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104 条记录 (耗时 0.035 秒)

    CHARGED PARTICLE BEAM DEVICE AND SAMPLE PRODUCTION METHOD
    11.
    发明申请
    CHARGED PARTICLE BEAM DEVICE AND SAMPLE PRODUCTION METHOD 审中-公开
    充电颗粒光束装置和样品生产方法

    公开(公告)号：US20130105302A1

    公开(公告)日：2013-05-02

    申请号：US13808261

    申请日：2011-07-05

    申请人： Terutaka Nanri ,  Tsuyoshi Onishi ,  Satoshi Tomimatsu

    发明人： Terutaka Nanri ,  Tsuyoshi Onishi ,  Satoshi Tomimatsu

    IPC分类号： C23F4/02

    CPC分类号： C23F4/02 ,  G01N1/32 ,  G01N23/225 ,  H01J37/08 ,  H01J37/244 ,  H01J37/3002 ,  H01J37/3056 ,  H01J2237/31745

    摘要： Provided is a technique capable of removing a damaged layer of a sample piece generated through an FIB fabrication sufficiently but at the minimum. A charged particle beam device includes a first element ion beam optical system unit (110) which performs a first FIB fabrication to form a sample piece from a sample, a second element ion beam optical system unit (120) which performs a second FIB fabrication to remove a damaged layer formed on a surface of the sample piece, and a first element detector (140) which detects an first element existing in the damaged layer. A termination of the second FIB fabrication is determined if an amount of the first element existing in the damaged layer becomes smaller than a predefined threshold value.

    摘要翻译： 提供了一种能够通过FIB制造而产生的样品片的损伤层除去至少最小的技术。 带电粒子束装置包括：第一元件离子束光学系统单元，其执行第一FIB制造以从样品形成样品片;第二元件离子束光学系统单元，其执行第二FIB制造， 去除形成在样品表面上的损伤层，以及检测存在于损伤层中的第一元素的第一元件检测器（140）。 如果损伤层中存在的第一元素的量变得小于预定阈值，则确定第二FIB制造的终止。

    Dual beam apparatus with tilting sample stage
    12.
    发明授权
    Dual beam apparatus with tilting sample stage 有权
    具有倾斜样品台的双光束装置

    公开(公告)号：US08431891B2

    公开(公告)日：2013-04-30

    申请号：US12731910

    申请日：2010-03-25

    申请人： Hiroyasu Shichi ,  Satoshi Tomimatsu ,  Noriyuki Kaneoka ,  Kaoru Umemura ,  Koji Ishiguro

    发明人： Hiroyasu Shichi ,  Satoshi Tomimatsu ,  Noriyuki Kaneoka ,  Kaoru Umemura ,  Koji Ishiguro

    IPC分类号： G01N23/00 ,  G21K7/00

    CPC分类号： H01J37/261 ,  H01J37/20 ,  H01J37/3045 ,  H01J2237/08 ,  H01J2237/20207 ,  H01J2237/24528 ,  H01J2237/28 ,  H01J2237/31713 ,  H01J2237/3174 ,  H01J2237/31749

    摘要： An ion beam processing apparatus includes an ion beam irradiation optical system that irradiate a rectangular ion beam to a sample held on a first sample stage, an electron beam irradiation optical system that irradiates an electron beam to the sample, and a second sample stage on which a test piece, extracted from the sample by a probe, is mounted. An angle of irradiation of the ion beam can be tilted by rotating the second sample stage about a tilting axis. A controller controls the width of skew of an intensity profile representing an edge of the rectangular ion beam in a direction perpendicular to a first direction in which the tilting axis of the second sample stage is projected on the second sample stage surface so that the width will be smaller than the width of skew of an intensity profile representing another edge of the ion beam in a direction parallel to the first direction.

    摘要翻译： 一种离子束处理装置，包括：将矩形离子束照射到保持在第一样品台上的样品的离子束照射光学系统，向样品照射电子束的电子束照射光学系统;以及第二样品台， 通过探针从样品中提取的试片被安装。 离子束的照射角度可以通过使第二样品台围绕倾斜轴旋转来倾斜。 控制器控制表示矩形离子束在与第二样品台的倾斜轴投射到第二样品台表面上的第一方向垂直的方向上的强度分布的偏斜宽度，使得宽度将 小于在平行于第一方向的方向上表示离子束的另一边缘的强度分布的偏斜宽度。

    Charged Particle Beam Apparatus and Film Thickness Measurement Method
    13.
    发明申请
    Charged Particle Beam Apparatus and Film Thickness Measurement Method 有权
    带电粒子束和膜厚测量方法

    公开(公告)号：US20120187292A1

    公开(公告)日：2012-07-26

    申请号：US13498994

    申请日：2010-10-12

    申请人： Satoshi Tomimatsu ,  Tsuyoshi Onishi ,  Toshihide Agemura ,  Terutaka Nanri

    发明人： Satoshi Tomimatsu ,  Tsuyoshi Onishi ,  Toshihide Agemura ,  Terutaka Nanri

    IPC分类号： H01J37/26

    CPC分类号： H01J37/3005 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/24475 ,  H01J2237/24578 ,  H01J2237/3174

    摘要： A charged particle beam apparatus of the present invention comprises a transmission electron detector (113; 206) having a detection portion divided into multiple regions (201 to 205; 301 to 305), wherein a film thickness of a sample is calculated by detecting a transmission electron beam (112) generated from the sample when the sample is irradiated with an electron beam (109), as a signal of each of the regions in accordance with scattering angles of the transmission electron beam, and thereafter calculating the intensities of the individual signals. According to the above, there is provided a charged particle beam apparatus capable of performing accurate film thickness monitoring while suppressing an error due to an external condition and also capable of processing a thin film sample into a sample having an accurate film thickness, which makes it possible to improve the accuracy in structure observations, element analyses and the like.

