公开(公告)号：US20050062073A1

公开(公告)日：2005-03-24

申请号：US10978440

申请日：2004-11-02

Applicant: Tetsuo Takahashi ,  Katsumi Nakamura ,  Tadaharu Minato ,  Masana Harada

Inventor： Tetsuo Takahashi ,  Katsumi Nakamura ,  Tadaharu Minato ,  Masana Harada

IPC: H01L21/331 ,  H01L29/06 ,  H01L29/423 ,  H01L29/739 ,  H01L29/74 ,  H01L29/76 ,  H01L29/768 ,  H01L29/861 ,  H01L29/868 ,  H01L31/111

CPC classification number: H01L29/7397 ,  H01L29/0692 ,  H01L29/0696 ,  H01L29/66348 ,  H01L29/66356 ,  H01L29/7391 ,  H01L29/7455 ,  H01L29/749 ,  H01L29/861 ,  H01L29/868

Abstract: A pin diode is formed by a p+ collector region, an n type buffer region, an n− region and an n+ cathode region. A trench is formed from the surface of n+ cathode region through n+ cathode region to reach n− region. An insulating film is formed along an inner wall surface of trench. A gate electrode layer is formed to oppose to the sidewall of n+ cathode region with insulating film interposed. A cathode electrode is formed to be electrically connected to n+ cathode region. An anode electrode is formed to be electrically connected to p+ collector region. The n+ cathode region is formed entirely over the surface between trenches extending parallel to each other. Thus, a power semiconductor device in which gate control circuit is simplified and which has good on property can be obtained.

Abstract translation: pin二极管由p +集电极区，n型缓冲区，n +区和n +阴极区形成。 从n + +阴极区域通过n + +阴极区域的表面形成沟槽，到达n +区域。 绝缘膜沿沟槽的内壁表面形成。 形成与绝缘膜插入的n +阴极区域的侧壁相对的栅极电极层。 阴极电极形成为与n +阴极区域电连接。 阳极电极形成为与p +集电极区域电连接。 n + +阴极区域完全形成在彼此平行延伸的沟槽之间的表面上。 因此，可以获得其中简化了栅极控制电路并且具有良好的性能的功率半导体器件。

公开(公告)号：US06665049B1

公开(公告)日：2003-12-16

申请号：US09807064

申请日：2001-04-09

Applicant: Tetsuo Takahashi

Inventor： Tetsuo Takahashi

IPC: G03B2742

CPC classification number: G03F1/62 ,  G03F7/70258 ,  G03F7/70308 ,  G03F7/70591 ,  G03F7/70983

Abstract: The present invention is to provide a photomask which has a sufficient durability to short-wavelength exposure beams, too, and also can prevent any foreign matter from adhering to patterns for transfer. In a photomask on which a transfer pattern to be transferred to an exposure-target substrate 19 is formed and through which a stated exposure beam applied to a pattern surface 1P where the transfer pattern is formed is guided to a projection optical system PL for forming an image of the pattern, the photomask comprises a transmitting plate 3 disposed apart from the pattern surface by a stated interval d0 and having a stated thickness h and a transmission to the exposure beam, and the transmitting plate is substantially square and fulfills a stated condition.

Abstract translation: 本发明还提供一种对短波长曝光光束具有足够的耐久性的光掩模，并且还可以防止任何异物粘附到转印图案上。 在其上形成要转印到曝光目标基板19的转印图案的光掩模中，并且将施加到形成转印图案的图案表面1P的所述曝光光束引导到投影光学系统PL，以形成 图案的图案，光掩模包括透射板3，透射板3与图案表面隔开规定的间隔d0并具有规定的厚度h和透射到曝光光束，并且透射板基本上是正方形并且满足所述条件。

公开(公告)号：US06642994B2

公开(公告)日：2003-11-04

申请号：US09870718

申请日：2001-06-01

Applicant: Takashi Mori ,  Tetsuo Takahashi ,  Hiroshi Nakamura ,  Yuji Kudo ,  Taro Ogata

Inventor： Takashi Mori ,  Tetsuo Takahashi ,  Hiroshi Nakamura ,  Yuji Kudo ,  Taro Ogata

IPC: G03B2742

CPC classification number: G03F7/70075 ,  G03F7/2022 ,  G03F7/70091 ,  G03F7/70858 ,  G03F7/70925

