公开(公告)号：US5510617A

公开(公告)日：1996-04-23

申请号：US404706

申请日：1995-03-15

Applicant: Kars Z. Troost ,  Alexander Henstra

Inventor： Kars Z. Troost ,  Alexander Henstra

IPC: H01J37/147 ,  G01Q60/40 ,  G01Q70/00 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J2237/1516 ,  H01J2237/2448

Abstract: A primary beam in a scanning electron microscope (SEM) releases secondary electrons in the specimen to be studied. These electrons move back to the focusing lens against the direction of the primary beam, detection of these electrons taking place in the vicinity of said lens. A known detector comprises a Wien filter for deflecting the electrons from the optical axis to the actual detector. In accordance with the invention a SEM detector is provided with a double electric dipole. The latter leaves the primary beam undisturbed to a high degree, but very efficiently deflects the secondary electrons to the actual detector.

Abstract translation: 扫描电子显微镜（SEM）中的主光束释放待研究样品中的二次电子。 这些电子相对于主光束的方向移动到聚焦透镜，这些电子在所述透镜附近发生的检测。 已知的检测器包括用于将电子从光轴偏转到实际检测器的维恩滤波器。 根据本发明，SEM检测器具有双电偶极子。 后者将主波束高度地保持不受干扰，但是非常有效地将二次电子偏转到实际的检测器。

公开(公告)号：US08884245B2

公开(公告)日：2014-11-11

申请号：US11591175

申请日：2006-11-01

Applicant: Alexander Henstra ,  Michael Ross Scheinfein

Inventor： Alexander Henstra ,  Michael Ross Scheinfein

IPC: G21K5/00 ,  H01J37/26 ,  H01J37/153

CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J2237/1534

Abstract: The invention describes a corrector for the correction of chromatic aberrations in a particle lens, such as used in a SEM or a TEM. So as to reduce the stability demands on the power supplies of such a corrector, the energy with which the particle beam passes through the corrector is lower than the energy with which the beam passes through the lens to be corrected.

Abstract translation: 本发明描述了用于校正像在用于SEM或TEM的粒子透镜中的色像差的校正器。 为了降低对这种校正器的电源的稳定性要求，粒子束通过校正器的能量低于光束通过透镜的能量，以被校正。

公开(公告)号：US08569693B2

公开(公告)日：2013-10-29

申请号：US13446908

申请日：2012-04-13

Applicant: Maarten Bischoff ,  Alexander Henstra ,  Uwe Luecken ,  Peter Christiaan Tiemeijer

Inventor： Maarten Bischoff ,  Alexander Henstra ,  Uwe Luecken ,  Peter Christiaan Tiemeijer

IPC: G21K7/00

CPC classification number: H01J37/26 ,  H01J37/153 ,  H01J2237/1532

Abstract: A charged particle apparatus is equipped with a third stigmator positioned between the objective lens and a detector system, as a result of which a third degree of freedom is created for reducing the linear distortion. Further, a method of using said three stigmators, comprises exciting the first stigmator to reduce astigmatism when imaging the sample, exciting the second stigmator to reduce astigmatism when imaging the diffraction plane, and exciting the third stigmator to reduce the linear distortion.

Abstract translation: 带电粒子装置配备有位于物镜和检测器系统之间的第三标示器，结果为了减少线性失真产生了第三自由度。 此外，使用所述三个标记器的方法包括：激光所述第一标示器以在对所述样品进行成像时减少散光，激励所述第二标示器以在对所述衍射平面进行成像时减少散光，以及激励所述第三施放器以减少所述线性失真。

公开(公告)号：US20090289195A1

公开(公告)日：2009-11-26

申请号：US12472259

申请日：2009-05-26

Applicant: Alexander Henstra

Inventor： Alexander Henstra

IPC: H01J3/14

CPC classification number: H01J37/05 ,  H01J3/027 ,  H01J3/04 ,  H01J37/063 ,  H01J2237/045 ,  H01J2237/057 ,  H01J2237/061 ,  H01J2237/08 ,  H01J2237/15 ,  H01J2237/1534

Abstract: The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 103 eccentrically through a lens 107. As a result of this, energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit 109 in an energy selecting diaphragm 108, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 113 will have a reduced energy spread. Deflection unit 112 deflects the beam to the optical axis 101. One can also elect to deflect a beam 105 going through the middle of the lens toward the optical axis and having, for example, greater current.The energy dispersed spot is imaged on the slit by a deflector 111. When positioning the energy dispersed spot on the slit, central beam 105 is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector 112 is avoided.

