公开(公告)号：US06929902B2

公开(公告)日：2005-08-16

申请号：US10370441

申请日：2003-02-20

Applicant: Yuan-Hsun Wu ,  Teng-Yen Huang ,  Wen-Bin Wu ,  Yi-Nan Chen

Inventor： Yuan-Hsun Wu ,  Teng-Yen Huang ,  Wen-Bin Wu ,  Yi-Nan Chen

IPC: G03F7/42 ,  H01L21/027 ,  H01L21/311 ,  G03F7/36

CPC classification number: G03F7/427 ,  H01L21/0276 ,  H01L21/31138

Abstract: A method of preventing repeated collapse in a reworked photoresist layer. First, oxygen-containing plasma is applied to remove a collapsed photoresist. Because the plasma containing oxygen reacts with a bottom anti-reflect layer comprising SiOxNy, some acids are produced on the bottom anti-reflect layer, resulting in undercutting in a subsequently reworked photoresist. Next, an alkaline solution treatment is performed on the anti-reflect layer after the collapsed photoresist layer is removed. Finally, the reworked photoresist with is formed on the anti-reflect layer, without undercutting.

Abstract translation: 防止再加工的光致抗蚀剂层中的重复塌陷的方法。 首先，施加含氧等离子体以除去塌陷的光致抗蚀剂。 因为含有氧的等离子体与包含SiO x N y Y y的底部防反射层反应，所以在底部防反射层上产生一些酸，导致在 随后再加工光致抗蚀剂。 接下来，在去除塌陷的光致抗蚀剂层之后，在抗反射层上进行碱性溶液处理。 最后，在反射层上形成返工光致抗蚀剂，而没有底切。

公开(公告)号：US06742367B2

公开(公告)日：2004-06-01

申请号：US10222885

申请日：2002-08-19

Applicant: Wen bin Wu

Inventor： Wen bin Wu

IPC: B60R2502

CPC classification number: E05B13/101 ,  Y10T70/5416 ,  Y10T70/5827 ,  Y10T70/5832 ,  Y10T292/57

Abstract: A lock. The lock includes an inner handle assembly, a latch bolt, and an outer handle assembly. The outer handle assembly includes an outer handle, an outer spindle, an actuating sleeve rotatably mounted in the outer spindle and having two guide slots each having an inclined section and a horizontal section, a locking plate mounted in the actuating sleeve and including two wings, and an unlatching member operably connected to the latch bolt. Each wing is extended through an associated guide slot into an associated positioning slot in the outer spindle. When the lock is in an unlocked state, the unlatching member is engaged with the locking plate to allow joint rotation. When the lock is in a locked state, the unlatching member is disengaged from the unlatching member such that the unlatching member is not turned when the outer handle is turned.

Abstract translation: 一个锁 该锁包括内部把手组件，闩锁螺栓和外部手柄组件。 外手柄组件包括外手柄，外心轴，可旋转地安装在外心轴中的致动套筒，具有分别具有倾斜部分和水平部分的两个引导槽，安装在致动套筒中并包括两个翼部的锁定板， 以及可操作地连接到所述闩锁螺栓的解锁构件。 每个机翼通过相关联的引导槽延伸到外主轴中的相关联的定位槽中。 当锁处于解锁状态时，解锁构件与锁定板接合以允许接合旋转。 当锁处于锁定状态时，解锁构件与解锁构件脱离接合，使得解锁构件在外手柄转动时不转动。

公开(公告)号：US07915133B2

公开(公告)日：2011-03-29

申请号：US11953481

申请日：2007-12-10

Applicant: Kuo-Yao Cho ,  Wen-Bin Wu ,  Chiang-Lin Shih ,  Jen-Jui Huang

Inventor： Kuo-Yao Cho ,  Wen-Bin Wu ,  Chiang-Lin Shih ,  Jen-Jui Huang

IPC: H01L21/20

CPC classification number: H01L29/945 ,  H01L29/66181

Abstract: A method of forming a ring-type capacitor is provided. The method includes providing a substrate; forming a patterned mask layer on the substrate, the patterned mask layer defining a ring pattern; removing the substrate by using the patterned mask layer as a mask to form a ring-type trench in the substrate; the ring-type trench including an inner wall and an outer wall; and forming a capacitor structure on the inner wall and the outer wall of the ring-type trench.

