公开(公告)号：US20250147421A1

公开(公告)日：2025-05-08

申请号：US18838262

申请日：2022-12-19

Applicant: JSR CORPORATION

Inventor： Ken MARUYAMA

IPC: G03F7/039 ,  C08F220/18 ,  C08F220/28 ,  G03F7/00 ,  G03F7/038

Abstract: A radiation-sensitive composition contains: (A) a polymer including a structural unit (U) represented by the following formula (1); and (B) a radiation-sensitive acid-generator formed of an onium cation having at least one group Rf1 selected from the group consisting of a fluoroalkyl group and a fluoro group (excepting a fluoro group in the fluoroalkyl group) and an organic anion having an iodine atom. In formula (1), R1 represents a hydrogen atom, a methyl group, or the like. X1 represents a single bond, an ether bond, an ester bond, or the like. Ar1 represents a cyclic group bound to X1 via an aromatic ring. A hydroxy group or group —ORY is bound to an atom adjacent to the atom bound to X1, among the atoms forming the aromatic group in Ar1. RY represents an acid-releasable group.

公开(公告)号：US20240385520A1

公开(公告)日：2024-11-21

申请号：US18026002

申请日：2021-07-30

Applicant: JSR CORPORATION

Inventor： Ken MARUYAMA

IPC: G03F7/039 ,  C08F220/18 ,  G03F7/004 ,  G03F7/038

Abstract: Provided is a radiation-sensitive resin composition capable of exhibiting sensitivity and CDU performance at a sufficient level when a next-generation technology is applied, and a method for forming a pattern. A radiation-sensitive resin composition contains: a resin containing a structural unit (I) having an acid-dissociable group represented by the following formula (1) and a structural unit (II) having a phenolic hydroxy group, and contains neither an organic acid anion moiety nor an onium cation moiety; one or more onium salts containing an organic acid anion moiety and an onium cation moiety; and a solvent, wherein at least part of the onium cation moiety in the onium salt contains an aromatic ring structure having a fluorine atom. In the formula (1), RT is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, and RX is a monovalent hydrocarbon group having 1 to 20 carbon atoms.

公开(公告)号：US20230259032A1

公开(公告)日：2023-08-17

申请号：US18138873

申请日：2023-04-25

Applicant: JSR CORPORATION

Inventor： Miki TAMADA ,  Ryo KUMEGAWA ,  Hiroyuki KOMATSU ,  Motohiro SHIRATANI ,  Ken MARUYAMA ,  Sosuke OSAWA

IPC: G03F7/11 ,  C08F112/08 ,  C08F120/14 ,  C09D125/06 ,  C09D133/12

CPC classification number: G03F7/11 ,  C08F112/08 ,  C08F120/14 ,  C09D125/06 ,  C09D133/12 ,  C08F2810/40

Abstract: A composition includes: at least one polymer represented by formula (1), formula (2), or both; and a solvent. A1 and A2 are each independently a structural unit having 2 or more carbon atoms; a plurality of A's are the same or different and a plurality of A2s are the same or different; n1 and n2 are each independently an integer of 2 to 500; R1, R2, and R3 are each independently an organic group having 1 or more carbon atoms, or R1 and R2 taken together represent a ring together with X1, Y1, and P; R1 and R2 are the same or different; X1, Y1, and Y2 are each independently a single bond, —O—, or —NR4—; R4 is an organic group having 1 or more carbon atoms; and Z1 and Z2 are each independently hydrogen or an organic group having 1 to 15 carbon atoms.