Abstract translation: 本发明描述了发生能量选择的粒子源。 通过透过透镜107偏心地发送带电粒子103的束来进行能量选择。结果，由透镜形成的图像中会发生能量分散。 通过将该图像投影到能量选择膜108中的狭缝109上，可以仅允许能谱范围的有限部分中的粒子通过。 因此，通过的梁113将具有减小的能量扩展。 偏转单元112将光束偏转到光轴101.也可以选择将穿过透镜中间的光束105偏转到光轴并具有例如更大的电流。 能量分散点通过偏转器111在狭缝上成像。当将能量分散光斑定位在狭缝上时，中心光束105从轴线偏转到被能量选择光阑停止的程度。 因此避免了在隔膜之后的区域中由该光束产生的反射和污染。 避免了在偏转器112的区域中与来自中心光束的电子与能量过滤光束相互作用的电子 - 电子相互作用。

公开(公告)号：US07378667B2

公开(公告)日：2008-05-27

申请号：US11397480

申请日：2006-04-04

Applicant: Alexander Henstra

Inventor： Alexander Henstra

IPC: G21K1/00

CPC classification number: H01J37/153 ,  H01J2237/1534

Abstract: Quadrupole-octupole aberration corrector for application in a TEM, STEM or SEM. A known corrector for correcting third-order and fifth-order aberrations of the objective is embodied with eight quadrupoles and three octupoles. The corrector according to the invention has at least the same aberration-correcting power, but, according to the invention, is embodied with six quadrupoles and three octupoles. By adding octupoles with a relatively weak excitation to a portion of the quadrupoles, correction of the anisotropic coma of the objective lens is also attained. By embodying all quadrupoles, or a portion thereof, to be electromagnetic, chromatic aberrations can also be corrected for.

Abstract translation: 用于TEM，STEM或SEM的四极八极畸变校正器。 用于校正目标的三阶和五阶像差的已知校正器具有八个四极和三个八极。 根据本发明的校正器具有至少相同的像差校正功率，但是根据本发明，具有六个四极和三个八极。 通过向四极的一部分添加具有相对弱激发的八极，还可以校正物镜的各向异性彗差。 通过将所有四极或其一部分体现为电磁，也可以校正色差。

公开(公告)号：US07034315B2

公开(公告)日：2006-04-25

申请号：US11058695

申请日：2005-02-15

Applicant: Alexander Henstra ,  Jaroslav Chmelik

Inventor： Alexander Henstra ,  Jaroslav Chmelik

IPC: H01J37/26

CPC classification number: H01J37/05 ,  H01J37/09 ,  H01J37/153 ,  H01J37/26

Abstract: The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 13 eccentrically through a lens 6. As a result of this, energy dispersion will occur in an image 15 formed by the lens 6. By projecting this image 15 onto a diaphragm 7, it is possible to only allow particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 16 will have a reduced energy spread. By adding a deflection unit 10, this particle beam 16 can be deflected toward the optical axis 2. One can also elect to deflect a beam 12 going through the middle of the lens 6—and having, for example, greater current—toward the optical axis.

Abstract translation: 本发明描述了发生能量选择的粒子源。 通过透镜6偏心地发送带电粒子13的束来进行能量选择。 其结果是，由透镜6形成的图像15中会发生能量分散。 通过将该图像15投影到膜片7上，可以仅允许能量谱的有限部分中的粒子通过。 因此，通过的光束16将具有减小的能量扩展。 通过添加偏转单元10，该粒子束16可以朝向光轴2偏转。 还可以选择使穿过透镜6的中部的光束12偏转，并具有例如更大的电流朝向光轴。

公开(公告)号：US06455848B1

公开(公告)日：2002-09-24

申请号：US09464008

申请日：1999-12-15

Applicant: Marcellinus Petrus Carolus Michael Krijn ,  Alexander Henstra

Inventor： Marcellinus Petrus Carolus Michael Krijn ,  Alexander Henstra

IPC: G01N2300

CPC classification number: H01J37/05 ,  H01J2237/2511

Abstract: In a SEM it is desirable, in given circumstances, to acquire an image of the sample (14) by means of Auger electrons extracted from the sample and traveling back through the bore of the objective lens (8) in the direction opposing the direction of the primary beam. It is known to separate extracted electrons from the primary beam by positioning Wien filters (32, 34) in front of the objective lens (8), the filters being energized in such a way that they do not cause deflection of the primary beam but do deflect the secondary electrons. This technique cannot be used for Auger electrons, considering their high energy and hence much stronger fields in the Wien filters, thus causing substantial imaging aberrations in the primary beam. According to the invention a quadrupole field is applied in the same position as the fields of each Wien filter (32, 34, 36), thus ensuring that the resolution of the image of the sample (14) is not degraded by the fields of the Wien filters.

Abstract translation: 在SEM中，在给定的情况下，期望通过从样品中提取的俄歇电子获取样品（14）的图像，并沿与物镜（8）的孔相反的方向 主梁。 已知通过将维恩滤波器（32,34）定位在物镜（8）的前面，将提取出的电子与初级束分开，滤光器以这样的方式通电，使得它们不会引起主光束的偏转，但是 偏转二次电子。 考虑到它们的高能量，因此Wien滤波器中的场强更强，因此这种技术不能用于俄歇电子。因此，在主波束中引起大量的成像像差。根据本发明，四极场应用于与 每个维恩滤波器（32,34,36），从而确保样本（14）的图像的分辨率不会被维恩滤波器的场降级。

