Electronic device with integrated galvanic isolation, and manufacturing method of the same

    公开(公告)号:US10199370B2

    公开(公告)日:2019-02-05

    申请号:US15900041

    申请日:2018-02-20

    Abstract: A method of manufacturing an electronic device for providing galvanic isolation includes forming a dielectric layer on a semiconductor body and integrating, in the dielectric layer, a galvanic isolation module, the integrating including forming a first metal region at a first height of the dielectric layer. A second metal region is formed at a second height greater than the first height of the dielectric layer, the first and second metal regions being at least one of capacitively and magnetically coupleable together. Forming the second metal region includes etching selective portions of the dielectric layer to form at least one trench having a side wall coupled to a bottom wall through rounded surface portions, and filling each trench with metal material to form the second metal region having rounded edges.

    DRIVER CIRCUIT, CORRESPONDING INTEGRATED CIRCUIT AND DEVICE

    公开(公告)号:US20170141775A1

    公开(公告)日:2017-05-18

    申请号:US15163142

    申请日:2016-05-24

    Abstract: A circuit provides a high-voltage low-drop diode-like conductive path between a DC voltage supply terminal and a bootstrap terminal in charging a supply capacitor for driving a power switch with the capacitor set between the bootstrap terminal and an output terminal alternatively switchable between a low voltage and a high voltage DC voltage. In an embodiment, the circuit includes first and second transistors such as LDMOS depletion transistors with the first transistor set in a cascode arrangement between the bootstrap terminal and the DC voltage supply terminal and the second transistor coupled with a sense comparator for comparing the voltage at the bootstrap terminal with the voltage at said DC voltage supply terminal. The first and second transistors have common control terminals coupled with the DC voltage supply terminal and common coupling terminals to the bootstrap terminal.

    SEMICONDUCTOR DEVICE WITH INTEGRATED MAGNETIC ELEMENT PROVIDED WITH A BARRIER STRUCTURE AGAINST METAL CONTAMINATION, AND MANUFACTURING
    7.
    发明申请
    SEMICONDUCTOR DEVICE WITH INTEGRATED MAGNETIC ELEMENT PROVIDED WITH A BARRIER STRUCTURE AGAINST METAL CONTAMINATION, AND MANUFACTURING 有权
    具有集成磁性元件的半导体器件,具有防止金属污染的障碍物结构和制造

    公开(公告)号:US20140167193A1

    公开(公告)日:2014-06-19

    申请号:US14104934

    申请日:2013-12-12

    Abstract: A semiconductor device including: a semiconductor body having a first side and a second side opposite to one another; a first barrier element, which extends over the first side of the semiconductor body and is made of a first material configured to act as barrier against metal ions, for example chosen from among titanium, tantalum, titanium alloys or compounds, tantalum alloy; a magnetic element, which extends over the first barrier layer and is made of a second material having magnetic properties, for example a ferromagnetic material; a second barrier element, which extends over the magnetic layer and is made of a third material configured to act as barrier against metal ions, for example chosen from among titanium, tantalum, titanium alloys or compounds, tantalum alloys or compounds. The first and second barrier elements form a top encapsulating structure and a bottom encapsulating structure for the magnetic element.

    Abstract translation: 一种半导体器件,包括:具有彼此相对的第一侧和第二侧的半导体本体; 第一屏障元件,其延伸在半导体本体的第一侧上,并且由构造成用作阻挡金属离子的第一材料制成,例如选自钛,钽,钛合金或化合物,钽合金; 磁性元件,其在第一阻挡层上延伸并且由具有磁性的第二材料制成,例如铁磁材料; 第二屏障元件,其在磁性层上延伸并由构成为用作阻挡金属离子的第三材料制成,例如选自钛,钽,钛合金或化合物,钽合金或化合物。 第一和第二屏障元件形成顶部封装结构和用于磁性元件的底部封装结构。

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