公开(公告)号：US07564557B2

公开(公告)日：2009-07-21

申请号：US11926603

申请日：2007-10-29

Applicant: Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant

Inventor： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant

IPC: G01B11/00 ,  G01B11/14 ,  G01B11/04 ,  G01B11/08 ,  G01N21/00 ,  G01N23/00 ,  G01N21/86 ,  G21K7/00 ,  G01V8/00

CPC classification number: G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

Abstract: Disclosed is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.

Abstract translation: 公开了一种组合的散射测量标记，其包括能够被测量以确定CD或轮廓信息的散射关键维度（CD）或轮廓目标，以及布置在散射测量CD或轮廓目标上的散射测绘覆盖目标，散射测绘覆盖目标与散射光谱CD 或轮廓目标以形成能够被测量以确定覆盖的散射测量标记。

公开(公告)号：US07564545B2

公开(公告)日：2009-07-21

申请号：US11724905

申请日：2007-03-15

Applicant: Stanley E. Stokowski

Inventor： Stanley E. Stokowski

IPC: G06K9/00

CPC classification number: G03F7/705

Abstract: Disclosed are apparatus and methods for finding lithographically significant defects on a reticle. In general, at least a pair of related intensity images of the reticle in question are obtained using an inspection apparatus. The intensity images are obtained such that each of the images experience different focus settings for the reticle so that there is a constant focus offset between the two focus values of the images. These images are then analyzed to obtain a transmission function of the reticle. This transmission function is then input into a model of the lithography system (e.g., a stepper, scanner, or other related photolithography system) to then produce an aerial image of the reticle pattern. The aerial image produced can then be input to a photoresist model to yield a “resist-modeled image” that corresponds to an image pattern to be printed onto the substrate using the reticle. This resist-modeled image can then be compared with a reference image to obtain defect information. In particular, due to the introduction of the lithography tool and photoresist model, this defect information pertains to lithographically significant defects.

Abstract translation: 公开了用于在掩模版上发现光刻显着缺陷的装置和方法。 通常，使用检查装置获得所述掩模版的至少一对相关强度图像。 获得强度图像，使得每个图像对于掩模版经历不同的焦点设置，使得在图像的两个焦点值之间存在恒定的聚焦偏移。 然后分析这些图像以获得掩模版的透射函数。 然后将该透射函数输入到光刻系统的模型（例如，步进器，扫描仪或其它相关的光刻系统）中，以产生标线图案的空中图像。 然后可以将产生的空间图像输入到光致抗蚀剂模型，以产生对应于使用掩模版印刷到基板上的图像图案的“抗蚀剂建模图像”。 然后将该抗蚀剂建模的图像与参考图像进行比较以获得缺陷信息。 特别地，由于引入了光刻工具和光致抗蚀剂模型，该缺陷信息涉及光刻显着的缺陷。

公开(公告)号：US07474967B2

公开(公告)日：2009-01-06

申请号：US11759580

申请日：2007-06-07

Applicant: Lei Zhong ,  John McCormack

Inventor： Lei Zhong ,  John McCormack

IPC: G06F19/00

CPC classification number: G06T7/0004

Abstract: Computer-implemented methods, carrier media, and systems for detecting defects on a wafer based on multi-core architecture are provided. One computer-implemented method for detecting defects on a wafer includes acquiring output for the wafer generated by an inspection system. Dies are formed on the wafer, and multiple cores are formed in the dies. The method also includes detecting defects on the wafer by comparing the output for a first of the multiple cores to the output for a second of the multiple cores. The first and second of the multiple cores are formed in the same die, different dies, or the same die and different dies.

