公开(公告)号：US07950137B2

公开(公告)日：2011-05-31

申请号：US11766711

申请日：2007-06-21

申请人： Christian Rene Bonhote ,  Thomas Dudley Boon, Jr. ,  Ming Jiang ,  Jordan Asher Katine ,  Quang Le ,  Yinshi Liu ,  Xhavin Sinha ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Christian Rene Bonhote ,  Thomas Dudley Boon, Jr. ,  Ming Jiang ,  Jordan Asher Katine ,  Quang Le ,  Yinshi Liu ,  Xhavin Sinha ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/3166 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3169 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A method for manufacturing a write pole for perpendicular magnetic recording for accurately defining a side shield throat height and write pole flare point. The magnetic structure includes a write pole portion and first and second side shield portions. The side shields portions are magnetically connected with the write pole portion in a region in front of an intended air bearing surface plane (e.g. in the direction from which lapping will progress). The side shields portions are each separated from the write pole portion in a region behind the intended air bearing surface plane by notches that terminate at a desired location relative to the intended air bearing surface plane and which open up in a region behind the intended air bearing surface plane.

摘要翻译： 一种制造用于垂直磁记录的写磁极的方法，用于准确地限定侧屏蔽喉高度和写磁极点。 磁性结构包括写极部分和第一和第二侧面屏蔽部分。 侧屏蔽部分在预期的空气轴承表面（例如沿着研磨过程的方向）前面的区域中与写入极部分磁性连接。 侧面屏蔽部分分别与预期的空气支承面平面后面的区域中的写入磁极部分分开，该凹口终止于相对于预期的空气轴承表面平面的期望位置，并且在预期的空气轴承后面的区域中开口 表面。

公开(公告)号：US07881010B2

公开(公告)日：2011-02-01

申请号：US11956277

申请日：2007-12-13

申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Edward Hin Pong Lee ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Edward Hin Pong Lee ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： G11B5/187

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/315

摘要： A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.

摘要翻译： 一种用于制造具有定义二次闪光点的具有扩口步骤特征的写极的磁写头的方法。 该方法包括将磁性写入极材料沉积在衬底上，然后将磁性材料沉积在写入极材料上，随后是非磁性材料。 形成第一掩模，其具有前边缘以限定次级火炬点的位置，并且使用一个或多个材料去除过程来去除未被该第一掩模保护的磁性层和非磁性层的部分。 第一个掩模由配置为定义写入极的第二个掩模代替，并且执行离子铣削来定义写入极点。 从磁性层和非磁性层的阴影形成扩张的次级耀斑点。

公开(公告)号：US20100163522A1

公开(公告)日：2010-07-01

申请号：US12345804

申请日：2008-12-30

申请人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： B44C1/22 ,  B05D5/12

CPC分类号： G11B5/3163 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/315

摘要： A method for manufacturing a magnetic write head. The write head is constructed by a method that includes depositing a magnetic write pole material and then depositing a hard mask over the magnetic material. An inorganic image transfer layer is formed over the hard mask. SiC, alumina, SiO2, SiN, Ta or TaOx. This image transfer is physically robust, so that it does not bend or tip over during manufacture. The image of a patterned photoresist layer can be transferred onto the underlying image transfer layer, and an ion milling can be performed to pattern the image of the image transfer layer onto the underlying hard mask and magnetic material, thereby forming a magnetic write pole.

摘要翻译： 一种用于制造磁写头的方法。 写头由包括沉积磁性写入磁极材料然后在磁性材料上沉积硬掩模的方法构成。 在硬掩模上形成无机图像转印层。 SiC，氧化铝，SiO2，SiN，Ta或TaOx。 这种图像传输是物理上坚固的，因此它在制造过程中不会弯曲或翻倒。 图案化的光致抗蚀剂层的图像可以转移到下面的图像转印层上，并且可以执行离子研磨以将图像转印层的图像图案化到下面的硬掩模和磁性材料上，从而形成磁性写入极。

公开(公告)号：US20100155364A1

公开(公告)日：2010-06-24

申请号：US12343726

申请日：2008-12-24

申请人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： B44C1/22

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3163

摘要： A method for manufacturing a magnetic write head having a write pole a tapered trailing edge and a trailing, wrap-around magnetic shield with a slanted bump structure that steps away from the magnetic write pole. The method involves first forming a write pole and non-magnetic side gap layers, and then depositing a non-magnetic RIEable material. A mask is formed on the RIEable material and a reactive ion etching (RIE) is performed to form the RIEable material layer into a nonmagnetic bump with a tapered front edge.

