公开(公告)号：US09897772B2

公开(公告)日：2018-02-20

申请号：US14563463

申请日：2014-12-08

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG DISPLAY CO., LTD.

Inventor： Sang-Joon Hong ,  Hi-Kuk Lee ,  Sang-Don Jang

IPC: G02B7/02 ,  F16B11/00

CPC classification number: G02B7/025 ,  F16B11/008 ,  Y10T403/472

Abstract: Disclosed is a fixing module for fixing an optical system to an optical apparatus, including a coupling unit having a plate to couple to the apparatus, the coupling unit having a first penetrating space at a central portion thereof and a protruding portion protruded downwards from the plate; a first fixing unit combinable with the coupling unit and having a receiving space including a thermosetting resin such that the protruding portion is fixed into the thermosetting resin; and a second fixing unit combinable with the first fixing unit and having a second penetrating space communicating with the first penetrating space, such that the optical system can penetrate through the first and the second penetrating spaces and be fixed by the second fixing unit.

公开(公告)号：US09594307B2

公开(公告)日：2017-03-14

申请号：US14226621

申请日：2014-03-26

Applicant: Samsung Display Co., Ltd.

Inventor： Cha-Dong Kim ,  Hoon Kang ,  Chang-Hoon Kim ,  Sang-Hyun Yun ,  Jung-In Park ,  Woo-Yong Sung ,  Ki-Beom Lee ,  Hi-Kuk Lee ,  Jae-Hyuk Chang

IPC: G03B27/68 ,  G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  G03F7/7055

Abstract: An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.

Abstract translation: 曝光装置包括光源，照明构件，突出构件，台，检查构件和信息处理构件。 光源被配置为根据表示光辐射周期的脉冲事件生成（PEG）提供光。 照明构件被配置为将光改变为点光。 突出构件被配置为根据在各个方向上延伸的光致抗蚀剂形状来投射点光源。 点灯投射在舞台上。 检查构件被配置为检查由投影点光形成的光致抗蚀剂图案。 信息处理构件被配置为分析对应于不同PEG的不同光刻胶图案，以从不同的PEG中选择一个PEG。 一个PEG与各个方向上的最小误差相关联。

公开(公告)号：US20160202615A1

公开(公告)日：2016-07-14

申请号：US14836422

申请日：2015-08-26

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： KAB-JONG SEO ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Ki-Beom Lee

IPC: G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/7005 ,  G03F7/704

Abstract: A maskless exposure device includes a plurality of exposure heads, each exposure head including a digital micro-mirror device configured to scan an exposure beam to a substrate, the exposure heads being disposed in staggered first and second rows, a plurality of reflecting members disposed on side surfaces of the exposure heads and having reflecting surfaces parallel with each other, a light emitting part configured to light to the reflecting members, and a light receiving part configured to receive light via the reflecting members.

Abstract translation: 无掩模曝光装置包括多个曝光头，每个曝光头包括配置成将曝光光束扫描到基板的数字微镜装置，曝光头设置在交错的第一和第二行中，多个反射部件设置在 曝光头的侧表面并且具有彼此平行的反射表面，被配置为对反射构件发光的发光部，以及被配置为经由反射构件接收光的光接收部。

公开(公告)号：US20160109809A1

公开(公告)日：2016-04-21

申请号：US14831830

申请日：2015-08-20

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hi-Kuk Lee ,  Jae-Young Jang ,  Jae-Hyuk Chang ,  Sang-Don Jang

IPC: G03F7/20

CPC classification number: G03F7/70275 ,  G03F7/70291 ,  G03F7/70358 ,  G03F7/70558

Abstract: A maskless exposure device including a light source configured to emit an exposure beam, a light modulation element configured to modulate the exposure beam according to an exposure pattern, a projection optical system configured to transfer a modulated exposure beam to a substrate as a beam spot array, a beam measurement part configured to measure a beam data of the beam spot array, and a compensating mask generator configured to generate a compensating mask by utilizing a measured data of the exposure beam for compensating cumulative illumination, wherein the compensating mask generator is configured to turn off left and right beams of a first selected spot beam selected by the beam data, and then to turn off a second selected spot beam.

Abstract translation: 一种无掩模曝光装置，包括被配置为发射曝光光束的光源，配置成根据曝光图案调制曝光光束的光调制元件，被配置为将调制曝光光束传送到基板的投影光学系统作为光束阵列 ，被配置为测量所述光束阵列的光束数据的光束测量部分以及被配置为通过利用所述曝光光束的测量数据来补偿累积照明来生成补偿掩模的补偿掩码发生器，其中所述补偿掩码发生器被配置为 关闭由光束数据选择的第一选定光束的左右光束，然后关闭第二选定的光束。

公开(公告)号：US08980528B2

公开(公告)日：2015-03-17

申请号：US13765132

申请日：2013-02-12

Applicant: Samsung Display Co., Ltd.

Inventor： Ki-Beom Lee ,  Chang-Hoon Kim ,  Su-Yeon Sim ,  Sang-Hyn Lee ,  Hi-Kuk Lee

IPC: G03F7/004 ,  G03F7/033 ,  G03F7/032 ,  G03F7/20 ,  G03F7/028

CPC classification number: G03F7/033 ,  G03F7/0007 ,  G03F7/028 ,  G03F7/029 ,  G03F7/031 ,  G03F7/032 ,  G03F7/105 ,  G03F7/20 ,  G03F7/2051

Abstract: A photoresist composition including: about 5% by weight to about 10% by weight of a binder resin; about 5% by weight to about 10% by weight of a photo-polymerization monomer; about 1% by weight to about 5% by weight of a photo initiator, which is activated by a light having a peak wavelength from about 400 nm to about 410 nm; about 5% by weight to about 10% by weight of a black-coloring agent, each based on a total weight of the photoresist composition; and a solvent.

