公开(公告)号：US10261413B2

公开(公告)日：2019-04-16

申请号：US15622474

申请日：2017-06-14

Applicant: FUJIFILM Corporation

Inventor： Hirotaka Kitagawa ,  Yuichiro Goto

IPC: G03F7/00 ,  C08F2/48 ,  C08F214/18 ,  H01L21/027 ,  B41M5/00 ,  C09D7/40 ,  C08F2/44 ,  C08F2/50 ,  C08F220/22 ,  C09D11/30 ,  B41M7/00 ,  C08F222/10 ,  C08F220/18 ,  C09D11/101 ,  C09D11/102 ,  G03F7/004 ,  G03F7/027

Abstract: Provided are a photocurable composition for imprints, having good releasability and temporal stability of the releasability, a pattern forming method, and a method for manufacturing a device. This photocurable composition for imprints includes a monofunctional chained aliphatic (meth)acrylate (A1) not containing a fluorine atom, a bifunctional or higher polyfunctional (meth)acrylate (A2) not containing a fluorine atom, a monofunctional (meth)acrylate (B) containing a fluorine atom, a photopolymerization initiator (C), and a non-polymerizable compound (D) having a polyoxyalkylene structure in a proportion of 1% to 5% by mass, in which the monofunctional chained aliphatic (meth)acrylate (A1) not containing a fluorine atom has a boiling point of 100° C. to 200° C. at a pressure of 0.67 kPa, and the monofunctional (meth)acrylate (B) containing a fluorine atom has a boiling point of 100° C. to 200° C. at a pressure of 0.67 kPa.

公开(公告)号：US10373863B2

公开(公告)日：2019-08-06

申请号：US15468911

申请日：2017-03-24

Applicant: FUJIFILM Corporation

Inventor： Yuichiro Goto ,  Tadashi Oomatsu

IPC: H01L23/52 ,  H01L21/768 ,  H01L21/027 ,  H01L21/3205 ,  H01L23/532 ,  B29C44/02 ,  B29C44/12 ,  H01L21/02 ,  H01L23/522 ,  H01L23/528 ,  B29C37/00 ,  B29K33/00 ,  B29K105/00 ,  B29L31/34 ,  B29K105/04

Abstract: Provided are a method of manufacturing a porous body capable of easily manufacturing a porous body, a porous body, a method of manufacturing a device, a device, a method of manufacturing a wiring structure, and a wiring structure.A photocurable composition including a condensing gas and a polymerizable compound is applied to a substrate or a mold, the photocurable composition is sandwiched between the substrate and the mold and then the photocurable composition is irradiated with light to cure the photocurable composition, and the mold is released from a surface of the cured photocurable composition.

公开(公告)号：US20190163059A1

公开(公告)日：2019-05-30

申请号：US16261884

申请日：2019-01-30

Applicant: FUJIFILM Corporation

Inventor： Yuichiro Goto

IPC: G03F7/031 ,  B29C59/02 ,  G03F7/00 ,  C08F222/10 ,  H01L21/027

Abstract: Provided are a curable composition for imprinting and a cured product, a pattern forming method, and a lithography method in which the curable composition for imprinting is used, the curable composition having excellent resolution ability, filling properties into a mold, and releasability from a mold in a case where a fine pattern having a size of 20 nm or less is prepared. The curable composition for imprinting includes: a monofunctional polymerizable compound; a bifunctional polymerizable compound; and a photopolymerization initiator, in which a content of the monofunctional polymerizable compound is 5 to 30 mass % with respect to a content of all the polymerizable compounds, a content of the bifunctional polymerizable compound is 70 mass % or higher with respect to a content of all the polymerizable compounds, at least one bifunctional polymerizable compound is a bifunctional polymerizable compound in which the number of atoms linking two polymerizable groups to each other is 2 or less, and a content of a bifunctional polymerizable compound that does not include an alicyclic structure and an aromatic ring structure and in which the number of atoms linking two polymerizable groups to each other is 3 or more is 30 mass % or lower with respect to the content of all the polymerizable compounds.

