公开(公告)号：US20090029561A1

公开(公告)日：2009-01-29

申请号：US12219131

申请日：2008-07-16

申请人： Masanao Fukuda ,  Kazuhiro Morimitsu ,  Takafumi Sasaki

发明人： Masanao Fukuda ,  Kazuhiro Morimitsu ,  Takafumi Sasaki

IPC分类号： H01L21/283 ,  C23C16/00

CPC分类号： C23C16/45591 ,  C23C16/45578 ,  C30B25/14 ,  C30B25/165

摘要： There is provided a semiconductor processing apparatus comprising a processing tube for housing a substrate support member that supports a plurality of substrates stacked at a prescribed pitch in a vertical direction; a gas supply part that extends in a direction in which the substrates are stacked in the processing tube and that has a plurality of gas supply openings; an exhaust part that opens onto the processing tube; a gas rectifying plate that is disposed in a space between a penumbra of the substrates supported on the substrate support member and an inner wall of the processing tube, and that extends from the gas supply part in a circumferential direction of the processing tube and in the direction in which the substrates are stacked; and a gas flow regulating part disposed in a space in the processing tube that is above a top-most gas supply opening and a top-most substrate and in a space in the processing tube that is below a bottom-most substrate and a bottom-most gas supply opening. A thin film formed on the substrate can be made more uniform.

摘要翻译： 提供了一种半导体处理装置，其包括：处理管，用于容纳基板支撑构件，所述基板支撑构件支撑以垂直方向以规定间距堆叠的多个基板; 气体供给部，其沿着所述基板堆叠在所述处理管中并具有多个气体供给开口的方向延伸; 通向处理管上的排气部分; 气体整流板，其设置在支撑在基板支撑部件上的基板的半暗区与处理管的内壁之间的空间中，并且从处理管的圆周方向从气体供给部延伸， 堆叠基板的方向; 以及气体流量调节部，其设置在所述处理管的空间中，所述空间位于最上面的气体供给开口和最上面的基板之上，并且处于所述处理管的位于最下面的基板之下的空间中， 大部分供气口。 可以使形成在基板上的薄膜更均匀。

公开(公告)号：US20060247817A1

公开(公告)日：2006-11-02

申请号：US11397692

申请日：2006-04-05

申请人： Toshiaki Otsuki ,  Soichiro Ide ,  Takafumi Sasaki

发明人： Toshiaki Otsuki ,  Soichiro Ide ,  Takafumi Sasaki

IPC分类号： G06F19/00

CPC分类号： G01B21/042

摘要： A work is installed on a table of a machine tool, and the coordinate system on the work is (X′, Y′, Z′). Each three points on respective three faces of the work, which are orthogonal to one another, A, B, C, D, E, F, G, H and I, are detected with a touch probe. From three points on the same plane, each of three formulas of planes which lies on the three points, respectively, are obtained. A position O′ (XO, YO, ZO) of a point where the three plane intersect with one another is obtained. This position is a parallel translation error. From these three plane formulas, points on the X′, Y′ and Z′ axes each being distant from the position O′ by the length L are obtained. Rotation matrices are obtained from the respective points, position O′ (XO, YO, ZO), and L. Rotary direction errors are obtained using the rotation matrices. In this manner, a work location error which is composed of the three-dimensional parallel translation error and three-dimensional rotary direction errors is obtained.

摘要翻译： 工件安装在机床的工作台上，工件上的坐标系为（X'，Y'，Z'）。 A，B，C，D，E，F，G，H和I彼此正交的工件的相应三个面上的每个三个点都用探针检测。 从同一平面上的三个点，分别得到位于三个点上的三个平面的三个公式。 获得三个平面彼此相交的点的位置O'（X O，O，Y O，Z O O）。 这个位置是平行翻译错误。 通过这三个平面公式，可以得到X'，Y'，Z'各自远离位置O'长度L的点。 旋转矩阵从相应的位置获得，位置O'（X O，O，O，Z O O）和L.旋转方向误差 使用旋转矩阵获得。 以这种方式，获得由三维平行平移平移误差和三维旋转方向误差构成的作业位置误差。

