21/00 ,  G01P15/125 ,  G01P15/131 ,  G01P2015/0828 ,  G01P2015/0831 ,  G01P2015/084

Abstract: One embodiment includes a method for dynamic self-calibration of an accelerometer system. The method includes forcing a proof-mass associated with a sensor of the accelerometer system in a first direction to a first predetermined position and obtaining a first measurement associated with the sensor in the first predetermined position via at least one force/detection element of the sensor. The method also includes forcing the proof-mass to a second predetermined position and obtaining a second measurement associated with the sensor in the second predetermined position via the at least one force/detection element of the sensor. The method further includes calibrating the accelerometer system based on the first and second measurements.

Abstract translation: 一个实施例包括用于加速度计系统的动态自校准的方法。 该方法包括：将加速度计系统的传感器与第一方向相关联的检验质量强制到第一预定位置，并通过传感器的至少一个力/检测元件获得与第一预定位置中的传感器相关的第一测量值 。 该方法还包括通过传感器的至少一个力/检测元件将证明质量强制到第二预定位置并获得与第二预定位置中的传感器相关联的第二测量。 该方法还包括基于第一和第二测量校准加速度计系统。

公开(公告)号：US08508003B2

公开(公告)日：2013-08-13

申请号：US13267004

申请日：2011-10-06

Applicant: Junichi Yoshida

Inventor： Junichi Yoshida

IPC: H01L29/84

CPC classification number: B81B3/0018 ,  B81B2201/0235 ,  B81B2201/0242 ,  B81B2203/053 ,  B81B2207/095 ,  B81B2207/096 ,  B81C1/00587 ,  B81C2201/0133 ,  B81C2203/0118 ,  G01P15/0802 ,  G01P15/125 ,  G01P2015/0828

Abstract: An acceleration sensor is formed using an etched layer sandwiched between first and second substrates. In this case, a structure including a movable portion which is displaceable in the thickness direction of the substrates, and a support frame are formed in the etched layer. In addition, first and second fixed electrodes are formed on the first and second substrates, respectively, at a position facing the movable portion. Further, a remaining sacrificial layer is provided on the substrate by leaving a portion of a second sacrificial layer when a first sacrificial layer is entirely etched away. Therefore, when the first sacrificial layer is etched away, corrosion of the structure and the support beams is prevented because the second sacrificial layer is preferentially corroded as compared to the structure.

Abstract translation: 使用夹在第一和第二基板之间的蚀刻层形成加速度传感器。 在这种情况下，在蚀刻层中形成有包括可在基板的厚度方向上移动的可动部分和支撑框架的结构。 此外，第一和第二固定电极分别在面对可动部分的位置上形成在第一和第二基板上。 此外，当第一牺牲层被完全蚀刻掉时，通过留下第二牺牲层的一部分，在衬底上提供剩余的牺牲层。 因此，当第一牺牲层被蚀刻掉时，由于与结构相比，第二牺牲层被优先腐蚀，所以防止了结构和支撑梁的腐蚀。

公开(公告)号：US20130042695A1

公开(公告)日：2013-02-21

申请号：US13209940

申请日：2011-08-15

Applicant: FREDERICK JAMES BARR ,  Stig Rune Lennart Tenghamn ,  Anders Göran Mattsson

Inventor： FREDERICK JAMES BARR ,  Stig Rune Lennart Tenghamn ,  Anders Göran Mattsson

IPC: G01L9/00

CPC classification number: G01P15/125 ,  G01L11/008 ,  G01L19/02 ,  G01P2015/0828 ,  G01V1/186 ,  G01V1/201

Abstract: A disclosed pressure-responsive sensor includes a flexible element contained within an enclosure and a membrane configured to exert an electrostatic force on the flexible element to cause the flexible element to respond to pressure variations on the membrane. A disclosed pressure-sensing method includes electrostatically coupling a membrane to a flexible element contained within an enclosure to transfer a pressure response of the membrane to the flexible element. Motion of the flexible element is converted into a pressure signal.

Abstract translation: 所公开的压力响应传感器包括容纳在外壳内的柔性元件和构造成在柔性元件上施加静电力以使柔性元件响应于膜上的压力变化的膜。 所公开的压力感测方法包括将膜静电耦合到容纳在外壳内的柔性元件以将膜的压力响应传递到柔性元件。 柔性元件的运动转换为压力信号。