Ellipsometry measurement and analysis
    11.
    发明授权
    Ellipsometry measurement and analysis 有权
    椭偏仪测量和分析

    公开(公告)号:US07453562B1

    公开(公告)日:2008-11-18

    申请号:US11863334

    申请日:2007-09-28

    CPC classification number: G01N21/33

    Abstract: A method of performing a measurement of properties of a sample, by directing a first beam of light at the sample, where a combination of the wavelength, energy, and length of time is sufficient to cause temporary damage to the sample. The first beam is reflected from the sample. The properties of the reflected beam are sensed to create a signal. A length of time is waited, sufficient for the damage to substantially heal, before a second beam of light is directed at the sample, where a combination of the wavelength, energy, and length of time is sufficient to cause temporary damage to the sample. The second beam is reflected from the sample. The properties of the reflected beam are sensed to create a signal. The first and second electrical signals are analyzed to determine the properties of the sample.

    Abstract translation: 通过在样品处引入第一光束,其中波长,能量和时间长度的组合足以引起对样品的暂时损坏,来执行样品的性质的测量的方法。 第一个光束从样品反射。 感测反射光束的特性以产生信号。 在第二光束被引导到样品之前等待长度的时间足以使损伤基本上愈合,其中波长,能量和时间长度的组合足以引起对样品的暂时损坏。 第二个光束从样品反射。 感测反射光束的特性以产生信号。 分析第一和第二电信号以确定样品的性质。

    Concurrent measurement and cleaning of thin films on silicon-on-insulator (SOI)
    12.
    发明授权
    Concurrent measurement and cleaning of thin films on silicon-on-insulator (SOI) 有权
    同时测量和清洁绝缘体上硅(SOI)上的薄膜

    公开(公告)号:US07006222B2

    公开(公告)日:2006-02-28

    申请号:US10339518

    申请日:2003-01-08

    Inventor: Shankar Krishnan

    CPC classification number: G01J4/00 G01B11/06 G01B11/065

    Abstract: A system for performing single wavelength ellipsometry (SWE) on a thin film on a multi-layer substrate such as silicon-on-insulator (SOI) applies a measurement beam having an absorption distance less than the thickness of the superficial layer of the multi-layer substrate. For example, for an SOI substrate, the measurement beam is selected to have a wavelength that results in an absorption distance that is less than the superficial silicon layer thickness. The system can include a cleaning laser to provide concurrent cleaning to enhance measurement accuracy without negatively impacting throughput. The measurement beam source can be configured to provide a measurement beam at one wavelength and a cleaning beam at a longer wavelength, so that the absorption depth of the measurement beam is less than the superficial layer thickness while the absorption depth of the cleaning beam is greater than the superficial layer thickness.

    Abstract translation: 在诸如绝缘体上硅(SOI)的多层基板上的薄膜上执行单波长椭偏仪(SWE)的系统应用具有小于多层膜的表层的厚度的吸收距离的测量光束, 层基板。 例如,对于SOI衬底,测量光束被选择为具有导致小于表面硅层厚度的吸收距离的波长。 该系统可以包括清洁激光器以提供同时清洁以提高测量精度,而不会不利地影响生产量。 测量光束源可以被配置为提供一个波长的测量光束和较长波长的清洁光束,使得测量光束的吸收深度小于表面层厚度,而清洁光束的吸收深度更大 比表面层厚度。

    Substrate thickness determination
    13.
    发明授权
    Substrate thickness determination 有权
    基板厚度测定

    公开(公告)号:US06710890B1

    公开(公告)日:2004-03-23

    申请号:US10375554

    申请日:2003-02-26

    CPC classification number: G01B11/0608

    Abstract: An apparatus for measuring a thickness of a substrate having an upper surface, without contacting the upper surface of the substrate. A platen having a base surface receives the substrate, and a reference surface is disposed at a known first height from the platen surface. A non contact sensor senses the known first height of the reference surface without making physical contact with the reference surface. The non contact sensor further senses a relative difference between the known first height of the reference surface and a second height of the upper surface of the substrate without making physical contact with the upper surface of the substrate. A controller controls the sensor and determines the thickness of the substrate based at least in part on the known first height of the reference surface and the relative difference between the known first height of the reference surface and the second height of the upper surface of the substrate.

