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公开(公告)号:US11302471B2
公开(公告)日:2022-04-12
申请号:US16744484
申请日:2020-01-16
Applicant: STMicroelectronics S.r.l.
Inventor: Vincenzo Palumbo , Gabriella Ghidini , Enzo Carollo , Fabrizio Fausto Renzo Toia
IPC: H01F27/28 , H01F27/32 , H01L23/522 , H01L23/64 , H01L27/08 , H01F41/063 , H01L23/66
Abstract: An integrated transformer includes a primary winding and a secondary winding each having a spiral planar arrangement coils. A dielectric portion of dielectric material is interposed between the primary winding and the secondary winding. A field plate winding is electrically coupled with the primary winding. The field plate winding includes at least one field plate coil having a first lateral extension greater than a second lateral extension of a primary outer coil of the primary winding. The field plate coil is superimposed in plan view to the primary outer coil of the primary winding.
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12.
公开(公告)号:US10930799B2
公开(公告)日:2021-02-23
申请号:US16246945
申请日:2019-01-14
Applicant: STMicroelectronics S.r.l.
Inventor: Flavio Francesco Villa , Marco Morelli , Marco Marchesi , Simone Dario Mariani , Fabrizio Fausto Renzo Toia
Abstract: A semiconductor body includes a front side and a back side and is configured to support an electronic circuit. A buried region is provided in the semiconductor body at a location between the electronic circuit and the back side. The buried region includes a layer of conductive material and a dielectric layer, where the dielectric layer is arranged between the layer of conductive material and the semiconductor body. A conductive path extends between the buried region and the front side to form a path for electrical access to the layer of conductive material. A capacitor is thus formed with the layer of conductive material providing a capacitor plate and the dielectric layer providing the capacitor dielectric. A further capacitor plate is provided by the semiconductor body, or by a further layer of conductive material in the buried region.
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公开(公告)号:US10535767B2
公开(公告)日:2020-01-14
申请号:US16264384
申请日:2019-01-31
Applicant: STMICROELECTRONICS S.R.L.
Inventor: Marco Sambi , Fabrizio Fausto Renzo Toia , Marco Marchesi , Marco Morelli , Riccardo Depetro , Giuseppe Barillaro , Lucanos Marsilio Strambini
IPC: H01L21/02 , H01L29/78 , H01L29/32 , H01L29/66 , H01L29/861 , H01L29/06 , H01L29/16 , H01L21/265 , H01L21/3063 , H01L21/308 , H01L21/762 , H01L29/08 , H01L29/36 , H01L29/417 , H03K17/687
Abstract: A process of forming integrated electronic device having a semiconductor body includes: forming a first electrode region having a first type of conductivity; forming a second electrode region having a second type of conductivity, which forms a junction with the first electrode region; and forming a nanostructured semiconductor region, which extends in one of the first and second electrode regions.
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14.
公开(公告)号:US20180097055A1
公开(公告)日:2018-04-05
申请号:US15454096
申请日:2017-03-09
Applicant: STMicroelectronics S.r.l.
Inventor: Elisabetta Pizzi , Fabrizio Fausto Renzo Toia , Marco Marchesi , Vincenzo Palumbo
Abstract: A dielectric structure extends over the substrate and a transformer is integrated in the dielectric structure. The transformed includes a first winding in the dielectric layer at a first height and a second winding in the dielectric layer at a second height greater than the first height. The first and second windings are magnetically coupleable to one another. A magnetic element is positioned in alignment with the first and second windings. In one implementation, the magnetic element underlies the first winding in a position between the substrate and the first winding. In another implementation, the magnetic element overlies the second winding.
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公开(公告)号:US20180061982A1
公开(公告)日:2018-03-01
申请号:US15457799
申请日:2017-03-13
Applicant: STMICROELECTRONICS S.R.L.
Inventor: Marco Sambi , Fabrizio Fausto Renzo Toia , Marco Marchesi , Marco Morelli , Riccardo Depetro , Giuseppe Barillaro , Lucanos Marsilio Strambini
IPC: H01L29/78 , H01L29/06 , H01L29/417 , H01L29/36 , H01L29/66 , H01L21/3063 , H01L21/265 , H01L21/308 , H01L21/02 , H01L29/08 , H01L21/762 , H03K17/687
CPC classification number: H01L29/7827 , H01L21/02233 , H01L21/02255 , H01L21/26513 , H01L21/3063 , H01L21/3081 , H01L21/76224 , H01L29/0649 , H01L29/0653 , H01L29/0665 , H01L29/0847 , H01L29/16 , H01L29/32 , H01L29/36 , H01L29/41741 , H01L29/66128 , H01L29/66666 , H01L29/66681 , H01L29/7816 , H01L29/8611 , H03K17/687
Abstract: An integrated electronic device having a semiconductor body including: a first electrode region having a first type of conductivity; and a second electrode region having a second type of conductivity, which forms a junction with the first electrode region. The integrated electronic device further includes a nanostructured semiconductor region, which extends in one of the first and second electrode regions.
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16.
公开(公告)号:US20170250253A1
公开(公告)日:2017-08-31
申请号:US15250638
申请日:2016-08-29
Applicant: STMICROELECTRONICS S.R.L.
CPC classification number: H01L29/1087 , H01L21/02381 , H01L21/02532 , H01L21/02639 , H01L21/0265 , H01L21/02664 , H01L21/3247 , H01L21/74 , H01L21/743 , H01L23/535 , H01L29/1083 , H01L29/401 , H01L29/7802
Abstract: A semiconductor device comprising: a semiconductor body including an active region that houses an electronic component and a passive dielectric region surrounding the active region; a conductive buried region, of metallic material or metallic alloy, which extends in the semiconductor body in the active region; and one or more electrical contacts, of metallic material, which extend between the conductive buried region and a top surface of the semiconductor body, and form respective paths for electrical access to the conductive buried region.
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