公开(公告)号：US20060127699A1

公开(公告)日：2006-06-15

申请号：US10527520

申请日：2003-09-13

申请人： Christoph Moelle ,  Lars Bewig ,  Frank Koppe ,  Thomas Kupper ,  Stefan Geisler ,  Stefan Bauer ,  Juergen Dzick ,  Lutz Klippe ,  Christian Henn

发明人： Christoph Moelle ,  Lars Bewig ,  Frank Koppe ,  Thomas Kupper ,  Stefan Geisler ,  Stefan Bauer ,  Juergen Dzick ,  Lutz Klippe ,  Christian Henn

IPC分类号： B32B17/06 ,  B32B9/00 ,  B32B19/00 ,  F24B1/182

CPC分类号： G02B5/285 ,  C03C17/3417 ,  C03C2217/734 ,  C03C2218/156 ,  C03C2218/322 ,  C23C14/0078 ,  C23C14/022 ,  C23C14/34 ,  C23C14/56 ,  C23C28/042 ,  C23C28/42 ,  G02B1/105 ,  G02B1/14 ,  Y10T428/12576 ,  Y10T428/12611

摘要： A scratchproof, temperature-stable protective layer, in particular a scratch-resistant protective layer for cooking hobs is provided. In addition, processes and an apparatus for producing these protective layers are provided. The protective layer includes at least one hard-material layer having a functional layer interrupted by very thin interlayers so that the functional layer has a morphologically dense columnar structure that grows substantially perpendicular to the body surface. The production of layers of this type is achieved by a magnetron sputtering process and a corresponding arrangement, with the tendency of the columnar structures to widen out being reduced by targeted interruption of the growth of the functional layers.

摘要翻译： 提供了耐刮擦，温度稳定的保护层，特别是用于烹饪炉盘的耐刮擦保护层。 此外，提供了用于制造这些保护层的工艺和设备。 保护层包括至少一个具有由非常薄的夹层中断的功能层的硬质材料层，使得功能层具有生长基本垂直于体表的形态致密的柱状结构。 这种类型的层的生产通过磁控溅射工艺和相应的布置实现，其中柱状结构扩大的趋势通过功能层的生长的目标中断而减少。

公开(公告)号：US20050163939A1

公开(公告)日：2005-07-28

申请号：US10502408

申请日：2003-01-28

申请人： Wolfgang Moehl ,  Lars Bewig ,  Thomas Kuepper ,  Wolfram Maring ,  Christoph Moelle

发明人： Wolfgang Moehl ,  Lars Bewig ,  Thomas Kuepper ,  Wolfram Maring ,  Christoph Moelle

IPC分类号： C03C17/34 ,  C23C16/30 ,  H01J61/35 ,  H05H1/24

CPC分类号： C03C17/3417 ,  H01J61/35

摘要： In order to improve the energy balance of an HID lamp, the quartz burner, preferably the inside thereof, is coated with a UV reflecting layer system by alternatingly applying amorphous thin layers made at least of titanium oxide and silicon oxide having the respective general stoichiometry TiOy and SiOx by means of a plasma impulse chemical vapor deposition (PICVD) method at a high power density and increased substrate temperatures ranging from 100° to 400° C., using small growth rates ranging from 1 nm/sec to 100 nm/sec so as to form an interference layer system having a thickness of less than 1200 nm and a minimized UV-active defective spot rate ranging from 0.1 to 1 percent.

摘要翻译： 为了提高HID灯的能量平衡，石英燃烧器，优选其内部，通过交替地施加至少由氧化钛和氧化硅制成的非晶薄层，涂覆有一般的化学计量的TiO 通过等离子体脉冲化学气相沉积（PICVD）方法在高功率密度和100°至400°C范围内提高的衬底温度下， 使用范围从1nm /秒到100nm / sec的小增长率，以便形成厚度小于1200nm的干涉层系统和0.1至1％范围内的最小化UV有源缺陷点率。

