公开(公告)号：US20120009440A1

公开(公告)日：2012-01-12

申请号：US13242190

申请日：2011-09-23

Applicant: Hideaki FUKUZAWA ,  Katsuhiko KOI ,  Hiromi FUKE ,  Hiroshi TOMITA ,  Hitoshi IWASAKI ,  Masashi SAHASHI

Inventor： Hideaki FUKUZAWA ,  Katsuhiko KOI ,  Hiromi FUKE ,  Hiroshi TOMITA ,  Hitoshi IWASAKI ,  Masashi SAHASHI

IPC: G11B5/39

CPC classification number: H01F10/3272 ,  B82Y10/00 ,  B82Y25/00 ,  G11B5/3903 ,  G11B5/3932 ,  G11B2005/3996 ,  H01F10/3259 ,  H01F10/3295 ,  H01F41/325 ,  H01L43/08 ,  H01L43/10 ,  Y10T428/1114 ,  Y10T428/1121

Abstract: There are provided a magnetoresistance effect element, a magnetic head, a magnetic head assembly and a magnetic recording system, which have high sensitivity and high reliability. The magnetoresistance effect element has two ferromagnetic layers, a non-magnetic layer provided between the ferromagnetic layers, and a layer containing an oxide or nitride as a principal component, wherein the layer containing the oxide or nitride as the principal component contains a magnetic transition metal element which does not bond to oxygen and nitrogen and which is at least one of Co, Fe and Ni.

Abstract translation: 提供了具有高灵敏度和高可靠性的磁阻效应元件，磁头，磁头组件和磁记录系统。 磁阻效应元件具有两个铁磁层，设置在铁磁层之间的非磁性层和包含以氧化物或氮化物为主要成分的层，其中以氧化物或氮化物为主要成分的层含有磁性过渡金属 元素，其不结合氧和氮并且是Co，Fe和Ni中的至少一种。

公开(公告)号：US20110314689A1

公开(公告)日：2011-12-29

申请号：US12980079

申请日：2010-12-28

Applicant: Hisashi OKUCHI ,  Yohei SATO ,  Hidekazu HAYASHI ,  Hiroshi TOMITA ,  Yukiko KITAJIMA

Inventor： Hisashi OKUCHI ,  Yohei SATO ,  Hidekazu HAYASHI ,  Hiroshi TOMITA ,  Yukiko KITAJIMA

IPC: F26B3/02 ,  B08B3/00

CPC classification number: C11D11/0047 ,  H01L21/02057 ,  H01L21/67028 ,  H01L21/67034

Abstract: According to one embodiment, a semiconductor substrate whose surface is wet with a chemical solution (solvent) and formed with patterns having an aspect ratio of 10 or more is loaded into a chamber. Then, while the chemical solution (solvent) remains on the semiconductor substrate, its temperature is increased to a predetermined temperature in the range of 160° C. or more and less than the critical temperature of the chemical solution (solvent), and the evaporated chemical solution (solvent) is discharged from the chamber.

Abstract translation: 根据一个实施例，将其表面用化学溶液（溶剂）润湿并且形成有纵横比为10以上的图案的半导体基板装载到室中。 然后，当化学溶液（溶剂）保留在半导体衬底上时，其温度升高到在160℃以上且小于化学溶液（溶剂）的临界温度的范围内的预定温度，并且蒸发 化学溶液（溶剂）从室排出。

公开(公告)号：US20110230054A1

公开(公告)日：2011-09-22

申请号：US12841217

申请日：2010-07-22

Applicant: Hiroshi TOMITA ,  Hisashi Okuchi ,  Minato Inukai ,  Hidekazu Hayashi ,  Yasuhito Yoshimizu

Inventor： Hiroshi TOMITA ,  Hisashi Okuchi ,  Minato Inukai ,  Hidekazu Hayashi ,  Yasuhito Yoshimizu

IPC: H01L21/3205 ,  B08B3/08 ,  B08B3/12

CPC classification number: H01L21/02052 ,  H01L21/02057

Abstract: In one embodiment, a semiconductor substrate cleaning method is disclosed. The method can clean a semiconductor substrate by using a chemical of 80° C. or above. The method can rinse the semiconductor substrate by using pure water of 40° C. or above after the cleaning of the semiconductor substrate. The method can then rinse the semiconductor substrate by using pure water of 30° C. or below. In addition, the method can dry the semiconductor substrate.

Abstract translation: 在一个实施例中，公开了半导体衬底清洗方法。 该方法可以使用80℃以上的化学物质来清洗半导体衬底。 该方法可以在清洁半导体衬底之后使用40℃以上的纯水冲洗半导体衬底。 然后，该方法可以通过使用30℃或更低的纯水冲洗半导体衬底。 此外，该方法可以干燥半导体衬底。

公开(公告)号：US20110168205A1

公开(公告)日：2011-07-14

申请号：US12985652

申请日：2011-01-06

Applicant: Shigeru TAHARA ,  Fumiko YAMASHITA ,  Eiichi NISHIMURA ,  Tokuhisa OHIWA ,  Takaya MATSUSHITA ,  Hiroshi TOMITA

Inventor： Shigeru TAHARA ,  Fumiko YAMASHITA ,  Eiichi NISHIMURA ,  Tokuhisa OHIWA ,  Takaya MATSUSHITA ,  Hiroshi TOMITA

IPC: B08B7/00 ,  C23F1/08

CPC classification number: H01L21/67028 ,  H01L21/02057

Abstract: A substrate cleaning method performing cleaning of a surface of a substrate after a pattern on the substrate is formed by plasma etching, includes: a by-product removal process removing a by-product by exposing the substrate to an HF gas atmosphere; and a residual fluorine removal process removing fluorine remaining on the substrate by turning cleaning gas containing hydrogen gas and chemical compound gas containing carbon and hydrogen as constituent elements into plasma to act on the substrate.