公开(公告)号：US10246605B2

公开(公告)日：2019-04-02

申请号：US15441716

申请日：2017-02-24

Applicant: FUJIFILM Corporation

Inventor： Tadashi Oomatsu ,  Hirotaka Kitagawa ,  Yuichiro Goto

IPC: C09D5/00 ,  C09D151/00 ,  B32B27/00 ,  C09D133/14 ,  C09D201/02 ,  B29C59/00 ,  B29C59/16 ,  G03F7/00 ,  H01L21/02 ,  H01L21/3105 ,  C08F290/14 ,  C09D151/08 ,  G03F7/075 ,  G03F7/09 ,  C09D7/40 ,  C09D5/32 ,  C09D7/65 ,  B29C59/02 ,  B29K33/00

Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device.Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.

公开(公告)号：US10175576B2

公开(公告)日：2019-01-08

申请号：US14643512

申请日：2015-03-10

Applicant: FUJIFILM Corporation

Inventor： Hirotaka Kitagawa ,  Yuichiro Goto ,  Yuichiro Enomoto

IPC: G03F7/00 ,  G03F7/031 ,  C08F2/44 ,  C08F2/48 ,  G03F7/004 ,  G03F7/027 ,  G03F7/038 ,  C09D11/101 ,  C09D11/30 ,  H01L21/308

Abstract: Provided is a curable composition for photo imprints excellent in the mold releasability and the ink jettability. The curable composition for photo imprints, comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a mold releasing agent (C), the mold releasing agent (C) being represented by the formula (I) below. Rf represents a C1-8 fluorine-containing alkyl group having two or more fluorine atoms; m represents 1 or 2; L represents a single bond or divalent linking group; n represents 1 or 2; X represents a single bond, oxygen atom, sulfur atom, or nitrogen atom; R1 represents a C1-8 substituent being free from a polymerizable group; R2 represents a hydrogen atom, C1-8 substituent, or divalent linking group; p represents 1 or 2, q represents 0 or 1, and r represents 1 or 2; R1 and R2 may combine with each other to form a ring.

公开(公告)号：US09862847B2

公开(公告)日：2018-01-09

申请号：US14757424

申请日：2015-12-23

Applicant: FUJIFILM Corporation

Inventor： Yuichiro Goto ,  Tadashi Oomatsu ,  Hirotaka Kitagawa ,  Yuichiro Enomoto ,  Kenichi Kodama

IPC: C09D11/30 ,  B41J2/01 ,  C09D11/106 ,  G03F7/00 ,  C09D11/101 ,  C09D11/38 ,  C08G65/00 ,  C08G65/332 ,  C09D133/06 ,  C08K5/06 ,  C08K5/103 ,  C08K5/12

CPC classification number: C09D11/30 ,  B41J2/01 ,  C08G65/007 ,  C08G65/3322 ,  C08K5/06 ,  C08K5/103 ,  C08K5/12 ,  C09D11/101 ,  C09D11/106 ,  C09D11/38 ,  C09D133/06 ,  G03F7/0002

Abstract: The present invention provides a discharge method which makes it possible to appropriately perform discharge even when a head for discharging microdroplets having a size of equal to or less than 6 pL that is necessary for controlling a residual film (forming a thin film and achieving uniformity) is used, and makes it possible to obtain an excellent pattern having excellent release properties. The discharge method is an inkjet discharge method including discharging a photocurable composition in the form of liquid droplets having a size of equal to or less than 6 pL, in which the composition satisfies the following (a) to (c), (a) containing a fluorine-containing material in a proportion of equal to or less than 4% by mass of the composition; (b) having a surface tension of 25 mN/m to 35 mN/m; and (c) containing a solvent having a boiling point of equal to or less than 200° C. in an amount of 5% by mass of the composition.

公开(公告)号：US12109752B2

公开(公告)日：2024-10-08

申请号：US17484492

申请日：2021-09-24

Applicant: FUJIFILM Corporation

Inventor： Akihiro Hakamata ,  Naoya Shimoju ,  Yuichiro Goto

IPC: B29C59/02 ,  C08F2/50 ,  C08F220/10 ,  G03F7/00 ,  G03F7/004 ,  G03F7/20

CPC classification number: B29C59/02 ,  C08F2/50 ,  C08F220/10 ,  G03F7/0002 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2004 ,  G03F7/2018