公开(公告)号：US20050132959A1

公开(公告)日：2005-06-23

申请号：US11014488

申请日：2004-12-16

申请人： Hartmut Bauch ,  Lars Bewig ,  Lutz Klippe ,  Thomas Kupper

发明人： Hartmut Bauch ,  Lars Bewig ,  Lutz Klippe ,  Thomas Kupper

IPC分类号： C23C16/448 ,  B01D3/42 ,  B05C11/00 ,  C23C16/00 ,  F25J3/00

CPC分类号： C23C16/448

摘要： A gas supply device for delivering precursors with a low vapor pressure to CVD coating systems. The gas supply device has a supply container for the precursor which is at a first temperature T1, an intermediate storage device for intermediately storing the vaporous precursor at a second temperature T2 and at a constant pressure p2, a first gas line between the supply container and the intermediate storage device and a second gas line for removing gas from the intermediate storage device. The gas supply device is developed in such a way that the first temperature T1 is higher than the second temperature T2. The lower temperature T2 of the intermediate storage device facilitates maintenance work on the same, while the precursor evaporates at a greater rate at the higher temperature T1 in the supply container. A first precursor vapor may be mixed with a gas and/or a second precursor vapor in the intermediate storage device. The partial pressure of the first precursor vapor is lower than that of the undiluted first precursor vapor at a constant overall pressure in the intermediate storage device, so that the temperature T2 of the intermediate storage device and the successive lines can be reduced.

摘要翻译： 一种气体供应装置，用于将CVD蒸气压低的前体输送到CVD涂层系统。 气体供给装置具有用于前体的供给容器，该供应容器处于第一温度T 1，中间储存装置用于在第二温度T 2和恒定压力p 2下将气态前体中间储存在第一温度T 1之间的第一气体管线 供给容器和中间储存装置以及用于从中间储存装置除去气体的第二气体管线。 气体供给装置以第一温度T 1高于第二温度T 2的方式展开。 中间储存装置的较低温度T 2有助于维护工作，而前体在供应容器中的较高温度T 1下以更大的速率蒸发。 第一前体蒸气可以与中间存储装置中的气体和/或第二前体蒸气混合。 在中间储存装置中，在恒定的总体压力下，第一前体蒸气的分压低于未稀释的第一前体蒸汽的分压，从而可以减少中间储存装置的温度T 2和连续的管线。

公开(公告)号：US07947337B2

公开(公告)日：2011-05-24

申请号：US11937280

申请日：2007-11-08

申请人： Thomas Kuepper ,  Lars Bewig ,  Christoph Moelle ,  Lars Brandt ,  Thomas Niklos

发明人： Thomas Kuepper ,  Lars Bewig ,  Christoph Moelle ,  Lars Brandt ,  Thomas Niklos

IPC分类号： H05H1/24

CPC分类号： C23C16/405 ,  C23C16/402 ,  C23C16/505 ,  C23C16/511 ,  C23C16/52 ,  H01J37/32266

摘要： A method and apparatus for coating substrates by means of plasma enhanced vapor deposition are provided, in which at least part of the surroundings of the substrate surface of a substrate to be coated is evacuated and a process gas with a starting substance for the coating is admitted, wherein the coating is deposited by a plasma being ignited by radiating in electromagnetic energy in the surroundings of the substrate surface filled with the process gas. The electromagnetic energy is radiated in by a multiplicity of pulse sequences, preferably microwave or radiofrequency pulses, with a multiplicity of pulses spaced apart temporally by first intermissions, wherein the electromagnetic energy radiated in is turned off in the intermissions, and wherein the intermissions between the pulse sequences are at least a factor of 3, preferably at least a factor of 5, longer than the first intermissions between the pulses within a pulse sequence.

摘要翻译： 提供了一种通过等离子体增强气相沉积来涂覆衬底的方法和装置，其中待涂覆的衬底的衬底表面的至少部分周围环境被抽真空，并且允许具有用于涂层的起始物质的工艺气体 ，其中通过在填充有工艺气体的衬底表面的周围的电磁能辐射而被等离子体沉积涂层。 电磁能通过多个脉冲序列辐射，优选地是微波或射频脉冲，其中多个脉冲通过第一次间歇在时间上间隔开，其中辐射的电磁能量在间歇中被截断，并且其中， 脉冲序列至少比脉冲序列中的脉冲之间的第一次间隔长3倍，优选至少5倍。

公开(公告)号：US07713638B2

公开(公告)日：2010-05-11

申请号：US10527494

申请日：2003-09-13

申请人： Christoph Moelle ,  Lars Bewig ,  Frank Koppe ,  Thomas Kuepper ,  Stefan Geisler ,  Stefan Bauer ,  Juergen Dzick ,  Christian Henn