Abstract translation: 通过等离子体蚀刻形成在基板上的图案之后进行基板表面的清洗的基板清洗方法，包括：通过将基板暴露于HF气体气氛中来除去副产物的副产物去除处理; 以及通过将含有氢气的含氢气和含有碳和氢的化合物气体作为构成元素的清洗气体转移到等离子体中，从而除去残留在基板上的氟的残留除氟过程。

公开(公告)号：US20110061684A1

公开(公告)日：2011-03-17

申请号：US12878382

申请日：2010-09-09

Applicant: Hiroshi TOMITA ,  Hidekazu Hayashi ,  Minako Inukai ,  Yasuhito Yoshimizu ,  Kaori Umezawa

Inventor： Hiroshi TOMITA ,  Hidekazu Hayashi ,  Minako Inukai ,  Yasuhito Yoshimizu ,  Kaori Umezawa

IPC: B08B7/00

CPC classification number: H01L21/67051 ,  H01L21/02052

Abstract: A cleaning method for a semiconductor wafer with cleaning liquid comprising: cleaning the semiconductor wafer while the temperature of the surface of the semiconductor wafer is from 30 degrees to 50 degrees, the cleaning liquid has lower surface tension and viscosity than water.

Abstract translation: 一种具有清洗液的半导体晶片的清洗方法，包括：在半导体晶片的表面的温度为30度至50度的范围内清洗半导体晶片，该清洗液具有比水低的表面张力和粘度。

公开(公告)号：US20090250431A1

公开(公告)日：2009-10-08

申请号：US12404681

申请日：2009-03-16

Applicant: Minako INUKAI ,  Yoshihiro OGAWA ,  Hiroshi TOMITA ,  Hiroyasu IIMORI ,  Yuji YAMADA ,  Yoshihiro UOZUMI ,  Linan JI ,  Kaori UMEZAWA ,  Hisadhi OKUCHI

Inventor： Minako INUKAI ,  Yoshihiro OGAWA ,  Hiroshi TOMITA ,  Hiroyasu IIMORI ,  Yuji YAMADA ,  Yoshihiro UOZUMI ,  Linan JI ,  Kaori UMEZAWA ,  Hisadhi OKUCHI

IPC: C23F1/00 ,  B08B3/08 ,  C23F1/08 ,  B08B13/00

CPC classification number: H01L21/02082 ,  H01L21/02057

Abstract: A substrate processing method that processes a substrate on which a plurality of patterns adjacent to each other are formed, has: supplying a first processing liquid to a principal surface of the substrate that is dry and has the patterns formed thereon to make the first processing liquid adhere to the principal surface of the substrate; and supplying a second processing liquid having a higher surface tension than the first processing liquid to the principal surface of the substrate in the state where the first processing liquid adheres to the principal surface of the substrate to process the principal surface of the substrate with the second processing liquid.

Abstract translation: 在其上形成有彼此相邻的多个图案的基板的处理的基板处理方法具有：将第一处理液体供给到干燥后的基板的主面，并且形成有图案的第一处理液 粘附在基材的主表面上; 以及在所述第一处理液体粘附到所述基板的主表面的状态下，将具有比所述第一处理液体更高的表面张力的第二处理液供给到所述基板的主表面，以处理所述基板的所述主表面， 处理液体。

公开(公告)号：US20080116277A1

公开(公告)日：2008-05-22

申请号：US11537563

申请日：2006-09-29

Applicant: Hiroshi TOMITA

Inventor： Hiroshi TOMITA

IPC: G06K7/10 ,  G06K9/00

CPC classification number: H04N1/32133 ,  H04N2201/3236 ,  H04N2201/3269 ,  H04N2201/3271 ,  H04N2201/3274 ,  H04N2201/3283

Abstract: Systems, methods and storage mediums are disclosed for processing images and two-dimensional barcodes for two-way verification of document data. In one exemplary embodiment, image data of a document is obtained, processed and rendered into a barcode for incorporation into a reproduction of an original image of the document. The resolution of the barcode may be higher than the resolution of the original image which allows the size of the barcode to be reduced. Moreover, the amount of data associated with the original image may be decreased which allows for smaller data storage requirements and faster data transfer of the document.

Abstract translation: 公开了用于处理图像和二维条形码以用于文档数据的双向验证的系统，方法和存储介质。 在一个示例性实施例中，文档的图像数据被获得，处理并呈现成条形码，以便并入到文档的原始图像的再现中。 条形码的分辨率可能高于允许缩小条形码尺寸的原始图像的分辨率。 此外，可以减少与原始图像相关联的数据量，这允许更小的数据存储要求和更快的文档数据传输。