公开(公告)号：US20140054809A1

公开(公告)日：2014-02-27

申请号：US14070351

申请日：2013-11-01

Applicant: Massachusetts Institute of Technology

Inventor： Paulo C. Lozano ,  Steven Mark Arestie

IPC: H01J37/08

CPC classification number: H01J37/08 ,  B01L3/502715 ,  C25F3/14 ,  H01J1/05 ,  H01J9/02 ,  H01J49/0445 ,  H01J2237/0802 ,  H01J2237/317

Abstract: An ionic liquid ion source can include a microfabricated body including a base and a tip. The body can be formed of a porous material compatible with at least one of an ionic liquid or room-temperature molten salt. The body can have a pore size gradient that decreases from the base of the body to the tip of the body, such that the at least one of an ionic liquid or room-temperature molten salt is capable of being transported through capillarity from the base to the tip.

Abstract translation: 离子液体离子源可以包括包含基底和尖端的微加工体。 身体可以由与离子液体或室温熔融盐中的至少一种相容的多孔材料形成。 身体可以具有从身体的基部到身体的尖端减小的孔径梯度，使得离子液体或室温熔融盐中的至少一种能够通过毛细管线从基底转移到 小费。

公开(公告)号：US08592784B2

公开(公告)日：2013-11-26

申请号：US13181910

申请日：2011-07-13

Applicant: John J. Hautala ,  Nathan E. Baxter

Inventor： John J. Hautala ,  Nathan E. Baxter

IPC: H01J37/317

CPC classification number: H01J37/317 ,  H01J27/026 ,  H01J37/08 ,  H01J37/3171 ,  H01J37/3178 ,  H01J2237/0812 ,  H01J2237/316 ,  H01J2237/3165 ,  H01J2237/31701 ,  H01J2237/31732

Abstract: A method of modifying a material layer on a substrate is described. The method comprises forming the material layer on the substrate. Thereafter, the method comprises establishing a gas cluster ion beam (GCIB) having an energy per atom ratio ranging from about 0.25 eV per atom to about 100 eV per atom, and modifying the material layer by exposing the material layer to the GCIB.

Abstract translation: 描述了改变衬底上的材料层的方法。 该方法包括在基底上形成材料层。 此后，该方法包括建立具有每原子约0.25eV至约100eV /原子比的每原子比能量的气体簇离子束（GCIB），以及通过将材料层暴露于GCIB来修饰该材料层。

公开(公告)号：US20130306597A1

公开(公告)日：2013-11-21

申请号：US13950658

申请日：2013-07-25

Applicant: Tokyo Electron Limited

Inventor： Isao Gunji ,  Hidenori Miyoshi ,  Kenichi Hara

IPC: C23F1/02 ,  C23F1/08

CPC classification number: C23F1/02 ,  C23F1/08 ,  C23F4/00 ,  H01J27/026 ,  H01J37/08 ,  H01J37/3056 ,  H01J37/317 ,  H01J2237/0812 ,  H01J2237/3174 ,  H01L21/32136

Abstract: A method for processing a metal film includes adiabatically expanding a mixed gas including an oxidation gas, a complexing gas and a rare gas in a processing chamber having a vacuum exhaust device such that a gas cluster beam is generated in the processing chamber, and irradiating the gas cluster beam upon a metal film formed on a surface of a workpiece in the processing chamber such that the gas cluster beam collides on the metal film including a metal element and the metal film is etched. The mixed gas includes the oxidation gas which oxidizes the metal element and forms an oxide, and the complexing gas which reacts with the oxide and forms an organometallic complex

Abstract translation: 一种处理金属膜的方法包括在具有真空排气装置的处理室中绝热膨胀包括氧化气体，络合气体和稀有气体的混合气体，使得在处理室中产生气体束束并照射 气体簇束在形成在处理室中的工件表面上的金属膜上，使得气体簇束与包括金属元素的金属膜碰撞并且金属膜被蚀刻。 混合气体包括氧化金属元素并形成氧化物的氧化气体和与氧化物反应形成有机金属络合物的络合气体

公开(公告)号：US08575565B2

公开(公告)日：2013-11-05

申请号：US13269795

申请日：2011-10-10

Applicant: Maximo Frati

Inventor： Maximo Frati

IPC: H01J1/50 ,  G21K5/04

CPC classification number: H01J37/08 ,  H01J27/143

Abstract: An ion beam source that emits an ion beam in a direction of a substrate is provided. A cathode with a discharge opening defined therein is included. An anode is also included and spaced apart from the cathode. Ions are set to be emitted in an area proximate to the discharge opening in a direction similar to the direction from the anode to the discharge opening. First and second ceramic walls at least partially define a discharge channel between the anode and the cathode. At least one magnet generates a magnetic field in an area proximate to the discharge opening.

