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公开(公告)号：US20220019143A1
公开(公告)日：2022-01-20
申请号：US17339522
申请日：2021-06-04
Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
Inventor： Emad Aqad , Brandon Wenning , Choong-Bong Lee , James W. Thackeray , Ke Yang , James F. Cameron
IPC: G03F7/039 , G03F7/004 , G03F7/038 , C08F220/18 , C08F220/28 , C08F212/14
Abstract: A photoresist composition comprising: a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group; a second polymer comprising a first repeating unit comprising an acid-labile group, a second repeating unit comprising a lactone group, and a third repeating unit comprising a base-soluble group, wherein the base-soluble group has a pKa of less than or equal to 12, and wherein the base-soluble group does not comprise a hydroxy-substituted aryl group; a photoacid generator; and a solvent, wherein the first polymer and the second polymer are different from each other.
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公开(公告)号：US20190227433A1
公开(公告)日：2019-07-25
申请号：US16371908
申请日：2019-04-01
Applicant: Rohm and Haas Electronic Materials LLC
Inventor： James W. Thackeray , Paul J. Labeaume , James F. Cameron
Abstract: Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, photoresists are provided that comprise (i) a polymer; (ii) a first onium salt acid generator that produces a first acid upon exposure of the photoresist composition to activating radiation; and (iii) a second onium salt acid generator that 1) comprises a covalently bound acid-labile moiety and 2) produces a second acid upon exposure of the photoresist composition to activating radiation, wherein the first acid and second acid have pKa values that differ by at least 0.5.
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公开(公告)号：US20190202955A1
公开(公告)日：2019-07-04
申请号：US16236883
申请日：2018-12-31
Applicant: Rohm and Haas Electronic Materials LLC
Inventor： Emad Aqad , James F. Cameron , James W. Thackeray
IPC: C08F230/04 , C07F11/00 , G03F7/038 , G03F7/039 , C09D143/00 , G03F7/11 , G03F7/16 , G03F7/20 , G03F7/32 , G03F7/38
CPC classification number: C08F230/04 , C07F11/00 , C09D143/00 , G03F7/038 , G03F7/039 , G03F7/11 , G03F7/162 , G03F7/168 , G03F7/2004 , G03F7/322 , G03F7/38
Abstract: New monomer and polymer materials that comprise one or more Te atoms. In one aspect, tellurium-containing monomers and polymers are provided that are useful for Extreme Ultraviolet Lithography.
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公开(公告)号：US20190155152A1
公开(公告)日：2019-05-23
申请号：US15817864
申请日：2017-11-20
Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
Inventor： Emad Aqad , James W. Thackeray
IPC: G03F7/004 , C07D333/76 , C07C309/12 , C07C65/05 , C07C25/02 , C07C323/09 , C07C323/03 , G03F7/038 , G03F7/039 , G03F7/16 , G03F7/20 , G03F7/26
Abstract: A photoacid generator compound having formula (I): wherein, in formula (I), groups and variables are the same as described in the specification.
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15.发明授权公开(公告)号：US10078261B2
公开(公告)日：2018-09-18
申请号：US14020343
申请日：2013-09-06
Inventor： Sangho Cho , Guorong Sun , Karen L. Wooley , James W. Thackeray , Peter Trefonas, III
CPC classification number: G03F7/038 , C08F293/005 , C08F2438/03 , C08G61/08 , C08G2261/126 , C08G2261/128 , C08G2261/136 , C08G2261/1426 , C08G2261/3324 , C08G2261/418 , C08G2261/80 , C08G2261/90 , C08L51/003 , G03F7/0002 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/0397 , C08F2220/185 , C08F220/22 , C08F2220/283
Abstract: Disclosed herein is a graft block copolymer comprising a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety that comprises a halocarbon moiety, a silicon containing moiety, or a combination of a halocarbon moiety and a silicon containing moiety; a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo acid-catalyzed deprotection causing a change of solubility of the graft block copolymer in a developer solvent.
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Patent Agency Ranking
公开(公告)号：US20170248844A1
公开(公告)日：2017-08-31
申请号：US15131135
申请日：2016-04-18
Applicant: Rohm and Haas Electronic Materials LLC
Inventor： Emad Aqad , James W. Thackeray , James F. Cameron
IPC: G03F7/004 , C07C309/17 , G03F7/20 , G03F7/32 , C08F224/00 , G03F7/039
CPC classification number: G03F7/0045 , C07C309/17 , C08F224/00 , G03F7/0397 , C08F2220/1866 , C08F220/24 , C08F2220/382
Abstract: A monomer has the structure wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.
