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57 条记录 (耗时 0.047 秒)

    Systems and methods for ion beam focusing
    11.
    发明授权
    Systems and methods for ion beam focusing 有权
    离子束聚焦的系统和方法

    公开(公告)号：US07019314B1

    公开(公告)日：2006-03-28

    申请号：US10967855

    申请日：2004-10-18

    申请人： Victor M. Benveniste ,  Peter L. Kellerman

    发明人： Victor M. Benveniste ,  Peter L. Kellerman

    IPC分类号： H01L21/324 ,  H01J37/317 ,  H01J49/30

    CPC分类号： H01J37/3171 ,  H01J37/147

    摘要： Systems and methods are provided for focusing a scanned ion beam in an ion implanter. A beam focusing system is provided, comprising first and second magnets providing corresponding magnetic fields that cooperatively provide a magnetic focusing field having a time-varying focusing field center generally corresponding to a time-varying beam position of a scanned ion beam along a scan direction. Methods are presented, comprising providing a focusing field having a focusing field center in the scan plane, and dynamically adjusting the focusing field such that the focusing field center is generally coincident with a time-varying beam position of the scanned ion beam along the scan direction.

    摘要翻译： 提供了将扫描离子束聚焦在离子注入机中的系统和方法。 提供了一种束聚焦系统，包括提供相应磁场的第一和第二磁体，其协作地提供磁聚焦场，其具有通常对应于扫描离子束沿扫描方向的时变束位置的时变聚焦场中心。 提出了方法，其包括提供在扫描平面中具有聚焦场中心的聚焦场，以及动态地调整聚焦场，使得聚焦场中心大体上与扫描离子束沿着扫描方向的时变束位置重合 。

    Techniques for independently controlling deflection, deceleration and focus of an ion beam
    12.
    发明授权
    Techniques for independently controlling deflection, deceleration and focus of an ion beam 有权
    用于独立控制离子束的偏转，减速和聚焦的技术

    公开(公告)号：US07888653B2

    公开(公告)日：2011-02-15

    申请号：US12348091

    申请日：2009-01-02

    申请人： Peter L. Kellerman ,  Svetlana Radovanov ,  Frank Sinclair ,  Victor M. Benveniste

    发明人： Peter L. Kellerman ,  Svetlana Radovanov ,  Frank Sinclair ,  Victor M. Benveniste

    IPC分类号： H01J3/14 ,  H01J49/22 ,  H01J23/083

    CPC分类号： H01J37/1471 ,  H01J37/12 ,  H01J37/3171

    摘要： Techniques for independently controlling deflection, deceleration, and focus of an ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for independently controlling deflection, deceleration, and focus of an ion beam. The apparatus may comprise an electrode configuration comprising a set of upper electrodes disposed above an ion beam and a set of lower electrodes disposed below the ion beam. The set of upper electrodes and the set of lower electrodes may be positioned symmetrically about a central ray trajectory of the ion beam. A difference in potentials between the set of upper electrodes and the set of lower electrodes may also be varied along the central ray trajectory to reflect an energy of the ion beam at each point along the central ray trajectory for independently controlling deflection, deceleration, and focus of an ion beam.

    摘要翻译： 公开了用于独立地控制离子束的偏转，减速和聚焦的技术。 在一个特定的示例性实施例中，这些技术可以被实现为用于独立地控制离子束的偏转，减速和聚焦的装置。 该装置可以包括电极配置，其包括设置在离子束上方的一组上电极和设置在离子束下方的一组下电极。 所述上电极组和下电极组可以围绕离子束的中心射线轨迹对称地定位。 上部电极组和下部电极组之间的电位差也可以沿着中心射线轨迹变化，以反映沿着中心射线轨迹的每个点处的离子束的能量，以独立地控制偏转，减速和聚焦 的离子束。

    METHOD AND APPARATUS FOR CONTROLLING AN ELECTROSTATIC LENS ABOUT A CENTRAL RAY TRAJECTORY OF AN ION BEAM
    14.
    发明申请
    METHOD AND APPARATUS FOR CONTROLLING AN ELECTROSTATIC LENS ABOUT A CENTRAL RAY TRAJECTORY OF AN ION BEAM 有权
    用于控制静电镜的方法和装置关于离子束的中心射线

    公开(公告)号：US20120168637A1

    公开(公告)日：2012-07-05

    申请号：US12981096

    申请日：2010-12-29

    申请人： Svetlana Radovanov ,  Peter L. Kellerman ,  Frank Sinclair ,  Robert C. Lindberg

    发明人： Svetlana Radovanov ,  Peter L. Kellerman ,  Frank Sinclair ,  Robert C. Lindberg

    IPC分类号： H01J3/14

    CPC分类号： H01J37/12 ,  H01J37/15 ,  H01J37/3171 ,  H01J2237/121 ,  H01J2237/151

    摘要： A method of controlling deflection of a charged particle beam in an electrostatic lens includes establishing a symmetrical electrostatic lens configuration comprising a plurality of electrodes disposed at unadjusted positions that are symmetric with respect to the central ray trajectory with applied unadjusted voltages that create fields symmetric with respect to the central ray trajectory. A symmetric electric field is calculated corresponding to the set of unadjusted voltages. A plurality of lower electrodes is arranged at adjusted positions that are asymmetric with respect to the central ray trajectory. A set of adjusted voltages is obtained for the plurality of lower electrodes, wherein the set of adjusted voltages corresponds to a set of respective potentials of the symmetric electric field at respective adjusted asymmetric positions. The adjusted voltages are applied to the asymmetric lens configuration when the charged particle beam passes therethrough.