发明人： Christoph Moelle ,  Lars Bewig ,  Frank Koppe ,  Thomas Kuepper ,  Stefan Geisler ,  Stefan Bauer ,  Juergen Dzick ,  Christian Henn

IPC分类号： B32B9/00

CPC分类号： G02B5/285 ,  C03C17/3417 ,  C03C2217/734 ,  C03C2218/156 ,  C03C2218/322 ,  C23C14/0078 ,  C23C14/022 ,  C23C14/34 ,  C23C14/56 ,  C23C28/042 ,  C23C28/42 ,  G02B1/105 ,  G02B1/14 ,  Y10T428/12576 ,  Y10T428/12611

摘要： The invention relates to layer systems having at least one layer comprising titanium aluminum oxide. The layer comprising titanium aluminum oxide may be either a functional layer—with or without interruption by an intermediate layer which is optically inactive—or a functional layer formed from a metal oxide which is interrupted by an intermediate layer comprising titanium aluminum oxide. The layer systems are structurally and thermally stable at operating temperatures of over 600° C. The layer systems may either comprise only one functional layer or may be a multilayer system, preferably an alternating layer system composed of functional layers with high and low refractive indices.

摘要翻译： 本发明涉及具有至少一层包含钛铝氧化物的层系统。 包含钛氧化铝的层可以是功能层 - 具有或不具有光学无活性的中间层或由金属氧化物形成的功能层中断，该金属氧化物由包含钛铝氧化物的中间层中断。 层系统在超过600℃的操作温度下在结构和热稳定性。层系统可以仅包括一个功能层，或者可以是多层系统，优选地由具有高和低折射率的功能层组成的交替层系统。

公开(公告)号：US20060093840A1

公开(公告)日：2006-05-04

申请号：US10527499

申请日：2003-09-13

申请人： Moelle Christoph ,  Lars Bewig ,  Frank Koppe ,  Thomas Kucpper ,  Stefan Geisler ,  Stefan Bauer

发明人： Moelle Christoph ,  Lars Bewig ,  Frank Koppe ,  Thomas Kucpper ,  Stefan Geisler ,  Stefan Bauer

IPC分类号： C23C14/32 ,  B32B15/04

CPC分类号： G02B5/285 ,  C03C17/3417 ,  C03C2217/734 ,  C03C2218/156 ,  C03C2218/322 ,  C23C14/0078 ,  C23C14/022 ,  C23C14/34 ,  C23C14/56 ,  C23C28/042 ,  C23C28/42 ,  G02B1/105 ,  G02B1/14 ,  Y10T428/12576 ,  Y10T428/12611

摘要： A method of producing substrates with functional layers which have high optical properties and/or a high surface smoothness, in particular a low turbidity and significantly lower roughness, is provided. The method includes a sputtering process for coating a substrate with at least one functional layer, the sputtering process being interrupted at least once by the application of an intermediate layer with a thickness of less than 20 nm.

摘要翻译： 提供了具有高光学特性和/或高表面平滑度，特别是低浊度和显着更低的粗糙度的具有功能层的基板的制造方法。 该方法包括用至少一个功能层涂覆衬底的溅射工艺，溅射工艺通过施加厚度小于20nm的中间层至少中断一次。

公开(公告)号：US20050199571A1

公开(公告)日：2005-09-15

申请号：US11031557

申请日：2005-01-07

申请人： Stefan Geisler ,  David Bain ,  Lars Bewig ,  Christoph Moelle ,  Thomas Kuepper

发明人： Stefan Geisler ,  David Bain ,  Lars Bewig ,  Christoph Moelle ,  Thomas Kuepper

IPC分类号： A45D33/18 ,  A45D34/00 ,  B65D23/00 ,  B65D23/02 ,  B65D25/14 ,  A47J41/02 ,  B65D90/02

CPC分类号： A45D33/18 ,  A45D34/00 ,  A45D2034/007 ,  A45D2200/053 ,  B65D23/02 ,  B65D2203/00

摘要： A container having an at least partly transparent hollow body and a decoration is provided. The decoration includes at least one interior lining of the hollow body so that reactions between ingredients of a product situated in the container and constituents of the decoration are prevented.

