摘要:
Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.
摘要:
Compounds, pharmaceutical compositions and methods for treating viral and bacterial infections, by administering certain thiourea compounds, specifically acylthiourea, carboximidoylthiourea and S-alkyl isothiourea derivatives and analogs, in therapeutically effective amounts are disclosed.
摘要:
A system for determining whether a motor in an electrical submersible pump is backspinning is described herein. The system comprises a sensor mounted in a well bore proximate to a ground surface, the sensor outputting a backspin signal; a communication link connected to the sensor, the communications link communicating the backspin signal; and a controller receiving the backspin signal from the communications link and processing the backspin signal to determine whether the motor is backspinning. Computer readable instructions associated with the system perform the steps of: monitoring the signal to determine whether the signal is above a threshold, the threshold for determining whether the signal is a noise signal or a backspin signal, and outputting the backspin signal; impeding operable AC power to the motor, responsive to the backspin signal; monitoring the backspin signal to determine whether the backspin signal is below the threshold; and returning AC power to the motor responsive to the determination that the backspin signal is below the threshold.
摘要:
A method of generating a relief pattern comprises disposing a resist composition on a substrate to form a film, the resist composition comprising a first silsesquioxane polymer of the formula (1): a second silsesquioxane polymer of the formula (2): and a photosensitive acid generator; patternwise exposing the film by e-beam lithography; heating the exposed film to effect crosslinking of the first polymer and second polymer in the exposed area; and developing the exposed film to form a negative relief pattern.
摘要:
An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要:
Compositions, a method, and a photopatternable blend. The compositions include a blend of a first and a second polymer. The first polymer is a substituted silsesquioxane copolymer. The second polymer is a substituted silsesquioxane polymer. The second polymer is configured to undergo chemical crosslinking with the first polymer, the second polymer, or a combination thereof, upon exposure to light, thermal energy, or a combination thereof. The compositions include a photosensitive acid generator. The method includes forming a film. The film is patternwise imaged, and at least one region is exposed to radiation. After the imaging, the film is baked, wherein at least one exposed region is rendered substantially soluble. After the baking, the film is developed, wherein a relief pattern remains. The relief pattern is exposed to radiation. The relief pattern is baked. The relief pattern is cured. A chemically amplified positive-tone photopatternable blend is also described.
摘要:
A device for restraining the movement of a body lying over the top surface of a tiltable treatment table comprises a yoke spanning said top surface and being secured at both ends to an accessory-mounting rail running along the side of the table. The yoke includes a channel into which rides a shuttle. An angled support bracket has a vertical leg mounting a padded barrier, and a horizontal plate attached to the shuttle across a slot in the channel. The translation of the barrier, support bracket and shuttle along the channel, and the orientation of the barrier can be adjusted and locked in place by a single knobbed tightening screw. A neck support is secured over a median portion of the yoke. The device may be used by placing one or more of the padded barriers against the shoulders, hips, feet or the head of a patient lying in the Trendelenburg or other tilted position on an operating table in order to prevent gravity-induced shift of the body.
摘要:
A device and method can detect, and also break, an occurrence of gas lock in an electrical submersible pump assembly in a well bore based upon surface or downhole data without the need for operator intervention. To detect an occurrence of gas lock, an instantaneous value is monitored using a sensor. Then a controller compares the instantaneous value to a threshold value over a predetermined duration to thereby detect the occurrence of gas lock in the electrical submersible pump assembly. Sensors can include, for example, a differential pressure gauge, a pressure gage located in a pump stage located toward the inlet, a fluid temperature sensor located toward the discharge, a free gas detector located near the pump discharge, an electrical resistivity gage, a flow meter located within surface production tubing, and a vibration sensor attached to a tubing string to measure a vibration signature.
摘要:
Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.
摘要:
A method. The method includes dip coating a film of a composition on a silicon wafer substrate. The composition includes a polymer blend of a first polymer and a second polymer. The first polymer is a substituted silsesquioxane copolymer. The second polymer is a polysilsesquioxane having silanol end groups. The composition includes a photosensitive acid generator, an organic base, and an organic crosslinking agent. The film is patternwise imaged and at least one region is exposed to radiation having a wavelength of about 248 nanometers. The film is baked, resulting in inducing crosslinking in the film. The film is developed resulting in removal of base-soluble unexposed regions of the film, wherein a relief pattern from the film remains. The relief pattern is cured at a temperature between about 300° C. and about 450° C., and the curing utilizes a combination of thermal treatment with UV radiation.