Abstract translation: 提供了在基板的方向上发射离子束的离子束源。 包括其中限定有排出口的阴极。 还包括阳极并与阴极间隔开。 离子被设置为在与从阳极到排出口的方向相似的方向上在靠近排放口的区域中排出。 第一和第二陶瓷壁至少部分地限定了阳极和阴极之间的放电通道。 至少一个磁体在靠近排放口的区域中产生磁场。

公开(公告)号：US20130284593A1

公开(公告)日：2013-10-31

申请号：US13926352

申请日：2013-06-25

Applicant: Hitachi High-Technologies Corporation

Inventor： Hiroyasu SHICHI ,  Satoshi TOMIMATSU ,  Kaoru UMEMURA ,  Noriyuki KANEOKA ,  Koji ISHIGURO

IPC: C23C14/34

CPC classification number: C23C14/3442 ,  H01J27/10 ,  H01J37/08 ,  H01J37/28 ,  H01J37/3023 ,  H01J37/3056 ,  H01J2237/006 ,  H01J2237/057 ,  H01J2237/0807 ,  H01J2237/0825 ,  H01J2237/0827 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: An ion beam machining and observation method relevant to a technique of cross sectional observation of an electronic component, through which a sample is machined by using an ion beam and a charged particle beam processor capable of reducing the time it takes to fill up a processed hole with a high degree of flatness at the filled area. The observation device is capable of switching the kind of gas ion beam used for machining a sample with the kind of a gas ion beam used for observing the sample. To implement the switch between the kind of a gas ion beam used for sample machining and the kind of a gas ion beam used for sample observation, at least two gas introduction systems are used, each system having a gas cylinder, a gas tube, a gas volume control valve, and a stop valve.

Abstract translation: 一种与电子部件的横截面观察技术有关的离子束加工和观察方法，通过使用离子束加工样品的电子部件和能够减少填充加工孔的时间的带电粒子束处理器 在填充区域具有高度的平整度。 观察装置能够切换用于用于观察样品的气体离子束的种类来加工样品的气体离子束的种类。 为了实现用于样品加工的气体离子束的种类和用于样品观察的气体离子束的种类之间的切换，使用至少两个气体引入系统，每个系统具有气瓶，气体管， 气体量控制阀和截止阀。

公开(公告)号：US08563944B2

公开(公告)日：2013-10-22

申请号：US13595588

申请日：2012-08-27

Applicant: Hiroyasu Shichi ,  Shinichi Matsubara ,  Norihide Saho ,  Noriaki Arai ,  Tohru Ishitani

Inventor： Hiroyasu Shichi ,  Shinichi Matsubara ,  Norihide Saho ,  Noriaki Arai ,  Tohru Ishitani

IPC: H01J49/10 ,  H01J37/28

CPC classification number: H01J37/08 ,  H01J27/26 ,  H01J37/15 ,  H01J2237/0216 ,  H01J2237/0807 ,  H01J2237/28

Abstract: Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization ion source is comprised of an emitter tip (21) for generating ions; an emitter base mount (64) for supporting the emitter tip; an ionizing chamber which has an extraction electrode (24) opposed to the emitter tip and which is configured so as to surround the emitter tip (21); and a gas supply tube (25) for supplying gas to the vicinity of the emitter tip. The emitter base mount and a vacuum container magnetically interact with each other.

Abstract translation: 提供了一种具有气体电离电离离子源的离子束装置，其能够防止发射极尖端以非接触的方式振动。 气体电场离子源由用于产生离子的发射极尖端（21）组成; 发射极底座（64），用于支撑发射器尖端; 电离室具有与发射极尖端相对的引出电极（24），其构造为围绕发射极尖端（21）; 以及用于将气体供给到发射极尖端附近的气体供给管（25）。 发射极基座和真空容器彼此磁性相互作用。

公开(公告)号：US08558192B2

公开(公告)日：2013-10-15

申请号：US13276836

申请日：2011-10-19

Applicant: Billy W. Ward ,  John Notte, IV ,  Randall G. Percival

Inventor： Billy W. Ward ,  John Notte, IV ,  Randall G. Percival

IPC: H01J37/08 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/08 ,  H01J2237/006 ,  H01J2237/038 ,  H01J2237/061 ,  H01J2237/0807

Abstract: Disclosed are systems and methods for applying a voltage gradient to a gas delivery system, delivering a gas through a length of the gas delivery system having the voltage gradient, the gas having a pressure-distance product of less than about 1×10−2 Torr-inches or greater than about 100 Torr-inches, and delivering the gas into a housing of an ion microscope, the housing including an emitter and an extractor.