    Abstract translation: 一种用于测量具有上表面的基板的厚度而不与基板的上表面接触的装置。 具有基面的台板容纳基板,并且参考表面设置在距压板表面已知的第一高度处。 非接触传感器感测参考表面的已知第一高度,而不与参考表面物理接触。 非接触式传感器进一步感测参考表面的已知第一高度与衬底的上表面的第二高度之间的相对差异,而不与衬底的上表面物理接触。 控制器控制传感器并且至少部分地基于参考表面的已知第一高度和参考表面的已知第一高度与衬底的上表面的第二高度之间的相对差异来确定衬底的厚度 。

    INTERFACIAL THERMAL TRANSFER STRUCTURE
    14.
    发明申请
    INTERFACIAL THERMAL TRANSFER STRUCTURE 审中-公开
    界面热传递结构

    公开(公告)号:US20150176915A1

    公开(公告)日:2015-06-25

    申请号:US14134937

    申请日:2013-12-19

    Abstract: An apparatus that interfaces thermal transfer components is described. The apparatus includes a soft, thermally conductive metal that enables a capillary flow path with a contact surface of a thermal transfer component and an imbibing thermal interface material. The thermal transfer component is a heat sink. The thermally conductive metal includes large pores that intertwine with smaller pores of the contact surface.

    Abstract translation: 描述了接触热转印组件的装置。 该装置包括柔软的导热金属,其能够使具有热传递部件的接触表面和吸收热界面材料的毛细管流动路径。 热转印组件是散热器。 导热金属包括与接触表面的较小孔交织的大孔。

    Optical system polarizer calibration
    15.
    发明授权
    Optical system polarizer calibration 有权
    光学系统偏光镜校准

    公开(公告)号:US08570514B2

    公开(公告)日:2013-10-29

    申请号:US13164130

    申请日:2011-06-20

    CPC classification number: G01N21/21 G01J3/504 G01N21/274

    Abstract: A method to calibrate a polarizer in polarized optical system at any angle of incidence, by decoupling the calibration from a polarization effect of the system, by providing a calibration apparatus that includes a substrate having a polarizer disposed on a surface thereof, with an indicator on the substrate for indicating a polarization orientation of the polarizer, loading the calibration apparatus in the polarized optical system with the indicator in a desired position, determining an initial angle between the polarization orientation and a reference of the polarized optical system, acquiring spectra using the polarized optical system at a plurality of known angles between the polarization orientation and the reference of the polarized optical system, using the spectra to plot a curve indicating an angle of the polarizer in the polarized optical system, and when the angle of the polarizer is outside of a desired range, adjusting the angle of the polarizer, and repeating the steps of acquiring the spectra, and plotting a curve indicating the angle of the polarizer.

    Abstract translation: 一种通过提供校准装置来校准偏振光学系统中任何入射角的偏振器的方法,通过提供校准装置,该校准装置包括具有设置在其表面上的偏振器的衬底, 用于指示偏振器的偏振取向的衬底,将校准装置装载在具有指示器的期望位置的偏振光学系统中,确定极化取向和偏振光学系统的基准之间的初始角度,使用偏振光 光学系统以偏振方向和偏振光学系统的基准之间的多个已知角度,使用光谱绘制指示偏振器在偏振光学系统中的角度的曲线,以及当偏振器的角度在 期望的范围,调节偏振器的角度,并重复以下步骤 获取光谱,并绘制一个指示偏振片角度的曲线。

    Measurement of critical dimension
    16.
    发明授权
    Measurement of critical dimension 有权
    关键尺寸的测量

    公开(公告)号:US08456639B2

    公开(公告)日:2013-06-04

    申请号:US13174815

    申请日:2011-07-01

    Abstract: A spectroscopic instrument for conducting multi-wavelength, multi-azimuth, multi-angle-of-incidence readings on a substrate, the instrument having a broadband light source for producing an illumination beam, an objective for directing the illumination onto the substrate at multiple azimuth angles and multiple angels-of-incidence simultaneously, thereby producing a reflection beam, an aperture plate having an illumination aperture and a plurality of collection apertures formed therein for selectively passing portions of the reflection beam having desired discreet combinations of azimuth angle and angle-of-incident, a detector for receiving the discreet combinations of azimuth angle and angle-of-incident and producing readings, and a processor for interpreting the readings.