摘要翻译： 提供具有至少部分透明的中空体和装饰物的容器。 装饰物包括中空体的至少一个内部衬里，从而防止位于容器中的产品的成分与装饰的成分之间的反应。

公开(公告)号：US20050005853A1

公开(公告)日：2005-01-13

申请号：US10486140

申请日：2002-08-07

申请人： Stephan Behle ,  Lars Bewig ,  Thomas Kupper ,  Wolfram Maring ,  Christoph Molle ,  Marten Walther

发明人： Stephan Behle ,  Lars Bewig ,  Thomas Kupper ,  Wolfram Maring ,  Christoph Molle ,  Marten Walther

IPC分类号： H05H1/46 ,  C23C16/511 ,  H01J37/32 ,  H01P5/12 ,  C23C16/00

CPC分类号： H01J37/32229 ,  C23C16/511 ,  H01J37/32192

摘要： An apparatus for coating objects having a single microwave source, two or more coating chambers, and an impedance structure or a waveguide structure. The coating chambers are connected to the single microwave source. The impedance structure or waveguide structure divides the microwave energy in order to generate plasmas in the coating chambers.

摘要翻译： 一种用于涂覆具有单个微波源，两个或更多个涂层室以及阻抗结构或波导结构的物体的设备。 涂层室连接到单个微波源。 阻抗结构或波导结构划分微波能量，以便在涂层室中产生等离子体。

公开(公告)号：US07641773B2

公开(公告)日：2010-01-05

申请号：US10527499

申请日：2003-09-13

申请人： Christoph Moelle ,  Lars Bewig ,  Frank Koppe ,  Thomas Kuepper ,  Stefan Geisler ,  Stefan Bauer

发明人： Christoph Moelle ,  Lars Bewig ,  Frank Koppe ,  Thomas Kuepper ,  Stefan Geisler ,  Stefan Bauer

IPC分类号： C23C14/34

CPC分类号： G02B5/285 ,  C03C17/3417 ,  C03C2217/734 ,  C03C2218/156 ,  C03C2218/322 ,  C23C14/0078 ,  C23C14/022 ,  C23C14/34 ,  C23C14/56 ,  C23C28/042 ,  C23C28/42 ,  G02B1/105 ,  G02B1/14 ,  Y10T428/12576 ,  Y10T428/12611

摘要： A method of producing substrates with functional layers which have high optical properties and/or a high surface smoothness, in particular a low turbidity and significantly lower roughness, is provided. The method includes a sputtering process for coating a substrate with at least one functional layer, the sputtering process being interrupted at least once by the application of an intermediate layer with a thickness of less than 20 nm.

摘要翻译： 提供了具有高光学特性和/或高表面平滑度，特别是低浊度和显着更低的粗糙度的具有功能层的基板的制造方法。 该方法包括用至少一个功能层涂覆衬底的溅射工艺，溅射工艺通过施加厚度小于20nm的中间层至少中断一次。

公开(公告)号：US20080113109A1

公开(公告)日：2008-05-15

申请号：US11937279

申请日：2007-11-08

申请人： Christoph Moelle ,  Lars Bewig ,  Thomas Kuepper

发明人： Christoph Moelle ,  Lars Bewig ,  Thomas Kuepper

IPC分类号： C23C16/52

CPC分类号： C23C16/515 ,  C23C16/45512 ,  C23C16/45523 ,  C23C16/45591

摘要： In the case of CVD methods, comprising PECVD and PICVD methods, the aim of the invention is to improve the impurity-free and, as far as possible, temporally and quantitatively precise feeding of process gases for the targeted layer systems. To this end, the invention provides a coating system and a method for coating articles with alternating layers, in the case of which process gases are introduced in an alternating fashion into a gas mixing point and mixed with a further gas and led to the reaction chamber, in which the deposition is carried out by producing a plasma.

摘要翻译： 在包括PECVD和PICVD方法的CVD方法的情况下，本发明的目的是改进目标层系统的无杂质，并且尽可能地临时和定量地精确地供给工艺气体。 为此，本发明提供一种涂覆系统和用交替层涂覆制品的方法，在这种情况下，工艺气体以交替的方式引入气体混合点并与另外的气体混合并被引导到反应室 ，其中通过产生等离子体进行沉积。