公开(公告)号：US20220381608A1

公开(公告)日：2022-12-01

申请号：US17818202

申请日：2022-08-08

Applicant: Gigaphoton Inc.

Inventor： Masato MORIYA

IPC: G01J3/02 ,  G01J3/26

Abstract: A sensor degradation evaluation method according to an aspect of the present disclosure includes an evaluation step of evaluating degradation of at least one of a sensor for coarse measurement that receives interference fringes produced by a spectrometer for coarse measurement and a sensor for fine measurement that receives interference fringes produced by a spectrometer for fine measurement, and the evaluation step includes causing a plurality of kinds of laser light having wavelengths different from one another to be sequentially incident on the spectrometer for coarse measurement and the spectrometer for fine measurement and acquiring a coarse-measurement wavelength and a fine-measurement wavelength on a wavelength basis from a plurality of the received interference fringes, acquiring a degradation parameter on a wavelength basis from the coarse-measurement wavelength and the fine-measurement wavelength on a wavelength basis, and comparing the degradation parameter on a wavelength basis with a threshold.

公开(公告)号：US20160192469A1

公开(公告)日：2016-06-30

申请号：US14984458

申请日：2015-12-30

Applicant: GIGAPHOTON INC.

Inventor： Yukio WATANABE ,  Miwa IGARASHI ,  Masato MORIYA ,  Hiroaki NAKARAI

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/003

Abstract: An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.

公开(公告)号：US20130250402A1

公开(公告)日：2013-09-26

申请号：US13895242

申请日：2013-05-15

Applicant: GIGAPHOTON INC.

Inventor： Krzysztof NOWAK ,  Masato MORIYA ,  Osamu WAKABAYASHI

IPC: H01S3/067

CPC classification number: H01S3/06758 ,  G03F7/70025 ,  G03F7/70033 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/032 ,  H01S3/036 ,  H01S3/0387 ,  H01S3/041 ,  H01S3/0971 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2325 ,  H01S3/2341

Abstract: A laser beam amplifier with high optical axis stability is provided. The laser beam amplifier includes: a container for accommodating a laser medium; a pair of electrodes for performing discharge in the laser medium to form an amplification region for a laser beam in the laser medium; and an optical system for forming an optical path between a first point, upon which the laser beam is incident, and a second point, from which the laser beam is outputted, such that the amplification region is located in the optical path between the first point and the second point, wherein the first point and the second point are conjugate to each other, and the laser beam incident upon the first point is amplified while passing through the amplification region at least twice and then transferred to the second point.

Abstract translation: 提供了具有高光轴稳定性的激光束放大器。 激光束放大器包括：用于容纳激光介质的容器; 一对电极，用于在激光介质中进行放电，以在激光介质中形成用于激光束的放大区域; 以及光学系统，用于在激光束入射的第一点和从其输出激光束的第二点之间形成光路，使得放大区域位于第一点之间的光路中 以及第二点，其中第一点和第二点彼此共轭，并且入射在第一点上的激光束在通过放大区域至少两次时被放大，然后被传送到第二点。

公开(公告)号：US20130148677A1

公开(公告)日：2013-06-13

申请号：US13759970

申请日：2013-02-05

Applicant: Gigaphoton Inc.

Inventor： Masato MORIYA ,  Hideo HOSHINO ,  Osamu WAKABAYASHI ,  Hakaru MIZOGUCHI

IPC: H01S3/10

CPC classification number: H01S3/10 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/034 ,  H01S3/1061 ,  H01S3/1307 ,  H01S3/136 ,  H01S3/2232 ,  H01S3/2316 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.

Abstract translation: EUV光源装置适当地补偿由热量改变的激光束的波前。 在放大激光束的放大系统中提供波前补偿器和传感器。 传感器检测并输出激光束的角度（方向）和其波前的曲率的变化。 波前补偿控制器根据传感器的测量结果向波前补偿器输出信号。 波前补偿器根据波前补偿控制器的指令将激光束的波前校正到预定的波前。

公开(公告)号：US20160341601A1

公开(公告)日：2016-11-24

申请号：US15224894

申请日：2016-08-01

Applicant: Gigaphoton Inc.

