Abstract:
A memory cell formed in a semiconductor substrate, includes a selection gate extending vertically in a trench made in the substrate, and isolated from the substrate by a first layer of gate oxide, a horizontal floating gate extending above the substrate and isolated from the substrate by a second layer of gate oxide, and a horizontal control gate extending above the floating gate. The selection gate covers a lateral face of the floating gate. The floating gate is separated from the selection gate only by the first layer of gate oxide, and separated from a vertical channel region, extending in the substrate along the selection gate, only by the second layer of gate oxide.
Abstract:
Non-volatile memory including rows and columns of memory cells, the columns of memory cells including pairs of twin memory cells including a common selection gate. According to the disclosure, two bitlines are provided per column of memory cells. The adjacent twin memory cells of the same column are not connected to the same bitline while the adjacent non-twin memory cells of the same column are connected to the same bitline.
Abstract:
A method for operating a non-volatile memory device uses a sense amplifier that includes a first branch and a second branch. During a pre-charging step, a bit line of a memory array of the non-volatile memory device is biased in order to pre-charge the bit line. During the pre-charging step, an offset between the first branch and the second branch is detected and stored. During a reading step subsequent to the pre-charging step, a cell current is received from the bit line at the first branch and a reference current is received from a current-reference structure at the second branch. During the reading step, and amplified voltage is generated as a function of the cell current and the reference current. During the reading step, an output voltage is generated based on the amplified voltage compensated by the offset stored during the pre-charging step.
Abstract:
The present disclosure relates to a non-volatile memory cell on a semiconductor substrate, comprising a first transistor comprising a control gate, a floating gate and a drain region, a second transistor comprising a control gate, a floating gate and a drain region, in which the floating gates of the first and second transistors are electrically coupled, and the second transistor comprises a conducting region electrically coupled to its drain region and extending opposite its floating gate through a tunnel dielectric layer.
Abstract:
The present disclosure relates to a method for controlling two twin memory cells each comprising a floating-gate transistor comprising a state control gate, in series with a select transistor comprising a select control gate common to the two memory cells, the drains of the floating-gate transistors being connected to a same bit line, the method comprising steps of programming the first memory cell by hot-electron injection, by applying a positive voltage to the bit line and a positive voltage to the state control gate of the first memory cell, and simultaneously, of applying to the state control gate of the second memory cell a positive voltage capable of causing a programming current to pass through the second memory cell, without switching it to a programmed state.
Abstract:
The present disclosure relates to a memory comprising at least one word line comprising a row of split gate memory cells each comprising a selection transistor section comprising a selection gate and a floating-gate transistor section comprising a floating gate and a control gate. According to the present disclosure, the memory comprises a source plane common to the memory cells of the word line, to collect programming currents passing through memory cells during their programming, and the selection transistor sections of the memory cells are connected to the source plane. A programming current control circuit is configured to control the programming current passing through the memory cells by acting on a selection voltage applied to a selection line.
Abstract:
A method for characterizing or measuring a capacitance includes linking the capacitance to a first mid-point of a first capacitive divider bridge, applying to the divider bridge a bias voltage, maintaining the voltage of the first mid-point near a reference voltage, discharging a second mid-point of a second divider bridge in parallel with the first using a constant current, and measuring the time for a voltage of the second mid-point to become equal to the voltage of the first mid-point. The method may be applied in particular to the control of a touch screen display.
Abstract:
A charge flow circuit for a time measurement, including a plurality of elementary capacitive elements electrically in series, each elementary capacitive element leaking through its dielectric space.
Abstract:
In an embodiment an integrated device includes a first physical unclonable function module configured to generate an initial data group and management module configured to generate an output data group from at least the initial data group, authorize only D successive deliveries of the output data group on a first output interface of the device, D being a non-zero positive integer, and prevent any new generation of the output data group.
Abstract:
In an embodiment a non-volatile memory device includes a memory plane including at least one memory area including an array of memory cells having two rows and N columns, wherein each memory cell comprises a state transistor having a control gate and a floating gate selectable by a vertical selection transistor buried in a substrate and including a buried selection gate, and wherein each column of memory cells includes a pair of twin memory cells, two selection transistors of the pair of twin memory cells having a common selection gate and a processing device configured to store in the memory area information including a succession of N bits so that, with exception of the last bit of the succession, a current bit of the succession is stored in two memory cells located on the same row and on two adjacent columns and a current bit and the following bit are respectively stored in two twin cells.