公开(公告)号：US4509779A

公开(公告)日：1985-04-09

申请号：US418835

申请日：1982-09-16

申请人： Takafumi Sasaki

发明人： Takafumi Sasaki

IPC分类号： E05B65/00 ,  E05C3/32 ,  F24C7/02 ,  F24C15/02 ,  H05B6/76

CPC分类号： F24C15/022 ,  H05B6/6417 ,  Y10S292/61 ,  Y10S292/69 ,  Y10S292/72 ,  Y10T292/18

摘要： A door locking device for a microwave oven of the present invention has a latch disposed on the rear surface of a door and pivoted clockwise by the urging force of a spring, and an engaging portion which stops a hook at the distal end of the latch. Upon closing operation of the door, the hook engages with the engaging portion to lock the door. For opening the door, a lock release actuator is moved upward to pivot the latch upward to release the locking state of the latch with the engaging portion.

摘要翻译： 本发明的用于微波炉的门锁装置具有设置在门的后表面上的闩锁，并通过弹簧的作用力顺时针方向枢转，以及在闩锁的远端止动钩子的接合部分。 在关闭门的操作时，钩与接合部分接合以锁定门。 为了打开门，锁定释放致动器向上移动以使闩锁向上枢转以释放闩锁与接合部分的锁定状态。

公开(公告)号：US11084274B2

公开(公告)日：2021-08-10

申请号：US15375738

申请日：2016-12-12

申请人： Takafumi Sasaki

发明人： Takafumi Sasaki

IPC分类号： B29C67/00 ,  B33Y50/02 ,  B29C64/165 ,  B33Y30/00 ,  B33Y50/00 ,  B33Y10/00 ,  B29K105/00

摘要： A three-dimensional shaping apparatus includes: a supplying unit configured to supply powder to a storage unit to form a layer of the powder; a discharging unit configured to discharge shaping liquid to solidify the powder onto the powder; and a controlling unit configured to generate a control signal for controlling the supplying unit and the discharging unit based on shaping data indicating a shape of a three-dimensional shaped object. The controlling unit is configured to generate the control signal for laminating at least one sacrificial layer separable from at least one shaping layer corresponding to the three-dimensional shaped object in such a position that the at least one sacrificial layer is under the at least one shaping layer, based on the shaping data and powder information stored in advance and indicating change in thickness of a layer of the powder caused by permeation of the shaping liquid.

公开(公告)号：US10336053B2

公开(公告)日：2019-07-02

申请号：US15276881

申请日：2016-09-27

申请人： Takafumi Sasaki

发明人： Takafumi Sasaki

IPC分类号： B29C67/00 ,  B33Y50/02 ,  B33Y30/00 ,  B29C64/165 ,  B29C64/386 ,  B29K105/00 ,  B29C64/393

摘要： A control apparatus controls a three-dimensional object fabrication apparatus including a storing unit configured to store therein powder, a supplying unit configured to supply the powder to the storing unit in layers, and a discharge unit configured to discharge, onto the powder, a fabrication liquid for solidifying the powder. The control apparatus includes a controller configured to control a total amount of the powder supplied from the supplying unit to the storing unit based on fabrication data indicating a shape of a three-dimensional object and powder information indicating a change in dimension of a layer of the powder due to permeation of the fabrication liquid.

公开(公告)号：US09028614B2

公开(公告)日：2015-05-12

申请号：US13406056

申请日：2012-02-27

申请人： Daisuke Hara ,  Takeshi Itoh ,  Masanao Fukuda ,  Takatomo Yamaguchi ,  Hiroaki Hiramatsu ,  Shuhei Saido ,  Takafumi Sasaki

发明人： Daisuke Hara ,  Takeshi Itoh ,  Masanao Fukuda ,  Takatomo Yamaguchi ,  Hiroaki Hiramatsu ,  Shuhei Saido ,  Takafumi Sasaki

IPC分类号： C23C16/455 ,  C23C16/458 ,  C23C16/46 ,  H01L21/67 ,  C30B25/08 ,  C30B25/14 ,  C30B29/36 ,  H01L21/673 ,  H01L21/677 ,  C23C16/32 ,  C23C16/44