Inventor： Masato MORIYA ,  Osamu WAKABAYASHI

IPC: G01J1/42 ,  G01J1/44 ,  G03F7/20 ,  H05G2/00

CPC classification number: G01J1/4257 ,  G01J1/0429 ,  G01J1/429 ,  G01J1/44 ,  G01J9/00 ,  G03F7/70258 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image.

Abstract translation: 一种用于产生极紫外光的系统可以包括：室，被配置成将目标材料供应到所述室中的目标供应装置，被配置为输出激光束以照射所述目标材料的激光装置;波前调整器， 所述激光束，被配置为聚焦由所述目标材料反射的激光束的成像光学系统;被配置为捕获由所述成像光学系统聚焦的所述激光束的图像的图像检测器;以及控制器，被配置为基于 捕获的图像。

公开(公告)号：US20160076944A1

公开(公告)日：2016-03-17

申请号：US14947335

申请日：2015-11-20

Applicant: Gigaphoton Inc.

Inventor： Masato MORIYA ,  Osamu WAKABAYASHI ,  Yoshinobu WATABE

IPC: G01J11/00 ,  H01S3/134 ,  G02B5/30 ,  H01S3/00 ,  G01J4/04 ,  G02B27/14

CPC classification number: G01J11/00 ,  G01J1/0414 ,  G01J1/0429 ,  G01J1/0477 ,  G01J1/4257 ,  G01J4/04 ,  G01J2001/4261 ,  G02B5/3066 ,  G02B27/148 ,  H01S3/0014 ,  H01S3/134 ,  H01S3/2366

Abstract: A light beam measurement device includes: a polarization measurement unit including a first measurement beam splitter provided on an optical path of a laser beam and configured to measure a polarization state of the laser beam having been partially reflected by the first measurement beam splitter; a beam profile measurement unit including a second measurement beam splitter provided on the optical path of the laser beam and configured to measure a beam profile of the laser beam having been partially reflected by the second measurement beam splitter; and a laser beam-directional stability measurement unit configured to measure a stability in a traveling direction of the laser beam, while the first measurement beam splitter and the second measurement beam splitter are made of a material containing CaF2.

Abstract translation: 光束测量装置包括：偏振测量单元，包括设置在激光束的光路上的第一测量光束分离器，其被配置为测量被第一测量分束器部分反射的激光束的偏振状态; 光束轮廓测量单元，包括设置在激光束的光路上并被配置为测量被第二测量分束器部分反射的激光束的光束轮廓的第二测量分束器; 以及激光束方向稳定性测量单元，被配置为测量激光束的行进方向上的稳定性，而第一测量分束器和第二测量分束器由含有CaF 2的材料制成。

公开(公告)号：US20150340838A1

公开(公告)日：2015-11-26

申请号：US14748332

申请日：2015-06-24

Applicant: GIGAPHOTON INC.

Inventor： Masato MORIYA ,  Takashi SUGANUMA ,  Osamu WAKABAYASHI

IPC: H01S3/23 ,  H01S3/223 ,  H01S3/00 ,  H05G2/00

CPC classification number: H01S3/0064 ,  H01S3/005 ,  H01S3/2232 ,  H01S3/2316 ,  H01S2301/02 ,  H05G2/008

Abstract: There may be included: a master oscillator configured to output pulsed laser light; two or more power amplifiers disposed in an optical path of the pulsed laser light to amplify the pulsed laser light; and an optical isolator provided between adjacent two of the power amplifiers in the optical path of the pulsed laser light, and configured to suppress transmission of light traveling from the power amplifiers to a side where the master oscillator is provided.

Abstract translation: 可以包括：主振荡器，被配置为输出脉冲激光; 设置在脉冲激光的光路中的两个或更多个功率放大器以放大脉冲激光; 以及光隔离器，其设置在脉冲激光的光路中的相邻的两个功率放大器之间，并且被配置为抑制从功率放大器传播到发送主振荡器的一侧的光。

公开(公告)号：US20140348188A1

公开(公告)日：2014-11-27

申请号：US14454494

申请日：2014-08-07

Applicant: GIGAPHOTON INC.

