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    Gas supply method in a CVD coating system for precursors with a low vapor pressure
    1.
    发明申请
    Gas supply method in a CVD coating system for precursors with a low vapor pressure 有权
    用于具有低蒸气压的前体的CVD涂覆系统中的气体供应方法

    公开(公告)号：US20050132959A1

    公开(公告)日：2005-06-23

    申请号：US11014488

    申请日：2004-12-16

    申请人： Hartmut Bauch ,  Lars Bewig ,  Lutz Klippe ,  Thomas Kupper

    发明人： Hartmut Bauch ,  Lars Bewig ,  Lutz Klippe ,  Thomas Kupper

    IPC分类号： C23C16/448 ,  B01D3/42 ,  B05C11/00 ,  C23C16/00 ,  F25J3/00

    CPC分类号： C23C16/448

    摘要： A gas supply device for delivering precursors with a low vapor pressure to CVD coating systems. The gas supply device has a supply container for the precursor which is at a first temperature T1, an intermediate storage device for intermediately storing the vaporous precursor at a second temperature T2 and at a constant pressure p2, a first gas line between the supply container and the intermediate storage device and a second gas line for removing gas from the intermediate storage device. The gas supply device is developed in such a way that the first temperature T1 is higher than the second temperature T2. The lower temperature T2 of the intermediate storage device facilitates maintenance work on the same, while the precursor evaporates at a greater rate at the higher temperature T1 in the supply container. A first precursor vapor may be mixed with a gas and/or a second precursor vapor in the intermediate storage device. The partial pressure of the first precursor vapor is lower than that of the undiluted first precursor vapor at a constant overall pressure in the intermediate storage device, so that the temperature T2 of the intermediate storage device and the successive lines can be reduced.

    摘要翻译： 一种气体供应装置，用于将CVD蒸气压低的前体输送到CVD涂层系统。 气体供给装置具有用于前体的供给容器，该供应容器处于第一温度T 1，中间储存装置用于在第二温度T 2和恒定压力p 2下将气态前体中间储存在第一温度T 1之间的第一气体管线 供给容器和中间储存装置以及用于从中间储存装置除去气体的第二气体管线。 气体供给装置以第一温度T 1高于第二温度T 2的方式展开。 中间储存装置的较低温度T 2有助于维护工作，而前体在供应容器中的较高温度T 1下以更大的速率蒸发。 第一前体蒸气可以与中间存储装置中的气体和/或第二前体蒸气混合。 在中间储存装置中，在恒定的总体压力下，第一前体蒸气的分压低于未稀释的第一前体蒸汽的分压，从而可以减少中间储存装置的温度T 2和连续的管线。

    Gas supply method in a CVD coating system for precursors with a low vapor pressure
    2.
    发明授权
    Gas supply method in a CVD coating system for precursors with a low vapor pressure 有权
    用于具有低蒸气压的前体的CVD涂覆系统中的气体供应方法

    公开(公告)号：US07413767B2

    公开(公告)日：2008-08-19

    申请号：US11014488

    申请日：2004-12-16

    申请人： Hartmut Bauch ,  Lars Bewig ,  Lutz Klippe ,  Thomas Küpper

    发明人： Hartmut Bauch ,  Lars Bewig ,  Lutz Klippe ,  Thomas Küpper

    IPC分类号： C23C16/00

    CPC分类号： C23C16/448

    摘要： A method for producing optical functional coatings comprising niobium, tantalum, titanium or aluminum by supplying a precursor gas of low vapor pressure in a CVD coating system. A precursor selected from the group consisting of Nb, Ta, Ti, and Al compounds having a vapor pressure is maintained within a first supply container at a first temperature T1 and a first pressure p1. Precursor vapor of the precursor is supplied from the first supply container to an intermediate storage device through a first gas line which fluidly communicates the first supply container and the intermediate storage device. A carrier gas or reaction gas is supplied to the first gas line such that a mixture of the precursor with the carrier gas or the reaction gas is provided. The mixture is maintained in the intermediate storage device at a constant second pressure p2 lower than the first pressure p1 and at a second temperature T2 lower than the first temperature T1, and the mixture is supplied from the intermediate storage device through a second gas line.

