公开(公告)号：US10654130B2

公开(公告)日：2020-05-19

申请号：US15175649

申请日：2016-06-07

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Joo Woan Cho ,  Byoung Ho Cheong ,  Oleg Prudnikov ,  Jeong Kyun Na ,  Joon-Hwa Bae ,  Seung Hwan Lee ,  Byoung Kwon Choo

IPC: G02B5/30 ,  G02B27/28 ,  B23K26/354 ,  G02B27/09 ,  G03F7/20 ,  B23K26/067 ,  B23K26/073 ,  G02B5/04 ,  G02B13/02

Abstract: A polarization module and a laser exposure apparatus have a polarization module including a first lens and a second lens that reduce a one-directional length of a cross-section of an incident laser beam having an optical axis. A polarization beam splitter divides the laser beam passing through the first and second lenses into two laser beams that are polarized in different directions with respect to each other. A first prism lens and a second prism lens emit an output laser beam by controlling the two laser beams that are divided by the polarization beam splitter to positions that are symmetrical with respect to the optical axis. At least one half wave plate is disposed between the polarization beam splitter and the first prism lens.

公开(公告)号：US09982165B2

公开(公告)日：2018-05-29

申请号：US15355917

申请日：2016-11-18

Applicant: SAMSUNG DISPLAY CO., LTD. ,  UBmaterials Inc.

Inventor： Byoung-Kwon Choo ,  Jin-Hyung Park ,  Jeong-Kyun Na ,  Joon-Hwa Bae ,  Byoung-Ho Cheong ,  Joo-Woan Cho ,  In-Sun Hwang

IPC: C09K13/04 ,  C09G1/02 ,  C09K3/14 ,  H01L27/12 ,  H01L29/786 ,  H01L21/321 ,  H01L27/32 ,  G02F1/1368

CPC classification number: C09G1/02 ,  B81C2201/0104 ,  C09K3/1409 ,  G02F1/1368 ,  G02F2202/104 ,  H01L21/3212 ,  H01L27/1222 ,  H01L27/1274 ,  H01L27/3262 ,  H01L29/66757 ,  H01L29/78675

Abstract: A polishing slurry for silicon, a method of polishing polysilicon, and a method of manufacturing a thin film transistor substrate, the slurry including a polishing particle; a dispersing agent including an anionic polymer, a hydroxyl acid, or an amino acid; a stabilizing agent including an organic acid, the organic acid including a carboxyl group; a hydrophilic agent including a hydrophilic group and a hydrophobic group, and water, wherein the polishing particle is included in the polishing slurry in an amount of about 0.1% by weight to about 10% by weight, based on a total weight of the slurry, a weight ratio of the polishing particle and the dispersing agent is about 1:0.01 to about 1:0.2, a weight ratio of the polishing particle and the stabilizing agent is about 1:0.001 to about 1:0.1, and a weight ratio of the polishing particle and the hydrophilic agent is about 1:0.01 to about 1:3.

公开(公告)号：US11985865B2

公开(公告)日：2024-05-14

申请号：US17332933

申请日：2021-05-27

Applicant: Samsung Display Co., Ltd.

Inventor： Byoung Kwon Choo ,  Seung Bae Kang ,  Bong Gu Kang ,  Tae Joon Kim ,  Jeong Min Park ,  Joon-Hwa Bae ,  Hee Sung Yang ,  Woo Jin Cho

IPC: H10K59/123 ,  H10K50/84 ,  H10K50/86 ,  H10K59/12 ,  H10K59/38 ,  H10K59/40 ,  H10K71/00

CPC classification number: H10K59/123 ,  H10K50/84 ,  H10K50/865 ,  H10K59/38 ,  H10K59/40 ,  H10K71/00 ,  H10K59/1201

Abstract: A display device according to an embodiment includes: a substrate; a transistor that is disposed on the substrate; a light emitting diode that is disposed on the substrate, and connected to the transistor; and a passivation layer that is disposed between the transistor and the light emitting diode, wherein a surface step of the passivation layer is within a range of and including 1 nm to 30 nm.

公开(公告)号：US11919122B2

公开(公告)日：2024-03-05

申请号：US17036062

申请日：2020-09-29

Applicant: Samsung Display Co., LTD. ,  KCTECH CO., LTD.

