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公开(公告)号：US20190049866A1
公开(公告)日：2019-02-14
申请号：US16069678
申请日：2017-01-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Simon Reinald HUISMAN , Alessandro POLO , Duygu AKBULUT , Sebastianus Adrianus GOORDEN , Arie Jeffrey DEN BOEF
Abstract: In an alignment sensor of a lithographic apparatus, position sensing radiation is delivered to a target (P1). After reflection or diffraction from the target, position sensing radiation is processed to determine a position of the target. Reference radiation interferes with the position sensing radiation) while a relative phase modulation is applied between the reference radiation and the position sensing radiation. The interfering radiation includes a time-varying component defined by the applied phase modulation. The interfering radiation is delivered to two photodetectors in such a way that each photodetector receives said time-varying component in anti-phase to that received at the other photodetector. A difference signal (i(t)) from said photodetectors contains an amplified, low noise version of said time-varying component. This is used in determining the position of the target. Mode matching enhances interference. Surface scattered radiation is rejected.
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公开(公告)号：US20240184215A1
公开(公告)日：2024-06-06
申请号：US18286327
申请日：2022-03-23
Applicant: ASML Netherlands B.V.
Inventor： Jin LIAN , Armand Eugene Albert KOOLEN , Sebastianus Adrianus GOORDEN , Hui Quan LIM
IPC: G03F7/00
CPC classification number: G03F7/70516 , G03F7/70025 , G03F7/70633
Abstract: Disclosed is a method of determining a correction for a measurement of a target and an associated apparatus. The measurement is subject to a target-dependent correction parameter which has a dependence the target and/or a stack on which the target is comprised. The method comprises obtaining first measurement data relating to a measurement of a fiducial target, said first measurement data comprising at least a first and second set of intensity parameter values: and second measurement data relating to a measurement of the fiducial target, the second measurement data comprising a third set of intensity parameter values. A target-invariant correction parameter is determined from said first measurement data and second measurement data. the target-invariant correction parameter being a component of the target-dependent correction parameter which is not dependent on the target and/or a stack: and the correction is determined from said target-in-variant correction parameter.
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公开(公告)号：US20240012342A1
公开(公告)日：2024-01-11
申请号：US18035008
申请日：2021-11-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Sebastianus Adrianus GOORDEN , Simon Gijsbert Josephus MATHIJSSEN , Leendert Jan KARSSEMEIJER , Manouk RIJPSTRA , Ralph BRINKHOF , Kaustuve BHATTACHARYYA
CPC classification number: G03F9/7046 , G03F7/706831 , G03F7/70625 , G03F7/706837
Abstract: A method for a metrology process, the method includes obtaining first measurement data relating to a first set of measurement conditions and determining a first measurement recipe based on the first measurement data. At least one performance indicator is determined from one or more components of the first measurement data obtained from a component analysis or statistical decomposition. Alternatively, at least one performance indicator is determined from a comparison of one or more first measurement values relating to the first measurement recipe and one or more second measurement values relating to a second measurement recipe, where second measurement recipe is different to the first measurement data and relates a second set of measurement conditions, the second set of measurement conditions being different to the first set of measurement conditions.
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公开(公告)号：US20220035257A1
公开(公告)日：2022-02-03
申请号：US17277353
申请日：2019-08-27
Applicant: ASML Netherlands B.V.
Inventor： Sebastianus Adrianus GOORDEN , Simon Reinald HUISMAN , Simon Gijsbert Josephus MATHIJSSEN , Henricus Petrus Maria PELLEMANS
IPC: G03F7/20
Abstract: Disclosed is a metrology device (1600) configured to produce measurement illumination comprising a plurality of illumination beams, each of said illumination beams being spatially incoherent or pseudo-spatially incoherent and comprising multiple pupil points in an illumination pupil of the metrology device. Each pupil point in each one of said plurality of illumination beams has a corresponding pupil point in at least one of the other illumination beams of said plurality of illumination beams thereby defining multiple sets of corresponding pupil points, and the pupil points of each set of corresponding pupil points are spatially coherent with respect to each other.
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15.发明申请公开(公告)号：US20190025714A1
公开(公告)日：2019-01-24
申请号：US16035961
申请日：2018-07-16
Applicant: ASML NETHERLANDS B.V.
Abstract: Methods and apparatuses for estimation of at least one parameter of interest of a feature fabricated on a substrate, the feature having a plurality of structure parameters, the structure parameters including the at least one parameter of interest and one or more nuisance parameters. A receiver receives radiation scattered from one or more measured features on the substrate. A pupil generator generates an unprocessed pupil representation of the received radiation. A matrix multiplier multiplies a transformation matrix with intensities of each of a plurality of pixels of the unprocessed pupil representation to determine a post-processed pupil representation in which effects of the one or more nuisance parameters are mitigated or removed. A parameter estimator estimates the at least one parameter of interest based on the post-processed pupil representation.