    摘要翻译： 一种通过在CVD涂覆系统中提供低蒸气压的前体气体来制造包括铌，钽，钛或铝的光学功能涂层的方法。 选自具有蒸气压的Nb，Ta，Ti和Al化合物的前体的前体在第一温度T 1和第一压力p 1下保持在第一供应容器内。 前体的前体蒸气通过与第一供给容器和中间储存装置流体连通的第一气体管线从第一供给容器供给到中间储存装置。 向第一气体管线供给载气或反应气体，使得前体与载体气体或反应气体的混合物被提供。 将混合物以比第一压力p 1低的恒定的第二压力p 2和低于第一温度T 1的第二温度T 2保持在中间储存装置中，并且将混合物从中间储存装置通过 第二条天然气线。

    Method for coating the quartz burner of an HID lamp
    6.
    发明授权
    Method for coating the quartz burner of an HID lamp 失效
    用于涂覆HID灯的石英燃烧器的方法

    公开(公告)号：US07306830B2

    公开(公告)日：2007-12-11

    申请号：US10502408

    申请日：2003-01-28

    申请人： Wolfgang Moehl ,  Lars Bewig ,  Thomas Kuepper ,  Wolfram Maring ,  Christopher Moelle

    发明人： Wolfgang Moehl ,  Lars Bewig ,  Thomas Kuepper ,  Wolfram Maring ,  Christopher Moelle

    IPC分类号： H05H1/24 ,  H01J61/40

    CPC分类号： C03C17/3417 ,  H01J61/35

    摘要： In order to improve the energy balance of an HID lamp, the quartz burner, preferably the inside thereof, is coated with a UV reflecting layer system by alternatingly applying amorphous thin layers made at least of titanium oxide and silicon oxide having the respective general stoichiometry TiOy and SiOx by means of a plasma impulse chemical vapor deposition (PICVD) method at a high power density and increased substrate temperatures ranging from 100° to 400° C., using small growth rates ranging from 1 nm/sec to 100 nm/sec so as to form an interference layer system having a thickness of less than 1200 nm and a minimized UV-active defective spot rate ranging from 0.1 to 1 percent.

    摘要翻译： 为了提高HID灯的能量平衡，石英燃烧器，优选其内部，通过交替地施加至少由氧化钛和氧化硅制成的非晶薄层，涂覆有一般的化学计量的TiO 通过等离子体脉冲化学气相沉积（PICVD）方法在高功率密度和100°至400°C范围内提高的衬底温度下， 使用范围从1nm /秒到100nm / sec的小增长率，以便形成厚度小于1200nm的干涉层系统和0.1至1％范围内的最小化UV有源缺陷点率。

    Coating system and method for coating, as well as coated articles
    7.
    发明授权
    Coating system and method for coating, as well as coated articles 有权
    涂层系统和涂层方法以及涂层制品

    公开(公告)号：US08268410B2

    公开(公告)日：2012-09-18

    申请号：US11937279

    申请日：2007-11-08

    申请人： Christoph Moelle ,  Lars Bewig ,  Thomas Kuepper

    发明人： Christoph Moelle ,  Lars Bewig ,  Thomas Kuepper

    IPC分类号： H05H1/24

    CPC分类号： C23C16/515 ,  C23C16/45512 ,  C23C16/45523 ,  C23C16/45591

    摘要： In the case of CVD methods, comprising PECVD and PICVD methods, the aim of the invention is to improve the impurity-free and, as far as possible, temporally and quantitatively precise feeding of process gases for the targeted layer systems. To this end, the invention provides a coating system and a method for coating articles with alternating layers, in the case of which process gases are introduced in an alternating fashion into a gas mixing point and mixed with a further gas and led to the reaction chamber, in which the deposition is carried out by producing a plasma.

    摘要翻译： 在包括PECVD和PICVD方法的CVD方法的情况下，本发明的目的是改进目标层系统的无杂质，并且尽可能地临时和定量地精确地供给工艺气体。 为此，本发明提供一种涂覆系统和用交替层涂覆制品的方法，在这种情况下，工艺气体以交替的方式引入气体混合点并与另外的气体混合并被引导到反应室 ，其中通过产生等离子体进行沉积。

    Volume-optimized reactor for simultaneously coating eyeglasses on both sides
    10.
    发明授权
    Volume-optimized reactor for simultaneously coating eyeglasses on both sides 有权
    体积优化的反应器，用于同时在两侧涂上眼镜

    公开(公告)号：US07533628B2

    公开(公告)日：2009-05-19

    申请号：US10319754

    申请日：2002-12-13

    申请人： Lars Bewig ,  Thomas Küpper

    发明人： Lars Bewig ,  Thomas Küpper

    IPC分类号： C23C16/00 ,  H01L21/306

    CPC分类号： H01J37/32192

    摘要： A reactor for simultaneous coating of eyeglasses on both sides thereof. Two partial devices are provided, each with a microwave energy waveguide, a gas supply and an apparatus for evacuating the coating chamber where the first and second devices can be moved relative to each other to open and close the coating chamber. The coating chamber itself is removable from the device and includes two gas supply connections and two connections for evacuating the coating chamber as well as microwave windows for coupling in microwave energy.

    摘要翻译： 用于同时在其两侧涂覆眼镜的反应器。 提供两个部分装置，每个部件具有微波能量波导，气体供应装置和用于抽出涂层室的装置，其中第一和第二装置可相对于彼此移动以打开和关闭涂覆室。 涂层室本身可以从设备中移除，并且包括两个气体供应连接和两个用于抽真空涂层室的连接以及用于以微波能量耦合的微波窗口。