公开(公告)号：US20230244143A9

公开(公告)日：2023-08-03

申请号：US17854048

申请日：2022-06-30

Applicant: JSR CORPORATION

Inventor： Takuhiro TANIGUCHI ,  Katsuaki NISHIKORI ,  Hayato NAMAI ,  Kazuya KIRIYAMA ,  Ken MARUYAMA

IPC: G03F7/039 ,  C08G75/20

CPC classification number: G03F7/0392 ,  C08G75/20

Abstract: A radiation-sensitive resin composition includes: a polymer including a structural unit including an acid-labile group; and a compound represented by formula (1). R1, R2, and R3 each independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; X1, X2, and X3 each independently represent a group represented by formula (2); a sum of d, e, and f is no less than 1; R4 represents a hydrocarbon group having 1 to 20 carbon atoms and R5 represents a hydrocarbon group having 1 to 20 carbon atoms, or R4 and R5 taken together represent a heterocyclic structure having 4 to 20 ring atoms, together with the sulfur atom to which R4 and R5 bond; n is 0 or 1; A− represents a monovalent sulfonic acid anion; and Y represents —COO—, —OCO—, or —N(R7)CO—.

公开(公告)号：US20220382152A1

公开(公告)日：2022-12-01

申请号：US17867739

申请日：2022-07-19

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Takuhiro TANIGUCHI ,  Ken MARUYAMA

IPC: G03F7/039 ,  G03F7/029

Abstract: A radiation-sensitive resin composition includes a polymer and a compound. The compound includes a first structural unit including an aromatic carbon ring to which no less than two hydroxy groups bond, and a second structural unit including an acid-labile group which is dissociable by an action of an acid to give a carboxy group. The compound is represented by formula (1). R1 represents a monovalent organic group having 1 to 30 carbon atoms; and X represents a monovalent radiation-sensitive onium cation. A weight average molecular weight of the polymer is no greater than 10,000. R1—COO−X+(1)

公开(公告)号：US20220269172A1

公开(公告)日：2022-08-25

申请号：US17673952

申请日：2022-02-17

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Takuhiro TANIGUCHI ,  Ken MARUYAMA

IPC: G03F7/039 ,  G03F7/004 ,  C08F220/18 ,  C08F220/22

Abstract: Provided are: a radiation-sensitive resin composition, a method of forming a resist pattern, and a polymer which enable forming a resist pattern with favorable sensitivity to exposure light and superiority in terms of CDU performance and resolution. The radiation-sensitive resin composition contains: a polymer having: a first structural unit represented by formula (1), and a second structural unit derived from a (meth)acrylic acid ester including an acid-labile group; and a radiation-sensitive acid generator.

公开(公告)号：US20210389667A9

公开(公告)日：2021-12-16

申请号：US17081000

申请日：2020-10-27

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Takuhiro TANIGUCHI ,  Ken MARUYAMA

IPC: G03F7/004 ,  G03F7/039 ,  C08F220/18 ,  C07D317/70 ,  C07C381/12 ,  C07C309/17 ,  C07D327/04 ,  C07C309/12 ,  C07C65/10 ,  C07C59/115 ,  C07C69/63 ,  C07C65/05

Abstract: A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R1, R2, and R3 represents a fluorine atom or the like; and R4 and R5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R6s represents a fluorine atom or the like; and R8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.

公开(公告)号：US20180299773A1

公开(公告)日：2018-10-18

申请号：US15953860

申请日：2018-04-16

Applicant: JSR CORPORATION

Inventor： Ken MARUYAMA

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  G03F7/40

Abstract: A radiation-sensitive resin composition includes: a resin including a structure unit having an acid-dissociable group; a radiation-sensitive acid generator; and a solvent. The radiation-sensitive acid generator includes at least two of compounds represented by formulae (1) to (3), provided that the compound represented by formula (1) and the compound represented by formula (3) within the scope of the compound represented by formula (2) are excluded. In the formulae (1) to (3), R1, R2 and R3 are each independently a group having a cyclic structure; X11, X12, X21, X22, X31 and X32 are each independently a hydrogen atom, a fluorine atom, or a fluorinated hydrocarbon group, provided that both X11 and X12, both X21 and X22, and both X31 and X32 are not a hydrogen atom, respectively.