Abstract translation: 提供了基于多核架构的计算机实现的方法，载体介质和用于检测晶片上的缺陷的系统。 用于检测晶片上的缺陷的一种计算机实现的方法包括获取由检查系统产生的晶片的输出。 模具形成在晶片上，并且在模具中形成多个芯。 该方法还包括通过将多个核中的第一个的输出与多个核中的第二个的输出进行比较来检测晶片上的缺陷。 多芯的第一和第二芯形成在相同的模具，不同的模具或相同的模具和不同的模具中。

公开(公告)号：US07436505B2

公开(公告)日：2008-10-14

申请号：US11278624

申请日：2006-04-04

Applicant: Alexander Belyaev ,  Daniel Kavaldjiev ,  Amith Murali ,  Aleksey Petrenko ,  Mike D. Kirk ,  David Shortt ,  Brian L. Haas ,  Kurt L. Haller

Inventor： Alexander Belyaev ,  Daniel Kavaldjiev ,  Amith Murali ,  Aleksey Petrenko ,  Mike D. Kirk ,  David Shortt ,  Brian L. Haas ,  Kurt L. Haller

IPC: G01N21/00

CPC classification number: G01N21/9501

Abstract: Computer-implemented methods and systems for determining a configuration for a light scattering inspection system are provided. One computer-implemented method includes determining a three-dimensional map of signal-to-noise ratio values for data that would be acquired for a specimen and a potential defect on the specimen by the light scattering inspection system across a scattering hemisphere of the inspection system. The method also includes determining one or more portions of the scattering hemisphere in which the signal-to-noise ratio values are higher than in other portions of the scattering hemisphere based on the three-dimensional map. In addition, the method includes determining a configuration for a detection subsystem of the inspection system based on the one or more portions of the scattering hemisphere.

Abstract translation: 提供了用于确定光散射检查系统的配置的计算机实现的方法和系统。 一种计算机实现的方法包括：通过在检查系统的散射半球上的光散射检查系统来确定用于样本获取的数据和样本上的潜在缺陷的信噪比值的三维图 。 该方法还包括基于三维图确定散射半球的一个或多个部分，其中信噪比值高于散射半球的其它部分。 此外，该方法包括基于散射半球的一个或多个部分来确定检查系统的检测子系统的配置。

公开(公告)号：US07436503B1

公开(公告)日：2008-10-14

申请号：US11009663

申请日：2004-12-10

Applicant: Grace Hsiu-Ling Chen ,  Tao-Yi Fu ,  Evan Mapoles

Inventor： Grace Hsiu-Ling Chen ,  Tao-Yi Fu ,  Evan Mapoles

IPC: G01N21/00 ,  G02B27/42

CPC classification number: G01N21/9501 ,  G01N2021/9563 ,  G02B21/10

Abstract: Accordingly, the present invention provides methods and apparatus for performing a darkfield inspection on a specimen having periodic structures thereon while substantially reducing or eliminating the long range ringing response, which is typically produced by a traditional Fourier filter mask used to eliminate the diffraction caused by the periodic structures. In one embodiment, an apparatus for inspecting a specimen by detecting optical beams scattered from the specimen. The apparatus includes a beam generator for providing and directing an incident beam towards a specimen and an array subtraction device for substantially subtracting a periodic component from an output beam scattered from the specimen in response to the incident beam. The periodic component corresponds to at least one periodic structure on the specimen, and the subtraction is performed so as to substantially reduce or eliminate a ringing response from the output beam. The subtraction is also performed so as to substantially prevent subtracting any actual defect components from the output beam. The apparatus further includes a detector for receiving the output beam and generating an output image or signal based on the output beam.