CPC分类号： H01L21/67109 ,  C23C16/325 ,  C23C16/4405 ,  C23C16/4412 ,  C23C16/455 ,  C23C16/458 ,  C23C16/4581 ,  C23C16/4582 ,  C23C16/4583 ,  C23C16/4584 ,  C23C16/4587 ,  C23C16/4588 ,  C23C16/46 ,  C30B25/08 ,  C30B25/14 ,  C30B29/36 ,  H01L21/67303 ,  H01L21/67309 ,  H01L21/67757

摘要： When processing such as SiC epitaxial growth is performed at an ultrahigh temperature of 1500° C. to 1700° C., a film-forming gas can be decreased to heat-resistant temperature of a manifold and film quality uniformity can be improved. A substrate processing apparatus includes a reaction chamber for processing a plurality of substrates, a boat for holding the plurality of substrates, a gas supply nozzle for supplying a film-forming gas to the plurality of substrates, an exhaust port for exhausting the film-forming gas supplied into the reaction chamber, a heat exchange part which defines a second flow path narrower than a first flow path defined by an inner wall of the reaction chamber and the boat, and a gas discharge part installed under the lowermost substrate of the plurality of substrates.

摘要翻译： 当在1500℃至1700℃的超高温下进行诸如SiC外延生长的处理时，可以将成膜气体降低至歧管的耐热温度，并且可以提高膜质量均匀性。 基板处理装置包括用于处理多个基板的反应室，用于保持多个基板的船，用于向多个基板供给成膜气体的气体供给喷嘴，用于排出成膜的排气口 供应到反应室的气体，限定比由反应室和船的内壁限定的第一流动路径窄的第二流动路径的热交换部分，以及安装在多个 底物。

公开(公告)号：US08889533B2

公开(公告)日：2014-11-18

申请号：US13580933

申请日：2011-02-22

申请人： Takafumi Sasaki ,  Yoshinori Imai ,  Koei Kuribayashi ,  Sadao Nakashima

发明人： Takafumi Sasaki ,  Yoshinori Imai ,  Koei Kuribayashi ,  Sadao Nakashima

IPC分类号： H01L21/20 ,  H01L21/36 ,  C23C16/455 ,  C23C16/32 ,  H01L21/02

CPC分类号： C23C16/45578 ,  C23C16/325 ,  H01L21/02529 ,  H01L21/02532 ,  H01L21/02573 ,  H01L21/0262 ,  Y10S438/931

摘要： A method of manufacturing a semiconductor device by using a substrate processing apparatus comprises a reaction chamber configured to process a plurality of substrates stacked at predetermined intervals, wherein a first gas flow from a first gas supply inlet and a second gas flow from a second gas supply inlet are crossed with each other before these gas flows reach the substrates. The method of manufacturing a semiconductor device comprises: loading the plurality of substrates into the reaction chamber; supplying a silicon-containing gas and a chlorine-containing gas from the first gas supply inlet into the reaction chamber, supplying a carbon-containing gas and a reducing gas from the second gas supply inlet into the reaction chamber and supplying a dopant-containing gas into the reaction chamber from the first gas supply inlet or the second gas supply inlet; and unloading the substrates from the reaction chamber.

摘要翻译： 通过使用基板处理装置制造半导体器件的方法包括：反应室，被配置为处理以预定间隔堆叠的多个基板，其中来自第一气体供应入口的第一气体流和来自第二气体供应源的第二气体流 入口在这些气体流到达基板之前彼此交叉。 制造半导体器件的方法包括：将多个衬底装载到反应室中; 将来自所述第一气体供给口的含硅气体和含氯气体供给到所述反应室中，将来自所述第二气体供给口的含碳气体和还原气体供给到所述反应室内，并供给含掺杂剂的气体 从第一供气口或第二供气口进入反应室; 并从反应室中卸载基板。

公开(公告)号：US08350514B2

公开(公告)日：2013-01-08

申请号：US13097795

申请日：2011-04-29

申请人： Toshiaki Otsuki ,  Soichiro Ide ,  Osamu Hanaoka ,  Takafumi Sasaki

发明人： Toshiaki Otsuki ,  Soichiro Ide ,  Osamu Hanaoka ,  Takafumi Sasaki

IPC分类号： G05B19/25

CPC分类号： G05B19/404 ,  G05B2219/49198 ,  G05B2219/50297

摘要： A numerical controller for controlling a multi-axis machine calculates an axis-dependent translation error amount and an axis-dependent rotation error amount based on a command axis position. Translation and rotation compensation amounts are calculated based on the axis dependent translation and rotation error amounts, respectively. The translation and rotation compensation amounts are added to command linear and rotary axis positions, respectively. Three linear axes and three rotary axes are driven to the added positions, individually. Thus, there is provided a numerical controller that enables even machining with a side face of a tool or boring to be in commanded tool position and posture (orientation) in the multi-axis machine.