摘要翻译： 一种用于制造具有锥形后缘的写入极和具有偏离磁性写入极的倾斜凸起结构的后部缠绕磁屏蔽的磁性写入头的方法。 该方法包括首先形成写磁极和非磁性侧隙层，然后沉积非磁性RIEable材料。 在RIEable材料上形成掩模，并执行反应离子蚀刻（RIE）以将RIEable材料层形成为具有锥形前边缘的非磁性凸块。

公开(公告)号：US07588884B2

公开(公告)日：2009-09-15

申请号：US10857151

申请日：2004-05-28

申请人： Amanda Baer ,  Nian-Xiang Sun ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Amanda Baer ,  Nian-Xiang Sun ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： G03F1/00

CPC分类号： G03F9/7084 ,  G03F9/7076 ,  G03F9/708

摘要： A method of enhancing alignment marks defined in a relatively thin layer on a wafer by etching the alignment marks into an underlying alignment mark transfer layer is described. The target area for the alignment marks is prepared by depositing material for the transfer layer. In alternative embodiments an oversized trench is formed in the target area prior to the deposition of the transfer layer. The alignment marks can fabricated in the layer(s) deposited by the existing process or alternatively, the original layers can be removed and replaced with a layer of material selected to have comparable etching properties (definition layer).

摘要翻译： 描述了通过将对准标记蚀刻到下面的对准标记转印层中来增强在晶片上相对薄的层中限定的对准标记的方法。 通过沉积用于转印层的材料来制备对准标记的目标区域。 在替代实施例中，在沉积转移层之前，在目标区域中形成尺寸过大的沟槽。 对准标记可以在通过现有工艺沉积的层中制造，或者替代地，原始层可被移除并被选择为具有相当的蚀刻性质（定义层）的材料层替代。

公开(公告)号：US20090152235A1

公开(公告)日：2009-06-18

申请号：US11956292

申请日：2007-12-13

申请人： Wen-Chien David Hsiao ,  Hieu Lam ,  Vladimir Nikitin ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Wen-Chien David Hsiao ,  Hieu Lam ,  Vladimir Nikitin ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： B44C1/22

CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3166 ,  G11B5/3169

摘要： A method for manufacturing a magnetic write head having a stepped trailing shield. The stepped trailing shield is formed by forming a non-magnetic bump over a write pole prior to electroplating a wrap-around magnetic shield. The method allows the location of the front edge of the bump relative to the back edge of the wrap-around shield to be monitored by measuring the electrical resistance of an electrical lapping guide formed concurrently with these features. This concurrent formation of a lapping guide can be used to define the relative location of other features as well, such as the location of a back edge of a wrap-around shield relative to a flare point of a write pole.

摘要翻译： 一种用于制造具有阶梯式后挡板的磁写头的方法。 在电镀环绕磁屏蔽之前，通过在写入极上形成非磁性凸块来形成阶梯式后屏蔽。 该方法允许通过测量与这些特征同时形成的电研磨引导件的电阻来监测凸块的前边缘相对于环绕护罩的后边缘的位置。 研磨引导件的这种同时形成也可以用于限定其它特征的相对位置，例如环绕屏蔽件的后边缘相对于写入极点的扩张点的位置。

公开(公告)号：US20090128964A1

公开(公告)日：2009-05-21

申请号：US11944125

申请日：2007-11-21

申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Changqing Shi ,  Sue Siyang Zhang

发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Changqing Shi ,  Sue Siyang Zhang

IPC分类号： G11B5/127

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49798

摘要： A method for manufacturing a magnetic write head having a wrap around magnetic shield. The method allows a highly accurate short wavelength such as 193 mm photolithography to be used to accurately define the placement and critical dimension of wrap around magnetic shield. The method includes the formation of a magnetic write pole, top gap, and side gap and the deposition of a RIEable fill layer thereover, and CMP to planarization. A 193 nm photolithography and ion milling is used to form a mask over the RIEable layer and one or more reactive ion etching processes are performed to pattern the RIEable layer through 193 nm photolithography mask. A wrap around shield can then be electroplated into the opening formed in the RIEable layer.