Abstract translation: 公开了用于向气体输送系统施加电压梯度的系统和方法，将气体输送通过具有电压梯度的气体输送系统的一段长度，气体的压力距离乘积小于约1×10 -2乇 或大于约100托/英寸，并将气体输送到离子显微镜的壳体中，该壳体包括发射器和提取器。

公开(公告)号：US20130261369A1

公开(公告)日：2013-10-03

申请号：US13673894

申请日：2012-11-09

Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH IN

Inventor： Moon Youn JUNG ,  Dong-Ho SHIN ,  Seunghwan KIM

IPC: A61N5/10 ,  H01J37/08

CPC classification number: A61N5/1077 ,  A61N2005/1088 ,  G21K1/00 ,  H01J27/24 ,  H01J37/08 ,  H05H6/00

Abstract: Provided are an ion generation target and a treatment apparatus using the same. The treatment apparatus includes an ion generation material generating the ions by incident laser beam, the ion generation material generating a bubble having a hemispheric shape, a support supporting the bubble having the hemispheric shape, a bubble generation member for generating the bubble having the hemispheric shape on the support by using the ion generation material, and a laser radiating laser beam onto a surface of the bubble to generate ions from the ion generation material, thereby projecting the ions onto a tumor portion of a patient.

Abstract translation: 提供了一种离子产生靶和使用其的处理装置。 处理装置包括通过入射激光束产生离子的离子产生材料，产生具有半球形状的气泡的离子产生材料，支撑具有半球形状的气泡的支撑体，用于产生具有半球形状的气泡的气泡产生部件 在通过使用离子产生材料的支撑件上，以及将激光辐射激光束到气泡的表面上以从离子产生材料产生离子，从而将离子投射到患者的肿瘤部分上。

公开(公告)号：US08530853B2

公开(公告)日：2013-09-10

申请号：US13369008

申请日：2012-02-08

Applicant: Adam V. Steele ,  Brenton J. Knuffman ,  Jabez J. McClelland

Inventor： Adam V. Steele ,  Brenton J. Knuffman ,  Jabez J. McClelland

IPC: H01J27/24

CPC classification number: H01J27/022 ,  G21K1/00 ,  H01J27/24 ,  H01J37/065 ,  H01J37/08 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/0815 ,  H05H3/02

Abstract: A system for producing a charged particle beam from a photoionized cold atom beam. A vapor of neutral atoms is generated. From these atoms, an atom beam having axial and transverse velocity distributions controlled by the application of laser light is produced. The produced atom beam is spatially compressed along each transverse axis, thus reducing the cross-sectional area of the produced beam and reducing a velocity spread of the produced beam along directions transverse to the beam's direction of propagation. Laser light is directed onto at least a portion of the neutral atoms in the atom beam, thereby producing ions and electrons. An electric field is generated at the location of the produced ions and electrons, thereby producing a beam of ions traveling in a first direction and electrons traveling in substantially the opposite direction. A vacuum chamber contains the atom beam, the ion beam and the electron beam.

Abstract translation: 用于从光电离冷原子束产生带电粒子束的系统。 产生中性原子的蒸汽。 由这些原子产生具有通过应用激光控制的轴向和横向速度分布的原子束。 所产生的原子束沿着每个横向轴线被空间压缩，从而减小所产生的光束的横截面面积，并且减小所产生的光束沿横向于光束传播方向的方向的速度扩展。 激光被引导到原子束中的至少一部分中性原子，从而产生离子和电子。 在产生的离子和电子的位置处产生电场，从而产生沿第一方向行进的离子束和基本上相反方向行进的电子。 真空室包含原子束，离子束和电子束。

公开(公告)号：US08525419B2

公开(公告)日：2013-09-03

申请号：US12623196

申请日：2009-11-20

Applicant: Noel S. Smith ,  Noel P. Martin ,  Paul P. Tesch

Inventor： Noel S. Smith ,  Noel P. Martin ,  Paul P. Tesch

IPC: H01J7/24

CPC classification number: H01J27/16 ,  H01J37/08 ,  H01J2237/31749

Abstract: A plasma source for processing or imaging a substrate, for ion source for proton therapy, for ion thrusters, or for high energy particle accelerators includes a coolant circuit passing adjacent to a plasma ion reactor chamber and RF antenna coils. In a method for operating the plasma ion source having an induction coil adjacent to a reaction chamber for inductively coupling power into the plasma from a radio frequency power source, the method comprises pumping a dielectric fluid into contact with induction coils of the plasma ion source along the coolant circuit. Use of the dielectric fluid both electrically insulates the plasma chamber, so that it can be biased to 30 kV and up, and efficiently transfers heat away from the plasma chamber.

Abstract translation: 用于处理或成像基板，用于质子治疗的离子源，离子推进器或用于高能量粒子加速器的等离子体源包括邻近等离子体离子反应室和RF天线线圈的冷却剂回路。 在用于操作具有与反应室相邻的感应线圈的等离子体离子源的方法中，用于将功率从射频电源感应耦合到等离子体中，该方法包括将介电流体泵送到与等离子体离子源的感应线圈接触 冷却液回路。 电介质流体的使用都使等离子体室电绝缘，使得其可被偏压到30kV及以上，并且有效地将热量从等离子体室传递出去。