Abstract translation: 因此，本发明提供了对具有周期性结构的样本进行暗视场检查的方法和装置，同时基本上减少或消除了远程振铃响应，其通常由传统的傅立叶滤波器掩模产生，用于消除由 周期性结构。 在一个实施例中，一种用于通过检测从样本散射的光束来检查样本的装置。 该装置包括用于向入射光束提供并引导入射光束的光束发生器和用于响应于入射光束从从样本散射的输出光束基本上减去周期分量的阵列减法装置。 周期性分量对应于样本上的至少一个周期性结构，并且执行减法以便显着地减少或消除来自输出光束的振铃响应。 还执行减法，以便基本上防止从输出光束中减去任何实际的缺陷分量。 该装置还包括用于接收输出光束并基于输出光束产生输出图像或信号的检测器。

公开(公告)号：US07359052B2

公开(公告)日：2008-04-15

申请号：US10846053

申请日：2004-05-14

Applicant: John Fielden ,  Gary Janik ,  Shing Lee

Inventor： John Fielden ,  Gary Janik ,  Shing Lee

IPC: G01J4/00

CPC classification number: G01J3/10 ,  G01J3/0286 ,  G01J3/36 ,  G01N21/211 ,  G01N2021/213

Abstract: Various systems for measurement of a specimen are provided. One system includes an optical subsystem configured to perform measurements of a specimen using vacuum ultraviolet light and non-vacuum ultraviolet light. This system also includes a purging subsystem that is configured to maintain a purged environment around the optical subsystem during the measurements. Another system includes a cleaning subsystem configured to remove contaminants from a specimen prior to measurement. In one embodiment, the cleaning subsystem may be a laser-based cleaning subsystem that is configured to remove contaminants from a localized area on the specimen. The system also includes an optical subsystem that is configured to perform measurements of the specimen using vacuum ultraviolet light. The optical subsystem is disposed within a purged environment. In some embodiments, the system may include a differential purging subsystem that is configured to provide the purged environment for the optical subsystem.

Abstract translation: 提供了用于测量样本的各种系统。 一个系统包括被配置为使用真空紫外光和非真空紫外光进行样本的测量的光学子系统。 该系统还包括清洗子系统，其被配置为在测量期间保持围绕光学子系统的净化环境。 另一种系统包括清洁子系统，其构造成在测量之前从试样中去除污染物。 在一个实施例中，清洁子系统可以是被配置为从样本上的局部区域去除污染物的基于激光的清洁子系统。 该系统还包括被配置为使用真空紫外光进行样本的测量的光学子系统。 光学子系统设置在净化的环境中。 在一些实施例中，系统可以包括差分清洗子系统，其被配置为提供用于光学子系统的净化环境。

公开(公告)号：US07349090B2

公开(公告)日：2008-03-25

申请号：US09956849

申请日：2001-09-20

Applicant: Dan Wack ,  Ady Levy ,  Kyle A. Brown ,  Gary Bultman ,  Mehrdad Nikoonahad ,  John Fielden

Inventor： Dan Wack ,  Ady Levy ,  Kyle A. Brown ,  Gary Bultman ,  Mehrdad Nikoonahad ,  John Fielden

IPC: G01J4/00

CPC classification number: G03F7/70616 ,  G01N21/211 ,  G01N21/47 ,  G01N21/636 ,  G01N21/64 ,  G01N21/9501 ,  G01N2021/646 ,  G01N2021/8825 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G03F7/70658 ,  G03F7/707 ,  G03F7/70708 ,  H01J2237/31701

Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a property of a specimen prior to, during, or subsequent to lithography. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

Abstract translation: 提供了用于监测半导体制造工艺的方法和系统。 系统可以包括被配置为支撑样本并耦合到测量装置的台。 测量装置可以包括照明系统和检测系统。 照明系统和检测系统可以被配置为使得系统可以被配置为确定样本的多个属性。 例如，该系统可以被配置为确定样品的多个性质，包括但不限于在光刻之前，期间或之后的样品的性质。 以这种方式，测量装置可以执行多个光学和/或非光学测量和/或检查技术。

公开(公告)号：US07345754B1

公开(公告)日：2008-03-18

申请号：US11228584

申请日：2005-09-16

Applicant: Guoheng Zhao ,  Mehdi Vaez-Iravani ,  Andrew V. Hill ,  Avijit K. Ray-Chaudhuri