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Patent Agency Ranking
公开(公告)号：US20240036484A1
公开(公告)日：2024-02-01
申请号：US18265606
申请日：2021-12-02
Applicant: ASML Netherlands B.V.
Inventor： Timothy Dugan DAVIS , Simon Gijsbert Josephus MATHIJSSEN , Kaustuve BHATTACHARYYA , Sebastianus Adrianus GOORDEN , Armand Eugene Albert KOOLEN , Sera JEON , Shuo-Chun LIN
CPC classification number: G03F9/7019 , G03F9/7092 , G03F7/70633 , G03F7/70641
Abstract: Disclosed is a method of metrology. The method comprises measuring at least one surrounding observable parameter relating to a surrounding signal contribution to a metrology signal which comprises a contribution to said metrology signal which is not attributable to at least one target being measured and determining a correction from said surrounding signal observable parameter. The correction is used to correct first measurement data relating to measurement of one or more targets using measurement radiation forming a measurement spot on one or more of said one or more targets which is larger than one of said targets.
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公开(公告)号：US20240012332A1
公开(公告)日：2024-01-11
申请号：US18038601
申请日：2021-11-12
Applicant: ASML Netherlands B.V.
Inventor： Luc Roger Simonne HASPESLAGH , Nitesh PANDEY , Ties Wouter VAN DER WOORD , Halil Gökay YEGEN , Guilherme BRONDANI TORRI , Sebastianus Adrianus GOORDEN , Alexander Ludwig KLEIN , Jim Vincent OVERKAMP , Edgar Alberto OSORIO OLIVEROS
CPC classification number: G03F7/70116 , G02B26/0858 , H02N2/108 , H02N2/009 , H10N30/50 , H10N30/05 , G03F7/70625 , G03F7/7015 , G03F7/706849
Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one multilayer piezoelectric actuator for displacing the mirror, wherein the at least one multilayer piezoelectric actuator is connected to the substrate, and wherein the at least one multilayer piezoelectric actuator comprises a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.
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18.发明公开公开(公告)号：US20230176491A1
公开(公告)日：2023-06-08
申请号：US17923913
申请日：2021-04-21
Applicant: ASML Netherlands B.V.
Inventor： Olger Victor ZWIER , Maurits VAN DER SCHAAR , Hilko Dirk BOS , Hans VAN DER LAAN , S.M. Masudur Rahman AL ARIF , Henricus Wilhelmus Maria Van Buel , Armand Eugene Albert KOOLEN , Victor CALADO , Kaustuve BHATTACHARYYA , Jin LIAN , Sebastianus Adrianus GOORDEN , Hui Quan LIM
IPC: G03F7/20
CPC classification number: G03F7/70641 , G03F7/70558 , G03F7/70633 , G03F7/70625
Abstract: Disclosed is a substrate and associated patterning device. The substrate comprises at least one target arrangement suitable for metrology of a lithographic process, the target arrangement comprising at least one pair of similar target regions which are arranged such that the target arrangement is, or at least the target regions for measurement in a single direction together are, centrosymmetric. A metrology method is also disclosed for measuring the substrate. A metrology method is also disclosed comprising which comprises measuring such a target arrangement and determining a value for a parameter of interest from the scattered radiation, while correcting for distortion of the metrology apparatus used.
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公开(公告)号：US20220382175A1
公开(公告)日：2022-12-01
申请号：US17782570
申请日：2020-11-16
Applicant: ASML Netherlands B.V.
Inventor： Sergei SOKOLOV , Filippo ALPEGGIANI , Sebastianus Adrianus GOORDEN , Simeon Reinaid HUISMAN
IPC: G03F9/00
Abstract: Disclosed is a method for determining a stage position or correction therefor in a lithographic process. The method comprises obtaining transmission data describing the transmission of alignment radiation onto the substrate; obtaining position data relating to a stage position of said stage and/or a sensor position of said sensor. A weighting is determined for the position data based on said transmission data. The position based on said transmission data, position data and weighting.
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公开(公告)号：US20220121128A1
公开(公告)日：2022-04-21
申请号：US17565422
申请日：2021-12-29
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: Disclosed is a method of metrology comprising using measurement illumination to measure a target, said measurement illumination comprising a plurality of illumination conditions. The method comprises performing a first measurement capture with a first subset of said plurality of illumination conditions, e.g., each comprising a positive weighting, to obtain a first parameter value and performing a second measurement capture with a second subset of said plurality of illumination conditions, e.g., each comprising a negative weighting, to obtain a second parameter value. An optimized parameter value is determined as a weighted combination of at least the first parameter value and the second parameter value.
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