    摘要翻译： 本发明的带电粒子束装置包括具有分成多个区域（201〜205; 301〜305）的检测部的透射电子检测器（113; 206），其中通过检测透射率来计算样品的膜厚度 当用电子束（109）照射样品时从样品产生的电子束（112）作为根据透射电子束的散射角的每个区域的信号，然后计算各个信号的强度 。 根据上述，提供了一种能够在抑制由于外部条件引起的误差的同时进行精确的膜厚度监测并且还能够将薄膜样品加工成具有精确膜厚度的样品的带电粒子束装置，这使得它 可能提高结构观察，元素分析等方面的准确性。

    APPARATUS AND METHOD FOR SPECIMEN FABRICATION
    15.
    发明申请
    APPARATUS AND METHOD FOR SPECIMEN FABRICATION 有权
    仪器制造的装置和方法

    公开(公告)号：US20090121158A1

    公开(公告)日：2009-05-14

    申请号：US12354153

    申请日：2009-01-15

    申请人： Satoshi Tomimatsu ,  Miyuki Takahashi ,  Hiroyasu Shichi ,  Muneyuki Fukuda

    发明人： Satoshi Tomimatsu ,  Miyuki Takahashi ,  Hiroyasu Shichi ,  Muneyuki Fukuda

    IPC分类号： G21G5/00

    CPC分类号： H01J37/3056 ,  H01J2237/006 ,  H01J2237/31744 ,  H01J2237/31745

    摘要： A specimen fabricating apparatus comprises: a specimen stage, on which a specimen is placed; a charged particle beam optical system to irradiate a charged particle beam on the specimen; an etchant material supplying source to supply an etchant material, which contains fluorine and carbon in molecules thereof, does not contain oxygen in molecules thereof, and is solid or liquid in a standard state; and a vacuum chamber to house therein the specimen stage. A specimen fabricating method comprises the steps of: processing a hole in the vicinity of a requested region of a specimen by means of irradiation of a charged particle beam; exposing the requested region by means of irradiation of the charged particle beam; supplying an etchant material, which contains fluorine and carbon in molecules thereof, does not contain oxygen in molecules thereof, and is solid or liquid in a standard state, to the requested region as exposed; and irradiating the charged particle beam on the requested region as exposed.

    摘要翻译： 试样制造装置包括：样品台，放置试样; 带电粒子束光学系统，用于将带电粒子束照射在样本上; 供给来源的蚀刻剂材料在其分子中含有氟和碳的蚀刻剂材料，其分子中不含氧，在标准状态下为固体或液体; 以及在其中容纳样品台的真空室。 试样制造方法包括以下步骤：通过照射带电粒子束来处理试样的要求区域附近的孔; 通过照射带电粒子束使被请求区域曝光; 在其分子中供给含有氟和碳的蚀刻剂材料在其分子中不含氧，并且在标准状态下为固体或液体，暴露于所要求的区域; 以及将所述带电粒子束照射在被请求区域上。

    Method and apparatus for specimen fabrication
    17.
    发明授权
    Method and apparatus for specimen fabrication 有权
    用于样品制造的方法和装置

    公开(公告)号：US07268356B2

    公开(公告)日：2007-09-11

    申请号：US10898592

    申请日：2004-07-26

    申请人： Hiroyasu Shichi ,  Tohru Ishitani ,  Hidemi Koike ,  Kaoru Umemura ,  Eiichi Seya ,  Mitsuo Tokuda ,  Satoshi Tomimatsu ,  Hideo Kashima ,  Muneyuki Fukuda

    发明人： Hiroyasu Shichi ,  Tohru Ishitani ,  Hidemi Koike ,  Kaoru Umemura ,  Eiichi Seya ,  Mitsuo Tokuda ,  Satoshi Tomimatsu ,  Hideo Kashima ,  Muneyuki Fukuda

    IPC分类号： G21G5/00

    CPC分类号： G01N23/20 ,  B23K15/0006 ,  B23K15/0013 ,  G01N1/286 ,  H01J2237/3114 ,  H01J2237/31745

    摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.

    摘要翻译： 相对于样品表面以小于90度的入射角照射具有聚焦离子束的样品的样品制造方法，消除作为目标的微量样品的周边区域，将样品台围绕线段 垂直于样品表面作为转动轴线，同时在样品表面上的入射角被固定的同时用聚焦离子束照射样品，并分离微量样品或制备待分离的微量样品。 一种样品制造装置，用于通过扫描和偏转离子束来形成保持在样品台上的样品中的样品部分，其中离子束的光轴与样品台的表面之间的角度被固定并形成样品 通过转动样品台来控制切片。