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38 条记录 (耗时 0.032 秒)

    Reliability in a maskless lithography system
    12.
    发明授权
    Reliability in a maskless lithography system 有权
    无掩模光刻系统的可靠性

    公开(公告)号：US08890095B2

    公开(公告)日：2014-11-18

    申请号：US11492572

    申请日：2006-07-24

    申请人： Stijn Willem Herman Karel Steenbrink ,  Pieter Kruit ,  Marco Jan-Jaco Wieland

    发明人： Stijn Willem Herman Karel Steenbrink ,  Pieter Kruit ,  Marco Jan-Jaco Wieland

    IPC分类号： H01J37/15 ,  G03F7/20 ,  B82Y40/00 ,  H01J37/317 ,  B82Y10/00

    CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70291 ,  G03F7/70425 ,  H01J2237/31757

    摘要： A maskless lithography system for transferring a pattern onto a surface of a target. At least one beamlet optical unit generates a plurality of beamlets. At least one measuring unit measures properties of each beamlet. At least one control unit generates and delivers pattern data to the beamlet optical unit. The control unit is operationally coupled to the measuring unit for identifying invalid beamlets which have a measured property value outside a predefined range of values for the property. At least one actuator induces a shift of the beamlet optical unit and the target with respect to one another. The actuator is operationally coupled with the control unit. The control unit determines the shift, positioning valid beamlets at the position of the invalid beamlets, thus replacing the invalid beamlets with valid beamlets.

    摘要翻译： 一种用于将图案转印到目标表面上的无掩模光刻系统。 至少一个子束光学单元产生多个子束。 至少一个测量单元测量每个子束的性质。 至少一个控制单元生成并将模式数据传送到子束光学单元。 控制单元可操作地耦合到测量单元，用于识别具有超出该属性的预定义值范围的测量属性值的无效子束。 至少一个致动器引起子束光学单元和目标相对于彼此的偏移。 致动器可操作地与控制单元耦合。 控制单元确定移位，在无效子束的位置定位有效子束，从而用有效的子束替换无效子束。

    Multiple beam charged particle optical system
    16.
    发明授权
    Multiple beam charged particle optical system 有权
    多光束带电粒子光学系统

    公开(公告)号：US08598545B2

    公开(公告)日：2013-12-03

    申请号：US13461594

    申请日：2012-05-01

    申请人： Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

    发明人： Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

    IPC分类号： G21K5/10 ,  H01J37/08

    CPC分类号： H01J37/12 ,  H01J37/153 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/317

    摘要： The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

    摘要翻译： 本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。 该系统可以包括发散的带电粒子束部分，其中包括透镜结构。 透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。 在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

    System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission
    17.
    发明授权
    System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission 有权
    用于多光束光刻的系统，方法和装置，包括用于均匀电子发射的分配器阴极

    公开(公告)号：US08247958B2

    公开(公告)日：2012-08-21

    申请号：US12750619

    申请日：2010-03-30

    申请人： Stijn Willem Herman Karel Steenbrink ,  Pieter Kruit

    发明人： Stijn Willem Herman Karel Steenbrink ,  Pieter Kruit

    IPC分类号： H01J19/14 ,  H01J1/20 ,  H01J1/14 ,  H01J1/28

    CPC分类号： H01J37/065 ,  B82Y10/00 ,  B82Y40/00 ,  H01J1/28 ,  H01J37/3177 ,  H01J2237/3175 ,  H01J2237/31754 ,  H01J2237/31774

    摘要： A dispenser cathode which is comprises an emission surface, a reservoir for material releasing, when heated, work-function-lowering particles, and at least one passage for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, and emission surface comprising at least one emission area and at least one non-emission area covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area.

    摘要翻译： 分配器阴极，其包括排放表面，用于材料释放的储存器，当加热时，功能降低颗粒和用于允许功能降低颗粒从所述储存器扩散到所述排放表面的至少一个通道，以及 发射表面包括至少一个发射区域和被发射抑制材料覆盖并围绕每个发射区域的至少一个非发射区域，所述非发射区域包括将所述储层与所述非发射区域连接的至少一个通道并在 与发射区域的扩散长度距离，用于允许作业功能降低颗粒从所述储存器扩散到所述发射区域。

    MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM
    18.
    发明申请
    MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM 有权
    多束光束粒子光学系统

    公开(公告)号：US20110168910A1

    公开(公告)日：2011-07-14

    申请号：US13071225

    申请日：2011-03-24

    申请人： Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

    发明人： Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

    IPC分类号： G21K1/08

    CPC分类号： H01J37/12 ,  H01J37/153 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/317

    摘要： The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

    摘要翻译： 本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。 该系统可以包括发散的带电粒子束部分，其中包括透镜结构。 透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。 在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

    MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM
    19.
    发明申请
    MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM 有权
    多束光束粒子光学系统

    公开(公告)号：US20120211677A1

    公开(公告)日：2012-08-23

    申请号：US13461594

    申请日：2012-05-01

    申请人： Pieter Kruit ,  Yanxia Zhang ,  Matijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

    发明人： Pieter Kruit ,  Yanxia Zhang ,  Matijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

    IPC分类号： G21K5/10

    CPC分类号： H01J37/12 ,  H01J37/153 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/317

    摘要： The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

    摘要翻译： 本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。 该系统可以包括发散的带电粒子束部分，其中包括透镜结构。 透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。 在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。