Abstract: Optical exposure apparatus and methods of using same, for patterning a workpiece and photo-cleaning the optical components in the apparatus, which can be contaminated by moisture and organic compounds in the atmosphere. The apparatus comprises an illumination optical system having a light source and one or more optical components, and a projection lens having an object plane and an image plane and one or more optical components. The optical exposure apparatus includes an exposure optical path or an exposure light beam through a predetermined space in the optical exposure system. An optical path deflection member for deflecting light is introduced into the exposure optical path so as to create a second optical path that differs from the exposure optical path. Also disclosed is a method of photo-cleaning the aforementioned optical components, including the steps of forming an exposure optical path and then changing this path to create a second optical path that differs from the exposure optical path. An additional method of photo-cleaning a projection lens is disclosed, including the steps of providing an illumination light beam along an optical axis, providing and inserting a photo-cleaning optical member having refractive power into the beam, and refracting the beam so as to illuminate the lens surfaces comprising the projection lens.

Abstract translation: 光学曝光装置及其使用方法，用于图案化工件并对设备中的光学部件进行光洁化，其可被大气中的水分和有机化合物污染。 该装置包括具有光源和一个或多个光学部件的照明光学系统以及具有物平面和图像平面以及一个或多个光学部件的投影透镜。 光学曝光装置包括通过光学曝光系统中的预定空间的曝光光路或曝光光束。 用于偏转光的光路偏转构件被引入到曝光光路中，以便产生与曝光光路不同的第二光路。 还公开了一种对上述光学部件进行光洁化的方法，包括以下步骤：形成曝光光路，然后改变该光路以产生不同于曝光光路的第二光路。 公开了一种附加的照片清洁投影透镜的方法，包括以下步骤：沿着光轴提供照明光束，提供并将具有屈光力的光清洁光学构件插入到光束中，并折射光束，以便 照亮包括投影透镜的透镜表面。

公开(公告)号：US06583856B1

公开(公告)日：2003-06-24

申请号：US09656030

申请日：2000-09-06

Applicant: Tetsuo Takahashi

Inventor： Tetsuo Takahashi

IPC: G03B2742

CPC classification number: G03F7/70225 ,  G03F7/70258 ,  G03F7/709 ,  G03F9/70

Abstract: Alignment is carried out between a mask and a wafer even during exposure as occasion demands, according to the movement of a pattern image caused by the positional fluctuation of a reflecting member. An exposure apparatus includes detection systems (13) and (14) for detecting the fluctuation amounts of reflecting members (M1) and (M2) from a reference position, and an arithmetic system (15) adapted to compute an amount of correction based on the detected fluctuation amounts, the amount of correction regarding at least one of the mask and the photosensitive substrate (4), and being necessary for substantial alignment between the pattern image formed in a moved state from a reference image-forming position and the photosensitive substrate (4). Based on the computed amount of correction, at least one of the mask and the photosensitive substrate is moved.

Abstract translation: 根据由反射构件的位置波动引起的图案图像的移动，即使在曝光期间也在掩模和晶片之间进行对准。 曝光装置包括用于检测来自参考位置的反射部件（M1）和（M2）的波动量的检测系统（13）和（14），以及适于基于所述检测系统计算校正量的算术系​​统（15） 检测到的波动量，关于掩模和感光基板（4）中的至少一个的校正量，并且对于从参考图像形成位置移动状态形成的图案图像与感光基板之间的基本对准是必要的（ 4）。 基于计算出的校正量，移动掩模和感光基片中的至少一个。

公开(公告)号：US06563567B1

公开(公告)日：2003-05-13

申请号：US09540874

申请日：2000-03-31

Applicant: Hideki Komatsuda ,  Osamu Tanitsu ,  Akihiko Goto ,  Nobumichi Kanayamaya ,  Masato Shibuya ,  Tetsuo Takahashi

Inventor： Hideki Komatsuda ,  Osamu Tanitsu ,  Akihiko Goto ,  Nobumichi Kanayamaya ,  Masato Shibuya ,  Tetsuo Takahashi

IPC: G03B2772

CPC classification number: G03F7/70075 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70158 ,  G03F7/70183 ,  G03F7/7025