摘要翻译： 一种用于制造具有围绕磁屏蔽的磁性写入头的方法。 该方法允许使用高精度的短波长（例如193mm光刻）来精确地定义磁屏蔽环绕的放置和临界尺寸。 该方法包括形成磁性写入极，顶部间隙和侧面间隙以及在其上沉积RIEable填充层，并将CMP平坦化。 使用193nm光刻和离子研磨在RIEable层上形成掩模，并且执行一个或多个反应离子蚀刻工艺以通过193nm光刻掩模对RIEable层进行图案化。 然后可以将环绕的护罩电镀到形成在RIEable层中的开口中。

公开(公告)号：US07469467B2

公开(公告)日：2008-12-30

申请号：US11195532

申请日：2005-08-01

申请人： Yunxiao Gao ,  Hung-Chin Guthrie ,  Ming Jiang ,  Sue Siyang Zhang

发明人： Yunxiao Gao ,  Hung-Chin Guthrie ,  Ming Jiang ,  Sue Siyang Zhang

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/1871 ,  G11B5/1278 ,  G11B5/3163 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A perpendicular write head includes a main pole comprising a Durimide/Alumina hard mask formed over a laminate layer process to form the main pole without using a liftoff or chemical mechanical polishing process, thereby avoiding rounding corners of the pole, the main pole being controlled in shape for improved control of critical dimension of track width and angle of the bevel to avoid undesirable adjacent track writing.

摘要翻译： 垂直写头包括主极，其包括形成在层压层工艺上的Durimide /氧化铝硬掩模，以形成主极，而不使用剥离或化学机械抛光工艺，从而避免极的圆角，主极被控制在 形状，用于改善斜面的轨道宽度和角度的临界尺寸的控制，以避免不期望的相邻轨道写入。

公开(公告)号：US07441325B2

公开(公告)日：2008-10-28

申请号：US11195222

申请日：2005-08-01

申请人： Yunxiao Gao ,  Hung-Chin Guthrie ,  Ming Jiang ,  Sue Siyang Zhang

发明人： Yunxiao Gao ,  Hung-Chin Guthrie ,  Ming Jiang ,  Sue Siyang Zhang

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/1871 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3163 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A perpendicular write head including a main pole and a trailing shield, the main pole being made of a diamond-like carbon (DLC) layer as hard mask and a rhodium (Rh) layer as shield gap, both DLC and Rh layers being CMP stop layers so as to avoid corner rounding and damage from chemical mechanical planarization (CMP) process, the DLC layer being removed by reactive ion etching (RIE) to create a trench, the trailing shield being deposited into the trench for self alignment.

摘要翻译： 包括主极和后屏蔽的垂直写头，主极由金刚石碳（DLC）层作为硬掩模和铑（Rh）层作为屏蔽间隙，DLC和Rh层都是CMP停止 层，以避免由化学机械平面化（CMP）工艺引起的角落圆角和损伤，通过反应离子蚀刻（RIE）去除DLC层以产生沟槽，后屏蔽层沉积到沟槽中用于自对准。

公开(公告)号：US07110217B2

公开(公告)日：2006-09-19

申请号：US10687284

申请日：2003-10-15

申请人： Edward Hin Pong Lee ,  Katalin Pentek ,  Yong Shen ,  Sue Siyang Zhang

发明人： Edward Hin Pong Lee ,  Katalin Pentek ,  Yong Shen ,  Sue Siyang Zhang

IPC分类号： G11B5/147

CPC分类号： G11B5/60 ,  G11B5/127 ,  G11B5/147

摘要： A magnetic head having an air bearing surface (ABS) and a first pole tip. A second pole tip is spaced apart from and facing the upper end of the first pole tip across a write gap. A bump extends into a portion of the upper end of the first pole tip and a portion of the bottom end of the second pole tip, the bump being positioned away from the ABS. The bump defines a throat height of the first and second pole tips.

摘要翻译： 具有空气轴承表面（ABS）和第一极端的磁头。 第二极尖与间隙隔开并面对第一极尖的上端。 凸块延伸到第一极尖端的上端的一部分和第二极尖的底端的一部分，凸块被定位成远离ABS。 凸块限定第一和第二极尖的喉部高度。