Inventor： Takashi SUGANUMA ,  Hidenobu KAMEDA ,  Masato MORIYA ,  Osamu WAKABAYASHI

IPC: H01S3/10

CPC classification number: H01S3/10 ,  H01S3/005 ,  H01S3/0971 ,  H01S3/10007 ,  H01S3/10023 ,  H01S3/1003 ,  H01S3/104 ,  H01S3/13 ,  H01S3/1301 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/2308 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2391 ,  H05G2/008

Abstract: A laser apparatus may include a master oscillator, an optical unit provided in a beam path of a laser beam from the master oscillator, a beam adjusting unit provided upstream from the optical unit in a beam path of the laser beam and configured for adjusting at least one of a beam path and a wavefront of the laser beam, a first detection unit provided between the beam adjusting unit and the optical unit in a beam path of the laser beam and configured for detecting the laser beam, a second detection unit provided downstream from the optical unit in a beam path of the laser beam and configured for detecting the laser beam, and a controller configured for controlling the beam adjusting unit based on outputs from the first and second detection units.

Abstract translation: 激光装置可以包括主振荡器，设置在来自主振荡器的激光束的光束路径中的光学单元，光束调节单元，其设置在激光束的光束路径中的光学单元的上游，并被配置为至少调节 激光束的光束路径和波前的一个;第一检测单元，设置在激光束的光束路径中的光束调整单元和光学单元之间，并且被配置为检测激光束;第二检测单元， 激光束的光束路径中的光学单元，被配置为检测激光束;以及控制器，被配置为基于来自第一和第二检测单元的输出来控制光束调整单元。

公开(公告)号：US20140319388A1

公开(公告)日：2014-10-30

申请号：US14215492

申请日：2014-03-17

Applicant: GIGAPHOTON INC.

Inventor： Masato MORIYA ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  H01S3/10

CPC classification number: H05G2/008 ,  H01S3/0078 ,  H01S3/10023 ,  H01S3/1003 ,  H01S3/10069 ,  H01S3/1306 ,  H01S3/2232 ,  H01S3/2316 ,  H01S2301/02

Abstract: A laser apparatus may include a master oscillator configured to output a pulse laser beam, an amplifier disposed in a light path of the pulse laser beam, a wavelength selection element disposed in the light path of the pulse laser beam and configured to transmit light of a selection wavelength at higher transmittance than transmittance of light of other wavelengths, and a controller configured to change the selection wavelength of the wavelength selection element.

Abstract translation: 激光装置可以包括配置成输出脉冲激光束的主振荡器，设置在脉冲激光束的光路中的放大器，配置在脉冲激光束的光路中的波长选择元件， 选择波长比其他波长的光的透射率高的透射率，以及配置为改变波长选择元件的选择波长的控制器。

公开(公告)号：US20130187065A1

公开(公告)日：2013-07-25

申请号：US13767789

申请日：2013-02-14

Applicant: GIGAPHOTON INC.

Inventor： Masato MORIYA ,  Osamu WAKABAYASHI

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H01S3/0007 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/08095 ,  H01S3/1305 ,  H01S3/1307 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2316 ,  H05G2/003

Abstract: A guide laser beam that has an optical axis and a beam diameter substantially equivalent to those of a driver pulsed laser beam is introduced into an amplification system that amplifies a laser beam that is output from a driver laser oscillator. The guide laser beam is output from a laser device as a continuous light, and is introduced into a light path of the driver pulsed laser beam via a guide laser beam introduction mirror. A sensor detects an angle (a direction) of a laser beam and a variation of a curvature of a wave front. A wave front correction controller outputs a signal to a wave front correction part based on a measured result of a sensor. The wave front correction part corrects a wave front of a laser beam to be a predetermined wave front according to an instruction from the wave front correction controller.

Abstract translation: 具有光轴和与驱动脉冲激光束的光束直径基本相同的光束直径的引导激光束被引入到放大从驱动激光振荡器输出的激光束的放大系统中。 引导激光束作为连续光从激光装置输出，并且通过引导激光束引入反射镜被引入到驱动脉冲激光束的光路中。 传感器检测激光束的角度（方向）和波前曲率的变化。 波前校正控制器基于传感器的测量结果向波前校正部输出信号。 波前校正部根据来自波前校正控制器的指示，将激光束的波前校正为规定的波前。