Inventor： Seung Bae Kang ,  Sung Hyeon Park ,  Jung Gun Nam ,  Joon-Hwa Bae ,  Kyung Bo Lee ,  Keun Woo Lee ,  Woo Jin Cho ,  Byoung Kwon Choo

IPC: B24B37/015 ,  B24B37/04 ,  C03C19/00 ,  H01L27/12 ,  H01L29/66 ,  H10K59/121 ,  H10K71/00 ,  H10K71/20 ,  H10K71/70 ,  H10K77/10 ,  H01L29/768 ,  H01L29/786 ,  H10K59/12

CPC classification number: B24B37/015 ,  B24B37/042 ,  C03C19/00 ,  H10K59/1213 ,  H10K71/00 ,  H10K71/20 ,  H10K71/70 ,  H10K77/10 ,  H01L27/1218 ,  H01L27/1222 ,  H01L27/1262 ,  H01L27/1274 ,  H01L29/6675 ,  H01L29/78672 ,  H10K59/1201

Abstract: A substrate processing apparatus includes: a conveyor belt configured to have an outer surface on which a bottom surface of a substrate is seated; and a polishing head unit configured to face an upper surface of the substrate, wherein the polishing head unit includes: a polishing head connected to a driver; a polishing pad configured to face the polishing head; a polishing pad fixing ring disposed between the polishing head and the polishing pad; and a temperature sensor configured to overlap the polishing pad fixing ring and to be spaced apart from the polishing pad fixing ring.

公开(公告)号：US11050045B2

公开(公告)日：2021-06-29

申请号：US16581993

申请日：2019-09-25

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Heesung Yang ,  Seung Bae Kang ,  Bonggu Kang ,  Tae Wook Kang ,  Joon-Hwa Bae ,  Woojin Cho ,  Byoung Kwon Choo

IPC: H01L51/56 ,  H01L21/311 ,  H01L21/3105

Abstract: A display device includes a planarization layer covering transistors in a display area on a substrate, an organic light emitting diode on the planarization layer, a pad electrode in a non-display area on the substrate surrounding the display area, and a sacrificial layer remnant capping a side surface of the pad electrode.

公开(公告)号：US10438976B2

公开(公告)日：2019-10-08

申请号：US16243702

申请日：2019-01-09

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hyun Jin Cho ,  Joon-Hwa Bae ,  Byoung Kwon Choo ,  Byung Hoon Kang ,  Kwang Suk Kim ,  Woo Jin Cho ,  Jun Hyuk Cheon

IPC: H01L27/12 ,  H01L21/3105 ,  G09G3/3233 ,  C09G1/02 ,  B24B31/00 ,  H01L27/32 ,  H01L21/02 ,  H01L29/786 ,  H01L21/66

Abstract: A method for manufacturing a display device includes forming a first gate metal wire on a substrate, forming a first insulation layer that covers the first gate metal wire, forming a second gate metal wire on the first insulation layer, forming a second main insulation layer that covers the second gate metal wire, forming a second auxiliary insulation layer on the second main insulation layer, forming an exposed portion of an upper surface of the second main insulation layer by polishing the second auxiliary insulation layer, and forming a first data metal wire on the second main insulation layer and the second auxiliary insulation layer.

公开(公告)号：US10199405B2

公开(公告)日：2019-02-05

申请号：US15671638

申请日：2017-08-08

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Joon-Hwa Bae ,  Byoung Kwon Choo ,  Byung Hoon Kang ,  Woo Jin Cho ,  Hyun Jin Cho ,  Jun Hyuk Cheon ,  Jee-Hyun Lee

IPC: H01L27/12 ,  H01L21/02 ,  H01L29/786 ,  H01L21/306 ,  H01L21/3105 ,  H01L21/321 ,  H01L29/66 ,  H01L21/768

Abstract: A method of manufacturing a transistor display panel and a transistor display panel, the method including forming a polycrystalline silicon layer on a substrate; forming an active layer by patterning the polycrystalline silicon layer; forming a first insulating layer covering the substrate and the active layer; exposing the active layer by polishing the first insulating layer using a polishing apparatus; and forming a second insulating layer that contacts the first insulating layer and the active layer, wherein exposing the active layer by polishing the first insulating layer includes coating a first slurry on a surface of the first insulating layer, the first slurry reducing a polishing rate of the active layer.

公开(公告)号：US09768019B2

公开(公告)日：2017-09-19

申请号：US15158755

申请日：2016-05-19

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Joon-Hwa Bae ,  Byoung Kwon Choo ,  Jeong Kyun Na ,  Byoung Ho Cheong ,  Joo Woan Cho

IPC: H01L21/20 ,  H01L21/268 ,  H01L33/58 ,  H01L21/339 ,  H01L21/84 ,  H01L21/02 ,  H01L21/3105 ,  H01L21/308 ,  H01L27/12

CPC classification number: H01L21/02675 ,  H01L21/02532 ,  H01L21/02592 ,  H01L21/02672 ,  H01L21/3086 ,  H01L21/3105 ,  H01L21/32139 ,  H01L27/1281

Abstract: A laser crystallization method includes forming a plurality of first protrusions and depressions on a surface of an amorphous silicon layer, wherein a first protrusion and an adjacent first depression of the plurality of first protrusions and depressions, together, have a first pitch, and irradiating the amorphous silicon layer with a laser beam to form a polycrystalline silicon layer.