    摘要翻译： 控制带电粒子束在静电透镜中的偏转的方法包括建立对称的静电透镜配置，其包括设置在相对于中心射线轨迹对称的未调整位置的多个电极，所施加的未调节电压产生对称的场 到中心射线轨迹。 对应于未调整电压组的对称电场。 多个下电极被布置在相对于中心射线轨迹不对称的调整位置处。 对于多个下电极获得一组调整的电压，其中所述一组调整的电压对应于在各自调整的非对称位置处的对称电场的各个电位的集合。 当带电粒子束通过时，经调整的电压施加到非对称透镜构型上。

    Method and apparatus for controlling an asymmetric electrostatic lens about a central ray trajectory of an ion beam
    15.
    发明授权
    Method and apparatus for controlling an asymmetric electrostatic lens about a central ray trajectory of an ion beam 有权
    围绕离子束的中心射线轨迹控制非对称静电透镜的方法和装置

    公开(公告)号：US08519353B2

    公开(公告)日：2013-08-27

    申请号：US12981096

    申请日：2010-12-29

    申请人： Svetlana Radovanov ,  Peter L. Kellerman ,  Frank Sinclair ,  Robert C. Lindberg

    发明人： Svetlana Radovanov ,  Peter L. Kellerman ,  Frank Sinclair ,  Robert C. Lindberg

    IPC分类号： H01J1/88 ,  H01J3/18 ,  H01J3/38 ,  G21K1/06

    CPC分类号： H01J37/12 ,  H01J37/15 ,  H01J37/3171 ,  H01J2237/121 ,  H01J2237/151

    摘要： A method of controlling deflection of a charged particle beam in an electrostatic lens includes establishing a symmetrical electrostatic lens configuration comprising a plurality of electrodes disposed at unadjusted positions that are symmetric with respect to the central ray trajectory with applied unadjusted voltages that create fields symmetric with respect to the central ray trajectory. A symmetric electric field is calculated corresponding to the set of unadjusted voltages. A plurality of lower electrodes is arranged at adjusted positions that are asymmetric with respect to the central ray trajectory. A set of adjusted voltages is obtained for the plurality of lower electrodes, wherein the set of adjusted voltages corresponds to a set of respective potentials of the symmetric electric field at respective adjusted asymmetric positions. The adjusted voltages are applied to the asymmetric lens configuration when the charged particle beam passes therethrough.

    摘要翻译： 控制带电粒子束在静电透镜中的偏转的方法包括建立对称静电透镜配置，其包括设置在相对于中心射线轨迹对称的未调整位置的多个电极，其中施加的未调节电压产生对称的场 到中心射线轨迹。 对应于未调整电压组的对称电场。 多个下电极被布置在相对于中心射线轨迹不对称的调整位置处。 对于多个下电极获得一组调整的电压，其中所述一组调整的电压对应于在各自调整的非对称位置处的对称电场的各个电位的集合。 当带电粒子束通过时，经调整的电压施加到非对称透镜构型。

    Floating sheet production apparatus and method
    19.
    发明授权
    Floating sheet production apparatus and method 有权
    浮板生产设备及方法

    公开(公告)号：US07855087B2

    公开(公告)日：2010-12-21

    申请号：US12403206

    申请日：2009-03-12

    申请人： Peter L. Kellerman ,  Frank Sinclair

    发明人： Peter L. Kellerman ,  Frank Sinclair

    IPC分类号： H01L21/00

    CPC分类号： H01L31/02 ,  C30B15/06 ,  C30B15/14 ,  C30B15/30 ,  C30B28/10 ,  C30B29/06

    摘要： This sheet production apparatus comprises a vessel defining a channel configured to hold a melt. The melt is configured to flow from a first point to a second point of the channel. A cooling plate is disposed proximate the melt and is configured to form a sheet on the melt. A spillway is disposed at the second point of the channel. This spillway is configured to separate the sheet from the melt.

    摘要翻译： 该片材生产设备包括限定被配置为保持熔体的通道的容器。 熔体构造成从通道的第一点流到第二点。 冷却板靠近熔体设置并且被配置成在熔体上形成片材。 溢流道设置在通道的第二点。 该溢流道构造成将片材与熔体分离。