摘要翻译： 用于控制多轴机器的数值控制器基于指令轴位置计算与轴相关的平移误差量和与轴相关的旋转误差量。 平移和旋转补偿量分别根据轴相关平移和旋转误差量计算。 平移和旋转补偿量分别被添加到命令线性和旋转轴位置。 三个直线轴和三个旋转轴分别被驱动到加入位置。 因此，提供了一种能够在多轴机器中使用工具或镗孔的侧面进行均匀加工的数值控制器处于命令的工具位置和姿势（取向）中。

公开(公告)号：US08042911B2

公开(公告)日：2011-10-25

申请号：US11936922

申请日：2007-11-08

申请人： Takafumi Sasaki

发明人： Takafumi Sasaki

IPC分类号： B41J2/04 ,  B41J2/045

CPC分类号： B41J2/055 ,  B41J2/14274

摘要： A liquid dispenser head includes nozzles, pressure chambers, an energy generator, a shared chamber, a vibration member, and a specific wall portion. The nozzles discharge liquid. Each of the pressure chambers communicates with a corresponding one of the nozzles. The energy generator, provided for each of the pressure chambers, generates energy for pressurizing liquid in the pressure chamber. The shared chamber supplies liquid to the pressure chambers. The vibration member, forming a wall of each one of the pressure chambers, includes an energy-transmitting area configured to transmit the energy generated by the energy generator to each one of the pressure chambers. The specific wall portion, constituting at least a part of the same wall, or a different wall, of each of the pressure chambers, has a structural compliance set greater than a compression compliance of liquid in the pressure chamber.

摘要翻译： 液体分配头包括喷嘴，压力室，能量发生器，共用室，振动构件和特定的壁部分。 喷嘴排出液体。 每个压力室与相应的一个喷嘴连通。 为每个压力室提供的能量发生器产生用于对压力室中的液体加压的能量。 共用室向压力室供应液体。 形成每个压力室的壁的振动构件包括能量传递区域，其被配置为将由能量发生器产生的能量传递到每个压力室。 构成每个压力室的至少一部分壁或不同壁的特定壁部具有大于压力室中液体的压缩顺应性的结构顺应度。

公开(公告)号：US08033657B2

公开(公告)日：2011-10-11

申请号：US12164383

申请日：2008-06-30

申请人： Takafumi Sasaki

发明人： Takafumi Sasaki

IPC分类号： B41J2/18 ,  B41J2/175

CPC分类号： B41J2/175 ,  B41J2/17503 ,  B41J2/17596

摘要： An image forming apparatus including a liquid discharge head unit which in turn includes (a) a liquid discharge head including multiple liquid chambers connected to multiple nozzles for discharging liquid droplets, and a common liquid chamber including a liquid supply opening and a liquid discharge opening, to supply a liquid to the multiple liquid chambers, (b) a sub tank including a liquid container, connected to the liquid supply opening to store the liquid to be supplied to the liquid discharge head, (c) a tank connected to the liquid discharge opening to store the liquid used for filling the liquid discharge head, and (d) a mechanism to return the liquid in the tank to the sub tank.

摘要翻译： 一种图像形成装置，包括：液体排出头单元，该液体排出头单元又包括：（a）液体排出头，其具有连接到用于排出液滴的多个喷嘴的多个液体室，以及包括液体供应开口和液体排出口的公共液体室， 向多个液体室供应液体，（b）包括液体容器的副罐，其连接到液体供应开口以存储要供给到液体排出头的液体，（c）连接到液体排出口的罐 打开以存储用于填充液体排出头的液体，以及（d）将罐中的液体返回到副罐的机构。