公开(公告)号：US5965894A

公开(公告)日：1999-10-12

申请号：US982880

申请日：1997-12-02

Applicant: Marcellinus P.C.M. Krijn ,  Alexander Henstra

Inventor： Marcellinus P.C.M. Krijn ,  Alexander Henstra

IPC: H01J37/153 ,  H01J37/141 ,  H01J37/28 ,  H01L21/027

CPC classification number: H01J37/141 ,  H01J2237/0492 ,  H01J2237/1534

Abstract: Electron-optical, rotationally-symmetrical lenses inevitably exhibit spherical and chromatic aberration which usually determine the limit of the resolution. Such lens aberrations cannot be eliminated by compensation by means of rotationally-symmetrical fields. In order to enhance the resolution nevertheless, it has already been proposed to reduce said lens aberrations by means of a Wien-type corrector. Such a configuration must satisfy very severe requirements as regards manufacturing precision, mechanical and electrical stability and alignment of the various elements relative to one another. Consequently, it is extremely difficult to perform readjustment of the electron-optical apparatus by means of such a corrector in the case of changing circumstances. According to the invention there is provided a combination of a correction unit and a doublet to be corrected. By constructing the objective to be corrected as a doublet 5 and by independently controlling the two lenses 6 and 8 of the doublet 5, the setting of the correction unit 28 can remain unchanged, it being possibly to vary the free object distance and the electron voltage nevertheless during operation of the electron-optical apparatus. FIG. 1.

Abstract translation: 电子 - 光学，旋转对称的透镜不可避免地呈现球面和色差，通常决定分辨率的极限。 这种透镜像差不能通过旋转对称场的补偿来消除。 为了提高分辨率，已经提出通过维恩型校正器来减少所述透镜像差。 这种构造在制造精度，机械和电气稳定性以及各种元件相对于彼此的对准方面必须满足非常严格的要求。 因此，在情况变化的情况下，通过这种校正器进行电子光学装置的重新调整是非常困难的。 根据本发明，提供了要校正的校正单元和双引号的组合。 通过构造要被校正为双折射5的目标并且通过独立地控制双折射5的两个透镜6和8，校正单元28的设置可以保持不变，可能改变自由物距离和电子电压 然而在电子光学装置的操作期间。 图。 1。

公开(公告)号：US08841630B2

公开(公告)日：2014-09-23

申请号：US12949312

申请日：2010-11-18

Applicant: Alexander Henstra

Inventor： Alexander Henstra

IPC: H01J37/153 ,  H01J37/26

CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J2237/1534 ,  H01J2237/28

Abstract: Commercially available High Resolution Transmission Electron Microscopes (HR-TEM) and Scanning Transmission Electron Microscopes (HR-STEM) are nowadays equipped with correctors for correcting the axial spherical aberration Cs of the so-named objective lens. Inevitably other aberrations become the limiting aberration. For the hexapole type correctors, also known as Rose correctors, or variants thereof, six-fold axial astigmatism, also known as A5, and sixth-order three lobe aberration, also known as D6, introduced by the corrector, are known to become the limiting aberration. The invention shows that by adding a weak hexapole (126) in the cross-over between the hexapoles, a Rose like corrector or a Crewe like corrector free of A5 or D6 can be made, or, by adding both the weak hexapole and a dodecapole, a corrector that is free of both A5 and D6.

Abstract translation: 市售的高分辨率透射电子显微镜（HR-TEM）和扫描透射电子显微镜（HR-STEM）现在配备有用于校正所谓物镜的轴向球面像差的校正器。 其他像差不可避免地成为限制像差。 对于六极型校正器，也称为玫瑰校正器或其变型，已知由校正器引入的六重轴向像散（也称为A5）和六阶三瓣像差（也称为D6）成为 限制像差。 本发明表明，通过在六极体之间的交叉处添加弱六极（126），可以制成玫瑰样校正器或不含A5或D6的Crewe像校正子，或者通过加入弱六极和十二烷 ，一个没有A5和D6的校正器。

公开(公告)号：US08598542B2

公开(公告)日：2013-12-03

申请号：US12719619

申请日：2010-03-08

Applicant: Milos Toth ,  Richard J. Young ,  Alexander Henstra ,  Alan Frank de Jong ,  Johannes Jacobus Lambertus Mulders

Inventor： Milos Toth ,  Richard J. Young ,  Alexander Henstra ,  Alan Frank de Jong ,  Johannes Jacobus Lambertus Mulders

IPC: G21G4/00

CPC classification number: H01J37/3056 ,  B81C99/0095 ,  H01J37/045 ,  H01J37/302 ,  H01J2237/0432 ,  H01J2237/04756 ,  H01J2237/2001 ,  H01J2237/24535 ,  H01J2237/30472

Abstract: Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate. The beam preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes.

Abstract translation: 电子束诱导的与前体气体的化学反应是通过吸附物去除控制来控制的。 可以通过控制束电流来控制吸附物消耗，优选地通过快速消隐光束，以及通过冷却衬底来控制。 光束优选具有低能量以减小相互作用体积。 通过控制耗尽和相互作用体积，用户具有产生精确形状的能力。