Abstract: A method and illumination optical system forms a modified illumination configuration on an optical integrator so that a secondary light source having a desired modified illumination configuration is formed and light loss is minimized. A light beam shape changing element that diffuses illumination in a plurality of directions, and an angular light beam forming element that forms a plurality of light source images operate together to create a modified illumination configuration on the optical integrator. Since the secondary light source has a desired modified illumination configuration, an aperture stop used to restrict the size and/or shape of the secondary light source blocks only a small amount of illumination, or can be eliminated altogether. It is possible to alter the annular ratio and outer diameter of an annular or quadrupole modified illumination configuration by changing the magnification of a zoom optical system positioned between the light beam shape changing element and the angular light beam forming element. Furthermore, by changing the focal length of a zoom optical system (which is positioned upstream of the optical integrator), it is possible to change the outer diameter of the annular or quadrupole secondary light source without changing the annular ratio thereof.

公开(公告)号：US06268904B1

公开(公告)日：2001-07-31

申请号：US09195880

申请日：1998-11-19

Applicant: Takashi Mori ,  Tetsuo Takahashi ,  Hiroshi Nakamura ,  Yuji Kudo ,  Taro Ogata

Inventor： Takashi Mori ,  Tetsuo Takahashi ,  Hiroshi Nakamura ,  Yuji Kudo ,  Taro Ogata

IPC: G03B2742

CPC classification number: G03F7/70075 ,  G03F7/2022 ,  G03F7/70091 ,  G03F7/70858 ,  G03F7/70925

Abstract: Optical exposure apparatus and methods of using same, for patterning a workpiece and photo-cleaning the optical components in the apparatus, which can be contaminated by moisture and organic compounds in the atmosphere. The apparatus comprises an illumination optical system having a light source and one or more optical components, and a projection lens having an object plane and an image plane and one or more optical components. The optical exposure apparatus includes an exposure optical path or an exposure light beam through a predetermined space in the optical exposure system. An optical path deflection member for deflecting light is introduced into the exposure optical path so as to create a second optical path that differs from the exposure optical path. Also disclosed is a method of photo-cleaning the aforementioned optical components, including the steps of forming an exposure optical path and then changing this path to create a second optical path that differs from the exposure optical path. An additional method of photo-cleaning a projection lens is disclosed, including the steps of providing an illumination light beam along an optical axis, providing and inserting a photo-cleaning optical member having refractive power into the beam, and refracting the beam so as to illuminate the lens surfaces comprising the projection lens.

公开(公告)号：USD428338S

公开(公告)日：2000-07-18

申请号：US107732

申请日：1999-07-14

Applicant: Takao Iizuka ,  Tetsuo Takahashi ,  Raymond A. Bourque ,  Ralph T. Coley, Jr.

Designer： Takao Iizuka ,  Tetsuo Takahashi ,  Raymond A. Bourque ,  Ralph T. Coley, Jr.

公开(公告)号：US5969802A

公开(公告)日：1999-10-19

申请号：US88140

申请日：1998-06-01

Applicant: Tetsuo Takahashi ,  Shigeo Mizoroke ,  Yasuhiro Omura

Inventor： Tetsuo Takahashi ,  Shigeo Mizoroke ,  Yasuhiro Omura

IPC: G02B17/08 ,  G03F7/20 ,  H01L21/027 ,  H05K3/00 ,  G03B27/54 ,  G03B27/42 ,  G03B9/60

CPC classification number: G02B17/0892 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70858

Abstract: An exposure apparatus for transferring a pattern on a mask (M) onto a photosensitive substrate (W) via a projection-optical system can reduce gas fluctuation even if the length of the optical path through gas is relatively long, and even if the diameter of light flux through the gas is relatively large.The projection-optical system satisfies the condition ##EQU1## where .lambda. is a wavelength of exposure light used in the apparatus, .SIGMA.i is a summary of gas sections i in an optical path from the mask to the photosensitive substrate, Li is a length of a gas section i along the optical axis, in m, and Ri is an average of a mask-side diameter and a substrate-side diameter of a light flux in each gas section, the light flux emerging from a maximum image height and advancing within meridional plane, wherein at least one gas section i is filled with helium or neon.