Abstract translation: 一种光致抗蚀剂组合物，其包含：约5重量％至约10重量％的粘合剂树脂; 约5重量％至约10重量％的光聚合单体; 约1重量％至约5重量％的光引发剂，其由具有约400nm至约410nm的峰值波长的光活化; 约5重量％至约10重量％的黑色着色剂，各自基于光致抗蚀剂组合物的总重量; 和溶剂。

公开(公告)号：US10859921B2

公开(公告)日：2020-12-08

申请号：US14738543

申请日：2015-06-12

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jun-Ho Sim ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Hyun-Seok Kim

IPC: G03F7/20 ,  G03F9/00 ,  H01L23/544

Abstract: A maskless exposure device includes an exposure head that includes a digital micro-mirror device configured to reflect a source beam received from an exposure source to a substrate to scan an exposure beam to the substrate, and a system control part configured to control the digital micro-mirror device using a graphic data system file. The graphic data system file includes data of an align-key. The align-key includes an X-align-key that extends in a direction parallel to a scan direction of the exposure head, and has a bar shape in a plan view, and a Y-align-key disposed adjacent to the X-align-key that has a frame shape in a plan view.

公开(公告)号：US09335631B2

公开(公告)日：2016-05-10

申请号：US14446282

申请日：2014-07-29

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Ki-Beom Lee ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Chang-Hoon Kim ,  Jung-In Park

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/40 ,  C08F220/30

CPC classification number: G03F7/0388 ,  C08F220/30 ,  C08F2220/301 ,  C08F2220/303 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/40

Abstract: A photosensitive resin composition includes an acid-labile resin of about 5 wt % to about 25 wt %, a monomer of about 5 wt % to about 10 wt %, a photoacid generator of about 5 wt % to about 10 wt %, a photoreaction accelerator of about 1 wt % to about 5 wt %, and a solvent of about 50 wt % to about 84 wt %, wherein the acid-labile resin comprises a repeating unit containing an acid group, and a protecting group configured to protect the repeating unit.

Abstract translation: 光敏树脂组合物包括约5重量％至约25重量％的酸不稳定树脂，约5重量％至约10重量％的单体，约5重量％至约10重量％的光酸产生剂，光反应 约1重量％至约5重量％的促进剂和约50重量％至约84重量％的溶剂，其中酸不稳定树脂包含含有酸基的重复单元和被保护重复的保护基 单元。

公开(公告)号：US20150168833A1

公开(公告)日：2015-06-18

申请号：US14446282

申请日：2014-07-29

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Ki-Beom Lee ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Chang-Hoon Kim ,  Jung-In Park

IPC: G03F7/038 ,  G03F7/40

CPC classification number: G03F7/0388 ,  C08F220/30 ,  C08F2220/301 ,  C08F2220/303 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/40

Abstract: A photosensitive resin composition includes an acid-labile resin of about 5 wt % to about 25 wt %, a monomer of about 5 wt % to about 10 wt %, a photoacid generator of about 5 wt % to about 10 wt %, a photoreaction accelerator of about 1 wt % to about 5 wt %, and a solvent of about 50 wt % to about 84 wt %, wherein the acid-labile resin comprises a repeating unit containing an acid group, and a protecting group configured to protect the repeating unit.

Abstract translation: 光敏树脂组合物包括约5重量％至约25重量％的酸不稳定树脂，约5重量％至约10重量％的单体，约5重量％至约10重量％的光酸产生剂，光反应 约1重量％至约5重量％的促进剂和约50重量％至约84重量％的溶剂，其中酸不稳定树脂包含含有酸基的重复单元和被保护重复的保护基 单元。

公开(公告)号：US08902414B2

公开(公告)日：2014-12-02

申请号：US13669751

申请日：2012-11-06

Applicant: Samsung Display Co., Ltd.

Inventor： Jung-In Park ,  Cha-Dong Kim ,  Su-Yeon Sim ,  Sang-Hyun Yun ,  Hi-Kuk Lee

IPC: G01J1/00 ,  G03F7/20

CPC classification number: G01J1/00 ,  G03F7/20 ,  G03F7/70133

Abstract: An exposure system includes an exposure apparatus, a mask, a test pattern portion and a uniformity measuring part. The exposure apparatus includes a first module and a second module. The first and second modules each emit light and are overlapped in an overlapping area. The mask includes a plurality of transmission portions which are spaced apart from each other. Each of the transmission portions has a width less than a width of the overlapping area. The test pattern portion includes a plurality of test patterns which are patterned by using the light transmitted through the transmission portions of the mask. The uniformity measuring part measures a uniformity of the test patterns.

Abstract translation: 曝光系统包括曝光装置，掩模，测试图案部分和均匀度测量部分。 曝光装置包括第一模块和第二模块。 第一和第二模块各自发光并且在重叠区域中重叠。 掩模包括彼此间隔开的多个传输部分。 每个传输部分具有小于重叠区域的宽度的宽度。 测试图形部分包括通过使用透过掩模的透射部分的光而构图的多个测试图案。 均匀度测量部件测量测试图案的均匀性。