Abstract translation: 提供一种形成环型电容器的方法。 该方法包括提供基板; 在所述衬底上形成图案化掩模层，所述图案化掩模层限定环形图案; 通过使用图案化掩模层作为掩模去除衬底，以在衬底中形成环型沟槽; 所述环形沟槽包括内壁和外壁; 并在环形沟槽的内壁和外壁上形成电容器结构。

公开(公告)号：US07480892B2

公开(公告)日：2009-01-20

申请号：US11513196

申请日：2006-08-31

Applicant: Chui-fu Chiu ,  Wen-Bin Wu

Inventor： Chui-fu Chiu ,  Wen-Bin Wu

IPC: G06F17/50

CPC classification number: G03F9/7076 ,  G03F1/42 ,  G03F7/70633 ,  G03F7/70683

Abstract: An overlay mark formed on a photomask, comprising a first rectangular region, a second rectangular region, a third rectangular region, and a fourth rectangular region, each rectangular region having the same pattern configuration, a longer side of the first rectangular region and a longer side of the third rectangular region being parallel to each other, and the first and third rectangular regions have the same first pattern configuration having a first pattern element, a longer side of the second rectangular region and a longer side of the fourth rectangular region being parallel to each other, and the second and fourth rectangular regions have the same second pattern configuration having a second pattern element, the longer side of the first rectangular region being perpendicular to the longer side of the second rectangular region; wherein, the first pattern element is different from the second pattern element for allowing the second pattern configuration be chosen to align when the first pattern configuration on the substrate was damaged during process.

Abstract translation: 形成在光掩模上的覆盖标记，包括第一矩形区域，第二矩形区域，第三矩形区域和第四矩形区域，每个矩形区域具有相同的图案构造，第一矩形区域的长边和较长的 所述第一矩形区域和所述第三矩形区域具有相同的第一图案构造，所述第一图案构造具有第一图案元素，所述第二矩形区域的长边和所述第四矩形区域的长边平行 并且第二和第四矩形区域具有相同的具有第二图案元素的第二图案构造，第一矩形区域的长边与第二矩形区域的长边垂直; 其中，所述第一图案元件与所述第二图案元件不同，用于当所述基板上的所述第一图案配置在处理期间被损坏时，所述第二图案构造被选择为对齐。

公开(公告)号：US20080286934A1

公开(公告)日：2008-11-20

申请号：US11953481

申请日：2007-12-10

Applicant: Kuo-Yao CHO ,  Wen-Bin WU ,  Chiang-Lin SHIH ,  Jen-Jui HUANG

Inventor： Kuo-Yao CHO ,  Wen-Bin WU ,  Chiang-Lin SHIH ,  Jen-Jui HUANG

IPC: H01L21/02

CPC classification number: H01L29/945 ,  H01L29/66181

Abstract: A method of forming a ring-type capacitor is provided. The method includes providing a substrate; forming a patterned mask layer on the substrate, the patterned mask layer defining a ring pattern; removing the substrate by using the patterned mask layer as a mask to form a ring-type trench in the substrate; the ring-type trench including an inner wall and an outer wall; and forming a capacitor structure on the inner wall and the outer wall of the ring-type trench.

Abstract translation: 提供一种形成环型电容器的方法。 该方法包括提供基板; 在所述衬底上形成图案化掩模层，所述图案化掩模层限定环形图案; 通过使用图案化掩模层作为掩模去除衬底，以在衬底中形成环型沟槽; 所述环形沟槽包括内壁和外壁; 并在环形沟槽的内壁和外壁上形成电容器结构。

公开(公告)号：US06987053B2

公开(公告)日：2006-01-17

申请号：US10792345

申请日：2004-03-03

Applicant: Wen-Bin Wu ,  Chih-Yuan Hsiao ,  Hui-Min Mao

Inventor： Wen-Bin Wu ,  Chih-Yuan Hsiao ,  Hui-Min Mao

IPC: H01L21/76

CPC classification number: G03F9/7019 ,  G03F7/70633 ,  G03F9/7011

Abstract: A method for evaluating reticle registration between two reticle patterns. A wafer is defined and etched to form a first exposure pattern, by photolithography with a first reticle having a first reticle pattern thereon. A photoresist layer is formed over the wafer and defined as a second exposure pattern, by photolithography with a second reticle having a second reticle pattern thereon. A deviation value between the first and second exposure patterns is measured by a CD-SEM. The deviation value is calibrated according to the scaling degree and the overlay offset to obtain a registration data. The reticle registration between the two reticle patterns is evaluated based on the registration data.

Abstract translation: 一种用于评估两个掩模版图案之间的掩模版配准的方法。 通过用其上具有第一掩模版图案的第一掩模版通过光刻来限定和蚀刻晶片以形成第一曝光图案。 在晶片上形成光致抗蚀剂层，并通过光刻法将其定义为第二曝光图案，其上具有第二掩模版图案的第二掩模版。 通过CD-SEM测量第一和第二曝光图案之间的偏差值。 根据缩放程度和覆盖偏移校正偏差值，以获得注册数据。 基于登记数据评价两个掩模图案之间的掩模版登记。

公开(公告)号：US06536249B2

公开(公告)日：2003-03-25

申请号：US10134527

申请日：2002-04-30

Applicant: Wen-Bin Wu

Inventor： Wen-Bin Wu

IPC: E05B1310

CPC classification number: E05B13/108 ,  E05B2063/207 ,  Y10T70/5394 ,  Y10T70/5504 ,  Y10T70/5792 ,  Y10T70/5832