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公开(公告)号：US09696624B2
公开(公告)日：2017-07-04
申请号：US14812238
申请日：2015-07-29
Inventor： James W. Thackeray , Meiliana Siauw , Peter Trefonas, III , Idriss Blakey , Andrew Keith Whittaker
CPC classification number: G03F7/09 , G03F7/0045 , G03F7/0046 , G03F7/0047 , G03F7/038 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/094 , G03F7/162 , G03F7/20 , G03F7/2037 , G03F7/325
Abstract: A composite, which is a blend comprising: a nanoparticle comprising a core and a coating surrounding the core; and a polymer, wherein the coating of the nanoparticle comprises a ligand, wherein the ligand is a substituted or unsubstituted C1-C16 carboxylic acid or a salt thereof, a substituted or unsubstituted C1-C16 amino acid or a salt thereof, a substituted or unsubstituted C1-C16 dialkyl phosphonate, or a combination thereof; and wherein the polymer is a polymerization product of a photoacid generator comprising a polymerizable group; at least one unsaturated monomer, which is different from the photoacid generator comprising a polymerizable group; and a chain transfer agent of formula (I); wherein: Z is a y valent C1-20 organic group, x is 0 or 1, and Rd is a substituted or unsubstituted C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl.
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18.发明申请BLOCK COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION AND METHOD OF FORMING AN ELECTRONIC DEVICE 有权嵌段共聚物及其相关的光电组合物及形成电子器件的方法公开(公告)号：US20170037178A1
公开(公告)日：2017-02-09
申请号：US14820647
申请日：2015-08-07
Inventor： James W. Thackeray , Ke Du , Peter Trefonas, III , Idriss Blakey , Andrew Keith Whittaker
IPC: C08F293/00 , G03F7/20 , G03F7/32 , G03F7/038
CPC classification number: C08F293/00 , C08F220/22 , C08F293/005 , C08F2438/03 , C09D153/00 , G03F7/0046 , G03F7/0048 , G03F7/038 , G03F7/0382 , G03F7/0392 , G03F7/0758 , G03F7/11 , G03F7/2004 , G03F7/2059 , G03F7/322
Abstract: A block copolymer useful in electron beam and extreme ultraviolet photolithography includes a first block with units derived from a base-solubility-enhancing monomer and an out-of-band absorbing monomer, and a second block having a low surface energy. Repeat units derived from the out-of-ban absorbing monomer allow the copolymer to absorb significantly in the wavelength range 150 to 400 nanometers. When incorporated into a photoresist composition with a photoresist random polymer, the block copolymer self-segregates to form a top layer that effectively screens out-of-band radiation.
Abstract translation: 可用于电子束和极紫外光刻的嵌段共聚物包括具有衍生自碱溶性增强单体和带外吸收单体的单元的第一嵌段和具有低表面能的第二嵌段。 来自禁止吸收单体的重复单元使共聚物在150至400纳米的波长范围内显着吸收。 当用光致抗蚀剂无规聚合物掺入光致抗蚀剂组合物时，嵌段共聚物自分离以形成有效屏蔽带外辐射的顶层。
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公开(公告)号：US20170031244A1
公开(公告)日：2017-02-02
申请号：US14812238
申请日：2015-07-29
Inventor： James W. Thackeray , Meiliana Siauw , Peter Trefonas, III , Idriss Blakey , Andrew Keith Whittaker
CPC classification number: G03F7/09 , G03F7/0045 , G03F7/0046 , G03F7/0047 , G03F7/038 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/094 , G03F7/162 , G03F7/20 , G03F7/2037 , G03F7/325
Abstract: A composite, which is a blend comprising: a nanoparticle comprising a core and a coating surrounding the core; and a polymer, wherein the coating of the nanoparticle comprises a ligand, wherein the ligand is a substituted or unsubstituted C1-C16 carboxylic acid or a salt thereof, a substituted or unsubstituted C1-C16 amino acid or a salt thereof, a substituted or unsubstituted C1-C16 dialkyl phosphonate, or a combination thereof; and wherein the polymer is a polymerization product of a photoacid generator comprising a polymerizable group; at least one unsaturated monomer, which is different from the photoacid generator comprising a polymerizable group; and a chain transfer agent of formula (I); wherein: Z is a y valent C1-20 organic group, x is 0 or 1, and Rd is a substituted or unsubstituted C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl.
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公开(公告)号：US09470976B2
公开(公告)日：2016-10-18
申请号：US14833278
申请日：2015-08-24
Applicant: Rohm and Haas Electronic Materials LLC
Inventor： Paul J. LaBeaume , Vipul Jain , Suzanne M. Coley , James W. Thackeray , James F. Cameron , Amy M. Kwok , David A. Valeri
IPC: G03F7/004 , G03F7/038 , G03F7/16 , G03F7/20 , G03F7/32 , G03F7/38 , H01L21/027 , C07C309/12 , C07C381/12 , C08F220/18 , C08F220/24 , C08F220/28 , C08F220/38 , G03F7/039
Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.
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