Laser apparatus
    11.
    发明授权

    公开(公告)号:US10965090B2

    公开(公告)日:2021-03-30

    申请号:US16402270

    申请日:2019-05-03

    Inventor: Takeshi Asayama

    Abstract: A laser apparatus according to the present disclosure includes: a laser chamber including a pair of electrodes and configured to emit, at each of a plurality of pulse repetition frequencies, a pulse laser beam having a pulse energy corresponding to a voltage applied between the electrodes; an energy detector provided on an optical path of the pulse laser beam and configured to detect the pulse energy of the pulse laser beam; a voltage control unit configured to control the applied voltage based on a target pulse energy and the pulse energy detected by the energy detector; and a pulse energy control unit configured to periodically vary the target pulse energy at a modulation frequency corresponding to each of the pulse repetition frequencies with a reference energy being a center of variation.

    Laser apparatus including gas supply device and exhausting device

    公开(公告)号:US11239625B2

    公开(公告)日:2022-02-01

    申请号:US16150297

    申请日:2018-10-03

    Inventor: Takeshi Asayama

    Abstract: A laser apparatus includes a controller that selects one of a first gas control and a second gas control based on gas pressure measured by a pressure sensor. The first gas control causes at least one of first laser gas and second laser gas is supplied to a chamber such that the gas pressure in the chamber after the first gas control is higher than the gas pressure in the chamber before the first gas control. The second gas control causes at least the first laser gas is supplied to the chamber and causes a part of the laser gas in the chamber is exhausted such that a difference between the gas pressure in the chamber before the second gas control and the gas pressure in the chamber after the second gas control is smaller than a difference between the gas pressure in the chamber before the first gas control and the gas pressure in the chamber after the first gas control.

    Excimer laser chamber device
    14.
    发明授权

    公开(公告)号:US10050403B2

    公开(公告)日:2018-08-14

    申请号:US15680474

    申请日:2017-08-18

    Abstract: An excimer laser chamber device may include: a the laser chamber; a first electrode provided in the laser chamber; a second electrode provided in the laser chamber to face the first electrode; an electrode holder provided in the laser chamber to be connected to a high voltage; at least one connecting terminal including a first anchored portion anchored to the first electrode and a second anchored portion anchored to the electrode holder, the at least one connecting terminal being configured to electrically connect the first electrode and the electrode holder; a guide member held by the electrode holder, the guide member being configured to position the first electrode in a direction substantially perpendicular to both a direction of electric discharge between the first electrode and the second electrode and a longitudinal direction of the first electrode; and an electrode-gap-varying unit configured to move the first electrode in a direction substantially parallel to the direction of electric discharge.

    METHOD AND APPARATUS FOR CLEANING COLLECTOR MIRROR IN EUV LIGHT GENERATOR
    16.
    发明申请
    METHOD AND APPARATUS FOR CLEANING COLLECTOR MIRROR IN EUV LIGHT GENERATOR 审中-公开
    EUV光发生器清洗收集器镜的方法和装置

    公开(公告)号:US20140166046A1

    公开(公告)日:2014-06-19

    申请号:US13964816

    申请日:2013-08-12

    CPC classification number: B08B7/00 B08B7/0035 B08B13/00

    Abstract: A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.

    Abstract translation: 一种在EUV光发生器中清洁收集反射镜的方法,其中靶产生等离子体状态,并且通过集光镜收集产生的EUV光,该方法被用于EUV发光器,用于清除附着在其上的污染物,该方法包括 :准备至少两个收集镜; 将其中一个反射镜定位在EUV聚光位置,同时将另一个反射镜定位在清洁位置; 确定在清洁位置处的反射镜是否被清洁,同时确定在聚光位置的反射镜是否需要清洁; 并且一旦确定在清洁位置处的反射镜被清洁并且聚光位置处的反射镜需要清洁,则在反射镜处于聚光位置并且在将反射镜输送到清洁位置并且被清洁时需要清洁到清洁位置 到聚光位置。

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