Abstract: A lock device that may be locked automatically includes a base fixed on a door plate. An actuating tube received in the hole of the base is provided with a locking member combined with a handle. The lock core unit has a lock core that may drive an actuating plate to rotate. The drive wheel has a drive slot for insertion of the actuating plate, so that the drive wheel and the actuating plate may be rotated simultaneously. An elastic member has two stop ends rested on the leg of the restoring wheel, and rested on the two sides of the ear plate of the locking plate. The drive plate has a first end inserted into an unlocking rotation knob of the other side of the door plate, and a second end inserted into the drive slot of the drive wheel.

公开(公告)号：US07723181B2

公开(公告)日：2010-05-25

申请号：US11616849

申请日：2006-12-27

Applicant: An-Hsiung Liu ,  Chiang-Lin Shih ,  Wen-Bin Wu ,  Hui-Min Mao ,  Lin-Chin Su ,  Pei-Ing Lee

Inventor： An-Hsiung Liu ,  Chiang-Lin Shih ,  Wen-Bin Wu ,  Hui-Min Mao ,  Lin-Chin Su ,  Pei-Ing Lee

IPC: H01L21/8242

CPC classification number: H01L29/66181 ,  G03F7/70633 ,  G03F9/7076 ,  G03F9/708 ,  G03F9/7084 ,  H01L23/544 ,  H01L27/1087 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A small-size (w

Abstract translation: 提出了与“k1工艺”结合的小尺寸（w <0.5微米）对准标记，其特别适用于制造需要高精度AA-DT和GC-DT重叠对准的沟槽电容器DRAM器件。 利用“k1工艺”来蚀刻散布在对准标记沟槽中的多晶硅，并刷新沟槽轮廓，从而提高覆盖对准精度和精度。

公开(公告)号：US20100058085A1

公开(公告)日：2010-03-04

申请号：US12542262

申请日：2009-08-17

Applicant: Chih-Ching Chien ,  Ying-Hui Zhu ,  Wen-Bin Wu ,  Yong-Peng Jing

Inventor： Chih-Ching Chien ,  Ying-Hui Zhu ,  Wen-Bin Wu ,  Yong-Peng Jing

IPC: G06F13/00 ,  G06F1/32

CPC classification number: G06F1/3225

Abstract: A power-saving device and method are applicable to a first electronic device having at least one connection interface, and the first electronic device is coupled to a second electronic device via a bus. The power-saving device includes a detection circuit, a power control circuit, and a connection control circuit. The detection circuit is coupled to the connection interface, to detect a load state of the connection interface and generate a detection signal. The power control circuit controls power supplied to the first electronic device via the bus in response to a state of the detection signal. The connection control circuit controls a connection state of the bus according to the detection signal.

Abstract translation: 省电装置和方法适用于具有至少一个连接接口的第一电子设备，并且第一电子设备经由总线耦合到第二电子设备。 省电装置包括检测电路，电源控制电路和连接控制电路。 检测电路耦合到连接接口，以检测连接接口的负载状态并产生检测信号。 功率控制电路响应于检测信号的状态，经由总线控制提供给第一电子设备的电力。 连接控制电路根据检测信号控制总线的连接状态。

公开(公告)号：US07582395B2

公开(公告)日：2009-09-01

申请号：US11513288

申请日：2006-08-31

Applicant: Chui-fu Chiu ,  Wen-Bin Wu

Inventor： Chui-fu Chiu ,  Wen-Bin Wu

IPC: G03F9/00

CPC classification number: G03F7/70633

Abstract: An overlay mark formed on a photomask, comprising a first rectangular region, a second rectangular region, a third rectangular region, and a fourth rectangular region, each rectangular region having the same pattern configuration, a longer side of the first rectangular region and a longer side of the third rectangular region being parallel to each other, and a longer side of the second rectangular region and a longer side of the fourth rectangular region being parallel to each other, the longer side of the first rectangular region being perpendicular to the longer side of the second rectangular region; wherein each pattern configuration has at least two different pattern elements allowing other pattern elements be chosen to align when any one of the pattern elements on the substrate was damaged during process.

Abstract translation: 形成在光掩模上的覆盖标记，包括第一矩形区域，第二矩形区域，第三矩形区域和第四矩形区域，每个矩形区域具有相同的图案构造，第一矩形区域的长边和较长的 所述第三矩形区域的一侧彼此平行，并且所述第二矩形区域的长边和所述第四矩形区域的长边彼此平行，所述第一矩形区域的长边垂直于所述长边 的第二矩形区域; 其中每个图案配置具有至少两个不同的图案元件，当在处理期间衬底上的任何一个图案元件被损坏时，允许其它图案元件被选择以对准。