Abstract translation: 用于通过投影光学系统将掩模（M）上的图案转印到感光基板（W）上的曝光装置即使通过气体的光路的长度相对较长也能够减小气体波动，并且即使直径 通过气体的光通量比较大。 投影光学系统满足λ是装置中使用的曝光光的波长的条件，SIGMA i是从掩模到感光基板的光路中的气体部分i的总结，Li是气体截面的长度 i沿着光轴，以m为单位，Ri是每个气体部分中的光通量的掩模侧直径和基板侧直径的平均值，从最大图像高度出现并在子午面内前进的光通量， 其中至少一个气体部分i填充有氦或氖。

公开(公告)号：US5368193A

公开(公告)日：1994-11-29

申请号：US993734

申请日：1992-12-17

Applicant: Tetsuo Takahashi ,  Shinichi Araya ,  Kuniaki Takahashi ,  Kunio Mogi ,  Koji Kudo ,  Takeshi Ito ,  Hiroshi Ikeda

Inventor： Tetsuo Takahashi ,  Shinichi Araya ,  Kuniaki Takahashi ,  Kunio Mogi ,  Koji Kudo ,  Takeshi Ito ,  Hiroshi Ikeda

IPC: H05K13/00 ,  H05K13/04 ,  B65G59/00

CPC classification number: H05K13/0434 ,  H05K13/0084 ,  Y10T29/53261

Abstract: Electronic component packaging case comprising a substantially plate-like body having a substantially spiral passageway formed in its interior, a linear passageway formed therein as a continuation of an outermost circular portion of the sapiral passageway, an outlet formed therein as a continuation of the linear passageway to communicate with the exterior of the body, a plurality of electronic components received in a row in the spiral passageway, and a plurality of air-intakes for facilitating forwarding of the electronic components along the spiral passageway to the outlet, the air-intakes being formed in the casing body in a manner to communicate between respective circular portions of the spiral passageway and the exterior of the casing body, the case being adapted to be supported on a base of an electronic component supply mechanism with the body standing on the base when the case is used as an electronic component supply source, the outlet being formed at a portion of the casing body which is located at an upper position when the case is supported on the base, the outlet being faced upward, above which outlet the mounting head is adapted to wait. Also, an electronic component supply mechanism for and a method of supplying electronic components to the mounting head by using the packaging case are disclosed.

Abstract translation: 电子部件包装盒包括基本上为板状的主体，该主体具有形成在其内部的基本螺旋形通道，形成在其中的线性通道，作为所述黑色通道的最外圆形部分的延续部，其中形成为所述直线通道 与身体的外部连通，在螺旋通道中一排地容纳的多个电子部件，以及用于促进电子部件沿着螺旋通道转移到出口的多个进气口，进气口为 在壳体内以螺旋形通道的各圆形部分和壳体外部连通的方式形成在壳体内，该壳体适于支撑在电子部件供应机构的基座上，其身体站在基座上， 该壳体用作电子部件供应源，该出口形成在壳体的一部分 当壳体被支撑在基座上时位于上部位置的主体，出口面向上方，安装头的出口适于在其上方等待。 此外，公开了一种电子部件供给机构，以及通过使用包装盒向安装头供给电子部件的方法。

公开(公告)号：US5052291A

公开(公告)日：1991-10-01

申请号：US424607

申请日：1989-10-20

Applicant: Tetsuo Takahashi ,  Akio Sasaki ,  Kunio Mogi ,  Hajime Shimazaki ,  Masakazu Hasegawa

Inventor： Tetsuo Takahashi ,  Akio Sasaki ,  Kunio Mogi ,  Hajime Shimazaki ,  Masakazu Hasegawa

IPC: B41F15/08 ,  B41M1/12 ,  H05K1/02 ,  H05K3/12

CPC classification number: H05K3/1233 ,  B41F15/0818 ,  B41M1/12 ,  B41P2215/14 ,  H05K1/0269 ,  H05K2201/09918 ,  H05K2203/0139 ,  H05K2203/163 ,  H05K2203/167

Abstract: A screen printing method includes the steps of moving a doctor plate across a printing screen to apply a paste thereon and then moving a squeegee across the screen to deposit a paste on an object below the screen while maintaining a predetermined pressure of the screen against the object to produce a substantially even deposition of the paste. The method also can include varying the squeegee pressure as the screen tension varies to maintain the predetermined printing pressure and using a screen aligning mark on an imaging plane to correct the positional relationship between the screen and the object.