Inventor： Guoheng Zhao ,  Mehdi Vaez-Iravani ,  Andrew V. Hill ,  Avijit K. Ray-Chaudhuri

IPC: G01N21/00 ,  G02B27/46

CPC classification number: G01N21/9501 ,  G01N21/4738 ,  G01N21/956 ,  G03F7/7065

Abstract: Fourier filters and wafer inspection systems are provided. One embodiment relates to a one-dimensional Fourier filter configured to be included in a bright field inspection system such that the bright field inspection system can be used for broadband dark field inspection of a wafer. The Fourier filter includes an asymmetric illumination aperture configured to be positioned in an illumination path of the inspection system. The Fourier filter also includes an asymmetric imaging aperture complementary to the illumination aperture. The imaging aperture is configured to be positioned in a light collection path of the inspection system such that the imaging aperture blocks light reflected and diffracted from structures on the wafer and allows light scattered from defects on the wafer to pass through the imaging aperture.

Abstract translation: 提供傅立叶滤波器和晶片检测系统。 一个实施例涉及被配置为包括在明场检查系统中的一维傅立叶滤波器，使得明场检查系统可以用于晶片的宽带暗视场检查。 傅里叶滤波器包括被配置为定位在检查系统的照明路径中的非对称照明孔。 傅立叶滤波器还包括与照明孔径互补的非对称成像孔。 成像孔被配置为定位在检查系统的光采集路径中，使得成像孔口阻挡从晶片上的结构反射和衍射的光，并允许从晶片上的缺陷散射的光通过成像孔。

公开(公告)号：US20080060426A1

公开(公告)日：2008-03-13

申请号：US11518320

申请日：2006-09-08

Applicant: Christoper F. Bevis ,  Marco Tortonese

Inventor： Christoper F. Bevis ,  Marco Tortonese

IPC: G01N13/16

CPC classification number: G01Q60/38 ,  G01Q70/02

Abstract: In one embodiment, an atomic force microscope comprises a frame, a beam coupled to the frame at a first end and a second end, a probe mounted to the beam, means for inducing relative motion between the beam and an underlying surface, and means for detecting a characteristic of the beam.

公开(公告)号：US20070229809A1

公开(公告)日：2007-10-04

申请号：US11278624

申请日：2006-04-04

Applicant: Alexander Belyaev ,  Daniel Kavaldjiev ,  Amith Murali ,  Aleksey Petrenko ,  Mike Kirk ,  David Shortt ,  Brian Haas ,  Kurt Haller

Inventor： Alexander Belyaev ,  Daniel Kavaldjiev ,  Amith Murali ,  Aleksey Petrenko ,  Mike Kirk ,  David Shortt ,  Brian Haas ,  Kurt Haller

IPC: G01N21/88

CPC classification number: G01N21/9501

Abstract: Computer-implemented methods and systems for determining a configuration for a light scattering inspection system are provided. One computer-implemented method includes determining a three-dimensional map of signal-to-noise ratio values for data that would be acquired for a specimen and a potential defect on the specimen by the light scattering inspection system across a scattering hemisphere of the inspection system. The method also includes determining one or more portions of the scattering hemisphere in which the signal-to-noise ratio values are higher than in other portions of the scattering hemisphere based on the three-dimensional map. In addition, the method includes determining a configuration for a detection subsystem of the inspection system based on the one or more portions of the scattering hemisphere.

Abstract translation: 提供了用于确定光散射检查系统的配置的计算机实现的方法和系统。 一种计算机实现的方法包括：通过在检查系统的散射半球上的光散射检查系统来确定用于样本获取的数据和样本上的潜在缺陷的信噪比值的三维图 。 该方法还包括基于三维图确定散射半球的一个或多个部分，其中信噪比值高于散射半球的其它部分。 此外，该方法包括基于散射半球的一个或多个部分来确定检查系统的检测子系统的配置。