    Abstract translation: 一种用于在衬底上进行多波长,多方位角,多角度入射读数的光谱仪器,该仪器具有用于产生照明光束的宽带光源,用于将多个方位角的照明引导到衬底上的物镜 角度和多个入射角,从而产生反射光束,具有照明孔的孔板和形成在其中的多个收集孔,用于选择性地通过具有期望的方位角和角度的离散组合的反射光束的部分 - 用于接收方位角和入射角的离散组合并产生读数的检测器,以及用于解释读数的处理器。

    Spreading thermoelectric coolers
    18.
    发明授权
    Spreading thermoelectric coolers 有权
    散布热电冷却器

    公开(公告)号:US07825324B2

    公开(公告)日:2010-11-02

    申请号:US11618056

    申请日:2006-12-29

    Abstract: An apparatus includes a thermoelectric cooler having a first set of one or more metal electrodes, a second set of one or more metal electrodes, and one or more doped semiconductor members. Each member physically joins a corresponding one electrode of the first set to a corresponding one electrode of the second set. Each member has a cross-sectional area that increases along a path from the one metal electrode of the first set to the one metal electrode of the second set.

    Abstract translation: 一种装置包括具有第一组一个或多个金属电极的热电冷却器,一个或多个金属电极的第二组和一个或多个掺杂的半导体部件。 每个构件将第一组的对应的一个电极物理地连接到第二组的对应的一个电极。 每个构件具有沿着从第一组的一个金属电极到第二组的一个金属电极的路径增加的横截面面积。

    METHOD AND APPARATUS FOR LOCATING LOAD-BALANCED FACILITIES
    19.
    发明申请
    METHOD AND APPARATUS FOR LOCATING LOAD-BALANCED FACILITIES 有权
    用于定位负荷平衡设备的方法和装置

    公开(公告)号:US20100169891A1

    公开(公告)日:2010-07-01

    申请号:US12347810

    申请日:2008-12-31

    Inventor: Shankar Krishnan

    CPC classification number: G06F9/5072 G06F9/5027 H04L41/145

    Abstract: A method and apparatus for providing a facility location plan for a network with a V-shaped facility cost are disclosed. For example, the method receives an event from a queue, wherein the event comprises an open event or a tight event. The method connects a plurality of adjacent clients to a facility, if the event comprises the open event, and adds a new client-facility edge to a graph comprising a plurality of client-facility edges, if the event comprises the tight event.

    Abstract translation: 公开了一种用于提供具有V形设备成本的网络的设施位置计划的方法和装置。 例如,该方法从队列接收事件,其中事件包括打开事件或紧急事件。 如果事件包括打开事件,则该方法将多个相邻客户端连接到设施,并且如果事件包括紧密事件,则将新的客户机设施边缘添加到包括多个客户机设施边缘的图形中。

    Measurement systems configured to perform measurements of a specimen and illumination subsystems configured to provide illumination for a measurement system
    20.
    发明授权
    Measurement systems configured to perform measurements of a specimen and illumination subsystems configured to provide illumination for a measurement system 失效
    测量系统被配置为执行被配置成为测量系统提供照明的样本和照明子系统的测量

    公开(公告)号:US07408641B1

    公开(公告)日:2008-08-05

    申请号:US11058153

    申请日:2005-02-14

    Abstract: An illumination subsystem configured to provide illumination for a measurement system includes first and second light sources configured to generate light for measurements in different wavelength regimes. The illumination subsystem also includes a TIR prism configured to be moved into and out of an optical path from the first and second light sources to the measurement system. If the TIR prism is positioned out of the optical path, light from only the first light source is directed along the optical path. If the TIR prism is positioned in the optical path, light from only the second light source is directed along the optical path. Various measurement systems are also provided. One measurement system includes an optical subsystem configured to perform measurements of a specimen using light in different wavelength regimes directed along a common optical path. The different wavelength regimes include vacuum ultraviolet, ultraviolet, visible, and near infrared wavelength regimes.

    Abstract translation: 被配置为为测量系统提供照明的照明子系统包括被配置为产生用于不同波长方案中的测量的光的第一和第二光源。 照明子系统还包括被配置为移入和移出从第一和第二光源到测量系统的光路的TIR棱镜。 如果TIR棱镜位于光路外,则仅沿着光路引导来自第一光源的光。 如果TIR棱镜位于光路中,则仅沿着光路引导来自第二光源的光。 还提供了各种测量系统。 一个测量系统包括光学子系统,该光学子系统被配置为使用沿着公共光路引导的不同波长方式的光来对样本进行测量。 不同的波长方案包括真空紫外线,紫外线,可见光和近红外波长方案。

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