Abstract: A composition for forming an underlayer film in an imprinting method, which includes a high-molecular-weight compound having a polymerizable functional group and a monomer having a plurality of crosslinking functional groups capable of being bonded to the polymerizable functional group, and in which a Hansen solubility parameter distance, which is a difference between a Hansen solubility parameter of the high-molecular-weight compound and a Hansen solubility parameter of the monomer, is 5.0 or less, and regarding the two crosslinking functional groups among the plurality of crosslinking functional groups, the number of atoms, which constitute a shortest atom chain mutually linking crosslinking points in the respective crosslinking functional groups, is 7 or more; a laminate including a layer formed of the composition for forming an underlayer film; and a method for manufacturing a semiconductor element, in which a semiconductor element is manufactured using a pattern obtained by a pattern producing method.

公开(公告)号：US11435663B2

公开(公告)日：2022-09-06

申请号：US16826565

申请日：2020-03-23

Applicant: FUJIFILM Corporation

Inventor： Yuichiro Goto

IPC: C08F2/46 ,  C08F2/50 ,  C08G61/04 ,  G03F7/00 ,  G03F7/16 ,  G03F7/20 ,  H05K1/09 ,  G03F7/027 ,  G03F7/031 ,  G03F7/075 ,  B81C1/00 ,  B82Y30/00

Abstract: A curable composition for imprinting satisfies the following A to C: A: the curable composition includes a polyfunctional polymerizable compound having a polymerizable group equivalent of 150 or higher; B: the curable composition includes a photopolymerization initiator; and C: the curable composition satisfies at least one of a condition that the content of an ultraviolet absorber in which the light absorption coefficient at a maximum emission wavelength of an irradiation light source is 1/2 or higher of the light absorption coefficient of the photopolymerization initiator is 0.5 to 8 mass % with respect to non-volatile components or a condition that the content of a polymerization inhibitor is 0.1 to 5 mass % with respect to the non-volatile components. The non-volatile components refer to components in the curable composition for imprinting other than a solvent.

公开(公告)号：US11299653B2

公开(公告)日：2022-04-12

申请号：US16598546

申请日：2019-10-10

Applicant: FUJIFILM Corporation

Inventor： Naoya Shimoju ,  Akinori Shibuya ,  Yuichiro Goto

IPC: B32B7/12 ,  C09J7/30 ,  B29C59/02 ,  B32B3/26 ,  B32B37/12 ,  B32B37/15 ,  C08F290/12 ,  C09J4/06 ,  C08F220/28 ,  C08F220/60 ,  B29L31/34 ,  H01L21/027

Abstract: There are provided a composition having excellent adhesiveness and wettability, an adhesive film, a laminate, a method for producing a cured product pattern, and a method for manufacturing a circuit substrate. A composition for forming an adhesive film for imprinting, includes a compound 1 or a compound group 2; and a solvent, in which the compound 1 and the like is a compound decomposable into two or more compounds in a case where a polarity conversion group is treated, and at least one compound has a molecular weight of 30 to 400, and at least one compound has a molecular weight of 1,000 or more, the compound 1: a compound is a resin having a polymerizable group and a polarity conversion group, in which the resin has the polarity conversion group in at least a main chain or a side chain, the polarity conversion group is bonded to the main chain of the resin via a linking group in a case where the polarity conversion group is provided in the side chain, and the number of atoms constituting a chain of the linking group is 8 or more; and the compound group 2: a compound that has a polymerizable group and does not have a polarity conversion group, and a compound that does not have a polymerizable group and has a polarity conversion group.

公开(公告)号：US11029597B2

公开(公告)日：2021-06-08

申请号：US16112003

申请日：2018-08-24

Applicant: FUJIFILM Corporation

Inventor： Yuichiro Goto ,  Kazuhiro Marumo

IPC: G03F7/00 ,  H01L21/308 ,  H01L21/311 ,  B81C1/00 ,  G03F7/027 ,  H01L21/027 ,  B82Y40/00 ,  G03F7/075

Abstract: Provided are a method for producing a pattern laminate, the pattern laminate having a first layer having a pattern on an object to be processed and a second layer, which has a small waviness after etching (ΔLWR), in which the method includes a step of forming a first layer having a pattern on an object to be processed and a step of forming a second layer on the first layer, and the glass transition temperature of the first layer is 90° C. or higher; a method for producing a reversal pattern; and a pattern laminate.