公开(公告)号：US20160291462A1

公开(公告)日：2016-10-06

申请号：US15082389

申请日：2016-03-28

Applicant: JSR CORPORATION

Inventor： Kanako MEYA ,  Yusuke ANNO ,  Ken MARUYAMA ,  Shuto MORI

IPC: G03F7/00 ,  H01L21/027 ,  G03F7/40

CPC classification number: G03F7/40 ,  G03F7/0397 ,  G03F7/325 ,  G03F7/405 ,  H01L21/0273

Abstract: A pattern-forming method comprises forming a prepattern that is insoluble or hardly soluble in an organic solvent. A first composition is applied on at least lateral faces of the prepattern to form a resin layer. Adjacent regions to the prepattern of the resin layer are insolubilized or desolubilized in the organic solvent without being accompanied by an increase in a molecular weight by heating the prepattern and the resin layer. Regions other than the adjacent regions insolubilized or desolubilized of the resin layer are removed with the organic solvent. The first composition comprises a first polymer having a solubility in the organic solvent to be decreased by an action of an acid. At least one selected from the following features (i) and (ii) is satisfied: (i) the first polymer comprises a basic group; and (ii) the first composition further comprises a basic compound.

Abstract translation: 图案形成方法包括形成不溶于或几乎不溶于有机溶剂的预模式。 将第一组合物涂覆在预制图案的至少侧面上以形成树脂层。 与树脂层的预制图相邻的区域在有机溶剂中不溶或脱溶，而不伴随着预加图案和树脂层的分子量的增加。 用有机溶剂除去除了树脂层不溶或去溶解的相邻区域以外的区域。 第一组合物包含在有机溶剂中具有通过酸作用而降低的第一聚合物。 选自以下特征（i）和（ii）中的至少一种：（i）第一聚合物包含碱性基团; 和（ii）第一组合物还包含碱性化合物。

公开(公告)号：US20130288179A1

公开(公告)日：2013-10-31

申请号：US13929357

申请日：2013-06-27

Applicant: JSR CORPORATION

Inventor： Kazuo NAKAHARA ,  Ken MARUYAMA

IPC: G03F7/004

CPC classification number: G03F7/004 ,  C07C22/02 ,  C07C22/08 ,  C07C25/18 ,  C07C309/19 ,  C07C381/12 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2601/16 ,  C07C2602/42 ,  C07D307/77 ,  C08K5/07 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  C08L101/02

Abstract: A radiation-sensitive resin composition includes a compound represented by a formula (1), and a polymer that includes a structural unit having an acid-labile group. R1 and R4 each independently represent a hydrogen atom, or the like. R2 and R3 each independently represent a hydrogen atom or the like. X1 and X2 each independently represent a hydrogen atom, or the like, or X1 and X2 taken together represent —S—, —O—, —SO2—, or the like. A represents an ethanediyl group, wherein at least one hydrogen atom included in X1, X2 and A is substituted by —Y—SO3−M+. Y represents an alkanediyl group having 1 to 10 carbon atoms, or the like. M+ represents a monovalent onium cation. In the case where —Y—SO3−M+ is present in a plurality of number, a plurality of Ys are each identical or different and a plurality of M+s are each identical or different.

Abstract translation: 辐射敏感性树脂组合物包括由式（1）表示的化合物和包含具有酸不稳定基团的结构单元的聚合物。 R 1和R 4各自独立地表示氢原子等。 R2和R3各自独立地表示氢原子等。 X1和X2各自独立地表示氢原子等，或者X1和X2一起表示-S-，-O-，-SO 2 - 等。 A表示乙二基，其中X1，X2和A中包含的至少一个氢原子被-Y-SO3-M +取代。 Y表示碳原子数1〜10的烷二基等。 M +表示单价鎓阳离子。 在-Y-SO3-M +存在多个数的情况下，多个Y分别相同或不同，多个M + s分别相同或不同。