Graphics processing unit and high bandwidth memory integration using integrated interface and silicon interposer

    公开(公告)号:US10770398B2

    公开(公告)日:2020-09-08

    申请号:US16180538

    申请日:2018-11-05

    Abstract: A semiconductor device assembly that includes a second side of an interposer being connected to a first side of a substrate. A plurality of interconnects may be connected to a second side of the substrate. First and second semiconductor devices are connected directly to the first side of the interposer. The interposer is configured to enable the first semiconductor device and the second semiconductor device to communicate with each other through the interposer. The interposer may be a silicon interposer that includes complementary metal-oxide-semiconductor circuits. The first semiconductor device may be a processing unit and the second semiconductor device may be a memory device, which may be a high bandwidth memory device. A method of making a semiconductor device assembly includes attaching both a memory device and a processing unit directly to a first side of an interposer and connecting a second side of the interposer to a substrate.

    ANTENNA FORMATION BY INTEGRATED METAL LAYER OR REDISTRIBUTION LAYER

    公开(公告)号:US20200176401A1

    公开(公告)日:2020-06-04

    申请号:US16208766

    申请日:2018-12-04

    Inventor: Owen R. Fay

    Abstract: Systems and methods of manufacture are disclosed for a semiconductor device having an integral antenna. The semiconductor device includes a substrate having a plurality of metal layers within the substrate with the plurality of metal layers being adjacent to an active side of the substrate. An antenna structure is formed on one of metal layers. The antenna structure may be configured to be connected to an external device. The substrate may include a redistribution layer connected to the active side of the substrate. The antenna structure may be formed in the redistribution layer instead of being formed on one of the metal layers. The area of the antenna structure may be configured to enable a device connected to the antenna structure to operate on a communication network. The antenna structure may be configured to be a 5G network antenna.

    INTEGRATED ANTENNA USING THROUGH SILICON VIAS
    153.
    发明申请

    公开(公告)号:US20200091597A1

    公开(公告)日:2020-03-19

    申请号:US16134315

    申请日:2018-09-18

    Inventor: Owen R. Fay

    Abstract: Systems and methods of manufacture are disclosed for semiconductor device assemblies having a front side metallurgy portion, a substrate layer adjacent to the front side metallurgy portion, a plurality of through-silicon-vias (TSVs) in the substrate layer, metallic conductors located within at least a portion of the plurality of TSVs, and at least one conductive connection circuitry between the metallic conductors and the front side metallurgy portion. The plurality of TSVs with metallic conductors located within are configured to form an antenna structure. Selectively breakable connective circuitry is used to form and/or tune the antenna structure.

    Semiconductor Device with Tunable Antenna Using Wire Bonds

    公开(公告)号:US20200076051A1

    公开(公告)日:2020-03-05

    申请号:US16118670

    申请日:2018-08-31

    Abstract: A semiconductor device, or semiconductor device package, that includes a substrate having an antenna structure on a surface of the substrate and a wire bond that electrically connects the antenna structure to the substrate to form an antenna or a first antenna configuration. The substrate may include a second antenna structure with the wire bond connected to the second antenna structure forming a second antenna or antenna configuration. The semiconductor device may include a radio communication device electrically connected to the substrate. The antenna or antenna configuration may be tuned to the requirements of the radio communication device. The antenna configuration may be tuned by connected to different antenna structures on the surface of the substrate. The antenna configuration may be tuned by changing a length of the wire bond, changing a diameter of the wire bond, and/or changing the material of the wire bond.

    Fabricated Two-Sided Millimeter Wave Antenna Using Through-Silicon-Vias

    公开(公告)号:US20200075512A1

    公开(公告)日:2020-03-05

    申请号:US16118723

    申请日:2018-08-31

    Abstract: A system may include a first semiconductor substrate having a first side and a second side opposite the first side. The system may further include multiple device layers positioned on the first side of the substrate. The system may also include a first portion of an antenna structure positioned within at least one of the multiple device layers. The system may include a second portion of the antenna structure positioned over the second side of the substrate. The system may further include a via passing through the substrate and electrically coupling the first portion of the antenna structure to the second portion of the antenna structure.

    Silicon interposer with fuse-selectable routing array

    公开(公告)号:US10580720B1

    公开(公告)日:2020-03-03

    申请号:US16166428

    申请日:2018-10-22

    Abstract: A silicon interposer that includes an array, or pattern, of conductive paths positioned within a silicon substrate with a plurality of pins on the exterior of the substrate. Each of the pins is connected to a portion of the array of conductive paths. The array of conductive paths is configurable to provide a first electrical flow path through the substrate via a portion of the array of conductive paths or a second electrical flow path through the substrate. The electrical flow path through the substrate may be customizable for testing various die or chip layout designs. The electrical flow path through the substrate may be customizable by laser ablation of portions of the conductive paths, breaking of fuses along the conductive paths, and/or the actuation of logic gates connected to the conductive paths.

    High Density, Tight Array Copper Pillar Interconnect Method and Package

    公开(公告)号:US20190172725A1

    公开(公告)日:2019-06-06

    申请号:US15830839

    申请日:2017-12-04

    Abstract: A semiconductor device assembly and method of forming a semiconductor device assembly that includes a first substrate, a second substrate disposed over the first substrate, at least one interconnect between the substrates, and at least one pillar extending from the bottom surface of the first substrate. The pillar is electrically connected to the interconnect and is located adjacent to a side of the first substrate. The pillar is formed by filling a via through the substrate with a conductive material. The first substrate may include an array of pillars extending from the bottom surface adjacent to a side of the substrate that are formed from a plurality of filled vias. The substrate may include a test pad located on the bottom surface or located on the top surface. The pillars may include a removable coating enabling the pillars to be probed without damaging the inner conductive portion of the pillar.

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